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Journal Articles

Study on the thermocyclic protection performance of ultrahigh temperature ceramic SiC–Si–Hf(Ta)B2 coating for static oxidation and ablation environments up to 2300 °C

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Jiani Yang, Xiaoyang Guo, Yuan Tian, Yan Jiang, Na Wang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 043105 (2025)
https://doi.org/10.1116/6.0004561
Published: June 2025
View articletitled, Study on the thermocyclic protection performance of ultrahigh temperature ceramic SiC–Si–Hf(Ta)B2 coating for static oxidation and ablation environments up to 2300 °C
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Journal Articles

Molybdenum erosion in iodine plasma at hollow cathode conditions

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James D. Rogers, Richard D. Branam
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 023005 (2024)
https://doi.org/10.1116/6.0003367
Published: February 2024
View articletitled, Molybdenum erosion in iodine plasma at hollow cathode conditions
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Journal Articles

Enhancing minority carrier lifetime in Ge: Insights from HF and HCl cleaning procedures

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Alexandre Chapotot, Jérémie Chrétien, Oleh Fesiienko, Erwine Pargon, Jinyoun Cho, Kristof Dessein, Abderraouf Boucherif, Gwenaëlle Hamon, Maxime Darnon
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 013203 (2024)
https://doi.org/10.1116/6.0003236
Published: January 2024
View articletitled, Enhancing minority carrier lifetime in Ge: Insights from HF and HCl cleaning procedures
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Journal Articles

Study of the surface and interface properties of ultrathin nickel film on cerium layer by in situ magnetic sputtering

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Tianzuo Fu, Yiqiang Zhong, Lihua Zhou, Shuwen Meng, Zhengang Tian, Yiwu Chen, Tianfu Li, Xiaoyu Zou, Zhengcao Li, Tinggui Yang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 043212 (2023)
https://doi.org/10.1116/6.0002455
Published: July 2023
View articletitled, Study of the surface and interface properties of ultrathin nickel film on cerium layer by in situ magnetic sputtering
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Journal Articles

Long and flexible atmospheric pressure plasma jet probes for operation in humid environments

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Jae Young Kim, Gyu Tae Bae, Ye Rin Lee, Sebinn Jang, Eun Young Jung, Heung-Sik Tae
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 043002 (2023)
https://doi.org/10.1116/6.0002710
Published: June 2023
View articletitled, Long and flexible atmospheric pressure plasma jet probes for operation in humid environments
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Journal Articles

Thermal stability and high-temperature photoluminescence of chemical vapor deposited MoS2 in different atmosphere

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Rongsheng Li, Junyao Yu, Bing Yao, Zhenjia Zhou, Guowen Yuan, Jie Xu, Libo Gao
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 052201 (2022)
https://doi.org/10.1116/5.0095120
Published: August 2022
View articletitled, Thermal stability and high-temperature photoluminescence of chemical vapor deposited MoS2 in different atmosphere
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Includes: Supplementary data
Journal Articles

Operando study of the preferential growth of SiO2 during the dry thermal oxidation of Si0.60Ge0.40(001) by ambient pressure x-ray photoelectron spectroscopy

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Shane P. Lorona, J. Trey Diulus, Jo E. Bergevin, Rafik Addou, Gregory S. Herman
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 053202 (2021)
https://doi.org/10.1116/6.0001174
Published: July 2021
View articletitled, Operando study of the preferential growth of SiO2 during the dry thermal oxidation of Si0.60Ge0.40(001) by ambient pressure x-ray photoelectron spectroscopy
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Journal Articles

Resolving self-limiting growth in silicon nitride plasma enhanced atomic layer deposition with tris-dimethylamino silane precursor

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Triratna Muneshwar, Ken Cadien
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 062406 (2020)
https://doi.org/10.1116/6.0000493
Published: October 2020
View articletitled, Resolving self-limiting growth in silicon nitride plasma enhanced atomic layer deposition with tris-dimethylamino silane precursor
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Includes: Supplementary data
Journal Articles

Atomic layer etching of metals with anisotropy, specificity, and selectivity

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Xia Sang, Yantao Xia, Philippe Sautet, Jane P. Chang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 043005 (2020)
https://doi.org/10.1116/6.0000225
Published: June 2020
View articletitled, Atomic layer etching of metals with anisotropy, specificity, and selectivity
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Includes: Supplementary data
Journal Articles

On the formation of black silicon in SF6-O2 plasma: The clear, oxidize, remove, and etch (CORE) sequence and black silicon on demand

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Vy Thi Hoang Nguyen, Flemming Jensen, Jörg Hübner, Pele Leussink, Henri Jansen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 043004 (2020)
https://doi.org/10.1116/6.0000196
Published: June 2020
View articletitled, On the formation of black silicon in SF6-O2 plasma: The clear, oxidize, remove, and etch (CORE) sequence and black silicon on demand
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Journal Articles

Stability of hexafluoroacetylacetone molecules on metallic and oxidized nickel surfaces in atomic-layer-etching processes

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Abdulrahman H. Basher, Marjan Krstić, Takae Takeuchi, Michiro Isobe, Tomoko Ito, Masato Kiuchi, Kazuhiro Karahashi, Wolfgang Wenzel, Satoshi Hamaguchi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 022610 (2020)
https://doi.org/10.1116/1.5127532
Published: February 2020
View articletitled, Stability of hexafluoroacetylacetone molecules on metallic and oxidized nickel surfaces in atomic-layer-etching processes
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Includes: Supplementary data
Journal Articles

Thermal atomic layer etching of silicon nitride using an oxidation and “conversion etch” mechanism

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Aziz I. Abdulagatov, Steven M. George
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 022607 (2020)
https://doi.org/10.1116/1.5140481
Published: February 2020
View articletitled, Thermal atomic layer etching of silicon nitride using an oxidation and “conversion etch” mechanism
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Journal Articles

Cu depletion on Cu(In,Ga)Se2 surfaces investigated by chemical engineering: An x-ray photoelectron spectroscopy approach

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Anais Loubat, Solène Béchu, Muriel Bouttemy, Jackie Vigneron, Daniel Lincot, Jean-François Guillemoles, Arnaud Etcheberry
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 041201 (2019)
https://doi.org/10.1116/1.5097353
Published: July 2019
View articletitled, Cu depletion on Cu(In,Ga)Se2 surfaces investigated by chemical engineering: An x-ray photoelectron spectroscopy approach
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Journal Articles

Oxidation behavior of intermetallic Al-Cr and Al-Cr-Fe macroparticles

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Christian Martin Koller, Alexander Kirnbauer, Rainer Hahn, Beno Widrig, Szilárd Kolozsvári, Jürgen Ramm, Paul Heinz Mayrhofer
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 061601 (2017)
https://doi.org/10.1116/1.4986928
Published: August 2017
View articletitled, Oxidation behavior of intermetallic Al-Cr and Al-Cr-Fe macroparticles
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Journal Articles

Use of a buried loop layer as a detector of interstitial flux during oxidation of SiGe heterostructures

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Thomas P. Martin, Henry L. Aldridge, Jr., K. S. Jones, Renata A. Camillo-Castillo
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 021101 (2017)
https://doi.org/10.1116/1.4972516
Published: December 2016
View articletitled, Use of a buried loop layer as a detector of interstitial flux during oxidation of SiGe heterostructures
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Journal Articles

Surface oxidation of the topological insulator Bi2Se3

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Avery J. Green, Sonal Dey, Yong Q. An, Brendan O'Brien, Samuel O'Mullane, Bradley Thiel, Alain C. Diebold
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 061403 (2016)
https://doi.org/10.1116/1.4964637
Published: October 2016
View articletitled, Surface oxidation of the topological insulator Bi2Se3
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Includes: Supplementary data
Journal Articles

Use of aluminum oxide as a permeation barrier for producing thin films on aluminum substrates

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James L. Provo
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 041503 (2016)
https://doi.org/10.1116/1.4950884
Published: May 2016
View articletitled, Use of aluminum oxide as a permeation barrier for producing thin films on aluminum substrates
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Journal Articles

Precise control of defects in graphene using oxygen plasma

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Geonyeop Lee, Jihyun Kim, Kyeounghak Kim, Jeong Woo Han
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 060602 (2015)
https://doi.org/10.1116/1.4926378
Published: July 2015
View articletitled, Precise control of defects in graphene using oxygen plasma
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Journal Articles

Vibronic fine structure in high-resolution x-ray absorption spectra from ion-bombarded boron nitride nanotubes

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Mladen Petravic, Robert Peter, Marijana Varasanec, Lu Hua Li, Ying Chen, Bruce C. C. Cowie
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 31, 031405 (2013)
https://doi.org/10.1116/1.4798271
Published: April 2013
View articletitled, Vibronic fine structure in high-resolution x-ray absorption spectra from ion-bombarded boron nitride nanotubes
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Journal Articles

Oxidation behavior of arc evaporated Al-Cr-Si-N thin films

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Christian Tritremmel, Rostislav Daniel, Christian Mitterer, Paul H. Mayrhofer, Markus Lechthaler, Peter Polcik
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 30, 061501 (2012)
https://doi.org/10.1116/1.4748802
Published: August 2012
View articletitled, Oxidation behavior of arc evaporated Al-Cr-Si-N thin films
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