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Journal Articles

Core-shell metallic nanotube arrays for highly sensitive surface-enhanced Raman scattering (SERS) detection

Jinn P. Chu, Yi-Jui Yeh, Chih-Yu Liu, Yi-Xiang Yang, Alfreda Krisna Altama, Ting-Hao Chang, Wei-Hung Chiang, Pakman Yiu, Kuo-Lun Tung
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063111 (2023)
https://doi.org/10.1116/6.0003055
Published: October 2023
View article titled, Core-shell metallic nanotube arrays for highly sensitive surface-enhanced Raman scattering (SERS) detection
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Journal Articles

Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge

J. Zgheib, L. Berthelot, J. Tranchant, N. Ginot, M.-P. Besland, A. Caillard, T. Minea, A. Rhallabi, P.-Y. Jouan
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063003 (2023)
https://doi.org/10.1116/6.0002857
Published: September 2023
View article titled, Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge
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Journal Articles

Comparative study of the microspot splitting characteristics of direct-current and pulsed cathodic vacuum arc

Ke Zhang, Wenchang Lang, Hao Du, Zhijie Chen, Xinlei Wei, Xianghong Wang, Bin Gao
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053105 (2023)
https://doi.org/10.1116/6.0002786
Published: July 2023
View article titled, Comparative study of the microspot splitting characteristics of direct-current and pulsed cathodic vacuum arc
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Journal Articles

Control of the ion flux and energy distribution of dual-frequency capacitive RF plasmas by the variation of the driving voltages

Hwan Ho Kim, Ji Hyun Shin, Hae June Lee
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 023004 (2023)
https://doi.org/10.1116/6.0002242
Published: February 2023
View article titled, Control of the ion flux and energy distribution of dual-frequency capacitive RF plasmas by the variation of the driving voltages
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Journal Articles

Nanosecond pulsed plasma discharge for remediation of simulated wastewater containing thiazine and azo dyes as model pollutants

Muhammad Farooq, Siddiqa Ismail, N. U. Rehman
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 013001 (2023)
https://doi.org/10.1116/6.0002064
Published: December 2022
View article titled, Nanosecond pulsed plasma discharge for remediation of simulated wastewater containing thiazine and azo dyes as model pollutants
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Journal Articles

Harmonic suppression and uniformity improvement of plasma density in capacitively coupled plasma

Yeong-Min Lim, So-Yeong Park, You He, Young-Hun Hong, Chin-Wook Chung
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 063003 (2022)
https://doi.org/10.1116/6.0002016
Published: October 2022
View article titled, Harmonic suppression and uniformity improvement of plasma density in capacitively coupled plasma
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Journal Articles

Electric discharge initiation in water with gas bubbles: A time scale approach

Nicholas L. Sponsel, Sophia Gershman, Maria J. Herrera Quesada, Jacob T. Mast, Katharina Stapelmann
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 063002 (2022)
https://doi.org/10.1116/6.0001990
Published: September 2022
View article titled, Electric discharge initiation in water with gas bubbles: A time scale approach
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Includes: Supplementary data
Journal Articles

Temporal evolution of the ion flux to the target in rotational RF multimagnetron plasma

Yasunori Ohtsu, Koya Yasuda, Julian Schulze
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 053006 (2022)
https://doi.org/10.1116/6.0001994
Published: August 2022
View article titled, Temporal evolution of the ion flux to the target in rotational RF multimagnetron plasma
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Journal Articles

Substrate temperature dependence of GaN film deposited on sapphire substrate by high-density convergent plasma sputtering device

Taisei Motomura, Tatsuo Tabaru, Masato Uehara
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 053001 (2022)
https://doi.org/10.1116/6.0001860
Published: July 2022
View article titled, Substrate temperature dependence of GaN film deposited on sapphire substrate by high-density convergent plasma sputtering device
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Journal Articles

Oxygen incorporation in AlN films grown by plasma-enhanced atomic layer deposition

Nese Gungor, Mustafa Alevli
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 022404 (2022)
https://doi.org/10.1116/6.0001498
Published: January 2022
View article titled, Oxygen incorporation in AlN films grown by plasma-enhanced atomic layer deposition
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Includes: Supplementary data
Journal Articles

Atomic layer etching of SiO2 with self-limiting behavior on the surface modification step using sequential exposure of HF and NH3

Nobuya Miyoshi, Hiroyuki Kobayashi, Kazunori Shinoda, Masaru Kurihara, Kohei Kawamura, Yutaka Kouzuma, Masaru Izawa
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 012601 (2022)
https://doi.org/10.1116/6.0001517
Published: December 2021
View article titled, Atomic layer etching of SiO<sub>2</sub> with self-limiting behavior on the surface modification step using sequential exposure of HF and NH<sub>3</sub>
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Journal Articles

Polymethylmethacrylate wettability change spatially correlates with self-organized streamer microdischarge patterns in dielectric barrier discharge plasmas

Oleksandr Polonskyi, Torge Hartig, Joshua R. Uzarski, Michael J. Gordon
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 063001 (2021)
https://doi.org/10.1116/6.0001148
Published: September 2021
View article titled, Polymethylmethacrylate wettability change spatially correlates with self-organized streamer microdischarge patterns in dielectric barrier discharge plasmas
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Includes: Supplementary data
Journal Articles

Green CVD—Toward a sustainable philosophy for thin film deposition by chemical vapor deposition

Henrik Pedersen, Seán T. Barry, Jonas Sundqvist
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 051001 (2021)
https://doi.org/10.1116/6.0001125
Published: July 2021
View article titled, Green CVD—Toward a sustainable philosophy for thin film deposition by chemical vapor deposition
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Journal Articles

Focus ring geometry influence on wafer edge voltage distribution for plasma processes

Yuhua Xiao, Yao Du, Carl Smith, Sang Ki Nam, Hoki Lee, Jang-Yeob Lee, Steven Shannon
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 043006 (2021)
https://doi.org/10.1116/6.0000981
Published: June 2021
View article titled, Focus ring geometry influence on wafer edge voltage distribution for plasma processes
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Journal Articles

Selective atomic layer reaction between GaN and SiN in HBr neutral beam etching

Daisuke Ohori, Takahiro Sawada, Kenta Sugawara, Masaya Okada, Ken Nakata, Kazutaka Inoue, Daisuke Sato, Seiji Samukawa
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 042601 (2021)
https://doi.org/10.1116/6.0000867
Published: May 2021
View article titled, Selective atomic layer reaction between GaN and SiN in HBr neutral beam etching
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Journal Articles

Effect of N2/H2 plasma on the growth of InN thin films on sapphire by hollow-cathode plasma-assisted atomic layer deposition

Mustafa Alevli, Nese Gungor
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 062407 (2020)
https://doi.org/10.1116/6.0000494
Published: October 2020
View article titled, Effect of N<sub>2</sub>/H<sub>2</sub> plasma on the growth of InN thin films on sapphire by hollow-cathode plasma-assisted atomic layer deposition
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Includes: Supplementary data
Journal Articles

Plasmonic nitriding of graphene on a graphite substrate via gold nanoparticles and NH3/Ar plasma

Takeshi Kitajima, Machiko Miyake, Ryo Katoh, Toshiki Nakano
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 063001 (2020)
https://doi.org/10.1116/6.0000405
Published: October 2020
View article titled, Plasmonic nitriding of graphene on a graphite substrate via gold nanoparticles and NH<sub>3</sub>/Ar plasma
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Journal Articles

Plasmonic nanocomposites of zinc oxide and titanium nitride

Chad A. Beaudette, Jacob T. Held, Benjamin L. Greenberg, Phong H. Nguyen, Nolan M. Concannon, Russell J. Holmes, K. Andre Mkhoyan, Eray S. Aydil, Uwe R. Kortshagen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 042404 (2020)
https://doi.org/10.1116/1.5142858
Published: June 2020
View article titled, Plasmonic nanocomposites of zinc oxide and titanium nitride
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Includes: Supplementary data
Journal Articles

Effect of frequency and applied voltage of an atmospheric-pressure dielectric-barrier discharge on breakdown and hydroxyl-radical generation with a liquid electrode

Joshua M. Blatz, Daniel Benjamin, Faraz A. Choudhury, Benjamin B. Minkoff, Michael R. Sussman, J. Leon Shohet
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 043001 (2020)
https://doi.org/10.1116/6.0000125
Published: May 2020
View article titled, Effect of frequency and applied voltage of an atmospheric-pressure dielectric-barrier discharge on breakdown and hydroxyl-radical generation with a liquid electrode
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Journal Articles

Chemical vapor deposition of metallic films using plasma electrons as reducing agents

Hama Nadhom, Daniel Lundin, Polla Rouf, Henrik Pedersen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 033402 (2020)
https://doi.org/10.1116/1.5142850
Published: March 2020
View article titled, Chemical vapor deposition of metallic films using plasma electrons as reducing agents
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Includes: Supplementary data