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Journal Articles

Long and flexible atmospheric pressure plasma jet probes for operation in humid environments

Jae Young Kim, Gyu Tae Bae, Ye Rin Lee, Sebinn Jang, Eun Young Jung, Heung-Sik Tae
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 043002 (2023)
https://doi.org/10.1116/6.0002710
Published: June 2023
View article titled, Long and flexible atmospheric pressure plasma jet probes for operation in humid environments
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Journal Articles

Real-time monitoring of atomic layer etching in Cl2/Ar pulsed gas, pulsed power plasmas by optical emission spectroscopy

Qinzhen Hao, Pilbum Kim, Sang Ki Nam, Song-Yun Kang, Vincent M. Donnelly
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 032605 (2023)
https://doi.org/10.1116/6.0002482
Published: April 2023
View article titled, Real-time monitoring of atomic layer etching in Cl<sub>2</sub>/Ar pulsed gas, pulsed power plasmas by optical emission spectroscopy
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Journal Articles

Applications and mechanisms of anisotropic two-step Si3N4 etching with hydrogen plasma conditioning

Ying Rui, Meng-Hsien Chen, Sumeet Pandey, Lan Li
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 022601 (2023)
https://doi.org/10.1116/6.0002139
Published: February 2023
View article titled, Applications and mechanisms of anisotropic two-step Si<sub>3</sub>N<sub>4</sub> etching with hydrogen plasma conditioning
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Journal Articles

Temperature study of atmospheric-pressure plasma-enhanced spatial ALD of Al2O3 using infrared and optical emission spectroscopy

M. A. Mione, V. Vandalon, W. M. M. Kessels, F. Roozeboom
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 062407 (2022)
https://doi.org/10.1116/6.0002158
Published: November 2022
View article titled, Temperature study of atmospheric-pressure plasma-enhanced spatial ALD of Al<sub>2</sub>O<sub>3</sub> using infrared and optical emission spectroscopy
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Includes: Supplementary data
Journal Articles

Atmospheric pressure plasma functionalization of polystyrene

Jordyn Polito, Mark Denning, Richard Stewart, David Frost, Mark J. Kushner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 043001 (2022)
https://doi.org/10.1116/6.0001850
Published: May 2022
View article titled, Atmospheric pressure plasma functionalization of polystyrene
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Journal Articles

A high-power impulse magnetron sputtering global model for argon plasma–chromium target interactions

Joelle Zgheib, Pierre Yves Jouan, Ahmed Rhallabi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 043004 (2021)
https://doi.org/10.1116/6.0000865
Published: June 2021
View article titled, A high-power impulse magnetron sputtering global model for argon plasma–chromium target interactions
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Journal Articles

Postgrowth modification of monolayer graphene films by low-pressure diborane-argon plasma

Pierre Vinchon, Xavier Glad, Germain Robert Bigras, Andranik Sarkissian, Richard Martel, Luc Stafford
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 043003 (2021)
https://doi.org/10.1116/6.0000924
Published: May 2021
View article titled, Postgrowth modification of monolayer graphene films by low-pressure diborane-argon plasma
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Journal Articles

Atomic layer deposition and selective etching of ruthenium for area-selective deposition: Temperature dependence and supercycle design

Martijn F. J. Vos, Sonali N. Chopra, John G. Ekerdt, Sumit Agarwal, Wilhelmus M. M. (Erwin) Kessels, Adriaan J. M. Mackus
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 032412 (2021)
https://doi.org/10.1116/6.0000912
Published: April 2021
View article titled, Atomic layer deposition and selective etching of ruthenium for area-selective deposition: Temperature dependence and supercycle design
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Includes: Supplementary data
Journal Articles

Atmospheric pressure plasma reduction of copper oxide to copper metal

Joyce Lee, Thomas S. Williams, Robert F. Hicks
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 023001 (2021)
https://doi.org/10.1116/6.0000704
Published: February 2021
View article titled, Atmospheric pressure plasma reduction of copper oxide to copper metal
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Journal Articles

Surface ligand removal in atomic layer deposition of GaN using triethylgallium

Petro Deminskyi, Chih-Wei Hsu, Babak Bakhit, Polla Rouf, Henrik Pedersen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 012411 (2021)
https://doi.org/10.1116/6.0000752
Published: January 2021
View article titled, Surface ligand removal in atomic layer deposition of GaN using triethylgallium
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Journal Articles

Work function performance of a C12A7 electride surface exposed to low pressure low temperature hydrogen plasmas

A. Heiler, K. Waetzig, M. Tajmar, R. Friedl, R. Nocentini, U. Fantz
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 013002 (2021)
https://doi.org/10.1116/6.0000749
Published: December 2020
View article titled, Work function performance of a C12A7 electride surface exposed to low pressure low temperature hydrogen plasmas
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Journal Articles

Universal scaling relationship for atomic layer etching

Keren J. Kanarik, Samantha Tan, Wenbing Yang, Ivan L. Berry, Yang Pan, Richard A. Gottscho
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 010401 (2021)
https://doi.org/10.1116/6.0000762
Published: December 2020
View article titled, Universal scaling relationship for atomic layer etching
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Journal Articles

Insight into the removal and reapplication of small inhibitor molecules during area-selective atomic layer deposition of SiO2

Marc J. M. Merkx, Rick G. J. Jongen, Alfredo Mameli, Paul C. Lemaire, Kashish Sharma, Dennis M. Hausmann, Wilhelmus M. M. Kessels, Adriaan J. M. Mackus
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 012402 (2021)
https://doi.org/10.1116/6.0000652
Published: December 2020
View article titled, Insight into the removal and reapplication of small inhibitor molecules during area-selective atomic layer deposition of SiO<sub>2</sub>
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Includes: Supplementary data
Journal Articles

Modeling of an atmospheric pressure plasma-liquid anodic interface: Solvated electrons and silver reduction

Yashuang Zheng, Lijun Wang, Peter Bruggeman
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 063005 (2020)
https://doi.org/10.1116/6.0000575
Published: October 2020
View article titled, Modeling of an atmospheric pressure plasma-liquid anodic interface: Solvated electrons and silver reduction
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Journal Articles

Effect of a low pressure low temperature hydrogen plasma on the work function of europium

Sofia Cristofaro, Roland Friedl, Ursel Fantz
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 063002 (2020)
https://doi.org/10.1116/6.0000461
Published: October 2020
View article titled, Effect of a low pressure low temperature hydrogen plasma on the work function of europium
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Journal Articles

O·, H·, and ·OH radical etching probability of polystyrene obtained for a radio frequency driven atmospheric pressure plasma jet

V. S. Santosh K. Kondeti, Yashuang Zheng, Pingshan Luan, Gottlieb S. Oehrlein, Peter J. Bruggeman
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 033012 (2020)
https://doi.org/10.1116/6.0000123
Published: May 2020
View article titled, O<sup>·</sup>, H<sup>·</sup>, and <sup>·</sup>OH radical etching probability of polystyrene obtained for a radio frequency driven atmospheric pressure plasma jet
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Journal Articles

Properties of secondary particles for the reactive ion beam sputtering of Ti and TiO2 using oxygen ions

Thomas Amelal, Lukas Pietzonka, Erik Rohkamm, Carsten Bundesmann
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 033403 (2020)
https://doi.org/10.1116/1.5142911
Published: March 2020
View article titled, Properties of secondary particles for the reactive ion beam sputtering of Ti and TiO<sub>2</sub> using oxygen ions
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Journal Articles

Silicon nitride spacer etching selectively to silicon using CH3F/O2/He/SiCl4 plasma

Nicolas Possémé, Maxime Garcia-Barros, Christian Arvet, Olivier Pollet, François Leverd, Sébastien Barnola
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 033004 (2020)
https://doi.org/10.1116/1.5145158
Published: March 2020
View article titled, Silicon nitride spacer etching selectively to silicon using CH<sub>3</sub>F/O<sub>2</sub>/He/SiCl<sub>4</sub> plasma
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Journal Articles

Evidence for anti-synergism between ion-assisted etching and in-plasma photoassisted etching of silicon in a high-density chlorine plasma

Emilia W. Hirsch, Linfeng Du, Demetre J. Economou, Vincent M. Donnelly
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 023009 (2020)
https://doi.org/10.1116/1.5138189
Published: January 2020
View article titled, Evidence for anti-synergism between ion-assisted etching and in-plasma photoassisted etching of silicon in a high-density chlorine plasma
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Journal Articles

Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition

Shinsuke Miyagawa, Kazuhiro Gotoh, Shohei Ogura, Markus Wilde, Yasuyoshi Kurokawa, Katsuyuki Fukutani, Noritaka Usami
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 022410 (2020)
https://doi.org/10.1116/1.5134720
Published: January 2020
View article titled, Effect of hydrogen plasma treatment on the passivation performance of TiO<em><sub>x</sub></em> on crystalline silicon prepared by atomic layer deposition
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