1-20 of 63
Reaction probability
Close
Save search
Follow your search
Access your saved searches in your account
Close Modal
Sort by
Journal Articles

Modeling of microtrenching and bowing effects in nanoscale Si inductively coupled plasma etching process

Ziyi Hu, Hua Shao, Junjie Li, Panpan Lai, Wenrui Wang, Chen Li, Qi Yan, Xiaobin He, Junfeng Li, Tao Yang, Rui Chen, Yayi Wei
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063113 (2023)
https://doi.org/10.1116/6.0003032
Published: November 2023
View article titled, Modeling of microtrenching and bowing effects in nanoscale Si inductively coupled plasma etching process
Open the PDF for Modeling of microtrenching and bowing effects in nanoscale Si inductively coupled plasma etching process in another window
Journal Articles

Enhancing the reactivity of clean, defect-free epitaxial graphene by the substrate—Experiment and theory

T. Stach, A. Seif, A. Ambrosetti, P. L. Silvestrelli, U. Burghaus
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 062201 (2023)
https://doi.org/10.1116/6.0002948
Published: September 2023
View article titled, Enhancing the reactivity of clean, defect-free epitaxial graphene by the substrate—Experiment and theory
Open the PDF for Enhancing the reactivity of clean, defect-free epitaxial graphene by the substrate—Experiment and theory in another window
Includes: Supplementary data
Journal Articles

Conformal chemical vapor deposition of boron-rich boron carbide thin films from triethylboron

Arun Haridas Choolakkal, Hans Högberg, Jens Birch, Henrik Pedersen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 013401 (2023)
https://doi.org/10.1116/6.0002203
Published: December 2022
View article titled, Conformal chemical vapor deposition of boron-rich boron carbide thin films from triethylboron
Open the PDF for Conformal chemical vapor deposition of boron-rich boron carbide thin films from triethylboron in another window
Journal Articles

Modification of a force field for molecular dynamics simulations of silicon etching by chlorine atoms

Featured
Joseph R. Vella, David B. Graves
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 063203 (2022)
https://doi.org/10.1116/6.0002027
Published: October 2022
View article titled, Modification of a force field for molecular dynamics simulations of silicon etching by chlorine atoms
Open the PDF for Modification of a force field for molecular dynamics simulations of silicon etching by chlorine atoms in another window
Includes: Supplementary data
Journal Articles

Atmospheric pressure plasma functionalization of polystyrene

Editor’s Pick
Jordyn Polito, Mark Denning, Richard Stewart, David Frost, Mark J. Kushner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 043001 (2022)
https://doi.org/10.1116/6.0001850
Published: May 2022
View article titled, Atmospheric pressure plasma functionalization of polystyrene
Open the PDF for Atmospheric pressure plasma functionalization of polystyrene in another window
Journal Articles

Plasma-enhanced atomic layer deposition of SiO2 film using capacitively coupled Ar/O2 plasmas: A computational investigation

Chenhui Qu, Yukinori Sakiyama, Pulkit Agarwal, Mark J. Kushner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 052403 (2021)
https://doi.org/10.1116/6.0001121
Published: August 2021
View article titled, Plasma-enhanced atomic layer deposition of SiO<sub>2</sub> film using capacitively coupled Ar/O<sub>2</sub> plasmas: A computational investigation
Open the PDF for Plasma-enhanced atomic layer deposition of SiO<sub>2</sub> film using capacitively coupled Ar/O<sub>2</sub> plasmas: A computational investigation in another window
Journal Articles

Superconformal chemical vapor deposition using plasma-generated atomic species as a consumable growth inhibitor

Yu Yang, Kinsey L. Canova, Sreenivas Jayaraman, Do-Young Kim, Gregory S. Girolami, John R. Abelson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 043409 (2021)
https://doi.org/10.1116/6.0001018
Published: May 2021
View article titled, Superconformal chemical vapor deposition using plasma-generated atomic species as a consumable growth inhibitor
Open the PDF for Superconformal chemical vapor deposition using plasma-generated atomic species as a consumable growth inhibitor in another window
Includes: Supplementary data
Journal Articles

O·, H·, and ·OH radical etching probability of polystyrene obtained for a radio frequency driven atmospheric pressure plasma jet

V. S. Santosh K. Kondeti, Yashuang Zheng, Pingshan Luan, Gottlieb S. Oehrlein, Peter J. Bruggeman
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 033012 (2020)
https://doi.org/10.1116/6.0000123
Published: May 2020
View article titled, O<sup>·</sup>, H<sup>·</sup>, and <sup>·</sup>OH radical etching probability of polystyrene obtained for a radio frequency driven atmospheric pressure plasma jet
Open the PDF for O<sup>·</sup>, H<sup>·</sup>, and <sup>·</sup>OH radical etching probability of polystyrene obtained for a radio frequency driven atmospheric pressure plasma jet in another window
Journal Articles

New strategies for conformal, superconformal, and ultrasmooth films by low temperature chemical vapor deposition

John R. Abelson, Gregory S. Girolami
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 030802 (2020)
https://doi.org/10.1116/6.0000035
Published: April 2020
View article titled, New strategies for conformal, superconformal, and ultrasmooth films by low temperature chemical vapor deposition
Open the PDF for New strategies for conformal, superconformal, and ultrasmooth films by low temperature chemical vapor deposition in another window
Journal Articles

Role of sulfur in catalyzing fluorine atom fast etching of silicon with smooth surface morphology

Priyanka Arora, Tam Nguyen, Aseem Chawla, Sang-Ki Nam, Vincent M. Donnelly
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 061303 (2019)
https://doi.org/10.1116/1.5125266
Published: November 2019
View article titled, Role of sulfur in catalyzing fluorine atom fast etching of silicon with smooth surface morphology
Open the PDF for Role of sulfur in catalyzing fluorine atom fast etching of silicon with smooth surface morphology in another window
Journal Articles

Sticking probabilities of H2O and Al(CH3)3 during atomic layer deposition of Al2O3 extracted from their impact on film conformality

Karsten Arts, Vincent Vandalon, Riikka L. Puurunen, Mikko Utriainen, Feng Gao, Wilhelmus M. M. (Erwin) Kessels, Harm C. M. Knoops
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 030908 (2019)
https://doi.org/10.1116/1.5093620
Published: April 2019
View article titled, Sticking probabilities of H<sub>2</sub>O and Al(CH<sub>3</sub>)<sub>3</sub> during atomic layer deposition of Al<sub>2</sub>O<sub>3</sub> extracted from their impact on film conformality
Open the PDF for Sticking probabilities of H<sub>2</sub>O and Al(CH<sub>3</sub>)<sub>3</sub> during atomic layer deposition of Al<sub>2</sub>O<sub>3</sub> extracted from their impact on film conformality in another window
Journal Articles

Reactivity of heterogeneous surfaces: Modeling precursor–surface interaction using absorbing Markov chains

Angel Yanguas-Gil
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 051510 (2018)
https://doi.org/10.1116/1.5034178
Published: August 2018
View article titled, Reactivity of heterogeneous surfaces: Modeling precursor–surface interaction using absorbing Markov chains
Open the PDF for Reactivity of heterogeneous surfaces: Modeling precursor–surface interaction using absorbing Markov chains in another window
Journal Articles

Influence of hydrogen in silicon nitride films on the surface reactions during hydrofluorocarbon plasma etching

Nobuyuki Kuboi, Tetsuya Tatsumi, Hideki Minari, Masanaga Fukasawa, Yoshifumi Zaizen, Jun Komachi, Takahiro Kawamura
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 061306 (2017)
https://doi.org/10.1116/1.5001034
Published: September 2017
View article titled, Influence of hydrogen in silicon nitride films on the surface reactions during hydrofluorocarbon plasma etching
Open the PDF for Influence of hydrogen in silicon nitride films on the surface reactions during hydrofluorocarbon plasma etching in another window
Journal Articles

Review Article: Reactions of fluorine atoms with silicon, revisited, again

Vincent M. Donnelly
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 05C202 (2017)
https://doi.org/10.1116/1.4983922
Published: May 2017
View article titled, Review Article: Reactions of fluorine atoms with silicon, revisited, again
Open the PDF for Review Article: Reactions of fluorine atoms with silicon, revisited, again in another window
Journal Articles

Effect of reactor pressure on the conformal coating inside porous substrates by atomic layer deposition

Paul Poodt, Alfredo Mameli, Jeff Schulpen, W. M. M. (Erwin) Kessels, Fred Roozeboom
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 021502 (2017)
https://doi.org/10.1116/1.4973350
Published: December 2016
View article titled, Effect of reactor pressure on the conformal coating inside porous substrates by atomic layer deposition
Open the PDF for Effect of reactor pressure on the conformal coating inside porous substrates by atomic layer deposition in another window
Journal Articles

Reactant utilization in CVD and ALD chambers

Edward J. McInerney
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 01B138 (2017)
https://doi.org/10.1116/1.4972773
Published: December 2016
View article titled, Reactant utilization in CVD and ALD chambers
Open the PDF for Reactant utilization in CVD and ALD chambers in another window
Journal Articles

Modeling precursor diffusion and reaction of atomic layer deposition in porous structures

Thomas Keuter, Norbert Heribert Menzler, Georg Mauer, Frank Vondahlen, Robert Vaßen, Hans Peter Buchkremer
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 01A104 (2015)
https://doi.org/10.1116/1.4892385
Published: August 2014
View article titled, Modeling precursor diffusion and reaction of atomic layer deposition in porous structures
Open the PDF for Modeling precursor diffusion and reaction of atomic layer deposition in porous structures in another window
Journal Articles

Analytic expressions for atomic layer deposition: Coverage, throughput, and materials utilization in cross-flow, particle coating, and spatial atomic layer deposition

Angel Yanguas-Gil, Jeffrey W. Elam
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 32, 031504 (2014)
https://doi.org/10.1116/1.4867441
Published: March 2014
View article titled, Analytic expressions for atomic layer deposition: Coverage, throughput, and materials utilization in cross-flow, particle coating, and spatial atomic layer deposition
Open the PDF for Analytic expressions for atomic layer deposition: Coverage, throughput, and materials utilization in cross-flow, particle coating, and spatial atomic layer deposition in another window
Journal Articles

Damage by radicals and photons during plasma cleaning of porous low-k SiOCH. I. Ar/O2 and He/H2 plasmas

Juline Shoeb, Ming Mei Wang, Mark J. Kushner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 30, 041303 (2012)
https://doi.org/10.1116/1.4718444
Published: May 2012
View article titled, Damage by radicals and photons during plasma cleaning of porous low-<em>k</em> SiOCH. I. Ar/O<sub>2</sub> and He/H<sub>2</sub> plasmas
Open the PDF for Damage by radicals and photons during plasma cleaning of porous low-<em>k</em> SiOCH. I. Ar/O<sub>2</sub> and He/H<sub>2</sub> plasmas in another window
Journal Articles

Simple model for atomic layer deposition precursor reaction and transport in a viscous-flow tubular reactor

Angel Yanguas-Gil, Jeffrey W. Elam
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 30, 01A159 (2012)
https://doi.org/10.1116/1.3670396
Published: December 2011
View article titled, Simple model for atomic layer deposition precursor reaction and transport in a viscous-flow tubular reactor
Open the PDF for Simple model for atomic layer deposition precursor reaction and transport in a viscous-flow tubular reactor in another window