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Journal Articles

Thermal atomic layer etching of cobalt using sulfuryl chloride for chlorination and tetramethylethylenediamine or trimethylphosphine for ligand addition

Editor’s Pick
Jessica A. Murdzek, Ann Lii-Rosales, Steven M. George
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 032603 (2023)
https://doi.org/10.1116/6.0002488
Published: April 2023
View article titled, Thermal atomic layer etching of cobalt using sulfuryl chloride for chlorination and tetramethylethylenediamine or trimethylphosphine for ligand addition
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Includes: Supplementary data
Journal Articles

Cut-and-pasting ligands: The structure/function relationships of a thermally robust Mo(VI) precursor

Editor’s Pick
Michael A. Land, Dexter A. Dimova, Katherine N. Robertson, Seán T. Barry
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 012403 (2023)
https://doi.org/10.1116/6.0002254
Published: December 2022
View article titled, Cut-and-pasting ligands: The structure/function relationships of a thermally robust Mo(VI) precursor
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Includes: Supplementary data
Journal Articles

(tBuN)SiMe2NMe2—A new N,N′-κ2-monoanionic ligand for atomic layer deposition precursors

Matthew B. E. Griffiths, David Zanders, Michael A. Land, Jason D. Masuda, Anjana Devi, Seán T. Barry
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 032409 (2021)
https://doi.org/10.1116/6.0000795
Published: March 2021
View article titled, (<sup>t</sup>BuN)SiMe<sub>2</sub>NMe<sub>2</sub>—A new <em>N,N</em>′-<em>κ</em><sub>2</sub>-monoanionic ligand for atomic layer deposition precursors
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Includes: Supplementary data
Journal Articles

Surface ligand removal in atomic layer deposition of GaN using triethylgallium

Petro Deminskyi, Chih-Wei Hsu, Babak Bakhit, Polla Rouf, Henrik Pedersen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 012411 (2021)
https://doi.org/10.1116/6.0000752
Published: January 2021
View article titled, Surface ligand removal in atomic layer deposition of GaN using triethylgallium
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Journal Articles

Surface plasmon driven near- and midinfrared photoconductivity in ligand-free ITO nanocrystal films

Editor’s Pick
Dmitriy S. Boyuk, Weize Hu, Ho Yee Hui, Michael A. Filler
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 022420 (2020)
https://doi.org/10.1116/1.5139310
Published: February 2020
View article titled, Surface plasmon driven near- and midinfrared photoconductivity in ligand-free ITO nanocrystal films
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Includes: Supplementary data
Journal Articles

Molecular mechanisms of atomic layer etching of cobalt with sequential exposure to molecular chlorine and diketones

Editor’s Pick
Mahsa Konh, Chuan He, Xi Lin, Xiangyu Guo, Venkateswara Pallem, Robert L. Opila, Andrew V. Teplyakov, Zijian Wang, Bo Yuan
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 021004 (2019)
https://doi.org/10.1116/1.5082187
Published: February 2019
View article titled, Molecular mechanisms of atomic layer etching of cobalt with sequential exposure to molecular chlorine and diketones
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Journal Articles

Extending the compositional diversity of films in area selective atomic layer deposition through chemical functionalities

Magi Mettry, Alexander E. Hess, Isabella Goetting, Noel Arellano, Alexander Friz, Andy Tek, Rudy J. Wojtecki
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 020923 (2019)
https://doi.org/10.1116/1.5080119
Published: February 2019
View article titled, Extending the compositional diversity of films in area selective atomic layer deposition through chemical functionalities
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Journal Articles

Surface oxidation model in plasma enhanced atomic layer deposition for silicon oxide films including various aminosilane precursors

Kosuke Yamamoto, Ayuta Suzuki, Munehito Kagaya, Masaaki Matsukuma, Tsuyoshi Moriya
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 020920 (2019)
https://doi.org/10.1116/1.5078537
Published: February 2019
View article titled, Surface oxidation model in plasma enhanced atomic layer deposition for silicon oxide films including various aminosilane precursors
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Journal Articles

Comparative study on the use of novel heteroleptic cyclopentadienyl-based zirconium precursors with H2O and O3 for atomic layer deposition of ZrO2

Editor’s Pick
Sanni Seppälä, Marko Vehkamäki, Kenichiro Mizohata, Wontae Noh, Jyrki Räisänen, Mikko Ritala, Markku Leskelä
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 020912 (2019)
https://doi.org/10.1116/1.5079539
Published: January 2019
View article titled, Comparative study on the use of novel heteroleptic cyclopentadienyl-based zirconium precursors with H<sub>2</sub>O and O<sub>3</sub> for atomic layer deposition of ZrO<sub>2</sub>
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Journal Articles

Comparison of ZnO surface modification with gas-phase propiolic acid at high and medium vacuum conditions

Mahsa Konh, Chuan He, Zhengxin Li, Shi Bai, Elena Galoppini, Lars Gundlach, Andrew V. Teplyakov
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 041404 (2018)
https://doi.org/10.1116/1.5031945
Published: June 2018
View article titled, Comparison of ZnO surface modification with gas-phase propiolic acid at high and medium vacuum conditions
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Includes: Supplementary data
Journal Articles

Preventing carbon contamination of Ge (001) during atomic layer deposition with a barium-based Zintl layer

Editor’s Pick
Shen Hu, John G. Ekerdt
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 041403 (2018)
https://doi.org/10.1116/1.5029918
Published: June 2018
View article titled, Preventing carbon contamination of Ge (001) during atomic layer deposition with a barium-based Zintl layer
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Journal Articles

In situ characterization of the deposition of anatase TiO2 on rutile TiO2(110)

Ashley R. Head, Niclas Johansson, Yuran Niu, Olesia Snezhkova, Shilpi Chaudhary, Joachim Schnadt, Hendrik Bluhm, Chaoyu Chen, José Avila, Maria-Carmen Asensio
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 02D405 (2018)
https://doi.org/10.1116/1.5005533
Published: February 2018
View article titled, <em>In situ</em> characterization of the deposition of anatase TiO<sub>2</sub> on rutile TiO<sub>2</sub>(110)
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Includes: Supplementary data
Journal Articles

Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma

Ville Rontu, Perttu Sippola, Mikael Broas, Glenn Ross, Timo Sajavaara, Harri Lipsanen, Mervi Paulasto-Kröckel, Sami Franssila
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 021508 (2018)
https://doi.org/10.1116/1.5003381
Published: January 2018
View article titled, Atomic layer deposition of AlN from AlCl<sub>3</sub> using NH<sub>3</sub> and Ar/NH<sub>3</sub> plasma
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Journal Articles

Investigation of the influence of oxygen plasma on supported silver nanoparticles

Yichen Duan, Sana Rani, John T. Newberg, Andrew V. Teplyakov
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 01B101 (2018)
https://doi.org/10.1116/1.4986208
Published: August 2017
View article titled, Investigation of the influence of oxygen plasma on supported silver nanoparticles
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Includes: Supplementary data
Journal Articles

Directional etch of magnetic and noble metals. II. Organic chemical vapor etch

Jack Kun-Chieh Chen, Nicholas D. Altieri, Taeseung Kim, Ernest Chen, Thorsten Lill, Meihua Shen, Jane P. Chang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 05C305 (2017)
https://doi.org/10.1116/1.4983830
Published: May 2017
View article titled, Directional etch of magnetic and noble metals. II. Organic chemical vapor etch
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Journal Articles

Review Article: Recommended reading list of early publications on atomic layer deposition—Outcome of the “Virtual Project on the History of ALD”

Esko Ahvenniemi, Andrew R. Akbashev, Saima Ali, Mikhael Bechelany, Maria Berdova, Stefan Boyadjiev, David C. Cameron, Rong Chen, Mikhail Chubarov, Veronique Cremers, Anjana Devi, Viktor Drozd, Liliya Elnikova, Gloria Gottardi, Kestutis Grigoras, Dennis M. Hausmann, Cheol Seong Hwang, Shih-Hui Jen, Tanja Kallio, Jaana Kanervo, Ivan Khmelnitskiy, Do Han Kim, Lev Klibanov, Yury Koshtyal, A. Outi I. Krause, Jakob Kuhs, Irina Kärkkänen, Marja-Leena Kääriäinen, Tommi Kääriäinen, Luca Lamagna, Adam A. Łapicki, Markku Leskelä, Harri Lipsanen, Jussi Lyytinen, Anatoly Malkov, Anatoly Malygin, Abdelkader Mennad, Christian Militzer, Jyrki Molarius, Małgorzata Norek, Çağla Özgit-Akgün, Mikhail Panov, Henrik Pedersen, Fabien Piallat, Georgi Popov, Riikka L. Puurunen, Geert Rampelberg, Robin H. A. Ras, Erwan Rauwel, Fred Roozeboom, Timo Sajavaara, Hossein Salami, Hele Savin, Nathanaelle Schneider, Thomas E. Seidel, Jonas Sundqvist, Dmitry B. Suyatin, Tobias Törndahl, J. Ruud van Ommen, Claudia Wiemer, Oili M. E. Ylivaara, Oksana Yurkevich
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 010801 (2017)
https://doi.org/10.1116/1.4971389
Published: December 2016
View article titled, Review Article: Recommended reading list of early publications on atomic layer deposition—Outcome of the “Virtual Project on the History of ALD”
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Includes: Supplementary data
Journal Articles

Vapor deposition of molybdenum oxide using bis(ethylbenzene) molybdenum and water

Tasha L. Drake, Peter C. Stair
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 051403 (2016)
https://doi.org/10.1116/1.4959532
Published: August 2016
View article titled, Vapor deposition of molybdenum oxide using bis(ethylbenzene) molybdenum and water
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Journal Articles

Precursor dependent nucleation and growth of ruthenium films during chemical vapor deposition

Wen Liao, John G. Ekerdt
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 041514 (2016)
https://doi.org/10.1116/1.4953882
Published: June 2016
View article titled, Precursor dependent nucleation and growth of ruthenium films during chemical vapor deposition
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Journal Articles

Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors

J Provine, Peter Schindler, Jan Torgersen, Hyo Jin Kim, Hans-Peter Karnthaler, Fritz B. Prinz
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 01A138 (2016)
https://doi.org/10.1116/1.4937991
Published: December 2015
View article titled, Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
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Includes: Supplementary data
Journal Articles

Diffusion and interface evolution during the atomic layer deposition of TiO2 on GaAs(100) and InAs(100) surfaces

Liwang Ye, Theodosia Gougousi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 01A105 (2016)
https://doi.org/10.1116/1.4931568
Published: September 2015
View article titled, Diffusion and interface evolution during the atomic layer deposition of TiO<sub>2</sub> on GaAs(100) and InAs(100) surfaces
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