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Journal Articles
Effect of mask geometry on high aspect ratio silicon etching using Cl2/O2 plasma
J. Vac. Sci. Technol. A 43, 053001 (2025)
Published: July 2025
Journal Articles
Kinetics model for thermal selective etching of Si1−xGex in F2/Ar
Available to Purchase
J. Vac. Sci. Technol. A 43, 042604 (2025)
Published: June 2025
Journal Articles
In situ, simultaneous spectroscopic ellipsometry and quadrupole mass spectrometry studies of ZnO etching using Hacac and O2 plasma
Terrick McNealy-James, Ruthlyn Mangroo, S. Novia Berriel, Luis Tomar, Eric Bissell, Taylor M. Currie, Justin Moore, Titel Jurca, Parag Banerjee
J. Vac. Sci. Technol. A 43, 042602 (2025)
Published: May 2025
Journal Articles
Enhanced tribocorrosive properties of precipitation-hardened martensitic stainless steel by arc plasma nitriding
Available to Purchase
J. Vac. Sci. Technol. A 43, 033104 (2025)
Published: April 2025
Journal Articles
SiO2 atomic-layer fluorination-passivation for dual-material molybdenum/polypyrrole area-selective deposition and strategies for surface reactivation
J. Vac. Sci. Technol. A 43, 032401 (2025)
Published: March 2025
Journal Articles
Spatial atomic layer deposition: Transport-reaction modeling and experimental validation of film geometry
J. Vac. Sci. Technol. A 43, 022415 (2025)
Published: March 2025
Journal Articles
Kees van der Zouw, Bernhard Y. van der Wel, Jacobus M. Sturm, Antonius A. I. Aarnink, Rob A. M. Wolters, Dirk J. Gravesteijn, Alexey Y. Kovalgin
J. Vac. Sci. Technol. A 43, 022407 (2025)
Published: February 2025
Includes: Supplementary data
Journal Articles
Area selective PECVD on metal oxide resist
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J. Vac. Sci. Technol. A 43, 023407 (2025)
Published: February 2025
Journal Articles
Investigation of ruthenium etching induced by electron beam irradiation and O2/Cl2 remote plasma-based neutral fluxes: Mechanistic insights and etching model
Yudong Li, Hubertus Marbach, Christian Preischl, Michael Budach, Daniel Rhinow, Michael Hinshelwood, Klaus Edinger, Gottlieb S. Oehrlein
J. Vac. Sci. Technol. A 43, 023005 (2025)
Published: February 2025
Journal Articles
Selective molecular gas phase etching in layered high aspect-ratio nanostructures for semiconductor processing. I. Modeling framework and simulation
J. Vac. Sci. Technol. A 43, 013006 (2025)
Published: January 2025
Journal Articles
Selective molecular gas phase etching in layered high aspect-ratio nanostructures for semiconductor processing. II. Experiments and model validation
J. Vac. Sci. Technol. A 43, 013007 (2025)
Published: January 2025
Journal Articles
Etching and fluorination of yttrium oxide (Y2O3) irradiated with fluorine ions or radicals
Available to PurchaseHojun Kang, Tomoko Ito, Junghwan Um, Hikaru Kokura, Sungil Cho, Hyunjung Park, Kazuhiro Karahashi, Satoshi Hamaguchi
J. Vac. Sci. Technol. A 43, 013003 (2025)
Published: January 2025
Journal Articles
J. Vac. Sci. Technol. A 43, 012404 (2025)
Published: December 2024
Journal Articles
J. Vac. Sci. Technol. A 42, 060801 (2024)
Published: November 2024
Journal Articles
Substrate induced composition change during Ge2Sb2Te5 atomic layer deposition and study of initial reactions on SiO2 surface
J. Vac. Sci. Technol. A 42, 062412 (2024)
Published: November 2024
Journal Articles
J. Vac. Sci. Technol. A 42, 052602 (2024)
Published: July 2024
Journal Articles
J. Vac. Sci. Technol. A 42, 042603 (2024)
Published: June 2024
Journal Articles
Bacterial and corrosion resistance of polytetrafluoroethylene-silver composite coatings by magnetron sputtering
Available to PurchaseHaiwen Li, Zhiwen He, Wei Wu, Long Zheng, Qingfang Xu, Tenghua Gao, Song Zhang, Honglian Dai, Takashi Goto, Rong Tu
J. Vac. Sci. Technol. A 42, 043409 (2024)
Published: June 2024
Journal Articles
Quantitative analysis of plasma-enhanced chemical vapor deposition mechanisms: Quantum chemical and plasma-fluid dynamics investigation on tetraethoxysilane/O2 plasma
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J. Vac. Sci. Technol. A 42, 043002 (2024)
Published: May 2024
Journal Articles
Comparison of three titanium-precursors for atomic-layer-deposited TiO2 for passivating contacts on silicon
Daniel Hiller, Frans Munnik, Julian López-Vidrier, Dmytro Solonenko, Johanna Reif, Martin Knaut, Oliver Thimm, Nicholas E. Grant
J. Vac. Sci. Technol. A 42, 032406 (2024)
Published: March 2024
Includes: Supplementary data
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