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Journal Articles

Carbon nanotube collimator as an vacuum ultraviolet window

S. C. Olsen, D. D. Allred, R. R. Vanfleet
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 043001 (2024)
https://doi.org/10.1116/6.0003675
Published: June 2024
View article titled, Carbon nanotube collimator as an vacuum ultraviolet window
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Journal Articles

Deviation of photoelectron intensity from Beer-Lambert law in near-ambient pressure hard x-ray photoelectron spectroscopy

Kento Takenaka, Koji Takahara, Tomoki Eguchi, Hirosuke Sumida, Satoru Suzuki
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 044204 (2023)
https://doi.org/10.1116/6.0002662
Published: June 2023
View article titled, Deviation of photoelectron intensity from Beer-Lambert law in near-ambient pressure hard x-ray photoelectron spectroscopy
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Journal Articles

Comparison of the effective parameters of single-tip tungsten emitter using Fowler–Nordheim and Murphy–Good plots

Eugeni O. Popov, Sergey V. Filippov, Anatoly G. Kolosko, Alexandr Knápek
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 024201 (2022)
https://doi.org/10.1116/6.0001645
Published: February 2022
View article titled, Comparison of the effective parameters of single-tip tungsten emitter using Fowler–Nordheim and Murphy–Good plots
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Journal Articles

High-brightness source of energetic He atoms

Venu S. Jonnalagadda, Navjot S. Randhawa, Apeksha Awale, Pratik Motwani, John C. Wolfe
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 38, 012601 (2020)
https://doi.org/10.1116/1.5124838
Published: December 2019
View article titled, High-brightness source of energetic He atoms
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Journal Articles

High emission current of 1000 μA at 4 × 10−10 Pa from W⟨310⟩ cold field emitter in electron gun

Keigo Kasuya, Souichi Katagiri, Takashi Ohshima
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 042202 (2016)
https://doi.org/10.1116/1.4953070
Published: June 2016
View article titled, High emission current of 1000 <em>μ</em>A at 4 × 10<sup>−10 </sup>Pa from W⟨310⟩ cold field emitter in electron gun
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Journal Articles

Magnetic field superimposed cold field emission gun under extreme-high vacuum

Keigo Kasuya, Takeshi Kawasaki, Noboru Moriya, Makoto Arai, Tadao Furutsu
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 32, 031802 (2014)
https://doi.org/10.1116/1.4869545
Published: March 2014
View article titled, Magnetic field superimposed cold field emission gun under extreme-high vacuum
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Journal Articles

Development of high spatial resolution x-ray radiography system equipped with multiwalled carbon nanotube field emission cathode

Ryosuke Yabushita, Koichi Hata
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 26, 702–705 (2008)
https://doi.org/10.1116/1.2894879
Published: April 2008
View article titled, Development of high spatial resolution x-ray radiography system equipped with multiwalled carbon nanotube field emission cathode
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Journal Articles

In situ x-ray absorption near-edge structure analysis for extreme ultraviolet lithography projection optics contamination

Masahito Niibe, Yukinobu Kakutani, Keigo Koida, Shuichi Matsunari, Takashi Aoki, Shigeru Terashima, Hiromitsu Takase, Katsuhiko Murakami, Yasuaki Fukuda
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 2118–2122 (2007)
https://doi.org/10.1116/1.2779047
Published: December 2007
View article titled, <em>In situ</em> x-ray absorption near-edge structure analysis for extreme ultraviolet lithography projection optics contamination
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Journal Articles

Large area and wide dimension range x-ray lithography for lithographite, galvanoformung, and abformung process using energy variable synchrotron radiation

Yuichi Utsumi, Takefumi Kishimoto
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 23, 2903–2909 (2005)
https://doi.org/10.1116/1.2131880
Published: December 2005
View article titled, Large area and wide dimension range x-ray lithography for lithographite, galvanoformung, and abformung process using energy variable synchrotron radiation
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Journal Articles

OS3: Photoemission from gold thin films for application in multiphotocathode arrays for electron beam lithography

Xinrong Jiang, C. N. Berglund, Anthony E. Bell, William A. Mackie
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 16, 3374–3379 (1998)
https://doi.org/10.1116/1.590462
Published: November 1998
View article titled, OS3: Photoemission from gold thin films for application in multiphotocathode arrays for electron beam lithography
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Journal Articles

Real‐time process and product diagnostics in rapid thermal chemical vapor deposition using in situ mass spectrometric sampling

L. L. Tedder, G. W. Rubloff, I. Shareef, M. Anderle, D.‐H. Kim, G. N. Parsons
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 13, 1924–1927 (1995)
https://doi.org/10.1116/1.588110
Published: July 1995
View article titled, Real‐time process and product diagnostics in rapid thermal chemical vapor deposition using <em>in situ</em> mass spectrometric sampling
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Journal Articles

Design of an atom‐cluster generator for a transmission electron microscope and in situ observation of the deposition process of large atom clusters

H. Mori, K. Fujii, M. Komatsu, K. Miyauchi
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 12, 2462–2464 (1994)
https://doi.org/10.1116/1.587784
Published: July 1994
View article titled, Design of an atom‐cluster generator for a transmission electron microscope and <em>in</em> <em>situ</em> observation of the deposition process of large atom clusters
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Journal Articles

100 kV Schottky electron gun

J. B. McGinn, L. W. Swanson, N. A. Martin, M. A. Gesley, M. A. McCord, R. Viswanathan, F. J. Hohn, A. D. Wilson, R. Naumann, M. Utlaut
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 9, 2925–2928 (1991)
https://doi.org/10.1116/1.585627
Published: November 1991
View article titled, 100 kV Schottky electron gun
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Journal Articles

The first x‐ray lithography beamline at Hefei National Synchrotron Radiation Laboratory

Shinan Qian, Guihe Li, Zewen Liu, Qianhong Chen, Dikui Jiang, Wanpo Liu, Ya Kan, Yonggang Su
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 8, 1524–1528 (1990)
https://doi.org/10.1116/1.585109
Published: November 1990
View article titled, The first x‐ray lithography beamline at Hefei National Synchrotron Radiation Laboratory
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Journal Articles

Silicon molecular beam epitaxy: Use of a microion source for doping by low‐energy implantation

R. P. de Carvalho, N. Djebbar, J. Gutierrez, A. Vapaille
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 5, 515–517 (1987)
https://doi.org/10.1116/1.583941
Published: March 1987
View article titled, Silicon molecular beam epitaxy: Use of a microion source for doping by low‐energy implantation
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