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Papers from the 65th International Conference on Electron, Ion, And Photon Beam Technology and Nanofabrication (EIPBN 2022)

This collection includes papers from the 65th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication held from May 31 – June 3, 2022 in New Orleans, Louisiana. The EIPBN Conference is dedicated to lithographic patterning science, nano-manufacturing process technology, and the applications these methods enable. The Conference Chair was James Spallas (KLA), and the Program Chair was B. Robert Ilic (National Institute of Standards and Technology).

Guest Editor: Program Chair: B. Robert Ilic

Nanoscale Science and Technology

Chemical and electrical modifications of few-layer graphene films via sub-10 keV electron beam irradiation

Karla Moyano; Carlos Reinoso; Steven Núñez; Beatriz Pérez; Cristian Santacruz; César Costa; Esteban Irribarra

https://doi.org/10.1116/6.0002123

Electronic and Optoelectronic Materials, Devices and Processing

Fabrication of plasmonic Au nanostructures on dielectric supports using 10 keV electron beam lithography and tests for SERS biodetection

Haseeb Ahmed; Min Wu; Maria Stepanova

https://doi.org/10.1116/6.0002108

Nanoscale Science and Technology

Computational study of mechanical stresses in a cell interacting with micromechanical cues and microfabrication of such cues in Nervous system-on-Chips

Rahman Sabahi-Kaviani; Daan van Boekel; Regina Luttge

https://doi.org/10.1116/6.0002291

Lithography

Effect of water vapor pressure on positive and negative tone electron-beam patterning of poly(methyl methacrylate)

Deepak Kumar; Krishnaroop Chaudhuri; Joseph W. Brill; Jonathan T. Pham; J. Todd Hastings

https://doi.org/10.1116/6.0002118

Nanoscale Science and Technology

Systematic study of InP/InGaAsP heated plasma etching and roughness improvement for integrated optical devices

Kaustubh Vyas; Kashif M. Awan; Ksenia Dolgaleva

https://doi.org/10.1116/6.0002167

Lithography

Surface property control for 193 nm immersion resist by addition of Si compound

Chen Tang; Atsushi Sekiguchi; Yosuke Ohta; Yoshihiko Hirai; Masaaki Yasuda

https://doi.org/10.1116/6.0002128

Lithography

Long, stitch-free slot waveguide with s-bend tapered couplers for IR-sensing applications using electron beam lithography

Henock Demessie Yallew; Jana Jágerská; Martin M. Greve

https://doi.org/10.1116/6.0002187

MEMS and NEMS

Pneumatic controlled nanosieve for efficient capture and release of nanoparticles

Animesh Nanaware; Taylor Kranbuhl; Jesus Ching; Janice S. Chen; Xinye Chen; Qingsong Tu; Ke Du

https://doi.org/10.1116/6.0002107

Lithography

Trilayer process for T-gate and Γ-gate lithography using ternary developer and proximity effect correction superposition

Leonidas E. Ocola; James Bucchignano; Simon Dawes; Andrei Fustochenko

https://doi.org/10.1116/6.0002121

Microelectronic and Nanoelectronic Devices

Micromirror fabrication for co-packaged optics using 3D nanoimprint technology

Fumi Nakamura; Kenta Suzuki; Akihiro Noriki; Takeru Amano

https://doi.org/10.1116/6.0002119

Lithography

Multiple material stack grayscale patterning using electron-beam lithography and a single plasma etching step

R. Dawant; S. Ecoffey; D. Drouin

https://doi.org/10.1116/6.0002116

Vacuum Measurement and Technology

Time response measurement of pulsed electron beam from InGaN photocathode

Daiki Sato; Haruka Shikano; Atsushi Koizumi; Tomohiro Nishitani

https://doi.org/10.1116/6.0002122

Vacuum Measurement and Technology

Scanning electron microscope imaging by selective e-beaming using photoelectron beams from semiconductor photocathodes

Tomohiro Nishitani; Yuta Arakawa; Shotaro Noda; Atsushi Koizumi; Daiki Sato; Haruka Shikano; Hokuto Iijima; Yoshio Honda; Hiroshi Amano

https://doi.org/10.1116/6.0002111

Nanoscale Science and Technology

Fabrication of three-dimensional opal nanolattices using template-directed colloidal assembly

Vijay Anirudh Premnath; I.-Te Chen; Kun-Chieh Chien; Chih-Hao Chang

https://doi.org/10.1116/6.0002112

Electronic and Optoelectronic Materials, Devices and Processing

Dependence of electron emission current density on excitation power density from Cs/O-activated negative electron affinity InGaN photocathode

Atsushi Koizumi; Daiki Sato; Haruka Shikano; Hokuto Iijima; Tomohiro Nishitani

https://doi.org/10.1116/6.0002124

Nanoscale Science and Technology

Controlling the etch selectivity of silicon using low-RF power HBr reactive ion etching

Kun-Chieh Chien; Chih-Hao Chang

https://doi.org/10.1116/6.0002109

Nanoscale Science and Technology

Fabrication of microstructures on curved hydrogel substrates

M. Chen; X. Ding; L. Que; X. Liang

https://doi.org/10.1116/6.0002071

Lithography

Selective growth of graphene films on gallium-focused ion beam irradiated domains

Jacques Gierak; Gilles Raynaud; Caroline Guiziou; Jean René Coudevylle; Ali Madouri; Lars Bruchhaus; Achim Nadzeyka; Björn Whittman; Ralf Jede; Christophe David; Jean Christophe Girard

https://doi.org/10.1116/6.0002104

Papers from the 65th International Conference on Electron, Ion, And Photon Beam Technology and Nanofabrication (EIPBN 2022)

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Papers from the 65th International Conference on Electron, Ion, And Photon Beam Technology and Nanofabrication (EIPBN 2022)

Resources

Explore

pubs.aip.org

Connect with AIP Publishing

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