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Journal Articles

Self-limiting deposition of copper from copper beta-diketonates and plasma electrons

Premrudee Promdet, Pentti Niiranen, Simon Lagerkvist, Daniel Lundin, Henrik Pedersen

J. Vac. Sci. Technol. A 43, 040402 (2025)

https://doi.org/10.1116/6.0004410

Published: May 2025

View articletitled, Self-limiting deposition of copper from copper beta-diketonates and plasma electrons

Journal Articles

Recent trends in thermal atomic layer deposition chemistry

Georgi Popov, Miika Mattinen, Anton Vihervaara, Markku Leskelä

J. Vac. Sci. Technol. A 43, 030801 (2025)

https://doi.org/10.1116/6.0004320

Published: March 2025

View articletitled, Recent trends in thermal atomic layer deposition chemistry

Journal Articles

Properties of low-resistivity molybdenum metal thin film deposited by atomic layer deposition using MoO₂Cl₂ as precursor

So Young Kim, Chunghee Jo, Hyerin Shin, Dongmin Yoon, Donghyuk Shin, Min-ho Cheon, Kyu-beom Lee, Dong-won Seo, Jae-wook Choi, Heungsoo Park, Dae-Hong Ko

J. Vac. Sci. Technol. A 42, 032405 (2024)

https://doi.org/10.1116/6.0003361

Published: March 2024

View articletitled, Properties of low-resistivity molybdenum metal thin film deposited by atomic layer deposition using MoO2Cl2 as precursor

Journal Articles

Plasma electron characterization in electron chemical vapor deposition

Pentti Niiranen, Anna Kapran, Hama Nadhom, Martin Čada, Zdeněk Hubička, Henrik Pedersen, Daniel Lundin

J. Vac. Sci. Technol. A 42, 023006 (2024)

https://doi.org/10.1116/6.0003408

Published: February 2024

View articletitled, Plasma electron characterization in electron chemical vapor deposition

Journal Articles

Density functional theory study on reaction mechanisms of Co(^tbu2DAD)₂ for area selective-atomic layer deposition of Co films on metal surfaces

Nickolas Ashburn, Xiuyao Lang, Sumeet Pandey, Steven Wolf, Steve Kramer, John Smythe, Gurtej Sandhu, Charles Winter, Andrew C. Kummel, Kyeongjae Cho

J. Vac. Sci. Technol. A 41, 052403 (2023)

https://doi.org/10.1116/6.0002840

Published: August 2023

View articletitled, Density functional theory study on reaction mechanisms of Co(tbu2DAD)2 for area selective-atomic layer deposition of Co films on metal surfaces

Includes: Supplementary data

Journal Articles

Pulsed chemical vapor deposition of cobalt and cobalt carbide thin films

Sen Chen, Xiangyu Zhang, Bowen Liu, Zhongwei Liu

J. Vac. Sci. Technol. A 40, 023401 (2022)

https://doi.org/10.1116/6.0001578

Published: January 2022

View articletitled, Pulsed chemical vapor deposition of cobalt and cobalt carbide thin films

Journal Articles

Area selective deposition of iron films using temperature sensitive masking materials and plasma electrons as reducing agents

Hama Nadhom, Yusheng Yuan, Polla Rouf, Niclas Solin, Henrik Pedersen

J. Vac. Sci. Technol. A 39, 043411 (2021)

https://doi.org/10.1116/6.0001076

Published: May 2021

View articletitled, Area selective deposition of iron films using temperature sensitive masking materials and plasma electrons as reducing agents

Journal Articles

Chemical vapor deposition of metallic films using plasma electrons as reducing agents

Hama Nadhom, Daniel Lundin, Polla Rouf, Henrik Pedersen

J. Vac. Sci. Technol. A 38, 033402 (2020)

https://doi.org/10.1116/1.5142850

Published: March 2020

View articletitled, Chemical vapor deposition of metallic films using plasma electrons as reducing agents

Includes: Supplementary data

Journal Articles

Facile benchtop reactor design using dendrimer-templating technology for the fabrication of polyethyleneimine-coated CuO nanoparticles on the gram scale

Aiesha L. Ethridge, Miranda J. Gallagher, Natalie V. Hudson-Smith, Demetrius Finley, Ariful Ahsan, D. Howard Fairbrother, Christy L. Haynes, Robert J. Hamers, Michael L. Curry

J. Vac. Sci. Technol. A 37, 041402 (2019)

https://doi.org/10.1116/1.5089593

Published: June 2019

View articletitled, Facile benchtop reactor design using dendrimer-templating technology for the fabrication of polyethyleneimine-coated CuO nanoparticles on the gram scale

Includes: Supplementary data

Journal Articles

Thermal atomic layer deposition of Sn metal using SnCl₄ and a vapor phase silyl dihydropyrazine reducing agent

Eric C. Stevens, Moataz Bellah M. Mousa, Gregory N. Parsons

J. Vac. Sci. Technol. A 36, 06A106 (2018)

https://doi.org/10.1116/1.5055212

Published: November 2018

View articletitled, Thermal atomic layer deposition of Sn metal using SnCl4 and a vapor phase silyl dihydropyrazine reducing agent

Journal Articles

Thermal atomic layer deposition of tungsten carbide films from WCl₆ and AlMe₃

Kyle J. Blakeney, Charles H. Winter

J. Vac. Sci. Technol. A 36, 01A104 (2018)

https://doi.org/10.1116/1.5002667

Published: November 2017

View articletitled, Thermal atomic layer deposition of tungsten carbide films from WCl6 and AlMe3

Includes: Supplementary data

Journal Articles

Ag⁺ reduction and silver nanoparticle synthesis at the plasma–liquid interface by an RF driven atmospheric pressure plasma jet: Mechanisms and the effect of surfactant

V. S. Santosh K. Kondeti, Urvashi Gangal, Shurik Yatom, Peter J. Bruggeman

J. Vac. Sci. Technol. A 35, 061302 (2017)

https://doi.org/10.1116/1.4995374

Published: July 2017

View articletitled, Ag+ reduction and silver nanoparticle synthesis at the plasma–liquid interface by an RF driven atmospheric pressure plasma jet: Mechanisms and the effect of surfactant

Journal Articles

Potential gold(I) precursors evaluated for atomic layer deposition

Maarit Mäkelä, Timo Hatanpää, Mikko Ritala, Markku Leskelä, Kenichiro Mizohata, Kristoffer Meinander, Jyrki Räisänen

J. Vac. Sci. Technol. A 35, 01B112 (2017)

https://doi.org/10.1116/1.4968193

Published: November 2016

View articletitled, Potential gold(I) precursors evaluated for atomic layer deposition

Journal Articles

Atomic layer deposition of ultrathin Cu₂O and subsequent reduction to Cu studied by in situ x-ray photoelectron spectroscopy

Dileep Dhakal, Khaybar Assim, Heinrich Lang, Philipp Bruener, Thomas Grehl, Colin Georgi, Thomas Waechtler, Ramona Ecke, Stefan E. Schulz, Thomas Gessner

J. Vac. Sci. Technol. A 34, 01A111 (2016)

https://doi.org/10.1116/1.4933088

Published: October 2015

View articletitled, Atomic layer deposition of ultrathin Cu2O and subsequent reduction to Cu studied by in situ x-ray photoelectron spectroscopy

Journal Articles

Experimental design and analysis of activators regenerated by electron transfer-atom transfer radical polymerization experimental conditions for grafting sodium styrene sulfonate from titanium substrates

Rami N. Foster, Patrik K. Johansson, Nicole R. Tom, Patrick Koelsch, David G. Castner

J. Vac. Sci. Technol. A 33, 05E131 (2015)

https://doi.org/10.1116/1.4929506

Published: August 2015

View articletitled, Experimental design and analysis of activators regenerated by electron transfer-atom transfer radical polymerization experimental conditions for grafting sodium styrene sulfonate from titanium substrates

Includes: Supplementary data

Journal Articles

Kinetic study on hot-wire-assisted atomic layer deposition of nickel thin films

Guangjie Yuan, Hideharu Shimizu, Takeshi Momose, Yukihiro Shimogaki

J. Vac. Sci. Technol. A 32, 01A104 (2014)

https://doi.org/10.1116/1.4829361

Published: November 2013

View articletitled, Kinetic study on hot-wire-assisted atomic layer deposition of nickel thin films

Journal Articles

Selective atomic layer deposition of zirconia on copper patterned silicon substrates using ethanol as oxygen source as well as copper reductant

Sathees Kannan Selvaraj, Jaya Parulekar, Christos G. Takoudis

J. Vac. Sci. Technol. A 32, 010601 (2014)

https://doi.org/10.1116/1.4826941

Published: October 2013

View articletitled, Selective atomic layer deposition of zirconia on copper patterned silicon substrates using ethanol as oxygen source as well as copper reductant

Journal Articles

Relative lability of gold-oxide thin films in contact with air, solvents, or electrolyte solutions

Kevin M. Cook, Gregory S. Ferguson

J. Vac. Sci. Technol. A 31, 021508 (2013)

https://doi.org/10.1116/1.4791687

Published: February 2013

View articletitled, Relative lability of gold-oxide thin films in contact with air, solvents, or electrolyte solutions

Includes: Supplementary data

Journal Articles

Characterization of alkali metal dispensers and non-evaporable getter pumps in ultrahigh vacuum systems for cold atomic sensors

David R. Scherer, David B. Fenner, Joel M. Hensley

J. Vac. Sci. Technol. A 30, 061602 (2012)

https://doi.org/10.1116/1.4757950

Published: October 2012

View articletitled, Characterization of alkali metal dispensers and non-evaporable getter pumps in ultrahigh vacuum systems for cold atomic sensors

Journal Articles

Microplasma-assisted growth of colloidal Ag nanoparticles for point-of-use surface-enhanced Raman scattering applications

Fang-Chia Chang, Carolyn Richmonds, R. Mohan Sankaran

J. Vac. Sci. Technol. A 28, L5–L8 (2010)

https://doi.org/10.1116/1.3428708

Published: June 2010

View articletitled, Microplasma-assisted growth of colloidal Ag nanoparticles for point-of-use surface-enhanced Raman scattering applications

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Self-limiting deposition of copper from copper beta-diketonates and plasma electrons

Recent trends in thermal atomic layer deposition chemistry

Properties of low-resistivity molybdenum metal thin film deposited by atomic layer deposition using MoO₂Cl₂ as precursor

Plasma electron characterization in electron chemical vapor deposition

Density functional theory study on reaction mechanisms of Co(^tbu2DAD)₂ for area selective-atomic layer deposition of Co films on metal surfaces

Pulsed chemical vapor deposition of cobalt and cobalt carbide thin films

Area selective deposition of iron films using temperature sensitive masking materials and plasma electrons as reducing agents

Chemical vapor deposition of metallic films using plasma electrons as reducing agents

Facile benchtop reactor design using dendrimer-templating technology for the fabrication of polyethyleneimine-coated CuO nanoparticles on the gram scale

Thermal atomic layer deposition of Sn metal using SnCl₄ and a vapor phase silyl dihydropyrazine reducing agent

Thermal atomic layer deposition of tungsten carbide films from WCl₆ and AlMe₃

Ag⁺ reduction and silver nanoparticle synthesis at the plasma–liquid interface by an RF driven atmospheric pressure plasma jet: Mechanisms and the effect of surfactant

Potential gold(I) precursors evaluated for atomic layer deposition

Atomic layer deposition of ultrathin Cu₂O and subsequent reduction to Cu studied by in situ x-ray photoelectron spectroscopy

Experimental design and analysis of activators regenerated by electron transfer-atom transfer radical polymerization experimental conditions for grafting sodium styrene sulfonate from titanium substrates

Kinetic study on hot-wire-assisted atomic layer deposition of nickel thin films

Selective atomic layer deposition of zirconia on copper patterned silicon substrates using ethanol as oxygen source as well as copper reductant

Relative lability of gold-oxide thin films in contact with air, solvents, or electrolyte solutions

Characterization of alkali metal dispensers and non-evaporable getter pumps in ultrahigh vacuum systems for cold atomic sensors

Microplasma-assisted growth of colloidal Ag nanoparticles for point-of-use surface-enhanced Raman scattering applications

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