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Journal Articles

Study on effective dry etching of InGaZnO thin films under capacitively coupled plasma-reactive ion etching with a nonfluorine-based etching gas

Changyong Oh, Hyeong Wook Kim, Myeong Woo Ju, Jun Ho Song, Bo Sung Kim
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053007 (2023)
https://doi.org/10.1116/6.0002798
Published: August 2023
View article titled, Study on effective dry etching of InGaZnO thin films under capacitively coupled plasma-reactive ion etching with a nonfluorine-based etching gas
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Journal Articles

Series resonance effects of a variable inductor termination on the nonpowered electrode in capacitively coupled plasmas

Ho-Jun Moon, Jae-Won Lee, Ho-Won Lee, Yeong-Min Lim, Jiwon Jung, Chin-Wook Chung
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053003 (2023)
https://doi.org/10.1116/6.0002790
Published: July 2023
View article titled, Series resonance effects of a variable inductor termination on the nonpowered electrode in capacitively coupled plasmas
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Journal Articles

Effects of the focus ring on the ion kinetics at the wafer edge in capacitively coupled plasma reactors

Fang-Fang Ma, Quan-Zhi Zhang, Dao-Man Han, Zi-Lan Xiong, Ming Gao, You-Nian Wang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053002 (2023)
https://doi.org/10.1116/6.0002585
Published: July 2023
View article titled, Effects of the focus ring on the ion kinetics at the wafer edge in capacitively coupled plasma reactors
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Journal Articles

Effect of focus ring with external circuit on cathode edge sheath dynamics in a capacitively coupled plasma

Yuhua Xiao, Joel Brandon, Joshua Morsell, Sang Ki Nam, KiHo Bae, Jang-Yeob Lee, Steven Shannon
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 033008 (2023)
https://doi.org/10.1116/6.0002496
Published: April 2023
View article titled, Effect of focus ring with external circuit on cathode edge sheath dynamics in a capacitively coupled plasma
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Journal Articles

Low-temperature synthesis of crystalline vanadium oxide films using oxygen plasmas

Adnan Mohammad, Krishna D. Joshi, Dhan Rana, Saidjafarzoda Ilhom, Barrett Wells, Brian Willis, Boris Sinkovic, A. K. Okyay, Necmi Biyikli
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 032405 (2023)
https://doi.org/10.1116/6.0002383
Published: March 2023
View article titled, Low-temperature synthesis of crystalline vanadium oxide films using oxygen plasmas
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Includes: Supplementary data
Journal Articles

Ion velocity distribution functions across a plasma meniscus

D. Caron, R. John, E. E. Scime, T. E. Steinberger
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 033001 (2023)
https://doi.org/10.1116/6.0002439
Published: March 2023
View article titled, Ion velocity distribution functions across a plasma meniscus
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Journal Articles

Characterization of neutral species in an NH3-Ar plasma generated by a capacitively coupled plasma source at various radio frequencies

S. M. Johnson, J. P. Zhao, C. Schlechte, J. Carroll, T. Iwao, P. L. G. Ventzek, J. G. Ekerdt
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 023002 (2023)
https://doi.org/10.1116/6.0002247
Published: February 2023
View article titled, Characterization of neutral species in an NH<sub>3</sub>-Ar plasma generated by a capacitively coupled plasma source at various radio frequencies
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Includes: Supplementary data
Journal Articles

CF4 plasma-based atomic layer etching of Al2O3 and surface smoothing effect

Chien-Wei Chen, Wen-Hao Cho, Chan-Yuen Chang, Chien-Ying Su, Nien-Nan Chu, Chi-Chung Kei, Bor-Ran Li
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 012602 (2023)
https://doi.org/10.1116/6.0002210
Published: December 2022
View article titled, CF<sub>4</sub> plasma-based atomic layer etching of Al<sub>2</sub>O<sub>3</sub> and surface smoothing effect
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Includes: Supplementary data
Journal Articles

Highly efficient plasma generation in inductively coupled plasmas using a parallel capacitor

Yeong-Min Lim, Young-Hun Hong, Gil-Ho Kang, Chin-Wook Chung
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 013005 (2023)
https://doi.org/10.1116/6.0002180
Published: December 2022
View article titled, Highly efficient plasma generation in inductively coupled plasmas using a parallel capacitor
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Journal Articles

Voltage waveform tailoring for high aspect ratio plasma etching of SiO2 using Ar/CF4/O2 mixtures: Consequences of ion and electron distributions on etch profiles

Florian Krüger, Hyunjae Lee, Sang Ki Nam, Mark J. Kushner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 013006 (2023)
https://doi.org/10.1116/6.0002290
Published: December 2022
View article titled, Voltage waveform tailoring for high aspect ratio plasma etching of SiO<sub>2</sub> using Ar/CF<sub>4</sub>/O<sub>2</sub> mixtures: Consequences of ion and electron distributions on etch profiles
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Journal Articles

Electron beam-induced etching of SiO2, Si3N4, and poly-Si assisted by CF4/O2 remote plasma

Kang-Yi Lin, Christian Preischl, Christian Felix Hermanns, Daniel Rhinow, Hans-Michael Solowan, Michael Budach, Hubertus Marbach, Klaus Edinger, G. S. Oehrlein
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 013004 (2023)
https://doi.org/10.1116/6.0002234
Published: December 2022
View article titled, Electron beam-induced etching of SiO<sub>2</sub>, Si<sub>3</sub>N<sub>4</sub>, and poly-Si assisted by CF<sub>4</sub>/O<sub>2</sub> remote plasma
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Journal Articles

Harmonic suppression and uniformity improvement of plasma density in capacitively coupled plasma

Yeong-Min Lim, So-Yeong Park, You He, Young-Hun Hong, Chin-Wook Chung
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 063003 (2022)
https://doi.org/10.1116/6.0002016
Published: October 2022
View article titled, Harmonic suppression and uniformity improvement of plasma density in capacitively coupled plasma
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Journal Articles

Cryogenic nanoscale etching of silicon nitride selectively to silicon by alternating SiF4/O2 and Ar plasmas

G. Antoun, T. Tillocher, A. Girard, P. Lefaucheux, J. Faguet, H. Kim, D. Zhang, M. Wang, K. Maekawa, C. Cardinaud, R. Dussart
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 052601 (2022)
https://doi.org/10.1116/6.0001885
Published: August 2022
View article titled, Cryogenic nanoscale etching of silicon nitride selectively to silicon by alternating SiF<sub>4</sub>/O<sub>2</sub> and Ar plasmas
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Journal Articles

Innovative remote plasma source for atomic layer deposition for GaN devices

Harm C. M. Knoops, Karsten Arts, Jan W. Buiter, Luca Matteo Martini, Richard Engeln, Dilini Tania Hemakumara, Michael Powell, Wilhelmus M. M. (Erwin) Kessels, Chris J. Hodson, Aileen O’Mahony
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 062403 (2021)
https://doi.org/10.1116/6.0001318
Published: September 2021
View article titled, Innovative remote plasma source for atomic layer deposition for GaN devices
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Includes: Supplementary data
Journal Articles

Erosion of focus rings in capacitively coupled plasma etching reactors

Xifeng Wang, Hyunjae Lee, Sang Ki Nam, Mark J. Kushner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 063002 (2021)
https://doi.org/10.1116/6.0001225
Published: September 2021
View article titled, Erosion of focus rings in capacitively coupled plasma etching reactors
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Journal Articles

Plasma-enhanced atomic layer deposition: Correlating O 2 plasma parameters and species to blister formation and conformal film growth

Andreas Werbrouck, Kevin Van de Kerckhove, Diederik Depla, Dirk Poelman, Philippe F. Smet, Jolien Dendooven, Christophe Detavernier
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 062402 (2021)
https://doi.org/10.1116/6.0001094
Published: September 2021
View article titled, Plasma-enhanced atomic layer deposition: Correlating O 2 plasma parameters and species to blister formation and conformal film growth
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Includes: Supplementary data
Journal Articles

Superconformal chemical vapor deposition using plasma-generated atomic species as a consumable growth inhibitor

Yu Yang, Kinsey L. Canova, Sreenivas Jayaraman, Do-Young Kim, Gregory S. Girolami, John R. Abelson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 043409 (2021)
https://doi.org/10.1116/6.0001018
Published: May 2021
View article titled, Superconformal chemical vapor deposition using plasma-generated atomic species as a consumable growth inhibitor
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Includes: Supplementary data
Journal Articles

Scaling of atomic layer etching of SiO2 in fluorocarbon plasmas: Transient etching and surface roughness

Xifeng Wang, Mingmei Wang, Peter Biolsi, Mark J. Kushner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 033003 (2021)
https://doi.org/10.1116/6.0000941
Published: March 2021
View article titled, Scaling of atomic layer etching of SiO<sub>2</sub> in fluorocarbon plasmas: Transient etching and surface roughness
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Journal Articles

Radical probe system for in situ measurements of radical densities of hydrogen, oxygen, and nitrogen

Dren Qerimi, Ivan Shchelkanov, Gianluca Panici, Arihant Jain, James Wagner, David N. Ruzic
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 023003 (2021)
https://doi.org/10.1116/6.0000786
Published: March 2021
View article titled, Radical probe system for <em>in situ</em> measurements of radical densities of hydrogen, oxygen, and nitrogen
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Journal Articles

Epitaxial growth of 3C-SiC film by microwave plasma chemical vapor deposition in H2-CH4-SiH4 mixtures: Optical emission spectroscopy study

V. Yu. Yurov, V. G. Ralchenko, A. K. Martyanov, I. A. Antonova, V. S. Sedov, A. A. Khomich, V. V. Voronov, S. S. Savin, M. Y. Shevchenko, A. P. Bolshakov
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 023002 (2021)
https://doi.org/10.1116/6.0000745
Published: February 2021
View article titled, Epitaxial growth of 3C-SiC film by microwave plasma chemical vapor deposition in H<sub>2</sub>-CH<sub>4</sub>-SiH<sub>4</sub> mixtures: Optical emission spectroscopy study
Open the PDF for Epitaxial growth of 3C-SiC film by microwave plasma chemical vapor deposition in H<sub>2</sub>-CH<sub>4</sub>-SiH<sub>4</sub> mixtures: Optical emission spectroscopy study in another window