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Journal Articles

Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge

J. Zgheib, L. Berthelot, J. Tranchant, N. Ginot, M.-P. Besland, A. Caillard, T. Minea, A. Rhallabi, P.-Y. Jouan
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063003 (2023)
https://doi.org/10.1116/6.0002857
Published: September 2023
View article titled, Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge
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Journal Articles

Effect of focus ring with external circuit on cathode edge sheath dynamics in a capacitively coupled plasma

Yuhua Xiao, Joel Brandon, Joshua Morsell, Sang Ki Nam, KiHo Bae, Jang-Yeob Lee, Steven Shannon
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 033008 (2023)
https://doi.org/10.1116/6.0002496
Published: April 2023
View article titled, Effect of focus ring with external circuit on cathode edge sheath dynamics in a capacitively coupled plasma
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Journal Articles

Control of the ion flux and energy distribution of dual-frequency capacitive RF plasmas by the variation of the driving voltages

Hwan Ho Kim, Ji Hyun Shin, Hae June Lee
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 023004 (2023)
https://doi.org/10.1116/6.0002242
Published: February 2023
View article titled, Control of the ion flux and energy distribution of dual-frequency capacitive RF plasmas by the variation of the driving voltages
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Journal Articles

Plasma-enhanced atomic layer deposition of SiO2 film using capacitively coupled Ar/O2 plasmas: A computational investigation

Chenhui Qu, Yukinori Sakiyama, Pulkit Agarwal, Mark J. Kushner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 052403 (2021)
https://doi.org/10.1116/6.0001121
Published: August 2021
View article titled, Plasma-enhanced atomic layer deposition of SiO<sub>2</sub> film using capacitively coupled Ar/O<sub>2</sub> plasmas: A computational investigation
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Journal Articles

Direct current and high power impulse magnetron sputtering discharges with a positively biased anode

Rainer Hippler, Martin Cada, Zdenek Hubicka
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 043007 (2021)
https://doi.org/10.1116/6.0001054
Published: June 2021
View article titled, Direct current and high power impulse magnetron sputtering discharges with a positively biased anode
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Journal Articles

Focus ring geometry influence on wafer edge voltage distribution for plasma processes

Yuhua Xiao, Yao Du, Carl Smith, Sang Ki Nam, Hoki Lee, Jang-Yeob Lee, Steven Shannon
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 043006 (2021)
https://doi.org/10.1116/6.0000981
Published: June 2021
View article titled, Focus ring geometry influence on wafer edge voltage distribution for plasma processes
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Journal Articles

Effect of nonvertical ion bombardment due to edge effects on polymer surface morphology evolution and etching uniformity

Adam Pranda, Chen Li, Youngsik Seo, Gottlieb S. Oehrlein
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 043001 (2021)
https://doi.org/10.1116/6.0001015
Published: May 2021
View article titled, Effect of nonvertical ion bombardment due to edge effects on polymer surface morphology evolution and etching uniformity
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Journal Articles

Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2

Samia Belahcen, Christophe Vallée, Ahmad Bsiesy, Ahmad Chaker, Moustapha Jaffal, Taguhi Yeghoyan, Marceline Bonvalot
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 012410 (2021)
https://doi.org/10.1116/6.0000655
Published: December 2020
View article titled, Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO<sub>2</sub>
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Journal Articles

Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition

Gilbert B. Rayner, Jr., Noel O’Toole, Jeffrey Shallenberger, Blaine Johs
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 062408 (2020)
https://doi.org/10.1116/6.0000454
Published: November 2020
View article titled, Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
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Journal Articles

The role of plasma in plasma-enhanced atomic layer deposition of crystalline films

David R. Boris, Virginia D. Wheeler, Neeraj Nepal, Syed B. Qadri, Scott G. Walton, Charles (Chip) R. Eddy
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 040801 (2020)
https://doi.org/10.1116/6.0000145
Published: May 2020
View article titled, The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
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Journal Articles

Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition

Masaki Hirayama, Akinobu Teramoto, Shigetoshi Sugawa
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 032408 (2020)
https://doi.org/10.1116/6.0000021
Published: April 2020
View article titled, Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
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Journal Articles

Particle-in-cell simulations and passive bulk model of collisional capacitive discharge

Emi Kawamura, Michael A. Lieberman, Allan J. Lichtenberg, Pascal Chabert
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 023003 (2020)
https://doi.org/10.1116/1.5135575
Published: January 2020
View article titled, Particle-in-cell simulations and passive bulk model of collisional capacitive discharge
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Journal Articles

Correlation of target properties and plasma parameters in DC magnetron sputtering with Langmuir probe measurements

Stefan Raggl, Johannes Postler, Jörg Winkler, Georg Strauss, Christian Feist, Arno Plankensteiner, Michael Eidenberger-Schober, Paul Scheier
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 061308 (2017)
https://doi.org/10.1116/1.4996074
Published: September 2017
View article titled, Correlation of target properties and plasma parameters in DC magnetron sputtering with Langmuir probe measurements
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Journal Articles

Plasma and floating potentials in magnetron discharges

Jindřich Musil, Martin Jaroš
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 060605 (2017)
https://doi.org/10.1116/1.4992054
Published: September 2017
View article titled, Plasma and floating potentials in magnetron discharges
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Journal Articles

Characterization of a cylindrical ring-cusp ion source with electrically isolated magnet rings

Neil A. Arthur, John E. Foster
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 021310 (2017)
https://doi.org/10.1116/1.4976746
Published: February 2017
View article titled, Characterization of a cylindrical ring-cusp ion source with electrically isolated magnet rings
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Journal Articles

Improved inflection point method of emissive probe for accurate measurement of plasma potential

Jian-quan Li, Jun Xu, Yu-jing Bai, Wen-qi Lu, You-nian Wang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 061304 (2016)
https://doi.org/10.1116/1.4964834
Published: October 2016
View article titled, Improved inflection point method of emissive probe for accurate measurement of plasma potential
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Journal Articles

Time-resolved ion flux and impedance measurements for process characterization in reactive high-power impulse magnetron sputtering

Daniel Lundin, Martin Čada, Zdenĕk Hubička
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 041305 (2016)
https://doi.org/10.1116/1.4953033
Published: June 2016
View article titled, Time-resolved ion flux and impedance measurements for process characterization in reactive high-power impulse magnetron sputtering
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Journal Articles

Ion energy control in reactive ion etching using 1-MHz pulsed-DC square-wave-superimposed 100-MHz RF capacitively coupled plasma

Akio Ui, Hisataka Hayashi, Itsuko Sakai, Takeshi Kaminatsui, Tokuhisa Ohiwa, Katsumi Yamamoto, Keisuke Kikutani
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 031301 (2016)
https://doi.org/10.1116/1.4943384
Published: March 2016
View article titled, Ion energy control in reactive ion etching using 1-MHz pulsed-DC square-wave-superimposed 100-MHz RF capacitively coupled plasma
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Journal Articles

Ion energy distribution function measurements by laser-induced fluorescence in a dual radio frequency sheath

Nathaniel B. Moore, Walter Gekelman, Patrick Pribyl
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 021303 (2016)
https://doi.org/10.1116/1.4941069
Published: February 2016
View article titled, Ion energy distribution function measurements by laser-induced fluorescence in a dual radio frequency sheath
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Journal Articles

Characterization of a cold cathode Penning ion source for the implantation of noble gases beneath 2D monolayers on metals: Ions and neutrals

Huanyao Cun, Annina Spescha, Adrian Schuler, Matthias Hengsberger, Jürg Osterwalder, Thomas Greber
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 020602 (2016)
https://doi.org/10.1116/1.4939507
Published: January 2016
View article titled, Characterization of a cold cathode Penning ion source for the implantation of noble gases beneath 2D monolayers on metals: Ions and neutrals
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