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Journal Articles

Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge

J. Zgheib, L. Berthelot, J. Tranchant, N. Ginot, M.-P. Besland, A. Caillard, T. Minea, A. Rhallabi, P.-Y. Jouan
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063003 (2023)
https://doi.org/10.1116/6.0002857
Published: September 2023
View article titled, Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge
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Journal Articles

Study on effective dry etching of InGaZnO thin films under capacitively coupled plasma-reactive ion etching with a nonfluorine-based etching gas

Changyong Oh, Hyeong Wook Kim, Myeong Woo Ju, Jun Ho Song, Bo Sung Kim
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053007 (2023)
https://doi.org/10.1116/6.0002798
Published: August 2023
View article titled, Study on effective dry etching of InGaZnO thin films under capacitively coupled plasma-reactive ion etching with a nonfluorine-based etching gas
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Journal Articles

Series resonance effects of a variable inductor termination on the nonpowered electrode in capacitively coupled plasmas

Ho-Jun Moon, Jae-Won Lee, Ho-Won Lee, Yeong-Min Lim, Jiwon Jung, Chin-Wook Chung
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053003 (2023)
https://doi.org/10.1116/6.0002790
Published: July 2023
View article titled, Series resonance effects of a variable inductor termination on the nonpowered electrode in capacitively coupled plasmas
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Journal Articles

Effects of the focus ring on the ion kinetics at the wafer edge in capacitively coupled plasma reactors

Fang-Fang Ma, Quan-Zhi Zhang, Dao-Man Han, Zi-Lan Xiong, Ming Gao, You-Nian Wang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053002 (2023)
https://doi.org/10.1116/6.0002585
Published: July 2023
View article titled, Effects of the focus ring on the ion kinetics at the wafer edge in capacitively coupled plasma reactors
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Journal Articles

Characterization of a broad beam Kaufman-type ion source operated with CHF3 and O2

Gregor Dornberg, Erik Rohkamm, Peter Birtel, Frank Scholze, Frank Frost
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053104 (2023)
https://doi.org/10.1116/6.0002766
Published: July 2023
View article titled, Characterization of a broad beam Kaufman-type ion source operated with CHF<sub>3</sub> and O<sub>2</sub>
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Includes: Supplementary data
Journal Articles

Selective generation of reactive oxygen species in plasma-activated water using CO2 plasma

Vikas Rathore, Sudhir Kumar Nema
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 043001 (2023)
https://doi.org/10.1116/6.0002460
Published: May 2023
View article titled, Selective generation of reactive oxygen species in plasma-activated water using CO<sub>2</sub> plasma
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Journal Articles

Effect of focus ring with external circuit on cathode edge sheath dynamics in a capacitively coupled plasma

Yuhua Xiao, Joel Brandon, Joshua Morsell, Sang Ki Nam, KiHo Bae, Jang-Yeob Lee, Steven Shannon
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 033008 (2023)
https://doi.org/10.1116/6.0002496
Published: April 2023
View article titled, Effect of focus ring with external circuit on cathode edge sheath dynamics in a capacitively coupled plasma
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Journal Articles

Study on etch characteristics of magnetic tunnel junction materials using rf-biased H2/NH3 reactive ion beam

Ye Eun Kim, Doo San Kim, Yun Jong Jang, Hong Seong Gil, Ho Seop Jeon, Jong Woo Hong, In Ho Kim, Cheol Kim, Jeong-Heon Park, Geun Young Yeom
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 033005 (2023)
https://doi.org/10.1116/6.0002465
Published: April 2023
View article titled, Study on etch characteristics of magnetic tunnel junction materials using rf-biased H<sub>2</sub>/NH<sub>3</sub> reactive ion beam
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Journal Articles

Ion velocity distribution functions across a plasma meniscus

D. Caron, R. John, E. E. Scime, T. E. Steinberger
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 033001 (2023)
https://doi.org/10.1116/6.0002439
Published: March 2023
View article titled, Ion velocity distribution functions across a plasma meniscus
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Journal Articles

Control of the ion flux and energy distribution of dual-frequency capacitive RF plasmas by the variation of the driving voltages

Hwan Ho Kim, Ji Hyun Shin, Hae June Lee
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 023004 (2023)
https://doi.org/10.1116/6.0002242
Published: February 2023
View article titled, Control of the ion flux and energy distribution of dual-frequency capacitive RF plasmas by the variation of the driving voltages
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Journal Articles

Voltage waveform tailoring for high aspect ratio plasma etching of SiO2 using Ar/CF4/O2 mixtures: Consequences of ion and electron distributions on etch profiles

Florian Krüger, Hyunjae Lee, Sang Ki Nam, Mark J. Kushner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 013006 (2023)
https://doi.org/10.1116/6.0002290
Published: December 2022
View article titled, Voltage waveform tailoring for high aspect ratio plasma etching of SiO<sub>2</sub> using Ar/CF<sub>4</sub>/O<sub>2</sub> mixtures: Consequences of ion and electron distributions on etch profiles
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Journal Articles

Investigation of the magnetron balancing effect on the ionized flux fraction and deposition rate of sputtered titanium species for the high-power impulse magnetron sputtering pulses of different lengths

Anna Kapran, Vinicius G. Antunes, Zdeněk Hubička, Charles Ballage, Tiberiu Minea
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 013003 (2023)
https://doi.org/10.1116/6.0002309
Published: December 2022
View article titled, Investigation of the magnetron balancing effect on the ionized flux fraction and deposition rate of sputtered titanium species for the high-power impulse magnetron sputtering pulses of different lengths
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Journal Articles

Harmonic suppression and uniformity improvement of plasma density in capacitively coupled plasma

Yeong-Min Lim, So-Yeong Park, You He, Young-Hun Hong, Chin-Wook Chung
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 063003 (2022)
https://doi.org/10.1116/6.0002016
Published: October 2022
View article titled, Harmonic suppression and uniformity improvement of plasma density in capacitively coupled plasma
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Journal Articles

Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition

Jeffrey M. Woodward, Samantha G. Rosenberg, David R. Boris, Michael J. Johnson, Scott G. Walton, Scooter D. Johnson, Zachary R. Robinson, Neeraj Nepal, Karl F. Ludwig, Jr., Jennifer K. Hite, Charles R. Eddy, Jr.
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 062405 (2022)
https://doi.org/10.1116/6.0002021
Published: October 2022
View article titled, Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition
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Includes: Supplementary data
Journal Articles

Effects of frequency and pulse width on electron density, hydrogen peroxide generation, and perfluorooctanoic acid mineralization in a nanosecond pulsed discharge gas-liquid plasma reactor

Radha Krishna Murthy Bulusu, Shurik Yatom, Christopher W. Patterson, Robert J. Wandell, Bruce R. Locke
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 063001 (2022)
https://doi.org/10.1116/6.0001992
Published: September 2022
View article titled, Effects of frequency and pulse width on electron density, hydrogen peroxide generation, and perfluorooctanoic acid mineralization in a nanosecond pulsed discharge gas-liquid plasma reactor
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Includes: Supplementary data
Journal Articles

Degradation of methylene blue by pulsed nanosecond discharge in Ar, O2, and N2 gaseous bubbles in water: Evaluation of direct and postprocessing modes

Naomi Bourbeau, Laure Soussan, Ahmad Hamdan
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 053003 (2022)
https://doi.org/10.1116/6.0001968
Published: August 2022
View article titled, Degradation of methylene blue by pulsed nanosecond discharge in Ar, O<sub>2</sub>, and N<sub>2</sub> gaseous bubbles in water: Evaluation of direct and postprocessing modes
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Journal Articles

Effects of structured electrodes on electron power absorption and plasma uniformity in capacitive RF discharges

Li Wang, Peter Hartmann, Zoltán Donkó, Yuan-Hong Song, Julian Schulze
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 063004 (2021)
https://doi.org/10.1116/6.0001327
Published: October 2021
View article titled, Effects of structured electrodes on electron power absorption and plasma uniformity in capacitive RF discharges
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Journal Articles

Plasma-enhanced atomic layer deposition of SiO2 film using capacitively coupled Ar/O2 plasmas: A computational investigation

Chenhui Qu, Yukinori Sakiyama, Pulkit Agarwal, Mark J. Kushner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 052403 (2021)
https://doi.org/10.1116/6.0001121
Published: August 2021
View article titled, Plasma-enhanced atomic layer deposition of SiO<sub>2</sub> film using capacitively coupled Ar/O<sub>2</sub> plasmas: A computational investigation
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Journal Articles

Direct current and high power impulse magnetron sputtering discharges with a positively biased anode

Rainer Hippler, Martin Cada, Zdenek Hubicka
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 043007 (2021)
https://doi.org/10.1116/6.0001054
Published: June 2021
View article titled, Direct current and high power impulse magnetron sputtering discharges with a positively biased anode
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Journal Articles

Focus ring geometry influence on wafer edge voltage distribution for plasma processes

Yuhua Xiao, Yao Du, Carl Smith, Sang Ki Nam, Hoki Lee, Jang-Yeob Lee, Steven Shannon
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 043006 (2021)
https://doi.org/10.1116/6.0000981
Published: June 2021
View article titled, Focus ring geometry influence on wafer edge voltage distribution for plasma processes
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