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Journal Articles

Plasma dynamics of modulated pulsed power magnetron sputtered Cr target in an Ar-He atmosphere

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Y. G. Li, G. Z. Ouyang, L. Cui, Z. Y. Zhou
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 043109 (2025)
https://doi.org/10.1116/6.0004623
Published: June 2025
View articletitled, Plasma dynamics of modulated pulsed power magnetron sputtered Cr target in an Ar-He atmosphere
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Journal Articles

Self-limiting deposition of copper from copper beta-diketonates and plasma electrons

Open Access
Premrudee Promdet, Pentti Niiranen, Simon Lagerkvist, Daniel Lundin, Henrik Pedersen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 040402 (2025)
https://doi.org/10.1116/6.0004410
Published: May 2025
View articletitled, Self-limiting deposition of copper from copper beta-diketonates and plasma electrons
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Journal Articles

Study of Cl2/Ar transient plasmas using a dynamic global model

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T. Rasoanarivo, C. Mannequin, F. Roqueta, M. Boufnichel, A. Rhallabi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 033008 (2025)
https://doi.org/10.1116/6.0004464
Published: May 2025
View articletitled, Study of Cl2/Ar transient plasmas using a dynamic global model
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Journal Articles

Dynamic global model of Cl2/Ar plasmas: Applicability to atomic layer etching processes

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T. Rasoanarivo, C. Mannequin, F. Roqueta, M. Boufnichel, A. Rhallabi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 063003 (2024)
https://doi.org/10.1116/6.0003932
Published: November 2024
View articletitled, Dynamic global model of Cl2/Ar plasmas: Applicability to atomic layer etching processes
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Journal Articles

Effect of plasma discharge pulse length for GaN film crystallinity on sapphire substrate by high density convergent plasma sputtering device

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Itsuki Misono, Taisei Motomura, Tatsuo Tabaru, Masato Uehara, Tetsuya Okuyama
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 053005 (2024)
https://doi.org/10.1116/6.0003743
Published: July 2024
View articletitled, Effect of plasma discharge pulse length for GaN film crystallinity on sapphire substrate by high density convergent plasma sputtering device
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Journal Articles

Effects of magnetic field gradient on capacitively coupled plasma driven by tailored voltage waveforms

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Huanhuan Wu, Minghan Yan, Hao Wu, Shali Yang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 033003 (2024)
https://doi.org/10.1116/6.0003324
Published: March 2024
View articletitled, Effects of magnetic field gradient on capacitively coupled plasma driven by tailored voltage waveforms
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Journal Articles

Novel high-efficiency plasma nitriding process utilizing a high power impulse magnetron sputtering discharge

Open Access
A. P. Ehiasarian, P. Eh. Hovsepian
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 023109 (2024)
https://doi.org/10.1116/6.0003277
Published: February 2024
View articletitled, Novel high-efficiency plasma nitriding process utilizing a high power impulse magnetron sputtering discharge
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Journal Articles

Plasma electron characterization in electron chemical vapor deposition

Open Access
Pentti Niiranen, Anna Kapran, Hama Nadhom, Martin Čada, Zdeněk Hubička, Henrik Pedersen, Daniel Lundin
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 023006 (2024)
https://doi.org/10.1116/6.0003408
Published: February 2024
View articletitled, Plasma electron characterization in electron chemical vapor deposition
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Journal Articles

Influence of magnetic field strength on plasma, microstructure, and mechanical properties of Cr thin films deposited by MPPMS and DOMS

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Y. G. Li, W. Y. Liu, L. Cui
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 023108 (2024)
https://doi.org/10.1116/6.0003287
Published: February 2024
View articletitled, Influence of magnetic field strength on plasma, microstructure, and mechanical properties of Cr thin films deposited by MPPMS and DOMS
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Journal Articles

Characterization of elastomer degradation in O2/Ar plasma via mass and surface morphology changes

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Nicholas Connolly, Michael Hysick, David E. Barlaz, Raquel Garza, Gilberto Lunardi, David N. Ruzic
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 023004 (2024)
https://doi.org/10.1116/6.0003240
Published: February 2024
View articletitled, Characterization of elastomer degradation in O2/Ar plasma via mass and surface morphology changes
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Journal Articles

Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge

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J. Zgheib, L. Berthelot, J. Tranchant, N. Ginot, M.-P. Besland, A. Caillard, T. Minea, A. Rhallabi, P.-Y. Jouan
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063003 (2023)
https://doi.org/10.1116/6.0002857
Published: September 2023
View articletitled, Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge
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Journal Articles

Nanosecond pulsed plasma discharge for remediation of simulated wastewater containing thiazine and azo dyes as model pollutants

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Muhammad Farooq, Siddiqa Ismail, N. U. Rehman
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 013001 (2023)
https://doi.org/10.1116/6.0002064
Published: December 2022
View articletitled, Nanosecond pulsed plasma discharge for remediation of simulated wastewater containing thiazine and azo dyes as model pollutants
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Journal Articles

Substrate temperature dependence of GaN film deposited on sapphire substrate by high-density convergent plasma sputtering device

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Taisei Motomura, Tatsuo Tabaru, Masato Uehara
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 053001 (2022)
https://doi.org/10.1116/6.0001860
Published: July 2022
View articletitled, Substrate temperature dependence of GaN film deposited on sapphire substrate by high-density convergent plasma sputtering device
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Journal Articles

Atomic layer etching of SiO2 with self-limiting behavior on the surface modification step using sequential exposure of HF and NH3

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Nobuya Miyoshi, Hiroyuki Kobayashi, Kazunori Shinoda, Masaru Kurihara, Kohei Kawamura, Yutaka Kouzuma, Masaru Izawa
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 012601 (2022)
https://doi.org/10.1116/6.0001517
Published: December 2021
View articletitled, Atomic layer etching of SiO2 with self-limiting behavior on the surface modification step using sequential exposure of HF and NH3
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Journal Articles

Polymethylmethacrylate wettability change spatially correlates with self-organized streamer microdischarge patterns in dielectric barrier discharge plasmas

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Oleksandr Polonskyi, Torge Hartig, Joshua R. Uzarski, Michael J. Gordon
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 063001 (2021)
https://doi.org/10.1116/6.0001148
Published: September 2021
View articletitled, Polymethylmethacrylate wettability change spatially correlates with self-organized streamer microdischarge patterns in dielectric barrier discharge plasmas
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Includes: Supplementary data
Journal Articles

Green CVD—Toward a sustainable philosophy for thin film deposition by chemical vapor deposition

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Henrik Pedersen, Seán T. Barry, Jonas Sundqvist
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 051001 (2021)
https://doi.org/10.1116/6.0001125
Published: July 2021
View articletitled, Green CVD—Toward a sustainable philosophy for thin film deposition by chemical vapor deposition
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Journal Articles

Focus ring geometry influence on wafer edge voltage distribution for plasma processes

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Yuhua Xiao, Yao Du, Carl Smith, Sang Ki Nam, Hoki Lee, Jang-Yeob Lee, Steven Shannon
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 043006 (2021)
https://doi.org/10.1116/6.0000981
Published: June 2021
View articletitled, Focus ring geometry influence on wafer edge voltage distribution for plasma processes
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Journal Articles

Selective atomic layer reaction between GaN and SiN in HBr neutral beam etching

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Daisuke Ohori, Takahiro Sawada, Kenta Sugawara, Masaya Okada, Ken Nakata, Kazutaka Inoue, Daisuke Sato, Seiji Samukawa
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 042601 (2021)
https://doi.org/10.1116/6.0000867
Published: May 2021
View articletitled, Selective atomic layer reaction between GaN and SiN in HBr neutral beam etching
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Journal Articles

Effect of frequency and applied voltage of an atmospheric-pressure dielectric-barrier discharge on breakdown and hydroxyl-radical generation with a liquid electrode

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Joshua M. Blatz, Daniel Benjamin, Faraz A. Choudhury, Benjamin B. Minkoff, Michael R. Sussman, J. Leon Shohet
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 043001 (2020)
https://doi.org/10.1116/6.0000125
Published: May 2020
View articletitled, Effect of frequency and applied voltage of an atmospheric-pressure dielectric-barrier discharge on breakdown and hydroxyl-radical generation with a liquid electrode
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Journal Articles

Chemical vapor deposition of metallic films using plasma electrons as reducing agents

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Hama Nadhom, Daniel Lundin, Polla Rouf, Henrik Pedersen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 033402 (2020)
https://doi.org/10.1116/1.5142850
Published: March 2020
View articletitled, Chemical vapor deposition of metallic films using plasma electrons as reducing agents
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Includes: Supplementary data