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Journal Articles

3D hybrid simulation of postarc sheath expansion with nonuniform residual plasmas

Zhenxing Wang, Rui Li, Bo Cao, Haopo Liu, Jing Liu, Liqiong Sun, Yingsan Geng, Jianhua Wang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 053008 (2024)
https://doi.org/10.1116/6.0003859
Published: September 2024
View article titled, 3D hybrid simulation of postarc sheath expansion with nonuniform residual plasmas
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Journal Articles

Numerical study of the effects of discharge parameters on capacitively coupled plasma in a magnetic field

Minghan Yan, Huanhuan Wu, Hao Wu, Yanli Peng, Shali Yang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 053007 (2024)
https://doi.org/10.1116/6.0003692
Published: September 2024
View article titled, Numerical study of the effects of discharge parameters on capacitively coupled plasma in a magnetic field
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Journal Articles

Revealing the controlling mechanisms of atomic layer etching for high-k dielectrics in conventional inductively coupled plasma etching tool

Vitaly Kuzmenko, Alexander Melnikov, Alexandr Isaev, Andrey Miakonkikh
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 052602 (2024)
https://doi.org/10.1116/6.0003717
Published: July 2024
View article titled, Revealing the controlling mechanisms of atomic layer etching for high-k dielectrics in conventional inductively coupled plasma etching tool
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Journal Articles

Investigating different carbon-based target materials: Can we improve ionization in HiPIMS for the deposition of diamondlike carbon films?

Martin Fenker, Martin Balzer, Holger Kaßner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 043402 (2024)
https://doi.org/10.1116/6.0003333
Published: May 2024
View article titled, Investigating different carbon-based target materials: Can we improve ionization in HiPIMS for the deposition of diamondlike carbon films?
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Journal Articles

Power measurement analysis of moderate pressure capacitively coupled discharges

Shadhin Hussain, Abhishek Verma, Kallol Bera, Shahid Rauf, Matthew Goeckner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 033010 (2024)
https://doi.org/10.1116/6.0003366
Published: April 2024
View article titled, Power measurement analysis of moderate pressure capacitively coupled discharges
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Includes: Supplementary data
Journal Articles

Remote inductively coupled plasmas in Ar/N2 mixtures and implications for plasma enhanced ALD

Editor’s Pick
David R. Boris, Michael J. Johnson, Jeffrey M. Woodward, Virginia D. Wheeler, Scott G. Walton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 033008 (2024)
https://doi.org/10.1116/6.0003538
Published: April 2024
View article titled, Remote inductively coupled plasmas in Ar/N<sub>2</sub> mixtures and implications for plasma enhanced ALD
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Journal Articles

Modeling of ion transport from ionization region to entrance of mass spectrometer in HiPIMS argon/Cr target

J. Zgheib, P.-Y. Jouan, A. Rhallabi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 033004 (2024)
https://doi.org/10.1116/6.0003317
Published: March 2024
View article titled, Modeling of ion transport from ionization region to entrance of mass spectrometer in HiPIMS argon/Cr target
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Journal Articles

Effects of magnetic field gradient on capacitively coupled plasma driven by tailored voltage waveforms

Huanhuan Wu, Minghan Yan, Hao Wu, Shali Yang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 033003 (2024)
https://doi.org/10.1116/6.0003324
Published: March 2024
View article titled, Effects of magnetic field gradient on capacitively coupled plasma driven by tailored voltage waveforms
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Journal Articles

Influence of magnetic field strength on plasma, microstructure, and mechanical properties of Cr thin films deposited by MPPMS and DOMS

Y. G. Li, W. Y. Liu, L. Cui
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 023108 (2024)
https://doi.org/10.1116/6.0003287
Published: February 2024
View article titled, Influence of magnetic field strength on plasma, microstructure, and mechanical properties of Cr thin films deposited by MPPMS and DOMS
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Journal Articles

Molybdenum erosion in iodine plasma at hollow cathode conditions

James D. Rogers, Richard D. Branam
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 023005 (2024)
https://doi.org/10.1116/6.0003367
Published: February 2024
View article titled, Molybdenum erosion in iodine plasma at hollow cathode conditions
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Journal Articles

Selective and nonselective plasma etching of (Al0.18Ga0.82)2O3/ Ga2O3 heterostructures

Hsiao-Hsuan Wan, Chao-Ching Chiang, Jian-Sian Li, Fan Ren, Fikadu Alema, Andrei Osinsky, Stephen J. Pearton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 022603 (2024)
https://doi.org/10.1116/6.0003400
Published: February 2024
View article titled, Selective and nonselective plasma etching of (Al<sub>0.18</sub>Ga<sub>0.82</sub>)<sub>2</sub>O<sub>3</sub>/ Ga<sub>2</sub>O<sub>3</sub> heterostructures
Open the PDF for Selective and nonselective plasma etching of (Al<sub>0.18</sub>Ga<sub>0.82</sub>)<sub>2</sub>O<sub>3</sub>/ Ga<sub>2</sub>O<sub>3</sub> heterostructures in another window
Journal Articles

Characterization of elastomer degradation in O2/Ar plasma via mass and surface morphology changes

Nicholas Connolly, Michael Hysick, David E. Barlaz, Raquel Garza, Gilberto Lunardi, David N. Ruzic
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 023004 (2024)
https://doi.org/10.1116/6.0003240
Published: February 2024
View article titled, Characterization of elastomer degradation in O<sub>2</sub>/Ar plasma via mass and surface morphology changes
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Journal Articles

Cathode spot dynamics in axial magnetic fields

Jiongyu Liang (梁炯煜), Kostadinos Tsoutas, Marcela Bilek
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 023001 (2024)
https://doi.org/10.1116/6.0003243
Published: January 2024
View article titled, Cathode spot dynamics in axial magnetic fields
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Journal Articles

Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge

J. Zgheib, L. Berthelot, J. Tranchant, N. Ginot, M.-P. Besland, A. Caillard, T. Minea, A. Rhallabi, P.-Y. Jouan
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063003 (2023)
https://doi.org/10.1116/6.0002857
Published: September 2023
View article titled, Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge
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Journal Articles

Study on effective dry etching of InGaZnO thin films under capacitively coupled plasma-reactive ion etching with a nonfluorine-based etching gas

Changyong Oh, Hyeong Wook Kim, Myeong Woo Ju, Jun Ho Song, Bo Sung Kim
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053007 (2023)
https://doi.org/10.1116/6.0002798
Published: August 2023
View article titled, Study on effective dry etching of InGaZnO thin films under capacitively coupled plasma-reactive ion etching with a nonfluorine-based etching gas
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Journal Articles

Series resonance effects of a variable inductor termination on the nonpowered electrode in capacitively coupled plasmas

Ho-Jun Moon, Jae-Won Lee, Ho-Won Lee, Yeong-Min Lim, Jiwon Jung, Chin-Wook Chung
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053003 (2023)
https://doi.org/10.1116/6.0002790
Published: July 2023
View article titled, Series resonance effects of a variable inductor termination on the nonpowered electrode in capacitively coupled plasmas
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Journal Articles

Effects of the focus ring on the ion kinetics at the wafer edge in capacitively coupled plasma reactors

Fang-Fang Ma, Quan-Zhi Zhang, Dao-Man Han, Zi-Lan Xiong, Ming Gao, You-Nian Wang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053002 (2023)
https://doi.org/10.1116/6.0002585
Published: July 2023
View article titled, Effects of the focus ring on the ion kinetics at the wafer edge in capacitively coupled plasma reactors
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Journal Articles

Characterization of a broad beam Kaufman-type ion source operated with CHF3 and O2

Gregor Dornberg, Erik Rohkamm, Peter Birtel, Frank Scholze, Frank Frost
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053104 (2023)
https://doi.org/10.1116/6.0002766
Published: July 2023
View article titled, Characterization of a broad beam Kaufman-type ion source operated with CHF<sub>3</sub> and O<sub>2</sub>
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Includes: Supplementary data
Journal Articles

Selective generation of reactive oxygen species in plasma-activated water using CO2 plasma

Vikas Rathore, Sudhir Kumar Nema
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 043001 (2023)
https://doi.org/10.1116/6.0002460
Published: May 2023
View article titled, Selective generation of reactive oxygen species in plasma-activated water using CO<sub>2</sub> plasma
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Journal Articles

Effect of focus ring with external circuit on cathode edge sheath dynamics in a capacitively coupled plasma

Yuhua Xiao, Joel Brandon, Joshua Morsell, Sang Ki Nam, KiHo Bae, Jang-Yeob Lee, Steven Shannon
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 033008 (2023)
https://doi.org/10.1116/6.0002496
Published: April 2023
View article titled, Effect of focus ring with external circuit on cathode edge sheath dynamics in a capacitively coupled plasma
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