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Journal Articles

Controlling the silicon nanowire tapering angle in dense arrays of silicon nanowires using deep reactive ion etching

Daniel S. Engstrom, Yeong-Ah Soh
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 31, 021806 (2013)
https://doi.org/10.1116/1.4793500
Published: February 2013
View article titled, Controlling the silicon nanowire tapering angle in dense arrays of silicon nanowires using deep reactive ion etching
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Journal Articles

Hot embossing of thick amorphous fluoropolymer for back end processing of infrared arrays

Justin K. Markunas, Peter J. Smith, John Melngailis
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 30, 061601 (2012)
https://doi.org/10.1116/1.4757287
Published: October 2012
View article titled, Hot embossing of thick amorphous fluoropolymer for back end processing of infrared arrays
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Journal Articles

Fabrication of ultra-high-density nanodot array patterns (∼3 Tbits/in.2) using electron-beam lithography

Min-Hyun Lee, Hyun-Mi Kim, Seong-Yong Cho, Kipil Lim, Soo-Yeon Park, Jae Jong Lee, Ki-Bum Kim
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 29, 061602 (2011)
https://doi.org/10.1116/1.3646469
Published: October 2011
View article titled, Fabrication of ultra-high-density nanodot array patterns (∼3 Tbits/in.<sup>2</sup>) using electron-beam lithography
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Includes: Supplementary data
Journal Articles

Circular apertures for contact hole patterning in 193 nm immersion lithography

C. J. Tay, C. Quan, M. L. Ling, G. S. Chua, S. K. Tan, Q. Lin
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 29, 021003 (2011)
https://doi.org/10.1116/1.3546100
Published: January 2011
View article titled, Circular apertures for contact hole patterning in 193 nm immersion lithography
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Journal Articles

High transmission pellicles for extreme ultraviolet lithography reticle protection

Yashesh A. Shroff, Michael Leeson, Pei-Yang Yan, Eric Gullikson, Farhad Salmassi
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 28, C6E36–C6E41 (2010)
https://doi.org/10.1116/1.3505126
Published: November 2010
View article titled, High transmission pellicles for extreme ultraviolet lithography reticle protection
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Journal Articles

Mask observation results using a coherent extreme ultraviolet scattering microscope at NewSUBARU

Tetsuo Harada, Junki Kishimoto, Takeo Watanabe, Hiroo Kinoshita, Dong Gun Lee
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 3203–3207 (2009)
https://doi.org/10.1116/1.3258633
Published: December 2009
View article titled, Mask observation results using a coherent extreme ultraviolet scattering microscope at NewSUBARU
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Journal Articles

Feature filling modeling for step and flash imprint lithography

Siddharth Chauhan, Frank Palmieri, Roger T. Bonnecaze, C. Grant Willson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 1926–1932 (2009)
https://doi.org/10.1116/1.3147212
Published: July 2009
View article titled, Feature filling modeling for step and flash imprint lithography
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Journal Articles

Micro-ink-jetting of silver nanoparticles on low temperature cofired ceramic substrates for drop-on-demand metallization

Y. N. Liang, Xuechuan Shan, P. W. Gian, B. K. Lok, C. W. Lu
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 1431–1436 (2009)
https://doi.org/10.1116/1.3093921
Published: May 2009
View article titled, Micro-ink-jetting of silver nanoparticles on low temperature cofired ceramic substrates for drop-on-demand metallization
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Journal Articles

Forbidden pitch improvement using modified illumination in lithography

M. L. Ling, C. J. Tay, C. Quan, G. S. Chua, Q. Lin
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 85–91 (2009)
https://doi.org/10.1116/1.3054286
Published: January 2009
View article titled, Forbidden pitch improvement using modified illumination in lithography
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Journal Articles

Comparative study of size dependent four-point probe sheet resistance measurement on laser annealed ultra-shallow junctions

Dirch Hjorth Petersen, Rong Lin, Torben Mikael Hansen, Erik Rosseel, Wilfried Vandervorst, Christian Markvardsen, Daniel Kjær, Peter Folmer Nielsen
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 26, 362–367 (2008)
https://doi.org/10.1116/1.2794743
Published: January 2008
View article titled, Comparative study of size dependent four-point probe sheet resistance measurement on laser annealed ultra-shallow junctions
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Journal Articles

Exposure latitude of deep-ultraviolet conformable contact photolithography

C. P. Fucetola, D. J. D. Carter, J. G. Goodberlet
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 26, 36–40 (2008)
https://doi.org/10.1116/1.2817634
Published: January 2008
View article titled, Exposure latitude of deep-ultraviolet conformable contact photolithography
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Journal Articles

Optimal temperature for development of poly(methylmethacrylate)

Bryan Cord, Jodie Lutkenhaus, Karl K. Berggren
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 2013–2016 (2007)
https://doi.org/10.1116/1.2799978
Published: December 2007
View article titled, Optimal temperature for development of poly(methylmethacrylate)
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Journal Articles

Low temperature ZEP-520A development process for enhanced critical dimension realization in reactive ion etch etched polysilicon

H. Wang, G. M. Laws, S. Milicic, P. Boland, A. Handugan, M. Pratt, T. Eschrich, S. Myhajlenko, J. A. Allgair, B. Bunday
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 102–105 (2007)
https://doi.org/10.1116/1.2426976
Published: January 2007
View article titled, Low temperature ZEP-520A development process for enhanced critical dimension realization in reactive ion etch etched polysilicon
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Journal Articles

Effect of mask pattern correction for off-axis incident light in extreme ultraviolet lithography

Minoru Sugawara, Iwao Nishiyama, Mikio Takai
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 22, 3053–3058 (2004)
https://doi.org/10.1116/1.1809616
Published: December 2004
View article titled, Effect of mask pattern correction for off-axis incident light in extreme ultraviolet lithography
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Journal Articles

Analytical study on small contact hole process for sub- 65 nm node generation

Hyun-Woo Kim, Jin-Young Yoon, Jung-Hwan Hah, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 22, L38–L43 (2004)
https://doi.org/10.1116/1.1815315
Published: November 2004
View article titled, Analytical study on small contact hole process for sub- 65 nm node generation
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Journal Articles

Optical proximity correction for intermediate-pitch features using sub-resolution scattering bars

J. Fung Chen, Tom Laidig, Kurt E. Wampler, Roger Caldwell
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 15, 2426–2433 (1997)
https://doi.org/10.1116/1.589660
Published: November 1997
View article titled, Optical proximity correction for intermediate-pitch features using sub-resolution scattering bars
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