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Journal Articles

Studies on the growth mechanism of aluminide coating on K444 alloy surface by chemical vapor deposition

Weijun Mo, Mingpeng Shao, Yong Wu, Qingyun Sun, Siyao Xia, Feng Wen, Yongxin Wang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 043103 (2023)
https://doi.org/10.1116/6.0002654
Published: May 2023
View article titled, Studies on the growth mechanism of aluminide coating on K444 alloy surface by chemical vapor deposition
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Journal Articles

On the limitations of thermal atomic layer deposition of InN using ammonia

Karl Rönnby, Henrik Pedersen, Lars Ojamäe
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 020401 (2023)
https://doi.org/10.1116/6.0002355
Published: February 2023
View article titled, On the limitations of thermal atomic layer deposition of InN using ammonia
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Includes: Supplementary data
Journal Articles

Nanosecond pulsed plasma discharge for remediation of simulated wastewater containing thiazine and azo dyes as model pollutants

Muhammad Farooq, Siddiqa Ismail, N. U. Rehman
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 013001 (2023)
https://doi.org/10.1116/6.0002064
Published: December 2022
View article titled, Nanosecond pulsed plasma discharge for remediation of simulated wastewater containing thiazine and azo dyes as model pollutants
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Journal Articles

Elucidating energetics and kinetics in environmentally relevant mixed gas plasmas

Tara L. Van Surksum, Ellen R. Fisher
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 053001 (2021)
https://doi.org/10.1116/6.0001080
Published: July 2021
View article titled, Elucidating energetics and kinetics in environmentally relevant mixed gas plasmas
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Includes: Supplementary data
Journal Articles

Determination of recombination coefficients for hydrogen, oxygen, and nitrogen gasses via in situ radical probe system

Dren Qerimi, Gianluca Panici, Arihant Jain, Daniel Jacobson, David N. Ruzic
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 023004 (2021)
https://doi.org/10.1116/6.0000787
Published: March 2021
View article titled, Determination of recombination coefficients for hydrogen, oxygen, and nitrogen gasses via <em>in situ</em> radical probe system
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Journal Articles

Kinetic modeling of ammonia decomposition at chemical vapor deposition conditions

Karl Rönnby, Henrik Pedersen, Lars Ojamäe
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 050402 (2020)
https://doi.org/10.1116/6.0000369
Published: August 2020
View article titled, Kinetic modeling of ammonia decomposition at chemical vapor deposition conditions
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Includes: Supplementary data
Journal Articles

Formation of MoS2 from elemental Mo and S using reactive molecular dynamics simulations

Rimei Chen, Arben Jusufi, Alan Schilowitz, Ashlie Martini
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 022201 (2020)
https://doi.org/10.1116/1.5128377
Published: February 2020
View article titled, Formation of MoS<sub>2</sub> from elemental Mo and S using reactive molecular dynamics simulations
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Includes: Supplementary data
Journal Articles

Effect of vacuum heat treatment on the oxidation kinetics of freestanding nanostructured NiCoCrAlY coatings deposited by high-velocity oxy-fuel spraying

Farzin Ghadami, Alireza Sabour Rouh Aghdam, Soheil Ghadami, Qunfeng Zeng
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 022601 (2020)
https://doi.org/10.1116/1.5132416
Published: January 2020
View article titled, Effect of vacuum heat treatment on the oxidation kinetics of freestanding nanostructured NiCoCrAlY coatings deposited by high-velocity oxy-fuel spraying
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Journal Articles

Particle nucleation and growth in dusty plasmas: On the importance of charged-neutral interactions

Steven L. Girshick
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 011001 (2020)
https://doi.org/10.1116/1.5136337
Published: December 2019
View article titled, Particle nucleation and growth in dusty plasmas: On the importance of charged-neutral interactions
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Journal Articles

Mass spectrometric method for estimating dissociation rates in hydrogen discharge plasmas

A. Cotter, Alexander Stowell, John Carlson, James R. Doyle
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 031304 (2018)
https://doi.org/10.1116/1.5020723
Published: April 2018
View article titled, Mass spectrometric method for estimating dissociation rates in hydrogen discharge plasmas
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Journal Articles

Atomic hydrogen induced defect kinetics in amorphous silicon

Floran J. J. Peeters, Jie Zheng, Igor M. P. Aarts, Andrew C. R. Pipino, Wilhelmus M. M. Kessels, Mauritius C. M. van de Sanden
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 05C307 (2017)
https://doi.org/10.1116/1.4987152
Published: June 2017
View article titled, Atomic hydrogen induced defect kinetics in amorphous silicon
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Journal Articles

Atomic fluorine densities in electron beam generated plasmas: A high ion to radical ratio source for etching with atomic level precision

David R. Boris, Tzvetelina B. Petrova, George M. Petrov, Scott G. Walton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 01A104 (2017)
https://doi.org/10.1116/1.4971416
Published: December 2016
View article titled, Atomic fluorine densities in electron beam generated plasmas: A high ion to radical ratio source for etching with atomic level precision
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Journal Articles

Quantifying STM-tip induced directed hopping of Sb2 dimers on Si(001): A kinetic Monte Carlo study

Marvin A. Albao, Anna Patricia S. Cristobal, Jason R. Albia
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 061407 (2015)
https://doi.org/10.1116/1.4935098
Published: November 2015
View article titled, Quantifying STM-tip induced directed hopping of Sb<sub>2</sub> dimers on Si(001): A kinetic Monte Carlo study
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Journal Articles

Thermal stability and oxidation resistance of Cr1−xAlxN coatings with single phase cubic structure

Linqing He, Li Chen, Yuxiang Xu, Yong Du
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 061513 (2015)
https://doi.org/10.1116/1.4930424
Published: September 2015
View article titled, Thermal stability and oxidation resistance of Cr<sub>1−x</sub>Al<sub>x</sub>N coatings with single phase cubic structure
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Journal Articles

Non-Arrhenius temperature dependence of the island density of one-dimensional Al chains on Si(100): A kinetic Monte Carlo study

Jason R. Albia, Marvin A. Albao
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 021404 (2015)
https://doi.org/10.1116/1.4905457
Published: January 2015
View article titled, Non-Arrhenius temperature dependence of the island density of one-dimensional Al chains on Si(100): A kinetic Monte Carlo study
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Journal Articles

Comparison of defects in crystalline oxide semiconductor materials by electron spin resonance

Tokiyoshi Matsuda, Mutsumi Kimura
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 020601 (2015)
https://doi.org/10.1116/1.4904400
Published: December 2014
View article titled, Comparison of defects in crystalline oxide semiconductor materials by electron spin resonance
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Journal Articles

Electron depletion via cathode spot dispersion of dielectric powder into an overhead plasma

Eric D. Gillman, John E. Foster
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 31, 061303 (2013)
https://doi.org/10.1116/1.4817753
Published: August 2013
View article titled, Electron depletion via cathode spot dispersion of dielectric powder into an overhead plasma
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Journal Articles

HfxZr1−xO2 compositional control using co-injection atomic layer deposition

Steven Consiglio, Kandabara Tapily, Robert D. Clark, Genji Nakamura, Cory S. Wajda, Gert J. Leusink
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 31, 01A115 (2013)
https://doi.org/10.1116/1.4764473
Published: October 2012
View article titled, Hf<sub>x</sub>Zr<sub>1−x</sub>O<sub>2</sub> compositional control using co-injection atomic layer deposition
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Journal Articles

On the kinetics of spatial atomic layer deposition

Paul Poodt, Joep van Lieshout, Andrea Illiberi, Raymond Knaapen, Fred Roozeboom, Almie van Asten
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 31, 01A108 (2013)
https://doi.org/10.1116/1.4756692
Published: October 2012
View article titled, On the kinetics of spatial atomic layer deposition
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Journal Articles

Oxidation resistance of quintuple Ti-Al-Si-C-N coatings and associated mechanism

Guizhi Wu, Shengli Ma, Kewei Xu, Vincent Ji, Paul K. Chu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 30, 041508 (2012)
https://doi.org/10.1116/1.4721376
Published: May 2012
View article titled, Oxidation resistance of quintuple Ti-Al-Si-C-N coatings and associated mechanism
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