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Papers from the 66th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN 2023)
This collection includes papers from the 66th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication held from May 30 – June 2, 2023 in San Francisco, CA. The EIPBN Conference is dedicated to lithographic patterning science, nano-manufacturing process technology, and the applications these methods enable. The Conference Chair was Qiangfei Xia (University of Massachusetts), and the Program Chair was Chih-Hao Chang (University of Texas at Austin).
Guest Editor: Program Chair: Chih-Hao Chang
Lithography
Barbara A. Kazanowska; Aaron M. Dangerfield; Han Wang; Gene Lee; Luisa D. Bozano
Microelectronic and Nanoelectronic Devices
Mohammad Istiaque Rahaman; G. P. Szakmany; A. O. Orlov; G. L. Snider
Lithography
Soo-Young Lee
Nanoscale Science and Technology
Yingtao Wang; Mona Savalia; Xian Zhang
Lithography
Jianran Zhang; Carsten Strobel; Kathrin Estel; Thomas Mikolajick; Robert Kirchner
Measurement and Characterization
Delong Chen; Jielin Zhou; Yanjun Zhang; Erbo Xiao; Jinguo Ge; Quantong Li; Zhuming Liu
Nanoscale Science and Technology
Kun-Chieh Chien; Noah Graff; Dragan Djurdjanovic; Chih-Hao Chang
MEMS and NEMS
Devin K. Brown; Isha Lodhi; Biya Haile; David R. Myers; Wilbur A. Lam; Oliver Brand
Nanoscale Science and Technology
Vijay Anirudh Premnath; Chih-Hao Chang
Nanoscale Science and Technology
Andrew Tunell; Lauren Micklow; Nichole Scott; Stephen Furst; Chih-Hao Chang
Nanoscale Science and Technology
Ethan Flores; Saurav Mohanty; Andrew Tunell; Chih-Hao Chang
Lithography
Briana Cuero; Kun-Chieh Chien; Chih-Hao Chang
Lithography
Kanta Yamamoto; Yuichi Utsumi; Ikuya Sakurai; Ikuo Okada; Kenji Hanada; Hidehiro Ishizawa; Masahiro Takeo; Taki Watanabe; Sho Amano; Satoru Suzuki; Koji Sumitomo; Akinobu Yamaguchi
Measurement and Characterization
Kwon Sang Lee; Kun-Chieh Chien; Barbara Groh; I-Te Chen; Michael Cullinan; Chih-Hao Chang
Lithography
Henry I. Smith; Mark Mondol; Feng Zhang; Timothy Savas; Michael Walsh
Plasmonics
M. Serra González; M. Keil; R. Deshpande; S. Kadkhodazadeh; N. Okulova; R. J. Taboryski