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Journal Articles

Science challenges and research opportunities for plasma applications in microelectronics

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David B. Graves, Catherine B. Labelle, Mark J. Kushner, Eray S. Aydil, Vincent M. Donnelly, Jane P. Chang, Peter Mayer, Lawrence Overzet, Steven Shannon, Shahid Rauf, David N. Ruzic
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 042202 (2024)
https://doi.org/10.1116/6.0003531
Published: June 2024
View article titled, Science challenges and research opportunities for plasma applications in microelectronics
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Journal Articles

Extreme contact shrink for back end of line connectivity

Filip Schleicher, Sara Paolillo, Stefan Decoster, Chen Wu, Victor Vega-Gonzalez, Mahmudul Hasan, Christophe Beral, Frédéric Lazzarino
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 032803 (2022)
https://doi.org/10.1116/6.0001757
Published: May 2022
View article titled, Extreme contact shrink for back end of line connectivity
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Journal Articles

Buffer insensitive optoelectronic quality of InP-on-Si with templated liquid phase growth

Debarghya Sarkar, Wei Wang, Qingfeng Lin, Jun Tao, Matthew Mecklenburg, Jayakanth Ravichandran, Rehan Kapadia
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 031204 (2018)
https://doi.org/10.1116/1.5026503
Published: April 2018
View article titled, Buffer insensitive optoelectronic quality of InP-on-Si with templated liquid phase growth
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Journal Articles

Modeling the topography of uneven substrates post spin-coating

Stefan Decoster, Xiaoyu Piao, Werner Gillijns, Frédéric Lazzarino
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 03E102 (2018)
https://doi.org/10.1116/1.5022166
Published: March 2018
View article titled, Modeling the topography of uneven substrates post spin-coating
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Journal Articles

Analytical study of polymer deposition distribution for two-dimensional trench sidewall in low-k fluorocarbon plasma etching process

Sun-Woo Kim, Hwan-Jun Zang, June Park, Gwang-Sik Kim, Hyun-Yong Yu, Minwoo Ha, Kyungbo Ko, Sang Soo Park, Choon Hwan Kim
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 011802 (2018)
https://doi.org/10.1116/1.4996641
Published: December 2017
View article titled, Analytical study of polymer deposition distribution for two-dimensional trench sidewall in low-k fluorocarbon plasma etching process
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Journal Articles

Tilted ion implantation as a cost-efficient sublithographic patterning technique

Sang Wan Kim, Peng Zheng, Kimihiko Kato, Leonard Rubin, Tsu-Jae King Liu
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 040608 (2016)
https://doi.org/10.1116/1.4953085
Published: June 2016
View article titled, Tilted ion implantation as a cost-efficient sublithographic patterning technique
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Journal Articles

To charge or not to charge: 50 years of lithographic choices

R. Fabian Pease
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 28, C6A1–C6A6 (2010)
https://doi.org/10.1116/1.3517607
Published: December 2010
View article titled, To charge or not to charge: 50 years of lithographic choices
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Journal Articles

Molecular beam epitaxy growth of InAs and In 0.8 Ga 0.2 As channel materials on GaAs substrate for metal oxide semiconductor field effect transistor applications

Ning Li, Eric S. Harmon, David B. Salzman, Dmitri N. Zakharov, Jong-Hyeok Jeon, Eric Stach, Jerry M. Woodall, X. W. Wang, T. P. Ma, Fred Walker
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 26, 1187–1190 (2008)
https://doi.org/10.1116/1.2912086
Published: May 2008
View article titled, Molecular beam epitaxy growth of InAs and In 0.8 Ga 0.2 As channel materials on GaAs substrate for metal oxide semiconductor field effect transistor applications
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Journal Articles

Effect of low Ge content on B diffusion in amorphous SiGe alloys

L. A. Edelman, R. G. Elliman, L. Rubin, L. Washington, K. S. Jones
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 26, 333–337 (2008)
https://doi.org/10.1116/1.2781511
Published: January 2008
View article titled, Effect of low Ge content on B diffusion in amorphous SiGe alloys
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Journal Articles

Ballistic recovery in III-V nanowire transistors

M. J. Gilbert, S. K. Banerjee
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 189–193 (2007)
https://doi.org/10.1116/1.2409987
Published: January 2007
View article titled, Ballistic recovery in III-V nanowire transistors
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Journal Articles

Arrayed miniature electron beam columns for mask making

J. P. Spallas, C. S. Silver, L. P. Muray
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 24, 2892–2896 (2006)
https://doi.org/10.1116/1.2395955
Published: November 2006
View article titled, Arrayed miniature electron beam columns for mask making
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Journal Articles

Converging lithography by combination of electrostatic layer-by-layer self-assembly and 193 nm photolithography: Top-down meets bottom-up

Jung Hwan Hah, Subramanya Mayya, Mitsuhiro Hata, Yun-Kyeong Jang, Hyun-Woo Kim, Manhyoung Ryoo, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 24, 2209–2213 (2006)
https://doi.org/10.1116/1.2244541
Published: September 2006
View article titled, Converging lithography by combination of electrostatic layer-by-layer self-assembly and 193 nm photolithography: Top-down meets bottom-up
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Journal Articles

Resist effects at small pitches

David Van Steenwinckel, Jeroen H. Lammers, Thomas Koehler, Robert L. Brainard, Peter Trefonas
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 24, 316–320 (2006)
https://doi.org/10.1116/1.2151912
Published: January 2006
View article titled, Resist effects at small pitches
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Journal Articles

Charting the future (and remembering the past) of optical lithography simulation

Chris A. Mack
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 23, 2601–2606 (2005)
https://doi.org/10.1116/1.2130354
Published: November 2005
View article titled, Charting the future (and remembering the past) of optical lithography simulation
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Journal Articles

Immersion lithography: New opportunities for semiconductor manufacturing

Darío Gil, Timothy A. Brunner, Carlos Fonseca, Nakgeuon Seong, Bob Streefkerk, Christian Wagner, Marco Stavenga
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 22, 3431–3438 (2004)
https://doi.org/10.1116/1.1823431
Published: December 2004
View article titled, Immersion lithography: New opportunities for semiconductor manufacturing
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Journal Articles

Secondary ion mass spectrometry characterization of source/drain junctions for strained silicon channel metal–oxide–semiconductor field-effect transistors

Erika Duda, Shifeng Lu, Chun-Li Liu, Zhixiong Jiang, Joe Lerma, Alex Barr, Aaron Thean, Marius Orlowski, Ted White, Bich-Yen Nguyen
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 22, 327–331 (2004)
https://doi.org/10.1116/1.1640659
Published: February 2004
View article titled, Secondary ion mass spectrometry characterization of source/drain junctions for strained silicon channel metal–oxide–semiconductor field-effect transistors
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