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Journal Articles

Low-temperature etching of silicon oxide and silicon nitride with hydrogen fluoride

Editor’s Pick
Thorsten Lill, Mingmei Wang, Dongjun Wu, Youn-Jin Oh, Tae Won Kim, Mark Wilcoxson, Harmeet Singh, Vahid Ghodsi, Steven M. George, Yuri Barsukov, Igor Kaganovich
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 063006 (2024)
https://doi.org/10.1116/6.0004019
Published: November 2024
View article titled, Low-temperature etching of silicon oxide and silicon nitride with hydrogen fluoride
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Journal Articles

Report on laser-induced fluorescence transitions relevant for the microelectronics industry and sustainability applications

Featured
V. S. Santosh K. Kondeti, Shurik Yatom, Ivan Romadanov, Yevgeny Raitses, Leonid Dorf, Andrei Khomenko
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 063005 (2024)
https://doi.org/10.1116/6.0004070
Published: November 2024
View article titled, Report on laser-induced fluorescence transitions relevant for the microelectronics industry and sustainability applications
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Journal Articles

Dynamic global model of Cl2/Ar plasmas: Applicability to atomic layer etching processes

Editor’s Pick
T. Rasoanarivo, C. Mannequin, F. Roqueta, M. Boufnichel, A. Rhallabi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 063003 (2024)
https://doi.org/10.1116/6.0003932
Published: November 2024
View article titled, Dynamic global model of Cl<sub>2</sub>/Ar plasmas: Applicability to atomic layer etching processes
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Journal Articles

Numerical study of the effects of discharge parameters on capacitively coupled plasma in a magnetic field

Minghan Yan, Huanhuan Wu, Hao Wu, Yanli Peng, Shali Yang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 053007 (2024)
https://doi.org/10.1116/6.0003692
Published: September 2024
View article titled, Numerical study of the effects of discharge parameters on capacitively coupled plasma in a magnetic field
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Journal Articles

Empirical analysis of a hollow cathode’s intensity distribution in the vacuum ultraviolet range

S. C. Olsen, D. D. Allred, R. R. Vanfleet
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 043004 (2024)
https://doi.org/10.1116/6.0003633
Published: June 2024
View article titled, Empirical analysis of a hollow cathode’s intensity distribution in the vacuum ultraviolet range
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Journal Articles

Case study in machine learning for predicting moderate pressure plasma behavior

Shadhin Hussain, David J. Lary, Kentaro Hara, Kallol Bera, Shahid Rauf, Matthew Goeckner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 043001 (2024)
https://doi.org/10.1116/6.0003434
Published: May 2024
View article titled, Case study in machine learning for predicting moderate pressure plasma behavior
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Journal Articles

Power measurement analysis of moderate pressure capacitively coupled discharges

Shadhin Hussain, Abhishek Verma, Kallol Bera, Shahid Rauf, Matthew Goeckner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 033010 (2024)
https://doi.org/10.1116/6.0003366
Published: April 2024
View article titled, Power measurement analysis of moderate pressure capacitively coupled discharges
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Includes: Supplementary data
Journal Articles

Remote inductively coupled plasmas in Ar/N2 mixtures and implications for plasma enhanced ALD

Editor’s Pick
David R. Boris, Michael J. Johnson, Jeffrey M. Woodward, Virginia D. Wheeler, Scott G. Walton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 033008 (2024)
https://doi.org/10.1116/6.0003538
Published: April 2024
View article titled, Remote inductively coupled plasmas in Ar/N<sub>2</sub> mixtures and implications for plasma enhanced ALD
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Journal Articles

Computational modeling of a surfatron mode microwave plasma in NH3/N2 for remote radical generation in a silicon native oxide cleaning process

Juan P. Barberena-Valencia, Laxminarayan L. Raja
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 033005 (2024)
https://doi.org/10.1116/6.0003415
Published: April 2024
View article titled, Computational modeling of a surfatron mode microwave plasma in NH<sub>3</sub>/N<sub>2</sub> for remote radical generation in a silicon native oxide cleaning process
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Journal Articles

Effects of magnetic field gradient on capacitively coupled plasma driven by tailored voltage waveforms

Huanhuan Wu, Minghan Yan, Hao Wu, Shali Yang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 033003 (2024)
https://doi.org/10.1116/6.0003324
Published: March 2024
View article titled, Effects of magnetic field gradient on capacitively coupled plasma driven by tailored voltage waveforms
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Journal Articles

Growth of conformal TiN thin film with low resistivity and impurity via hollow cathode plasma atomic layer deposition

Editor’s Pick
Ha Young Lee, Jeong Hwan Han, Byung Joon Choi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 022405 (2024)
https://doi.org/10.1116/6.0003319
Published: February 2024
View article titled, Growth of conformal TiN thin film with low resistivity and impurity via hollow cathode plasma atomic layer deposition
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Includes: Supplementary data
Journal Articles

Novel high-efficiency plasma nitriding process utilizing a high power impulse magnetron sputtering discharge

A. P. Ehiasarian, P. Eh. Hovsepian
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 023109 (2024)
https://doi.org/10.1116/6.0003277
Published: February 2024
View article titled, Novel high-efficiency plasma nitriding process utilizing a high power impulse magnetron sputtering discharge
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Journal Articles

Characterization of elastomer degradation in O2/Ar plasma via mass and surface morphology changes

Nicholas Connolly, Michael Hysick, David E. Barlaz, Raquel Garza, Gilberto Lunardi, David N. Ruzic
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 023004 (2024)
https://doi.org/10.1116/6.0003240
Published: February 2024
View article titled, Characterization of elastomer degradation in O<sub>2</sub>/Ar plasma via mass and surface morphology changes
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Journal Articles

Impact of plasma operating conditions on the ion energy and angular distributions in dual-frequency capacitively coupled plasma reactors using CF4 chemistry

Pierre Ducluzaux, Delia Ristoiu, Gilles Cunge, Emilie Despiau-Pujo
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 013002 (2024)
https://doi.org/10.1116/6.0003291
Published: January 2024
View article titled, Impact of plasma operating conditions on the ion energy and angular distributions in dual-frequency capacitively coupled plasma reactors using CF4 chemistry
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Journal Articles

Optimizing impedance matching parameters for single-frequency capacitively coupled plasma via machine learning

Dehen Cao, Shimin Yu, Zili Chen, Yu Wang, Hongyu Wang, Zhipeng Chen, Wei Jiang, Ya Zhang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 013001 (2024)
https://doi.org/10.1116/5.0173921
Published: December 2023
View article titled, Optimizing impedance matching parameters for single-frequency capacitively coupled plasma via machine learning
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Journal Articles

Study on effective dry etching of InGaZnO thin films under capacitively coupled plasma-reactive ion etching with a nonfluorine-based etching gas

Changyong Oh, Hyeong Wook Kim, Myeong Woo Ju, Jun Ho Song, Bo Sung Kim
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053007 (2023)
https://doi.org/10.1116/6.0002798
Published: August 2023
View article titled, Study on effective dry etching of InGaZnO thin films under capacitively coupled plasma-reactive ion etching with a nonfluorine-based etching gas
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Journal Articles

Series resonance effects of a variable inductor termination on the nonpowered electrode in capacitively coupled plasmas

Ho-Jun Moon, Jae-Won Lee, Ho-Won Lee, Yeong-Min Lim, Jiwon Jung, Chin-Wook Chung
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053003 (2023)
https://doi.org/10.1116/6.0002790
Published: July 2023
View article titled, Series resonance effects of a variable inductor termination on the nonpowered electrode in capacitively coupled plasmas
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Journal Articles

Effects of the focus ring on the ion kinetics at the wafer edge in capacitively coupled plasma reactors

Fang-Fang Ma, Quan-Zhi Zhang, Dao-Man Han, Zi-Lan Xiong, Ming Gao, You-Nian Wang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053002 (2023)
https://doi.org/10.1116/6.0002585
Published: July 2023
View article titled, Effects of the focus ring on the ion kinetics at the wafer edge in capacitively coupled plasma reactors
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Journal Articles

Effect of focus ring with external circuit on cathode edge sheath dynamics in a capacitively coupled plasma

Yuhua Xiao, Joel Brandon, Joshua Morsell, Sang Ki Nam, KiHo Bae, Jang-Yeob Lee, Steven Shannon
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 033008 (2023)
https://doi.org/10.1116/6.0002496
Published: April 2023
View article titled, Effect of focus ring with external circuit on cathode edge sheath dynamics in a capacitively coupled plasma
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Journal Articles

Low-temperature synthesis of crystalline vanadium oxide films using oxygen plasmas

Adnan Mohammad, Krishna D. Joshi, Dhan Rana, Saidjafarzoda Ilhom, Barrett Wells, Brian Willis, Boris Sinkovic, A. K. Okyay, Necmi Biyikli
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 032405 (2023)
https://doi.org/10.1116/6.0002383
Published: March 2023
View article titled, Low-temperature synthesis of crystalline vanadium oxide films using oxygen plasmas
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Includes: Supplementary data