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Journal Articles

Boron carbide films with reduced nodular defect density deposited by full-face erosion radio-frequency magnetron sputtering

G. V. Taylor, L. B. Bayu Aji, S. J. Shin, J. H. Bae, A. M. Engwall, S. O. Kucheyev
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 040401 (2024)
https://doi.org/10.1116/6.0003571
Published: May 2024
View article titled, Boron carbide films with reduced nodular defect density deposited by full-face erosion radio-frequency magnetron sputtering
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Journal Articles

Superconformal silicon carbide coatings via precursor pulsed chemical vapor deposition

Jing-Jia Huang, Christian Militzer, Charles A. Wijayawardhana, Urban Forsberg, Henrik Pedersen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 030403 (2023)
https://doi.org/10.1116/6.0002461
Published: April 2023
View article titled, Superconformal silicon carbide coatings via precursor pulsed chemical vapor deposition
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Journal Articles

Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices

Raffaella Lo Nigro, Emanuela Schilirò, Patrick Fiorenza, Fabrizio Roccaforte
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 032410 (2020)
https://doi.org/10.1116/1.5134662
Published: April 2020
View article titled, Nanolaminated Al<sub>2</sub>O<sub>3</sub>/HfO<sub>2</sub> dielectrics for silicon carbide based devices
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Journal Articles

Impact of encapsulation method on the adsorbate induced electrical instability of monolayer graphene

Sırrı Batuhan Kalkan, Alper Yanilmaz, Cem Çelebi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 051502 (2019)
https://doi.org/10.1116/1.5099141
Published: July 2019
View article titled, Impact of encapsulation method on the adsorbate induced electrical instability of monolayer graphene
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Journal Articles

High temperature deuterium enrichment using TiC coated vanadium membranes

Thomas F. Fuerst, Chase N. Taylor, Masashi Shimada, J. Douglas Way, Colin A. Wolden
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 021501 (2019)
https://doi.org/10.1116/1.5080720
Published: January 2019
View article titled, High temperature deuterium enrichment using TiC coated vanadium membranes
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Includes: Supplementary data
Journal Articles

Corrosion resistance of sintered SiC against fluorinated plasmas

Tetsuya Goto, Michito Miyahara, Masaru Sasaki, Shigetoshi Sugawa
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 061404 (2018)
https://doi.org/10.1116/1.5046792
Published: October 2018
View article titled, Corrosion resistance of sintered SiC against fluorinated plasmas
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Journal Articles

Simple device for the growth of micrometer-sized monocrystalline single-layer graphene on SiC(0001)

Editor’s Pick
Jesús Redondo, Mykola Telychko, Pavel Procházka, Martin Konečný, Jan Berger, Martin Vondráček, Jan Čechal, Pavel Jelínek, Martin Švec
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 031401 (2018)
https://doi.org/10.1116/1.5008977
Published: April 2018
View article titled, Simple device for the growth of micrometer-sized monocrystalline single-layer graphene on SiC(0001)
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Includes: Supplementary data
Journal Articles

Selective anisotropic etching of GaN over AlGaN for very thin films

Joel C. Wong, Miroslav Micovic, David F. Brown, Isaac Khalaf, Adam Williams, Andrea Corrion
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 030603 (2018)
https://doi.org/10.1116/1.5012530
Published: April 2018
View article titled, Selective anisotropic etching of GaN over AlGaN for very thin films
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Journal Articles

Application of linear least squares to the analysis of Auger electron spectroscopy depth profiles of plutonium oxides

Scott B. Donald, Jeff A. Stanford, William McLean, Art J. Nelson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 03E104 (2018)
https://doi.org/10.1116/1.5021587
Published: March 2018
View article titled, Application of linear least squares to the analysis of Auger electron spectroscopy depth profiles of plutonium oxides
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Journal Articles

XeF2 etching of epitaxial Nb2N for lift-off or micromachining of III-N materials and devices

Brian P. Downey, D. Scott Katzer, Neeraj Nepal, Matthew T. Hardy, David J. Meyer
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 05C312 (2017)
https://doi.org/10.1116/1.4994400
Published: July 2017
View article titled, XeF<sub>2</sub> etching of epitaxial Nb<sub>2</sub>N for lift-off or micromachining of III-N materials and devices
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Journal Articles

Boron and high-k dielectrics: Possible fourth etch stop colors for multipattern optical lithography processing

Shailesh Dhungana, Thuong D. Nguyen, Bradley J. Nordell, Anthony N. Caruso, Michelle M. Paquette, Georges Chollon, William A. Lanford, Kris Scharfenberger, Danya Jacob, Sean W. King
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 021510 (2017)
https://doi.org/10.1116/1.4974920
Published: January 2017
View article titled, Boron and high-<em>k</em> dielectrics: Possible fourth etch stop colors for multipattern optical lithography processing
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Includes: Supplementary data
Journal Articles

Trenched 4H-SiC with tapered sidewall formed by Cl2/O2 reactive ion etching

Yuan-Hung Tseng, Bing-Yue Tsui
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 061305 (2016)
https://doi.org/10.1116/1.4965421
Published: October 2016
View article titled, Trenched 4H-SiC with tapered sidewall formed by Cl<sub>2</sub>/O<sub>2</sub> reactive ion etching
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Journal Articles

Investigating routes toward atomic layer deposition of silicon carbide: Ab initio screening of potential silicon and carbon precursors

Ekaterina A. Filatova, Dennis Hausmann, Simon D. Elliott
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 01B103 (2017)
https://doi.org/10.1116/1.4964890
Published: October 2016
View article titled, Investigating routes toward atomic layer deposition of silicon carbide: <em>Ab initio</em> screening of potential silicon and carbon precursors
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Includes: Supplementary data
Journal Articles

Combinatorial survey of fluorinated plasma etching in the silicon-oxygen-carbon-nitrogen-hydrogen system

Shailesh Dhungana, Bradley J. Nordell, Anthony N. Caruso, Michelle M. Paquette, William A. Lanford, Kris Scharfenberger, Danya Jacob, Sean W. King
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 061302 (2016)
https://doi.org/10.1116/1.4964648
Published: October 2016
View article titled, Combinatorial survey of fluorinated plasma etching in the silicon-oxygen-carbon-nitrogen-hydrogen system
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Journal Articles

XPS and SIMS study of the surface and interface of aged C+ implanted uranium

Scott B. Donald, Wigbert J. Siekhaus, Art J. Nelson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 061401 (2016)
https://doi.org/10.1116/1.4962386
Published: September 2016
View article titled, XPS and SIMS study of the surface and interface of aged C<sup>+</sup> implanted uranium
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Journal Articles

Initial stages of growth and the influence of temperature during chemical vapor deposition of sp2-BN films

Mikhail Chubarov, Henrik Pedersen, Hans Högberg, Anne Henry, Zsolt Czigány
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 061520 (2015)
https://doi.org/10.1116/1.4935155
Published: November 2015
View article titled, Initial stages of growth and the influence of temperature during chemical vapor deposition of sp<sup>2</sup>-BN films
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Includes: Supplementary data
Journal Articles

Large-area SiC membrane produced by plasma enhanced chemical vapor deposition at relatively high temperature

Yu Liu, Changqing Xie
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 05E114 (2015)
https://doi.org/10.1116/1.4926896
Published: July 2015
View article titled, Large-area SiC membrane produced by plasma enhanced chemical vapor deposition at relatively high temperature
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Journal Articles

Hydrogen desorption from hydrogen fluoride and remote hydrogen plasma cleaned silicon carbide (0001) surfaces

Sean W. King, Satoru Tanaka, Robert F. Davis, Robert J. Nemanich
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 05E105 (2015)
https://doi.org/10.1116/1.4921526
Published: May 2015
View article titled, Hydrogen desorption from hydrogen fluoride and remote hydrogen plasma cleaned silicon carbide (0001) surfaces
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Journal Articles

Gas source molecular beam epitaxy of scandium nitride on silicon carbide and gallium nitride surfaces

Sean W. King, Robert F. Davis, Robert J. Nemanich
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 32, 061504 (2014)
https://doi.org/10.1116/1.4894816
Published: September 2014
View article titled, Gas source molecular beam epitaxy of scandium nitride on silicon carbide and gallium nitride surfaces
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Journal Articles

Characterization and photoluminescence of Co-doped SiC films

Xianke Sun, Xin Jin, Shiqi Wang, Huarui Liu, Peng Sun, Yukai An, Ruisong Guo, Jiwen Liu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 31, 061512 (2013)
https://doi.org/10.1116/1.4822057
Published: September 2013
View article titled, Characterization and photoluminescence of Co-doped SiC films
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