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Journal Articles

Transient-assisted plasma etching (TAPE): Concept, mechanism, and prospects

Editor’s Pick
Atefeh Fathzadeh, Philippe Bezard, Maxime Darnon, Inge Manders, Thierry Conard, Ilse Hoflijk, Frederic Lazzarino, Stefan de Gendt
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 033006 (2024)
https://doi.org/10.1116/6.0003380
Published: April 2024
View article titled, Transient-assisted plasma etching (TAPE): Concept, mechanism, and prospects
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Journal Articles

An examination of the performance of molecular dynamics force fields: Silicon and silicon dioxide reactive ion etching

Editor’s Pick
Seungbo Shim, Joseph R. Vella, Jack S. Draney, Donghyeon Na, David B. Graves
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 023207 (2024)
https://doi.org/10.1116/6.0003425
Published: February 2024
View article titled, An examination of the performance of molecular dynamics force fields: Silicon and silicon dioxide reactive ion etching
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Includes: Supplementary data
Journal Articles

Characterization of elastomer degradation in O2/Ar plasma via mass and surface morphology changes

Nicholas Connolly, Michael Hysick, David E. Barlaz, Raquel Garza, Gilberto Lunardi, David N. Ruzic
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 023004 (2024)
https://doi.org/10.1116/6.0003240
Published: February 2024
View article titled, Characterization of elastomer degradation in O<sub>2</sub>/Ar plasma via mass and surface morphology changes
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Journal Articles

Significance of plasma-surface interactions in the etch behavior of low-k materials

Adam Pranda, Steven Grzeskowiak, Yu- Hao Tsai, Yusuke Yoshida, Eric Liu, Yun Han, Peter Biolsi, Ken Kobayashi, Nobuyuki Ikezawa
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063009 (2023)
https://doi.org/10.1116/6.0003014
Published: November 2023
View article titled, Significance of plasma-surface interactions in the etch behavior of low-k materials
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Journal Articles

Ion velocity distribution functions across a plasma meniscus

Editor’s Pick
D. Caron, R. John, E. E. Scime, T. E. Steinberger
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 033001 (2023)
https://doi.org/10.1116/6.0002439
Published: March 2023
View article titled, Ion velocity distribution functions across a plasma meniscus
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Journal Articles

Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition

Editor’s Pick
Jeffrey M. Woodward, Samantha G. Rosenberg, David R. Boris, Michael J. Johnson, Scott G. Walton, Scooter D. Johnson, Zachary R. Robinson, Neeraj Nepal, Karl F. Ludwig, Jr., Jennifer K. Hite, Charles R. Eddy, Jr.
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 062405 (2022)
https://doi.org/10.1116/6.0002021
Published: October 2022
View article titled, Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition
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Includes: Supplementary data
Journal Articles

Elucidating energetics and kinetics in environmentally relevant mixed gas plasmas

Tara L. Van Surksum, Ellen R. Fisher
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 053001 (2021)
https://doi.org/10.1116/6.0001080
Published: July 2021
View article titled, Elucidating energetics and kinetics in environmentally relevant mixed gas plasmas
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Includes: Supplementary data
Journal Articles

Hollow cathode plasma electron source for low temperature deposition of cobalt films by electron-enhanced atomic layer deposition

Zachary C. Sobell, Andrew S. Cavanagh, David R. Boris, Scott G. Walton, Steven M. George
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 042403 (2021)
https://doi.org/10.1116/6.0001033
Published: June 2021
View article titled, Hollow cathode plasma electron source for low temperature deposition of cobalt films by electron-enhanced atomic layer deposition
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Journal Articles

Effect of nonvertical ion bombardment due to edge effects on polymer surface morphology evolution and etching uniformity

Adam Pranda, Chen Li, Youngsik Seo, Gottlieb S. Oehrlein
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 043001 (2021)
https://doi.org/10.1116/6.0001015
Published: May 2021
View article titled, Effect of nonvertical ion bombardment due to edge effects on polymer surface morphology evolution and etching uniformity
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Journal Articles

Preface for the Festschrift Honoring Dr. Steve Rossnagel

Ivan Petrov, J. E. Greene, James M. Fitz-Gerald, Jerrold A. Floro, Eric A. Joseph, Eray S. Aydil
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 051601 (2020)
https://doi.org/10.1116/6.0000480
Published: August 2020
View article titled, Preface for the Festschrift Honoring Dr. Steve Rossnagel
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Journal Articles

The role of plasma in plasma-enhanced atomic layer deposition of crystalline films

David R. Boris, Virginia D. Wheeler, Neeraj Nepal, Syed B. Qadri, Scott G. Walton, Charles (Chip) R. Eddy
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 040801 (2020)
https://doi.org/10.1116/6.0000145
Published: May 2020
View article titled, The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
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Journal Articles

Gas-phase diagnostic studies of H2 and CH4 inductively coupled plasmas

Editor’s Pick
Tara L. Van Surksum, Ellen R. Fisher
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 033010 (2020)
https://doi.org/10.1116/6.0000090
Published: April 2020
View article titled, Gas-phase diagnostic studies of H<sub>2</sub> and CH<sub>4</sub> inductively coupled plasmas
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Journal Articles

Plasma deposition—Impact of ions in plasma enhanced chemical vapor deposition, plasma enhanced atomic layer deposition, and applications to area selective deposition

Editor’s Pick
Christophe Vallée, Marceline Bonvalot, Samia Belahcen, Taguhi Yeghoyan, Moustapha Jaffal, Rémi Vallat, Ahmad Chaker, Gautier Lefèvre, Sylvain David, Ahmad Bsiesy, Nicolas Possémé, Rémy Gassilloud, Agnès Granier
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 033007 (2020)
https://doi.org/10.1116/1.5140841
Published: April 2020
View article titled, Plasma deposition—Impact of ions in plasma enhanced chemical vapor deposition, plasma enhanced atomic layer deposition, and applications to area selective deposition
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Journal Articles

Argon clustering in silicon under low-energy irradiation: Molecular dynamics simulation with different Ar–Si potentials

Anastasia A. Sycheva, Ekaterina N. Voronina, Tatyana V. Rakhimova, Alexander T. Rakhimov
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 061303 (2018)
https://doi.org/10.1116/1.5050325
Published: November 2018
View article titled, Argon clustering in silicon under low-energy irradiation: Molecular dynamics simulation with different Ar–Si potentials
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Journal Articles

Modeling of silicon etching using Bosch process: Effects of oxygen addition on the plasma and surface properties

Guillaume Le Dain, Ahmed Rhallabi, Christophe Cardinaud, Aurélie Girard, Marie-Claude Fernandez, Mohamed Boufnichel, Fabrice Roqueta
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 03E109 (2018)
https://doi.org/10.1116/1.5023590
Published: May 2018
View article titled, Modeling of silicon etching using Bosch process: Effects of oxygen addition on the plasma and surface properties
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Journal Articles

Plasma–surface interaction at atmospheric pressure: A case study of polystyrene etching and surface modification by Ar/O2 plasma jet

Editor’s Pick
Pingshan Luan, Andrew J. Knoll, Peter J. Bruggeman, Gottlieb S. Oehrlein
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 05C315 (2017)
https://doi.org/10.1116/1.5000691
Published: August 2017
View article titled, Plasma–surface interaction at atmospheric pressure: A case study of polystyrene etching and surface modification by Ar/O<sub>2</sub> plasma jet
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Journal Articles

Review Article: Plasma–surface interactions at the atomic scale for patterning metals

Nicholas D. Altieri, Jack Kun-Chieh Chen, Luke Minardi, Jane P. Chang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 05C203 (2017)
https://doi.org/10.1116/1.4993602
Published: July 2017
View article titled, Review Article: Plasma–surface interactions at the atomic scale for patterning metals
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Journal Articles

Quasiatomic layer etching of silicon oxide selective to silicon nitride in topographic structures using fluorocarbon plasmas

Mingmei Wang, Peter L. G. Ventzek, Alok Ranjan
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 031301 (2017)
https://doi.org/10.1116/1.4978224
Published: March 2017
View article titled, Quasiatomic layer etching of silicon oxide selective to silicon nitride in topographic structures using fluorocarbon plasmas
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Journal Articles

Ion energy control in reactive ion etching using 1-MHz pulsed-DC square-wave-superimposed 100-MHz RF capacitively coupled plasma

Akio Ui, Hisataka Hayashi, Itsuko Sakai, Takeshi Kaminatsui, Tokuhisa Ohiwa, Katsumi Yamamoto, Keisuke Kikutani
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 031301 (2016)
https://doi.org/10.1116/1.4943384
Published: March 2016
View article titled, Ion energy control in reactive ion etching using 1-MHz pulsed-DC square-wave-superimposed 100-MHz RF capacitively coupled plasma
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Journal Articles

Ion energy distribution function measurements by laser-induced fluorescence in a dual radio frequency sheath

Nathaniel B. Moore, Walter Gekelman, Patrick Pribyl
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 021303 (2016)
https://doi.org/10.1116/1.4941069
Published: February 2016
View article titled, Ion energy distribution function measurements by laser-induced fluorescence in a dual radio frequency sheath
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