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Journal Articles

Multielectronic and multiatomic effects in the U O4,5 x-ray absorption spectroscopy of uranium dioxide

J. G. Tobin, H. Ramanantoanina, C. Daul, S.-W. Yu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063208 (2023)
https://doi.org/10.1116/6.0002969
Published: October 2023
View article titled, Multielectronic and multiatomic effects in the U O<sub>4,5</sub> x-ray absorption spectroscopy of uranium dioxide
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Journal Articles

Low temperature epitaxial growth of Cantor-nitride thin films by magnetic field assisted magnetron sputtering

Smita G. Rao, Pascal Manuel Illgner, Robert Boyd, Gyula Nagy, Philippe Djemia, Daniel Primetzhofer, Ivan Petrov, Arnaud le Febvrier, Per Eklund
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053415 (2023)
https://doi.org/10.1116/6.0002947
Published: August 2023
View article titled, Low temperature epitaxial growth of Cantor-nitride thin films by magnetic field assisted magnetron sputtering
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Includes: Supplementary data
Journal Articles

Theoretical analysis of thermal spikes during ion bombardment of amorphous silicon nitride surfaces

Erik S. Cheng, Peter L. G. Ventzek, Gyeong S. Hwang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 043207 (2023)
https://doi.org/10.1116/6.0002656
Published: June 2023
View article titled, Theoretical analysis of thermal spikes during ion bombardment of amorphous silicon nitride surfaces
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Includes: Supplementary data
Journal Articles

Resolving buried interfaces with low energy ion scattering

Adele Valpreda, Jacobus M. Sturm, Andrey E. Yakshin, Marcelo Ackermann
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 043203 (2023)
https://doi.org/10.1116/6.0002567
Published: May 2023
View article titled, Resolving buried interfaces with low energy ion scattering
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Journal Articles

Measurements and model of UV-induced oxidation of aluminum

Robert F. Berg, Charles Tarrio, Thomas B. Lucatorto
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 033204 (2023)
https://doi.org/10.1116/6.0002432
Published: March 2023
View article titled, Measurements and model of UV-induced oxidation of aluminum
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Journal Articles

Inert-gas ion scattering at grazing incidence on smooth and rough Si and SiO2 surfaces

Charisse Marie D. Cagomoc, Michiro Isobe, Eric A. Hudson, Satoshi Hamaguchi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 023003 (2023)
https://doi.org/10.1116/6.0002381
Published: February 2023
View article titled, Inert-gas ion scattering at grazing incidence on smooth and rough Si and SiO<sub>2</sub> surfaces
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Journal Articles

Target ion and neutral spread in high power impulse magnetron sputtering

H. Hajihoseini, N. Brenning, M. Rudolph, M. A. Raadu, D. Lundin, J. Fischer, T. M. Minea, J. T. Gudmundsson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 013002 (2023)
https://doi.org/10.1116/6.0002292
Published: December 2022
View article titled, Target ion and neutral spread in high power impulse magnetron sputtering
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Journal Articles

Practical guide to understanding goodness-of-fit metrics used in chemical state modeling of x-ray photoelectron spectroscopy data by synthetic line shapes using nylon as an example

Neal Fairley, Pascal Bargiela, Adam Roberts, Vincent Fernandez, Jonas Baltrusaitis
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 013203 (2023)
https://doi.org/10.1116/6.0002196
Published: December 2022
View article titled, Practical guide to understanding goodness-of-fit metrics used in chemical state modeling of x-ray photoelectron spectroscopy data by synthetic line shapes using nylon as an example
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Includes: Supplementary data
Journal Articles

Comparison of glancing-angle scatterings on different materials in a high aspect ratio plasma etching process using molecular dynamics simulation

Yao Du, Florian Krüger, Sang Ki Nam, Hoki Lee, Suyoung Yoo, Jacob Eapen, Mark J. Kushner, Steven Shannon
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 053007 (2022)
https://doi.org/10.1116/6.0002008
Published: September 2022
View article titled, Comparison of glancing-angle scatterings on different materials in a high aspect ratio plasma etching process using molecular dynamics simulation
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Journal Articles

First principles study on the lattice thermal conductivity of α-phase Ga2O3

Gang Yang, Pedro Rojo Romeo, Aleksandra Apostoluk, Bertrand Vilquin
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 052801 (2022)
https://doi.org/10.1116/6.0001870
Published: July 2022
View article titled, First principles study on the lattice thermal conductivity of α-phase Ga<sub>2</sub>O<sub>3</sub>
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Journal Articles

Low-energy ion scattering from quasicrystals

Robert Bastasz
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 010805 (2022)
https://doi.org/10.1116/6.0001502
Published: December 2021
View article titled, Low-energy ion scattering from quasicrystals
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Journal Articles

Using the inelastic background in hard x-ray photoelectron spectroscopy for a depth-resolved analysis of the CdS/Cu(In,Ga)Se2 interface

Dirk Hauschild, Ralph Steininger, Dimitrios Hariskos, Wolfram Witte, Sven Tougaard, Clemens Heske, Lothar Weinhardt
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 063216 (2021)
https://doi.org/10.1116/6.0001336
Published: October 2021
View article titled, Using the inelastic background in hard x-ray photoelectron spectroscopy for a depth-resolved analysis of the CdS/Cu(In,Ga)Se<sub>2</sub> interface
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Includes: Supplementary data
Journal Articles

Surface characterization of ultrathin atomic layer deposited molybdenum oxide films using high-sensitivity low-energy ion scattering

Raivathari M. Singhania, Henry Price, Vaneck Y. Kounga, Benjamin Davis, Philipp Brüner, Ryan Thorpe, David J. Hynek, Judy J. Cha, Nicholas C. Strandwitz
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 063210 (2021)
https://doi.org/10.1116/6.0001164
Published: October 2021
View article titled, Surface characterization of ultrathin atomic layer deposited molybdenum oxide films using high-sensitivity low-energy ion scattering
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Journal Articles

Applications of the National Institute of Standards and Technology (NIST) database for the simulation of electron spectra for surface analysis for quantitative x-ray photoelectron spectroscopy of nanostructures

Wolfgang S. M. Werner, Cedric J. Powell
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 063205 (2021)
https://doi.org/10.1116/6.0001261
Published: September 2021
View article titled, Applications of the National Institute of Standards and Technology (NIST) database for the simulation of electron spectra for surface analysis for quantitative x-ray photoelectron spectroscopy of nanostructures
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Journal Articles

Electronic surface reconstruction of TiO2 nanocrystals revealed by resonant inelastic x-ray scattering

Cheng-Hao Chuang, Chieh-Ming Chen, Yu-Cheng Shao, Ping-Hung Yeh, Chih-Ming Chang, Way-Faung Pong, Mukes Kapilashrami, Per-Anders Glans, Sheraz Gul, Gongming Wang, Yat Li, Jin Zhang, Jun Miyawaki, Hideharu Niwa, Yoshihisa Harada, Jin-Ming Chen, Jinghua Guo
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 063204 (2021)
https://doi.org/10.1116/6.0001247
Published: September 2021
View article titled, Electronic surface reconstruction of TiO<sub>2</sub> nanocrystals revealed by resonant inelastic x-ray scattering
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Journal Articles

Photoelectron diffraction: Early demonstrations and alternative modes

David Phil Woodruff
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 040801 (2021)
https://doi.org/10.1116/6.0001104
Published: June 2021
View article titled, Photoelectron diffraction: Early demonstrations and alternative modes
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Journal Articles

Highly selective and vertical etch of silicon dioxide using ruthenium films as an etch mask

William J. Mitchell, Brian J. Thibeault, Demis D. John, Thomas E. Reynolds
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 043204 (2021)
https://doi.org/10.1116/6.0001030
Published: May 2021
View article titled, Highly selective and vertical etch of silicon dioxide using ruthenium films as an etch mask
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Journal Articles

Molecule deposition in mask-shielded regions revealed by selective Mg vapor deposition

Tsuyoshi Tsujioka, Hatsuka Kusaka, Arimi Shimotsu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 043202 (2021)
https://doi.org/10.1116/6.0000994
Published: May 2021
View article titled, Molecule deposition in mask-shielded regions revealed by selective Mg vapor deposition
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Journal Articles

Properties of indium tin oxide thin films grown by Ar ion beam sputter deposition

Carsten Bundesmann, Jens Bauer, Annemarie Finzel, Jürgen W. Gerlach, Wolfgang Knolle, Anke Hellmich, Ron Synowicki
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 033406 (2021)
https://doi.org/10.1116/6.0000917
Published: March 2021
View article titled, Properties of indium tin oxide thin films grown by Ar ion beam sputter deposition
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Journal Articles

ERRATUM: “Versailles project on advanced materials and standards interlaboratory study on intensity calibration for x-ray photoelectron spectroscopy instruments using low-density polyethylene” [J. Vac. Sci. Technol. A 38, 063208 (2020)]

Benjamen P. Reed, David J. H. Cant, Steve J. Spencer, Abraham Jorge Carmona-Carmona, Adam Bushell, Alberto Herrera-Gómez, Akira Kurokawa, Andreas Thissen, Andrew G. Thomas, Andrew J. Britton, Andrzej Bernasik, Anne Fuchs, Arthur P. Baddorf, Bernd Bock, Bill Theilacker, Bin Cheng, David G. Castner, David J. Morgan, David Valley, Elizabeth A. Willneff, Emily F. Smith, Emmanuel Nolot, Fangyan Xie, Gilad Zorn, Graham C. Smith, Hideyuki Yasufuku, Jeffrey L. Fenton, Jian Chen, Jonathan D. P. Counsell, Jörg Radnik, Karen J. Gaskell, Kateryna Artyushkova, Li Yang, Lulu Zhang, Makiho Eguchi, Marc Walker, Mariusz Hajdyła, Mateusz M. Marzec, Matthew R. Linford, Naoyoshi Kubota, Orlando Cortazar-Martínez, Paul Dietrich, Riki Satoh, Sven L. M. Schroeder, Tahereh G. Avval, Takaharu Nagatomi, Vincent Fernandez, Wayne Lake, Yasushi Azuma, Yusuke Yoshikawa, Claudia L. Compean-Gonzalez, Giacomo Ceccone, Alexander G. Shard
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 027001 (2021)
https://doi.org/10.1116/6.0000907
Published: January 2021
View article titled, ERRATUM: “Versailles project on advanced materials and standards interlaboratory study on intensity calibration for x-ray photoelectron spectroscopy instruments using low-density polyethylene” [J. Vac. Sci. Technol. A 38, 063208 (2020)]
Open the PDF for ERRATUM: “Versailles project on advanced materials and standards interlaboratory study on intensity calibration for x-ray photoelectron spectroscopy instruments using low-density polyethylene” [J. Vac. Sci. Technol. A 38, 063208 (2020)] in another window