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Journal Articles

Catalytic atomic layer deposition of amorphous alumina–silica thin films on carbon microfibers

Editor’s Pick
Elise des Ligneris, Diane Samélor, Abderrahime Sekkat, Claudie Josse, Teresa Hungria, Alessandro Pugliara, Constantin Vahlas, Brigitte Caussat
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 032408 (2024)
https://doi.org/10.1116/6.0003422
Published: April 2024
View article titled, Catalytic atomic layer deposition of amorphous alumina–silica thin films on carbon microfibers
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Includes: Supplementary data
Journal Articles

Area-selective plasma-enhanced atomic layer etching (PE-ALE) of silicon dioxide using a silane coupling agent

Airah P. Osonio, Takayoshi Tsutsumi, Yoshinari Oda, Bablu Mukherjee, Ranjit Borude, Nobuyoshi Kobayashi, Masaru Hori
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 062601 (2022)
https://doi.org/10.1116/6.0002044
Published: October 2022
View article titled, Area-selective plasma-enhanced atomic layer etching (PE-ALE) of silicon dioxide using a silane coupling agent
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Journal Articles

On the interplay between a novel iron and iron-carbide atomic layer deposition process, the carbon nanotube growth, and the metal–carbon nanotube coating properties on silica substrates

Tairan da Cunha, Noureddine Adjeroud, Jérôme Guillot, Benoit Duez, Damien Lenoble, Didier Arl
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 033415 (2022)
https://doi.org/10.1116/6.0001806
Published: April 2022
View article titled, On the interplay between a novel iron and iron-carbide atomic layer deposition process, the carbon nanotube growth, and the metal–carbon nanotube coating properties on silica substrates
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Journal Articles

Experimental and theoretical investigation of the formation of two-dimensional Fe silicate on Pd(111)

Nassar Doudin, Kayahan Saritas, Sohrab Ismail-Beigi, Eric I. Altman
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 062201 (2021)
https://doi.org/10.1116/6.0001397
Published: November 2021
View article titled, Experimental and theoretical investigation of the formation of two-dimensional Fe silicate on Pd(111)
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Journal Articles

Thermally activated nucleation and growth of cobalt and nickel oxide nanoparticles on porous silica

Vijayakumar Murugesan, Michel Gray, Mond Guo, Heather Job, Libor Kovarik, Arun Devaraj, Suntharampillai Thevuthasan, Karthikeyan K. Ramasamy
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 031101 (2019)
https://doi.org/10.1116/1.5080448
Published: April 2019
View article titled, Thermally activated nucleation and growth of cobalt and nickel oxide nanoparticles on porous silica
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Includes: Supplementary data
Journal Articles

Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition

Donghyuk Shin, Heungseop Song, Ji-eun Jeong, Heungsoo Park, Dae-Hong Ko
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 020902 (2019)
https://doi.org/10.1116/1.5079573
Published: January 2019
View article titled, Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
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Journal Articles

Modulation of the interfacial and electrical properties of atomic-layer-deposited Hf0.5Al0.5O/Si gate stacks using Al2O3 passivation layer with various thickness

Juan Gao, Gang He, Die Wang, Shuang Liang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 011101 (2019)
https://doi.org/10.1116/1.5050642
Published: December 2018
View article titled, Modulation of the interfacial and electrical properties of atomic-layer-deposited Hf<sub>0.5</sub>Al<sub>0.5</sub>O/Si gate stacks using Al<sub>2</sub>O<sub>3</sub> passivation layer with various thickness
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Journal Articles

Plasma enhanced chemical vapor deposition of SiO2 and SiNx on AlGaN: Band offsets and interface studies as a function of Al composition

Pramod Reddy, Shun Washiyama, Will Mecouch, Luis H. Hernandez-Balderrama, Felix Kaess, M. Hayden Breckenridge, Biplab Sarkar, Brian B. Haidet, Alexander Franke, Erhard Kohn, Ramon Collazo, Zlatko Sitar
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 061101 (2018)
https://doi.org/10.1116/1.5050501
Published: November 2018
View article titled, Plasma enhanced chemical vapor deposition of SiO<sub>2</sub> and SiN<sub>x</sub> on AlGaN: Band offsets and interface studies as a function of Al composition
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Journal Articles

Transient behavior in quasi-atomic layer etching of silicon dioxide and silicon nitride in fluorocarbon plasmas

Scilight
Chad M. Huard, Saravanapriyan Sriraman, Alex Paterson, Mark J. Kushner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 06B101 (2018)
https://doi.org/10.1116/1.5049225
Published: October 2018
View article titled, Transient behavior in quasi-atomic layer etching of silicon dioxide and silicon nitride in fluorocarbon plasmas
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Journal Articles

Growth of yttrium iron garnet on SiO2

Hadrian Renaldo O. Aquino, Sergei Rouvimov, Alexei Orlov, Wolfgang Porod, Gary H. Bernstein
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 031518 (2018)
https://doi.org/10.1116/1.5022483
Published: May 2018
View article titled, Growth of yttrium iron garnet on SiO<sub>2</sub>
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Journal Articles

Initial reactions of ultrathin HfO2 films by in situ atomic layer deposition: An in situ synchrotron photoemission spectroscopy study

Seok Hwan Kim, Wooseok Song, In Su Jeon, Sun Sook Lee, Taek-Mo Chung, Ki-Seok An
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 02D402 (2018)
https://doi.org/10.1116/1.5015946
Published: February 2018
View article titled, Initial reactions of ultrathin HfO<sub>2</sub> films by <em>in situ</em> atomic layer deposition: An <em>in situ</em> synchrotron photoemission spectroscopy study
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Journal Articles

Structural and compositional characterization of RF magnetron cosputtered lithium silicate films: From Li2Si2O5 to lithium-rich Li8SiO6

Editor’s Pick
Jaclyn Coyle, Christopher Apblett, Michael Brumbach, James Ohlhausen, Conrad Stoldt
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 061509 (2017)
https://doi.org/10.1116/1.4998726
Published: October 2017
View article titled, Structural and compositional characterization of RF magnetron cosputtered lithium silicate films: From Li<sub>2</sub>Si<sub>2</sub>O<sub>5</sub> to lithium-rich Li<sub>8</sub>SiO<sub>6</sub>
Open the PDF for Structural and compositional characterization of RF magnetron cosputtered lithium silicate films: From Li<sub>2</sub>Si<sub>2</sub>O<sub>5</sub> to lithium-rich Li<sub>8</sub>SiO<sub>6</sub> in another window
Includes: Supplementary data
Journal Articles

Atomic layer etching in close-to-conventional plasma etch tools

Andy Goodyear, Mike Cooke
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 01A105 (2017)
https://doi.org/10.1116/1.4972393
Published: December 2016
View article titled, Atomic layer etching in close-to-conventional plasma etch tools
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Journal Articles

Correlation between chemical-bonding states and fixed-charge states of Sr-silicate film on Si(100) substrate

Shota Taniwaki, Haruhiko Yoshida, Koji Arafune, Atsushi Ogura, Shin-ichi Satoh, Yasushi Hotta
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 061506 (2016)
https://doi.org/10.1116/1.4966904
Published: November 2016
View article titled, Correlation between chemical-bonding states and fixed-charge states of Sr-silicate film on Si(100) substrate
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Journal Articles

Pore radius fine tuning of a silica matrix (MCM-41) based on the synthesis of alumina nanolayers with different thicknesses by atomic layer deposition

Elena G. Zemtsova, Andrei Yu. Arbenin, Alexander F. Plotnikov, Vladimir M. Smirnov
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 021519 (2015)
https://doi.org/10.1116/1.4907989
Published: February 2015
View article titled, Pore radius fine tuning of a silica matrix (MCM-41) based on the synthesis of alumina nanolayers with different thicknesses by atomic layer deposition
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Journal Articles

Mass densification and defect restoration in chemical vapor deposition silicon dioxide film using Ar plasma excited by microwave

Kazumasa Kawase, Tsukasa Motoya, Yasushi Uehara, Akinobu Teramoto, Tomoyuki Suwa, Tadahiro Ohmi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 32, 051502 (2014)
https://doi.org/10.1116/1.4886770
Published: July 2014
View article titled, Mass densification and defect restoration in chemical vapor deposition silicon dioxide film using Ar plasma excited by microwave
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Journal Articles

Fabrication of Sr silicate buffer layer on Si(100) substrate by pulsed laser deposition using a SrO target

Atsuhiro Imanaka, Tsubasa Sasaki, Yasushi Hotta, Shin-ichi Satoh
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 32, 051501 (2014)
https://doi.org/10.1116/1.4886972
Published: July 2014
View article titled, Fabrication of Sr silicate buffer layer on Si(100) substrate by pulsed laser deposition using a SrO target
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Journal Articles

In-situ spectroscopic ellipsometry study of copper selective-area atomic layer deposition on palladium

Xiaoqiang Jiang, Han Wang, Jie Qi, Brian G. Willis
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 32, 041513 (2014)
https://doi.org/10.1116/1.4884535
Published: June 2014
View article titled, <em>In-situ</em> spectroscopic ellipsometry study of copper selective-area atomic layer deposition on palladium
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Journal Articles

TOF SIMS analysis and generation of white photoluminescence from strontium silicate codoped with europium and terbium

Modiehi A. Tshabalala, Hendrik C. Swart, Odireleng M. Ntwaeaborwa
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 32, 021401 (2014)
https://doi.org/10.1116/1.4862752
Published: January 2014
View article titled, TOF SIMS analysis and generation of white photoluminescence from strontium silicate codoped with europium and terbium
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Journal Articles

Interface layer in hafnia/Si films as a function of ALD cycles

Pierre-Giovanni Mani-Gonzalez, Milton-Oswaldo Vazquez-Lepe, Francisco Espinosa-Magaña, Alberto Herrera-Gomez
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 31, 010601 (2013)
https://doi.org/10.1116/1.4747324
Published: August 2012
View article titled, Interface layer in hafnia/Si films as a function of ALD cycles
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