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Journal Articles

Twin-free thermal laser epitaxy of Si on sapphire

Editor’s PickOpen Access
Thomas J. Smart, Dong Yeong Kim, Wolfgang Braun
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 062204 (2024)
https://doi.org/10.1116/6.0003945
Published: October 2024
View articletitled, Twin-free thermal laser epitaxy of Si on sapphire
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Journal Articles

4H-SiC layer with multiple trenches in lateral double-diffused metal-oxide-semiconductor transistors for high temperature and high voltage applications

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Amir Sohrabi-Movahed, Ali Asghar Orouji
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 063201 (2023)
https://doi.org/10.1116/6.0002971
Published: November 2023
View articletitled, 4H-SiC layer with multiple trenches in lateral double-diffused metal-oxide-semiconductor transistors for high temperature and high voltage applications
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Journal Articles

Defect characterization in floating body transistors using a single pulse charge pumping method

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Manh-Cuong Nguyen, An Hoang-Thuy Nguyen, Jiyong Yim, Anh-Duy Nguyen, Mingyu Kim, Jeonghan Kim, Jongyeon Baek, Rino Choi
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 053205 (2021)
https://doi.org/10.1116/6.0001172
Published: September 2021
View articletitled, Defect characterization in floating body transistors using a single pulse charge pumping method
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Journal Articles

Improvement of silicon microdisk resonators with movable waveguides by hydrogen annealing treatment

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Taiyu Okatani, Yuichi Sato, Kaoru Imai, Kazuhiro Hane, Yoshiaki Kanamori
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 030602 (2021)
https://doi.org/10.1116/6.0000971
Published: April 2021
View articletitled, Improvement of silicon microdisk resonators with movable waveguides by hydrogen annealing treatment
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Journal Articles

Experimental reliability study of cumulative damage models on state-of-the-art semiconductor technologies for step-stress tests and mission profile stresses

Open Access
A. Hirler, J. Biba, D. Lipp, H. Lochner, M. Siddabathula, S. Simon, T. Sulima, M. Wiatr, W. Hansch
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 38, 064001 (2020)
https://doi.org/10.1116/6.0000504
Published: September 2020
View articletitled, Experimental reliability study of cumulative damage models on state-of-the-art semiconductor technologies for step-stress tests and mission profile stresses
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Journal Articles

Imaging the native inversion layer under buried oxide in silicon-on-insulator radio frequency device technology via scanning surface photovoltage microscopy

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Daminda H. Dahanayaka, Philip V. Kaszuba, Leon Moszkowicz, Randall H. Wells, Franklin J. Alwine, Richard A. Phelps, James A. Slinkman, Andrew A. Wong, Lloyd A. Bumm
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 37, 052906 (2019)
https://doi.org/10.1116/1.5111139
Published: September 2019
View articletitled, Imaging the native inversion layer under buried oxide in silicon-on-insulator radio frequency device technology via scanning surface photovoltage microscopy
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Journal Articles

On the trends and application of pattern density dependent isofocal dose of positive resists for 100 keV electron beam lithography

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Gerald G. Lopez, Glen de Villafranca, Mohsen Azadi, Meredith G. Metzler, Kevin Lister, Michael Labella, Chad Eichfeld, Nikola Belic, Ulrich Hofmann
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 06JA05 (2018)
https://doi.org/10.1116/1.5048206
Published: November 2018
View articletitled, On the trends and application of pattern density dependent isofocal dose of positive resists for 100 keV electron beam lithography
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Journal Articles

Bevel depth profiling by high-spatial-resolution sputtered neutral mass spectrometry with laser postionization

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Takahiro Kashiwagi, Satoru Nagashima, Takeharu Ishikawa, Akio Takano, Suet-Yi Liu, Hisataka Takenaka, Katsumi Endo, Masaaki Fujii
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 03F133 (2018)
https://doi.org/10.1116/1.5019692
Published: May 2018
View articletitled, Bevel depth profiling by high-spatial-resolution sputtered neutral mass spectrometry with laser postionization
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Journal Articles

Top-down technique for scaling to nano in silicon MEMS

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Mustafa Yilmaz, Yasin Kilinc, Gokhan Nadar, Zuhal Tasdemir, Nicole Wollschläger, Werner Österle, Yusuf Leblebici, B. Erdem Alaca
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 35, 022001 (2017)
https://doi.org/10.1116/1.4978047
Published: March 2017
View articletitled, Top-down technique for scaling to nano in silicon MEMS
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Journal Articles

Fabrication process for 200 nm-pitch polished freestanding ultrahigh aspect ratio gratings

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Alexander R. Bruccoleri, Ralf K. Heilmann, Mark L. Schattenburg
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 06KD02 (2016)
https://doi.org/10.1116/1.4966595
Published: November 2016
View articletitled, Fabrication process for 200 nm-pitch polished freestanding ultrahigh aspect ratio gratings
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Journal Articles

Study of the effect of thermal treatment on morphology and chemical composition of silicon-on-insulator

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Prabhava S. N. Barimar, Catherine M. Doyle, Borislav Naydenov, John J. Boland
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 041806 (2016)
https://doi.org/10.1116/1.4955067
Published: July 2016
View articletitled, Study of the effect of thermal treatment on morphology and chemical composition of silicon-on-insulator
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Journal Articles

High quality extremely thin SOI fabricated by facilitated ion-cut with H-trapping effect

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Yongwei Chang, Zhongying Xue, Da Chen, Shi Cheng, Miao Zhang, Zengfeng Di, Xing Wei, Xi Wang
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 020601 (2016)
https://doi.org/10.1116/1.4943562
Published: March 2016
View articletitled, High quality extremely thin SOI fabricated by facilitated ion-cut with H-trapping effect
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Journal Articles

Sacrificial structures for deep reactive ion etching of high-aspect ratio kinoform silicon x-ray lenses

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Frederik Stöhr, Jonas Michael-Lindhard, Jörg Hübner, Flemming Jensen, Hugh Simons, Anders Clemen Jakobsen, Henning Friis Poulsen, Ole Hansen
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 33, 062001 (2015)
https://doi.org/10.1116/1.4931622
Published: September 2015
View articletitled, Sacrificial structures for deep reactive ion etching of high-aspect ratio kinoform silicon x-ray lenses
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Includes: Supplementary data
Journal Articles

Hydrogen silsesquioxane on SOI proximity and microloading effects correction from a single 1D characterization sample

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Justin R. Bickford, Gerald Lopez, Nikola Belic, Ulrich Hofmann
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 32, 06F511 (2014)
https://doi.org/10.1116/1.4901567
Published: November 2014
View articletitled, Hydrogen silsesquioxane on SOI proximity and microloading effects correction from a single 1D characterization sample
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Journal Articles

Programmed self-assembly of microscale components using biomolecular recognition through the avidin–biotin interaction

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Trevor Olsen, Jason Ng, Maria Stepanova, Steven K. Dew
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 32, 06F301 (2014)
https://doi.org/10.1116/1.4893075
Published: August 2014
View articletitled, Programmed self-assembly of microscale components using biomolecular recognition through the avidin–biotin interaction
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Journal Articles

Highly separated hybrid orientation structure of CeO2(100) and (110) on Si(100) substrates by electron beam-induced orientation-selective epitaxy

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Tomoyasu Inoue, Shigenari Shida
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 32, 03D108 (2014)
https://doi.org/10.1116/1.4863301
Published: January 2014
View articletitled, Highly separated hybrid orientation structure of CeO2(100) and (110) on Si(100) substrates by electron beam-induced orientation-selective epitaxy
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Journal Articles

Fabrication of p-type silicon nanowires for 3D FETs using focused ion beam

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Marcos V. Puydinger dos Santos, Lucas P. B. Lima, Jose A. Diniz, Jose Godoy Filho
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 31, 06FA01 (2013)
https://doi.org/10.1116/1.4823763
Published: September 2013
View articletitled, Fabrication of p-type silicon nanowires for 3D FETs using focused ion beam
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Journal Articles

Stiction-free fabrication of lithographic nanostructures on resist-supported nanomechanical resonators

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Zhu Diao, Joseph E. Losby, Jacob A. J. Burgess, Vincent T. K. Sauer, Wayne K. Hiebert, Mark R. Freeman
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 31, 051805 (2013)
https://doi.org/10.1116/1.4821194
Published: September 2013
View articletitled, Stiction-free fabrication of lithographic nanostructures on resist-supported nanomechanical resonators
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Journal Articles

Fabrication of transferrable, fully suspended silicon photonic crystal nanomembranes exhibiting vivid structural color and high-Q guided resonance

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Chenxi Lin, Luis Javier Martínez, Michelle L. Povinelli
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 31, 050606 (2013)
https://doi.org/10.1116/1.4819297
Published: August 2013
View articletitled, Fabrication of transferrable, fully suspended silicon photonic crystal nanomembranes exhibiting vivid structural color and high-Q guided resonance
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Journal Articles

Characteristics of metal–oxide–semiconductor field-effect transistors with a functional gate using trap charging for ultralow power operation

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Takashi Kudo, Takashi Ito, Anri Nakajima
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 31, 012206 (2013)
https://doi.org/10.1116/1.4773576
Published: January 2013
View articletitled, Characteristics of metal–oxide–semiconductor field-effect transistors with a functional gate using trap charging for ultralow power operation
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