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Journal Articles

Understanding ion and atom fluxes during high-power impulse magnetron sputtering deposition of NbC_x films from a compound target

M. Farahani, T. Kozák, A. D. Pajdarová, A. Bahr, H. Riedl, P. Zeman

J. Vac. Sci. Technol. A 41, 063008 (2023)

https://doi.org/10.1116/6.0002944

Published: October 2023

View article titled, Understanding ion and atom fluxes during high-power impulse magnetron sputtering deposition of NbCx films from a compound target

Journal Articles

Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge

J. Zgheib, L. Berthelot, J. Tranchant, N. Ginot, M.-P. Besland, A. Caillard, T. Minea, A. Rhallabi, P.-Y. Jouan

J. Vac. Sci. Technol. A 41, 063003 (2023)

https://doi.org/10.1116/6.0002857

Published: September 2023

View article titled, Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge

Journal Articles

Series resonance effects of a variable inductor termination on the nonpowered electrode in capacitively coupled plasmas

Ho-Jun Moon, Jae-Won Lee, Ho-Won Lee, Yeong-Min Lim, Jiwon Jung, Chin-Wook Chung

J. Vac. Sci. Technol. A 41, 053003 (2023)

https://doi.org/10.1116/6.0002790

Published: July 2023

View article titled, Series resonance effects of a variable inductor termination on the nonpowered electrode in capacitively coupled plasmas

Journal Articles

In situ diagnostics of the Si etching structures profile in ICP SF₆/C₄F₈ plasma: Macrostructures

Artem Osipov, Alina Gagaeva, Anastasia Speshilova, Armenak Osipov, Yakov Enns, Alexey Kazakin, Ekaterina Endiiarova, Roman Kornilov, Sergey Alexandrov

J. Vac. Sci. Technol. A 41, 033007 (2023)

https://doi.org/10.1116/6.0002427

Published: April 2023

View article titled, In situ diagnostics of the Si etching structures profile in ICP SF6/C4F8 plasma: Macrostructures

Journal Articles

Harmonic suppression and uniformity improvement of plasma density in capacitively coupled plasma

Yeong-Min Lim, So-Yeong Park, You He, Young-Hun Hong, Chin-Wook Chung

J. Vac. Sci. Technol. A 40, 063003 (2022)

https://doi.org/10.1116/6.0002016

Published: October 2022

View article titled, Harmonic suppression and uniformity improvement of plasma density in capacitively coupled plasma

Journal Articles

Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition

Jeffrey M. Woodward, Samantha G. Rosenberg, David R. Boris, Michael J. Johnson, Scott G. Walton, Scooter D. Johnson, Zachary R. Robinson, Neeraj Nepal, Karl F. Ludwig, Jr., Jennifer K. Hite, Charles R. Eddy, Jr.

J. Vac. Sci. Technol. A 40, 062405 (2022)

https://doi.org/10.1116/6.0002021

Published: October 2022

View article titled, Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition

Includes: Supplementary data

Journal Articles

Temporal evolution of the ion flux to the target in rotational RF multimagnetron plasma

Yasunori Ohtsu, Koya Yasuda, Julian Schulze

J. Vac. Sci. Technol. A 40, 053006 (2022)

https://doi.org/10.1116/6.0001994

Published: August 2022

View article titled, Temporal evolution of the ion flux to the target in rotational RF multimagnetron plasma

Journal Articles

Quantitative analysis of composition and temperature of semiconductor processing plasmas via terahertz spectroscopy

Yaser H. Helal, Christopher F. Neese, Frank C. De Lucia, Phillip J. Stout, Barry Craver, Michael Armacost

J. Vac. Sci. Technol. A 40, 043004 (2022)

https://doi.org/10.1116/6.0001843

Published: June 2022

View article titled, Quantitative analysis of composition and temperature of semiconductor processing plasmas via terahertz spectroscopy

Journal Articles

Comparative studies of cold/hot probe techniques for accurate plasma measurements

Jian-quan Li, Qing-he Zhang, Zan-yang Xing, Wen-qi Lu

J. Vac. Sci. Technol. A 40, 033001 (2022)

https://doi.org/10.1116/6.0001461

Published: March 2022

View article titled, Comparative studies of cold/hot probe techniques for accurate plasma measurements

Journal Articles

Optical emission spectroscopy and Langmuir probe studies of an intermediate pressure, supersonic microplasma jet deposition source

Katherine E. Mackie, Michael J. Gordon

J. Vac. Sci. Technol. A 40, 013002 (2022)

https://doi.org/10.1116/6.0001386

Published: December 2021

View article titled, Optical emission spectroscopy and Langmuir probe studies of an intermediate pressure, supersonic microplasma jet deposition source

Journal Articles

Various evolution trends of sample thickness in fluorocarbon film deposition on SiO₂

Youngseok Lee, Inho Seong, Jangjae Lee, Sangho Lee, Chulhee Cho, Sijun Kim, ShinJae You

J. Vac. Sci. Technol. A 40, 013001 (2022)

https://doi.org/10.1116/6.0001466

Published: December 2021

View article titled, Various evolution trends of sample thickness in fluorocarbon film deposition on SiO2

Journal Articles

Ion beam assisted chemical vapor deposition of hybrid coatings—Process diagnostics and mechanisms

Artem Shelemin, Oleg Zabeida, Jolanta-Ewa Klemberg-Sapieha, Ludvik Martinu

J. Vac. Sci. Technol. A 39, 063003 (2021)

https://doi.org/10.1116/6.0001291

Published: October 2021

View article titled, Ion beam assisted chemical vapor deposition of hybrid coatings—Process diagnostics and mechanisms

Includes: Supplementary data

Journal Articles

Direct current and high power impulse magnetron sputtering discharges with a positively biased anode

Rainer Hippler, Martin Cada, Zdenek Hubicka

J. Vac. Sci. Technol. A 39, 043007 (2021)

https://doi.org/10.1116/6.0001054

Published: June 2021

View article titled, Direct current and high power impulse magnetron sputtering discharges with a positively biased anode

Journal Articles

Determination of recombination coefficients for hydrogen, oxygen, and nitrogen gasses via in situ radical probe system

Dren Qerimi, Gianluca Panici, Arihant Jain, Daniel Jacobson, David N. Ruzic

J. Vac. Sci. Technol. A 39, 023004 (2021)

https://doi.org/10.1116/6.0000787

Published: March 2021

View article titled, Determination of recombination coefficients for hydrogen, oxygen, and nitrogen gasses via in situ radical probe system

Journal Articles

Radical probe system for in situ measurements of radical densities of hydrogen, oxygen, and nitrogen

Dren Qerimi, Ivan Shchelkanov, Gianluca Panici, Arihant Jain, James Wagner, David N. Ruzic

J. Vac. Sci. Technol. A 39, 023003 (2021)

https://doi.org/10.1116/6.0000786

Published: March 2021

View article titled, Radical probe system for in situ measurements of radical densities of hydrogen, oxygen, and nitrogen

Journal Articles

Preface for the Special Topic Collection Commemorating the Career of John Coburn

Eric Kay, David B. Graves, Eray S. Aydil

J. Vac. Sci. Technol. A 38, 061602 (2020)

https://doi.org/10.1116/6.0000643

Published: October 2020

View article titled, Preface for the Special Topic Collection Commemorating the Career of John Coburn

Journal Articles

Investigation of organic precursors and plasma mixtures allowing control of carbon passivation when etching HgCdTe in hydrocarbon-based inductively coupled plasmas

Jordan Piet, Wilfrid Faider, Aurélie Girard, François Boulard, Christophe Cardinaud

J. Vac. Sci. Technol. A 38, 053005 (2020)

https://doi.org/10.1116/6.0000397

Published: August 2020

View article titled, Investigation of organic precursors and plasma mixtures allowing control of carbon passivation when etching HgCdTe in hydrocarbon-based inductively coupled plasmas

Journal Articles

Gas-phase diagnostic studies of H₂ and CH₄ inductively coupled plasmas

Tara L. Van Surksum, Ellen R. Fisher

J. Vac. Sci. Technol. A 38, 033010 (2020)

https://doi.org/10.1116/6.0000090

Published: April 2020

View article titled, Gas-phase diagnostic studies of H2 and CH4 inductively coupled plasmas

Journal Articles

Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition

Masaki Hirayama, Akinobu Teramoto, Shigetoshi Sugawa

J. Vac. Sci. Technol. A 38, 032408 (2020)

https://doi.org/10.1116/6.0000021

Published: April 2020

View article titled, Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition

Journal Articles

Electron beam injection from a hollow cathode plasma into a downstream reactive environment: Characterization of secondary plasma production and Si₃N₄ and Si etching

Chen Li, Valery Godyak, Thorsten Hofmann, Klaus Edinger, Gottlieb S. Oehrlein

J. Vac. Sci. Technol. A 38, 033001 (2020)

https://doi.org/10.1116/1.5143537

Published: March 2020

View article titled, Electron beam injection from a hollow cathode plasma into a downstream reactive environment: Characterization of secondary plasma production and Si3N4 and Si etching

NARROW

Topics

Understanding ion and atom fluxes during high-power impulse magnetron sputtering deposition of NbC_x films from a compound target

Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge

Series resonance effects of a variable inductor termination on the nonpowered electrode in capacitively coupled plasmas

In situ diagnostics of the Si etching structures profile in ICP SF₆/C₄F₈ plasma: Macrostructures

Harmonic suppression and uniformity improvement of plasma density in capacitively coupled plasma

Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition

Temporal evolution of the ion flux to the target in rotational RF multimagnetron plasma

Quantitative analysis of composition and temperature of semiconductor processing plasmas via terahertz spectroscopy

Comparative studies of cold/hot probe techniques for accurate plasma measurements

Optical emission spectroscopy and Langmuir probe studies of an intermediate pressure, supersonic microplasma jet deposition source

Various evolution trends of sample thickness in fluorocarbon film deposition on SiO₂

Ion beam assisted chemical vapor deposition of hybrid coatings—Process diagnostics and mechanisms

Direct current and high power impulse magnetron sputtering discharges with a positively biased anode

Determination of recombination coefficients for hydrogen, oxygen, and nitrogen gasses via in situ radical probe system

Radical probe system for in situ measurements of radical densities of hydrogen, oxygen, and nitrogen

Preface for the Special Topic Collection Commemorating the Career of John Coburn

Investigation of organic precursors and plasma mixtures allowing control of carbon passivation when etching HgCdTe in hydrocarbon-based inductively coupled plasmas

Gas-phase diagnostic studies of H₂ and CH₄ inductively coupled plasmas

Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition

Electron beam injection from a hollow cathode plasma into a downstream reactive environment: Characterization of secondary plasma production and Si₃N₄ and Si etching

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