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Journal Articles

Research on the difference in etching rates of SiO2 at the top and bottom of high-aspect-ratio trench in C4F8/Ar/O2 plasma etching

Leyi Zhang, Zhihong Gao, Yongzhi Fang, Dongyu Cen, Maoxiang Liu, Yan Zhang, Chunxia Ma, Enhao Zhao, Wencan Zhu, Wenli Wu, Xudong Wei
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 033003 (2025)
https://doi.org/10.1116/6.0004402
Published: March 2025
View article titled, Research on the difference in etching rates of SiO<sub>2</sub> at the top and bottom of high-aspect-ratio trench in C<sub>4</sub>F<sub>8</sub>/Ar/O<sub>2</sub> plasma etching
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Journal Articles

Anisotropic Ta2O5 photonic crystal waveguide etching using inductively coupled plasma etching

Wenjie Wang, Libe Arzubiaga, Maryam Shayesteh, Stephen Fenner, Owain Clark, Martin D. B. Charlton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 023405 (2025)
https://doi.org/10.1116/6.0004211
Published: February 2025
View article titled, Anisotropic Ta<sub>2</sub>O<sub>5</sub> photonic crystal waveguide etching using inductively coupled plasma etching
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Journal Articles

On the use of pulsed DC bias for etching high aspect ratio features

Editor’s Pick
Xingyi Shi, Samaneh Sadighi, Shahid Rauf, Han Luo, Jun-Chieh Wang, Jason Kenney, Jean-Paul Booth, Daniil Marinov, Mickaël Foucher, Nishant Sirse
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 013001 (2025)
https://doi.org/10.1116/6.0003943
Published: December 2024
View article titled, On the use of pulsed DC bias for etching high aspect ratio features
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Journal Articles

Electron temperature and ion density distribution on a vertical section in a weakly magnetized inductively coupled plasma

You He, Yi-Lang Jiang, Myoung-Jae Lee, Beom-Jun Seo, Ju-Ho Kim, Chin-Wook Chung
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 063004 (2024)
https://doi.org/10.1116/6.0003874
Published: November 2024
View article titled, Electron temperature and ion density distribution on a vertical section in a weakly magnetized inductively coupled plasma
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Journal Articles

Remote inductively coupled plasmas in Ar/N2 mixtures and implications for plasma enhanced ALD

Editor’s Pick
David R. Boris, Michael J. Johnson, Jeffrey M. Woodward, Virginia D. Wheeler, Scott G. Walton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 033008 (2024)
https://doi.org/10.1116/6.0003538
Published: April 2024
View article titled, Remote inductively coupled plasmas in Ar/N<sub>2</sub> mixtures and implications for plasma enhanced ALD
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Journal Articles

Molybdenum erosion in iodine plasma at hollow cathode conditions

James D. Rogers, Richard D. Branam
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 023005 (2024)
https://doi.org/10.1116/6.0003367
Published: February 2024
View article titled, Molybdenum erosion in iodine plasma at hollow cathode conditions
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Journal Articles

Selective and nonselective plasma etching of (Al0.18Ga0.82)2O3/ Ga2O3 heterostructures

Hsiao-Hsuan Wan, Chao-Ching Chiang, Jian-Sian Li, Fan Ren, Fikadu Alema, Andrei Osinsky, Stephen J. Pearton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 022603 (2024)
https://doi.org/10.1116/6.0003400
Published: February 2024
View article titled, Selective and nonselective plasma etching of (Al<sub>0.18</sub>Ga<sub>0.82</sub>)<sub>2</sub>O<sub>3</sub>/ Ga<sub>2</sub>O<sub>3</sub> heterostructures
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Journal Articles

Modeling of microtrenching and bowing effects in nanoscale Si inductively coupled plasma etching process

Ziyi Hu, Hua Shao, Junjie Li, Panpan Lai, Wenrui Wang, Chen Li, Qi Yan, Xiaobin He, Junfeng Li, Tao Yang, Rui Chen, Yayi Wei
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063113 (2023)
https://doi.org/10.1116/6.0003032
Published: November 2023
View article titled, Modeling of microtrenching and bowing effects in nanoscale Si inductively coupled plasma etching process
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Journal Articles

Effects of C4F8 plasma polymerization film on etching profiles in the Bosch process

Tomoyuki Nonaka, Kazuo Takahashi, Akimi Uchida, Stefan Lundgaard, Osamu Tsuji
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063004 (2023)
https://doi.org/10.1116/5.0158954
Published: October 2023
View article titled, Effects of C<sub>4</sub>F<sub>8</sub> plasma polymerization film on etching profiles in the Bosch process
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Journal Articles

Quasiatomic layer etching of silicon nitride enhanced by low temperature

Editor’s Pick
Daniel N. Shanks, Rania K. Ahmed, John D. Femi-Oyetoro, Matthew R. Dickie, Andrew D. Beyer, Frank Greer
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 052601 (2023)
https://doi.org/10.1116/6.0002846
Published: August 2023
View article titled, Quasiatomic layer etching of silicon nitride enhanced by low temperature
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Journal Articles

Atomic layer deposition of calcium fluoride for barrier coating applications

Editor’s Pick
John Hennessy, Robin E. Rodríguez, William C. West, Erik J. Brandon
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 042405 (2023)
https://doi.org/10.1116/6.0002563
Published: June 2023
View article titled, Atomic layer deposition of calcium fluoride for barrier coating applications
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Includes: Supplementary data
Journal Articles

Exploring the self-limiting atomic layer etching of AlGaN: A study of O2-BCl3 and chlorinate-argon systems

Lulu Guan, Xingyu Li, Chunxiang Guo, Xinying Shi, Kaidong Xu, Shiwei Zhuang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 042603 (2023)
https://doi.org/10.1116/6.0002647
Published: June 2023
View article titled, Exploring the self-limiting atomic layer etching of AlGaN: A study of O<sub>2</sub>-BCl<sub>3</sub> and chlorinate-argon systems
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Includes: Supplementary data
Journal Articles

Bias-pulsed atomic layer etching of 4H-silicon carbide producing subangstrom surface roughness

Editor’s Pick
J. A. Michaels, N. Delegan, Y. Tsaturyan, J. R. Renzas, D. D. Awschalom, J. G. Eden, F. J. Heremans
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 032607 (2023)
https://doi.org/10.1116/6.0002447
Published: May 2023
View article titled, Bias-pulsed atomic layer etching of 4H-silicon carbide producing subangstrom surface roughness
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Includes: Supplementary data
Journal Articles

Low-temperature synthesis of crystalline vanadium oxide films using oxygen plasmas

Adnan Mohammad, Krishna D. Joshi, Dhan Rana, Saidjafarzoda Ilhom, Barrett Wells, Brian Willis, Boris Sinkovic, A. K. Okyay, Necmi Biyikli
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 032405 (2023)
https://doi.org/10.1116/6.0002383
Published: March 2023
View article titled, Low-temperature synthesis of crystalline vanadium oxide films using oxygen plasmas
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Includes: Supplementary data
Journal Articles

Highly efficient plasma generation in inductively coupled plasmas using a parallel capacitor

Yeong-Min Lim, Young-Hun Hong, Gil-Ho Kang, Chin-Wook Chung
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 013005 (2023)
https://doi.org/10.1116/6.0002180
Published: December 2022
View article titled, Highly efficient plasma generation in inductively coupled plasmas using a parallel capacitor
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Journal Articles

Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition

Editor’s Pick
Jeffrey M. Woodward, Samantha G. Rosenberg, David R. Boris, Michael J. Johnson, Scott G. Walton, Scooter D. Johnson, Zachary R. Robinson, Neeraj Nepal, Karl F. Ludwig, Jr., Jennifer K. Hite, Charles R. Eddy, Jr.
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 062405 (2022)
https://doi.org/10.1116/6.0002021
Published: October 2022
View article titled, Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition
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Includes: Supplementary data
Journal Articles

Effects of N2 and O2 plasma treatments of quartz surfaces exposed to H2 plasmas

Yingliang Zhou, Hanyang Li, Ji-Eun Jung, Sang Ki Nam, Vincent M. Donnelly
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 053002 (2022)
https://doi.org/10.1116/6.0001896
Published: July 2022
View article titled, Effects of N<sub>2</sub> and O<sub>2</sub> plasma treatments of quartz surfaces exposed to H<sub>2</sub> plasmas
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Journal Articles

Quantitative analysis of composition and temperature of semiconductor processing plasmas via terahertz spectroscopy

Yaser H. Helal, Christopher F. Neese, Frank C. De Lucia, Phillip J. Stout, Barry Craver, Michael Armacost
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 043004 (2022)
https://doi.org/10.1116/6.0001843
Published: June 2022
View article titled, Quantitative analysis of composition and temperature of semiconductor processing plasmas via terahertz spectroscopy
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Journal Articles

Plasma enhanced atomic layer etching of high-k layers on WS2

Editor’s Pick
J.-F. de Marneffe, D. Marinov, A. Goodyear, P.-J. Wyndaele, N. St. J. Braithwaite, S. Kundu, I. Asselberghs, M. Cooke, S. De Gendt
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 042602 (2022)
https://doi.org/10.1116/6.0001726
Published: May 2022
View article titled, Plasma enhanced atomic layer etching of high-k layers on WS<sub>2</sub>
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Journal Articles

Plasma enhanced atomic layer deposition of textured aluminum nitride on platinized substrates for MEMS

Nicholas A. Strnad, Wendy L. Sarney, Gilbert B. Rayner, Jr., Robert R. Benoit, Glen R. Fox, Ryan Q. Rudy, Thomas J. Larrabee, Jeffrey Shallenberger, Jeffrey S. Pulskamp
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 042403 (2022)
https://doi.org/10.1116/6.0001633
Published: May 2022
View article titled, Plasma enhanced atomic layer deposition of textured aluminum nitride on platinized substrates for MEMS
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Includes: Supplementary data