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Journal Articles

Effects of structured electrodes on electron power absorption and plasma uniformity in capacitive RF discharges

Li Wang, Peter Hartmann, Zoltán Donkó, Yuan-Hong Song, Julian Schulze
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 063004 (2021)
https://doi.org/10.1116/6.0001327
Published: October 2021
View article titled, Effects of structured electrodes on electron power absorption and plasma uniformity in capacitive RF discharges
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Journal Articles

Evaluation of nickel self-sputtering yields by molecular-dynamics simulation

Nicolas A. Mauchamp, Michiro Isobe, Satoshi Hamaguchi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 043005 (2021)
https://doi.org/10.1116/6.0000979
Published: June 2021
View article titled, Evaluation of nickel self-sputtering yields by molecular-dynamics simulation
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Journal Articles

Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier

Yong-Ping Wang, Zi-Jun Ding, Bao Zhu, Wen-Jun Liu, David Wei Zhang, Shi-Jin Ding
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 031502 (2018)
https://doi.org/10.1116/1.5002727
Published: March 2018
View article titled, Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
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Journal Articles

Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma

Ville Rontu, Perttu Sippola, Mikael Broas, Glenn Ross, Timo Sajavaara, Harri Lipsanen, Mervi Paulasto-Kröckel, Sami Franssila
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 021508 (2018)
https://doi.org/10.1116/1.5003381
Published: January 2018
View article titled, Atomic layer deposition of AlN from AlCl<sub>3</sub> using NH<sub>3</sub> and Ar/NH<sub>3</sub> plasma
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Journal Articles

Quasi atomic layer etching of SiO2 using plasma fluorination for surface cleaning

Kyongbeom Koh, Yongjae Kim, Chang-Koo Kim, Heeyeop Chae
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 01B106 (2018)
https://doi.org/10.1116/1.5003417
Published: December 2017
View article titled, Quasi atomic layer etching of SiO<sub>2</sub> using plasma fluorination for surface cleaning
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Journal Articles

Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study

Małgorzata Kot, Justyna Łobaza, Franziska Naumann, Hassan Gargouri, Karsten Henkel, Dieter Schmeißer
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 01A114 (2018)
https://doi.org/10.1116/1.5003356
Published: December 2017
View article titled, Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study
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Journal Articles

Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature

Julian Pilz, Alberto Perrotta, Paul Christian, Martin Tazreiter, Roland Resel, Günther Leising, Thomas Griesser, Anna Maria Coclite
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 01A109 (2018)
https://doi.org/10.1116/1.5003334
Published: December 2017
View article titled, Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
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Includes: Supplementary data
Journal Articles

Thermal adsorption-enhanced atomic layer etching of Si3N4

Woo-Hee Kim, Dougyong Sung, Sejin Oh, Jehun Woo, Seungkyu Lim, Hyunju Lee, Stacey F. Bent
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 01B104 (2018)
https://doi.org/10.1116/1.5003271
Published: November 2017
View article titled, Thermal adsorption-enhanced atomic layer etching of Si<sub>3</sub>N<sub>4</sub>
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Includes: Supplementary data
Journal Articles

Influence of hydrogen in silicon nitride films on the surface reactions during hydrofluorocarbon plasma etching

Nobuyuki Kuboi, Tetsuya Tatsumi, Hideki Minari, Masanaga Fukasawa, Yoshifumi Zaizen, Jun Komachi, Takahiro Kawamura
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 061306 (2017)
https://doi.org/10.1116/1.5001034
Published: September 2017
View article titled, Influence of hydrogen in silicon nitride films on the surface reactions during hydrofluorocarbon plasma etching
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Journal Articles

Plasma–surface interaction at atmospheric pressure: A case study of polystyrene etching and surface modification by Ar/O2 plasma jet

Pingshan Luan, Andrew J. Knoll, Peter J. Bruggeman, Gottlieb S. Oehrlein
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 05C315 (2017)
https://doi.org/10.1116/1.5000691
Published: August 2017
View article titled, Plasma–surface interaction at atmospheric pressure: A case study of polystyrene etching and surface modification by Ar/O<sub>2</sub> plasma jet
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