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Journal Articles

Adsorption mechanism of dimeric Ga precursors in metalorganic chemical vapor deposition of gallium nitride

Hankyu Kim, Miso Kim, Bumsang Kim, Bonggeun Shong

J. Vac. Sci. Technol. A 41, 063409 (2023)

https://doi.org/10.1116/6.0002966

Published: October 2023

View article titled, Adsorption mechanism of dimeric Ga precursors in metalorganic chemical vapor deposition of gallium nitride

Includes: Supplementary data

Journal Articles

Mechanistic analysis on low temperature thermal atomic layer deposition of nitrides utilizing H₂S

Jinwoo Lee, Soo Hyun Lee, Bonggeun Shong

J. Vac. Sci. Technol. A 41, 062405 (2023)

https://doi.org/10.1116/6.0003041

Published: October 2023

View article titled, Mechanistic analysis on low temperature thermal atomic layer deposition of nitrides utilizing H2S

Journal Articles

Role of a surface hydroxyl group depending on growth temperature in atomic layer deposition of ternary oxides

Sanghun Lee, Seunggi Seo, Woo-Jae Lee, Wontae Noh, Se-Hun Kwon, Il-Kwon Oh, Hyungjun Kim

J. Vac. Sci. Technol. A 41, 062402 (2023)

https://doi.org/10.1116/6.0002880

Published: October 2023

View article titled, Role of a surface hydroxyl group depending on growth temperature in atomic layer deposition of ternary oxides

Includes: Supplementary data

Journal Articles

Orientation-dependent etching of silicon by fluorine molecules: A quantum chemistry computational study

Omesh Dhar Dwivedi, Yuri Barsukov, Sierra Jubin, Joseph R. Vella, Igor Kaganovich

J. Vac. Sci. Technol. A 41, 052602 (2023)

https://doi.org/10.1116/6.0002841

Published: August 2023

View article titled, Orientation-dependent etching of silicon by fluorine molecules: A quantum chemistry computational study

Journal Articles

Density functional theory study on reaction mechanisms of Co(^tbu2DAD)₂ for area selective-atomic layer deposition of Co films on metal surfaces

Nickolas Ashburn, Xiuyao Lang, Sumeet Pandey, Steven Wolf, Steve Kramer, John Smythe, Gurtej Sandhu, Charles Winter, Andrew C. Kummel, Kyeongjae Cho

J. Vac. Sci. Technol. A 41, 052403 (2023)

https://doi.org/10.1116/6.0002840

Published: August 2023

View article titled, Density functional theory study on reaction mechanisms of Co(tbu2DAD)2 for area selective-atomic layer deposition of Co films on metal surfaces

Includes: Supplementary data

Journal Articles

Targeted synthesis of predicted metastable compounds using modulated elemental reactants

Mellie Lemon, Fischer G. Harvel, Renae N. Gannon, Ping Lu, Sven P. Rudin, David C. Johnson

J. Vac. Sci. Technol. A 41, 022203 (2023)

https://doi.org/10.1116/6.0002260

Published: February 2023

View article titled, Targeted synthesis of predicted metastable compounds using modulated elemental reactants

Includes: Supplementary data

Journal Articles

In vacuo cluster tool for studying reaction mechanisms in atomic layer deposition and atomic layer etching processes

Heta-Elisa Nieminen, Mykhailo Chundak, Mikko J. Heikkilä, Paloma Ruiz Kärkkäinen, Marko Vehkamäki, Matti Putkonen, Mikko Ritala

J. Vac. Sci. Technol. A 41, 022401 (2023)

https://doi.org/10.1116/6.0002312

Published: February 2023

View article titled, In vacuo cluster tool for studying reaction mechanisms in atomic layer deposition and atomic layer etching processes

Journal Articles

Thermal atomic layer etching of VO₂ using sequential BCl₃ and SF₄ exposures: Observation of conversion, ligand-exchange, and oxidation state changes

Jonas C. Gertsch, Jonathan L. Partridge, Austin M. Cano, Joel W. Clancey, Victor M. Bright, Steven M. George

J. Vac. Sci. Technol. A 41, 012603 (2023)

https://doi.org/10.1116/6.0002149

Published: January 2023

View article titled, Thermal atomic layer etching of VO2 using sequential BCl3 and SF4 exposures: Observation of conversion, ligand-exchange, and oxidation state changes

Includes: Supplementary data

Journal Articles

CF₄ plasma-based atomic layer etching of Al₂O₃ and surface smoothing effect

Chien-Wei Chen, Wen-Hao Cho, Chan-Yuen Chang, Chien-Ying Su, Nien-Nan Chu, Chi-Chung Kei, Bor-Ran Li

J. Vac. Sci. Technol. A 41, 012602 (2023)

https://doi.org/10.1116/6.0002210

Published: December 2022

View article titled, CF4 plasma-based atomic layer etching of Al2O3 and surface smoothing effect

Includes: Supplementary data

Journal Articles

Surface reaction modelling of thermal atomic layer etching on blanket hafnium oxide and its application on high aspect ratio structures

Andreas Fischer, David Mui, Aaron Routzahn, Ryan Gasvoda, Jim Sims, Thorsten Lill

J. Vac. Sci. Technol. A 41, 012601 (2023)

https://doi.org/10.1116/6.0002244

Published: December 2022

View article titled, Surface reaction modelling of thermal atomic layer etching on blanket hafnium oxide and its application on high aspect ratio structures

Journal Articles

Packing of inhibitor molecules during area-selective atomic layer deposition studied using random sequential adsorption simulations

J. Li, I. Tezsevin, M. J. M. Merkx, J. F. W. Maas, W. M. M. Kessels, T. E. Sandoval, A. J. M. Mackus

J. Vac. Sci. Technol. A 40, 062409 (2022)

https://doi.org/10.1116/6.0002096

Published: November 2022

View article titled, Packing of inhibitor molecules during area-selective atomic layer deposition studied using random sequential adsorption simulations

Includes: Supplementary data

Journal Articles

Temperature study of atmospheric-pressure plasma-enhanced spatial ALD of Al₂O₃ using infrared and optical emission spectroscopy

M. A. Mione, V. Vandalon, W. M. M. Kessels, F. Roozeboom

J. Vac. Sci. Technol. A 40, 062407 (2022)

https://doi.org/10.1116/6.0002158

Published: November 2022

View article titled, Temperature study of atmospheric-pressure plasma-enhanced spatial ALD of Al2O3 using infrared and optical emission spectroscopy

Includes: Supplementary data

Journal Articles

SiO₂ etching and surface evolution using combined exposure to CF₄/O₂ remote plasma and electron beam

Kang-Yi Lin, Christian Preischl, Christian Felix Hermanns, Daniel Rhinow, Hans-Michael Solowan, Michael Budach, Klaus Edinger, G. S. Oehrlein

J. Vac. Sci. Technol. A 40, 063004 (2022)

https://doi.org/10.1116/6.0002038

Published: October 2022

View article titled, SiO2 etching and surface evolution using combined exposure to CF4/O2 remote plasma and electron beam

Journal Articles

Scalable synthesis of supported catalysts using fluidized bed atomic layer deposition

Zheng Lu, Angel Yanguas-Gil, Donghyeon Kang, Pragathi Darapaneni, Anil U. Mane, Christopher L. Marshall, Jeffrey W. Elam

J. Vac. Sci. Technol. A 40, 042404 (2022)

https://doi.org/10.1116/6.0001891

Published: June 2022

View article titled, Scalable synthesis of supported catalysts using fluidized bed atomic layer deposition

Journal Articles

Atmospheric pressure plasma functionalization of polystyrene

Jordyn Polito, Mark Denning, Richard Stewart, David Frost, Mark J. Kushner

J. Vac. Sci. Technol. A 40, 043001 (2022)

https://doi.org/10.1116/6.0001850

Published: May 2022

View article titled, Atmospheric pressure plasma functionalization of polystyrene

Journal Articles

Atomic layer etching of Al₂O₃ with NF₃ plasma fluorination and trimethylaluminum ligand exchange

Jihyun Kim, Dahee Shim, Yongjae Kim, Heeyeop Chae

J. Vac. Sci. Technol. A 40, 032603 (2022)

https://doi.org/10.1116/6.0001616

Published: April 2022

View article titled, Atomic layer etching of Al2O3 with NF3 plasma fluorination and trimethylaluminum ligand exchange

Journal Articles

Origin of enhanced thermal atomic layer etching of amorphous HfO₂

Rita Mullins, José Julio Gutiérrez Moreno, Michael Nolan

J. Vac. Sci. Technol. A 40, 022604 (2022)

https://doi.org/10.1116/6.0001614

Published: February 2022

View article titled, Origin of enhanced thermal atomic layer etching of amorphous HfO2

Includes: Supplementary data

Journal Articles

Room-temperature atomic layer deposition of iron oxide using plasma excited humidified argon

Kazuki Yoshida, Issei Nagata, Kentaro Saito, Masanori Miura, Kensaku Kanomata, Bashir Ahmmad, Shigeru Kubota, Fumihiko Hirose

J. Vac. Sci. Technol. A 40, 022408 (2022)

https://doi.org/10.1116/6.0001622

Published: February 2022

View article titled, Room-temperature atomic layer deposition of iron oxide using plasma excited humidified argon

Journal Articles

Control of etch profiles in high aspect ratio holes via precise reactant dosing in thermal atomic layer etching

Andreas Fischer, Aaron Routzahn, Ryan J. Gasvoda, Jim Sims, Thorsten Lill

J. Vac. Sci. Technol. A 40, 022603 (2022)

https://doi.org/10.1116/6.0001691

Published: February 2022

View article titled, Control of etch profiles in high aspect ratio holes via precise reactant dosing in thermal atomic layer etching

Journal Articles

Methyl-methacrylate based aluminum hybrid film grown via three-precursor molecular layer deposition

Solomon T. Oyakhire, Hayrensa Ablat, Nathaniel E. Richey, Stacey F. Bent

J. Vac. Sci. Technol. A 40, 023405 (2022)

https://doi.org/10.1116/6.0001505

Published: January 2022

View article titled, Methyl-methacrylate based aluminum hybrid film grown via three-precursor molecular layer deposition

Includes: Supplementary data

NARROW

Topics

Adsorption mechanism of dimeric Ga precursors in metalorganic chemical vapor deposition of gallium nitride

Mechanistic analysis on low temperature thermal atomic layer deposition of nitrides utilizing H₂S

Role of a surface hydroxyl group depending on growth temperature in atomic layer deposition of ternary oxides

Orientation-dependent etching of silicon by fluorine molecules: A quantum chemistry computational study

Density functional theory study on reaction mechanisms of Co(^tbu2DAD)₂ for area selective-atomic layer deposition of Co films on metal surfaces

Targeted synthesis of predicted metastable compounds using modulated elemental reactants

In vacuo cluster tool for studying reaction mechanisms in atomic layer deposition and atomic layer etching processes

Thermal atomic layer etching of VO₂ using sequential BCl₃ and SF₄ exposures: Observation of conversion, ligand-exchange, and oxidation state changes

CF₄ plasma-based atomic layer etching of Al₂O₃ and surface smoothing effect

Surface reaction modelling of thermal atomic layer etching on blanket hafnium oxide and its application on high aspect ratio structures

Packing of inhibitor molecules during area-selective atomic layer deposition studied using random sequential adsorption simulations

Temperature study of atmospheric-pressure plasma-enhanced spatial ALD of Al₂O₃ using infrared and optical emission spectroscopy

SiO₂ etching and surface evolution using combined exposure to CF₄/O₂ remote plasma and electron beam

Scalable synthesis of supported catalysts using fluidized bed atomic layer deposition

Atmospheric pressure plasma functionalization of polystyrene

Atomic layer etching of Al₂O₃ with NF₃ plasma fluorination and trimethylaluminum ligand exchange

Origin of enhanced thermal atomic layer etching of amorphous HfO₂

Room-temperature atomic layer deposition of iron oxide using plasma excited humidified argon

Control of etch profiles in high aspect ratio holes via precise reactant dosing in thermal atomic layer etching

Methyl-methacrylate based aluminum hybrid film grown via three-precursor molecular layer deposition

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