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Journal Articles

Over 6 MV/cm operation in β-Ga₂O₃ Schottky barrier diodes with IrO₂ and RuO₂ anodes deposited by molecular beam epitaxy

B. Cromer, D. Saraswat, N. Pieczulewski, W. Li, K. Nomoto, F. V. E. Hensling, K. Azizie, H. P. Nair, D. G. Schlom, D. A. Muller, D. Jena, H. G. Xing

J. Vac. Sci. Technol. A 42, 033206 (2024)

https://doi.org/10.1116/6.0003468

Published: April 2024

View article titled, Over 6 MV/cm operation in β-Ga2O3 Schottky barrier diodes with IrO2 and RuO2 anodes deposited by molecular beam epitaxy

Includes: Supplementary data

Journal Articles

Electrochromic properties of NiO films prepared by atomic layer deposition

Xi Su, Zexin Tu, Liwei Ji, Hao Wu, Hongxing Xu, Chang Liu

J. Vac. Sci. Technol. A 41, 062407 (2023)

https://doi.org/10.1116/6.0003040

Published: October 2023

View article titled, Electrochromic properties of NiO films prepared by atomic layer deposition

Journal Articles

Stabilization of the tetragonal phase in ZrO₂ thin films according to ozone concentration using atomic layer deposition

Seokhwi Song, Eungju Kim, Kyunghoo Kim, Jangho Bae, Jinho Lee, Chang Hwa Jung, Hanjin Lim, Hyeongtag Jeon

J. Vac. Sci. Technol. A 41, 062404 (2023)

https://doi.org/10.1116/6.0002901

Published: October 2023

View article titled, Stabilization of the tetragonal phase in ZrO2 thin films according to ozone concentration using atomic layer deposition

Journal Articles

Li_xCo_yO_z thin-films deposition through thermal atomic layer deposition

Antoine Peisert, Noureddine Adjeroud, Damien Lenoble, Guillaume Lamblin

J. Vac. Sci. Technol. A 41, 062403 (2023)

https://doi.org/10.1116/6.0002863

Published: October 2023

View article titled, LixCoyOz thin-films deposition through thermal atomic layer deposition

Journal Articles

Electron-enhanced SiO₂ atomic layer deposition at 35 °C using disilane and ozone or water as reactants

Jonas C. Gertsch, Zachary C. Sobell, Andrew S. Cavanagh, Harsono Simka, Steven M. George

J. Vac. Sci. Technol. A 41, 042404 (2023)

https://doi.org/10.1116/6.0002726

Published: June 2023

View article titled, Electron-enhanced SiO2 atomic layer deposition at 35 °C using disilane and ozone or water as reactants

Journal Articles

Etching of molybdenum via a combination of low-temperature ozone oxidation and wet-chemical oxide dissolution

Antoine Pacco, Teppei Nakano, Shota Iwahata, Akihisa Iwasaki, Efrain Altamirano Sanchez

J. Vac. Sci. Technol. A 41, 032601 (2023)

https://doi.org/10.1116/6.0002404

Published: March 2023

View article titled, Etching of molybdenum via a combination of low-temperature ozone oxidation and wet-chemical oxide dissolution

Includes: Supplementary data

Journal Articles

Nanosecond pulsed plasma discharge for remediation of simulated wastewater containing thiazine and azo dyes as model pollutants

Muhammad Farooq, Siddiqa Ismail, N. U. Rehman

J. Vac. Sci. Technol. A 41, 013001 (2023)

https://doi.org/10.1116/6.0002064

Published: December 2022

View article titled, Nanosecond pulsed plasma discharge for remediation of simulated wastewater containing thiazine and azo dyes as model pollutants

Journal Articles

Effect of ozone and humidity addition on hydrogen peroxide generation characteristics of plasmas in oxygen bubbles

Ryota Kazama, Taichi Watanabe, Shungo Zen, Nozomi Takeuchi

J. Vac. Sci. Technol. A 40, 063008 (2022)

https://doi.org/10.1116/6.0001861

Published: November 2022

View article titled, Effect of ozone and humidity addition on hydrogen peroxide generation characteristics of plasmas in oxygen bubbles

Journal Articles

Zn dots coherently grown as the seed and buffer layers on Si(111) for ZnO thin film: Mechanism, in situ analysis, and simulation

Wei-Ting Chen, Pei-Cheng Fang, Yen-Wei Chen, Shang-Jui Chiu, Ching-Shun Ku, Sanjaya Brahma, Kuang-Yao Lo

J. Vac. Sci. Technol. A 40, 063403 (2022)

https://doi.org/10.1116/5.0106583

Published: October 2022

View article titled, Zn dots coherently grown as the seed and buffer layers on Si(111) for ZnO thin film: Mechanism, in situ analysis, and simulation

Includes: Supplementary data

Journal Articles

Surface oxidation of hydrophobic ZnSe for enhanced growth of atomic layer deposited aluminum oxide

Corbin Feit, Jaynlynn Sosa, Alexandros Kostogiannes, Matthieu Chazot, Nicholas G. Rudawski, Titel Jurca, Kathleen A. Richardson, Parag Banerjee

J. Vac. Sci. Technol. A 40, 052402 (2022)

https://doi.org/10.1116/6.0002018

Published: August 2022

View article titled, Surface oxidation of hydrophobic ZnSe for enhanced growth of atomic layer deposited aluminum oxide

Journal Articles

Atmospheric pressure plasma functionalization of polystyrene

Jordyn Polito, Mark Denning, Richard Stewart, David Frost, Mark J. Kushner

J. Vac. Sci. Technol. A 40, 043001 (2022)

https://doi.org/10.1116/6.0001850

Published: May 2022

View article titled, Atmospheric pressure plasma functionalization of polystyrene

Journal Articles

Room-temperature atomic layer deposition of iron oxide using plasma excited humidified argon

Kazuki Yoshida, Issei Nagata, Kentaro Saito, Masanori Miura, Kensaku Kanomata, Bashir Ahmmad, Shigeru Kubota, Fumihiko Hirose

J. Vac. Sci. Technol. A 40, 022408 (2022)

https://doi.org/10.1116/6.0001622

Published: February 2022

View article titled, Room-temperature atomic layer deposition of iron oxide using plasma excited humidified argon

Journal Articles

Engineering ordered arrangements of oxygen vacancies at the surface of superconducting La₂CuO₄ thin films

Y. Eren Suyolcu, Georg Christiani, Patrick T. Gemperline, Sydney R. Provence, Annette Bussmann-Holder, Ryan B. Comes, Peter A. van Aken, Gennady Logvenov

J. Vac. Sci. Technol. A 40, 013214 (2022)

https://doi.org/10.1116/6.0001473

Published: December 2021

View article titled, Engineering ordered arrangements of oxygen vacancies at the surface of superconducting La2CuO4 thin films

Includes: Supplementary data

Journal Articles

Epitaxial film growth by thermal laser evaporation

Dong Yeong Kim, Jochen Mannhart, Wolfgang Braun

J. Vac. Sci. Technol. A 39, 053406 (2021)

https://doi.org/10.1116/6.0001177

Published: August 2021

View article titled, Epitaxial film growth by thermal laser evaporation

Includes: Supplementary data

Journal Articles

Atomic layer deposition of chromium oxide—An interplay between deposition and etching

Bireswar Mandol, Neha Mahuli, Kenichi Ohno, Lance Scudder, Shaibal K. Sarkar

J. Vac. Sci. Technol. A 39, 032414 (2021)

https://doi.org/10.1116/6.0000896

Published: April 2021

View article titled, Atomic layer deposition of chromium oxide—An interplay between deposition and etching

Journal Articles

Delta-doped β-(Al_xGa_1−x)₂O₃/Ga₂O₃ heterostructure field-effect transistors by ozone molecular beam epitaxy

Marko J. Tadjer, Kohei Sasaki, Daiki Wakimoto, Travis J. Anderson, Michael A. Mastro, James C. Gallagher, Alan G. Jacobs, Alyssa L. Mock, Andrew D. Koehler, Mona Ebrish, Karl D. Hobart, Akito Kuramata

J. Vac. Sci. Technol. A 39, 033402 (2021)

https://doi.org/10.1116/6.0000932

Published: March 2021

View article titled, Delta-doped β-(AlxGa1−x)2O3/Ga2O3 heterostructure field-effect transistors by ozone molecular beam epitaxy

Includes: Supplementary data

Journal Articles

Ultrasmooth cobalt films on SiO₂ by chemical vapor deposition using a nucleation promoter and a growth inhibitor

Zhejun V. Zhang, Sumeng Liu, Gregory S. Girolami, John R. Abelson

J. Vac. Sci. Technol. A 39, 023414 (2021)

https://doi.org/10.1116/6.0000688

Published: March 2021

View article titled, Ultrasmooth cobalt films on SiO2 by chemical vapor deposition using a nucleation promoter and a growth inhibitor

Includes: Supplementary data

Journal Articles

Thermal atomic layer etching of germanium-rich SiGe using an oxidation and “conversion-etch” mechanism

Aziz I. Abdulagatov, Varun Sharma, Jessica A. Murdzek, Andrew S. Cavanagh, Steven M. George

J. Vac. Sci. Technol. A 39, 022602 (2021)

https://doi.org/10.1116/6.0000834

Published: February 2021

View article titled, Thermal atomic layer etching of germanium-rich SiGe using an oxidation and “conversion-etch” mechanism

Journal Articles

Area-selective atomic layer deposition of noble metals: Polymerized fluorocarbon layers as effective growth inhibitors

Petro Deminskyi, Ali Haider, Hamit Eren, Talha M. Khan, Necmi Biyikli

J. Vac. Sci. Technol. A 39, 022402 (2021)

https://doi.org/10.1116/6.0000701

Published: January 2021

View article titled, Area-selective atomic layer deposition of noble metals: Polymerized fluorocarbon layers as effective growth inhibitors

Includes: Supplementary data

Journal Articles

Area-selective aerosol jet fog deposition: Advancing large-area and sustainable fabrication

Kamesh Mullapudi, Nishit M. Murari, Ryan H. Mansergh, Douglas A. Keszler, John F. Conley, Jr.

J. Vac. Sci. Technol. A 39, 013407 (2021)

https://doi.org/10.1116/6.0000642

Published: December 2020

View article titled, Area-selective aerosol jet fog deposition: Advancing large-area and sustainable fabrication

Includes: Supplementary data

NARROW

Topics

Over 6 MV/cm operation in β-Ga₂O₃ Schottky barrier diodes with IrO₂ and RuO₂ anodes deposited by molecular beam epitaxy

Electrochromic properties of NiO films prepared by atomic layer deposition

Stabilization of the tetragonal phase in ZrO₂ thin films according to ozone concentration using atomic layer deposition

Li_xCo_yO_z thin-films deposition through thermal atomic layer deposition

Electron-enhanced SiO₂ atomic layer deposition at 35 °C using disilane and ozone or water as reactants

Etching of molybdenum via a combination of low-temperature ozone oxidation and wet-chemical oxide dissolution

Nanosecond pulsed plasma discharge for remediation of simulated wastewater containing thiazine and azo dyes as model pollutants

Effect of ozone and humidity addition on hydrogen peroxide generation characteristics of plasmas in oxygen bubbles

Zn dots coherently grown as the seed and buffer layers on Si(111) for ZnO thin film: Mechanism, in situ analysis, and simulation

Surface oxidation of hydrophobic ZnSe for enhanced growth of atomic layer deposited aluminum oxide

Atmospheric pressure plasma functionalization of polystyrene

Room-temperature atomic layer deposition of iron oxide using plasma excited humidified argon

Engineering ordered arrangements of oxygen vacancies at the surface of superconducting La₂CuO₄ thin films

Epitaxial film growth by thermal laser evaporation

Atomic layer deposition of chromium oxide—An interplay between deposition and etching

Delta-doped β-(Al_xGa_1−x)₂O₃/Ga₂O₃ heterostructure field-effect transistors by ozone molecular beam epitaxy

Ultrasmooth cobalt films on SiO₂ by chemical vapor deposition using a nucleation promoter and a growth inhibitor

Thermal atomic layer etching of germanium-rich SiGe using an oxidation and “conversion-etch” mechanism

Area-selective atomic layer deposition of noble metals: Polymerized fluorocarbon layers as effective growth inhibitors

Area-selective aerosol jet fog deposition: Advancing large-area and sustainable fabrication

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