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Journal Articles

Synthesis and characterization of CaSi2 films for hydrogenated 2D Si nanosheets

Ryota Takagaki, Chiaya Yamamoto, Junji Yamanaka, Keisuke Arimoto, Masashi Kurosawa, Kosuke O. Hara
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 053404 (2024)
https://doi.org/10.1116/6.0003627
Published: August 2024
View article titled, Synthesis and characterization of CaSi<sub>2</sub> films for hydrogenated 2D Si nanosheets
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Journal Articles

On the limitations of thermal atomic layer deposition of InN using ammonia

Editor’s Pick
Karl Rönnby, Henrik Pedersen, Lars Ojamäe
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 020401 (2023)
https://doi.org/10.1116/6.0002355
Published: February 2023
View article titled, On the limitations of thermal atomic layer deposition of InN using ammonia
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Includes: Supplementary data
Journal Articles

Atomic layer deposition of titanium phosphate onto reinforcing fibers using titanium tetrachloride, water, and tris(trimethylsilyl) phosphate as precursors

Pauline Dill, Xiang Ren, Helen Hintersatz, Mathias Franz, Doreen Dentel, Christoph Tegenkamp, Susann Ebert
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 022403 (2022)
https://doi.org/10.1116/6.0001514
Published: January 2022
View article titled, Atomic layer deposition of titanium phosphate onto reinforcing fibers using titanium tetrachloride, water, and tris(trimethylsilyl) phosphate as precursors
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Includes: Supplementary data
Journal Articles

Kinetics of the low-pressure chemical vapor deposited tungsten nitride process using tungsten hexafluoride and ammonia precursors

Johan G. Hulkko, Katalin Böőr, Ren Qiu, Olof Bäcke, Mats Boman, Mats Halvarsson, Erik Lindahl
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 063403 (2021)
https://doi.org/10.1116/6.0001093
Published: September 2021
View article titled, Kinetics of the low-pressure chemical vapor deposited tungsten nitride process using tungsten hexafluoride and ammonia precursors
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Journal Articles

Atomic layer deposition onto fabrics of carbon and silicon carbide fibers: Preparation of multilayers comprising alumina, titania-furfuryl alcohol hybrid, and titanium phosphate

Scilight
Pauline Dill, Florian Pachel, Christian Militzer, Alexander Held, Georg Puchas, Stefan Knohl, Walter Krenkel, Christoph Tegenkamp, Werner Andreas Goedel
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 052406 (2021)
https://doi.org/10.1116/6.0001193
Published: August 2021
View article titled, Atomic layer deposition onto fabrics of carbon and silicon carbide fibers: Preparation of multilayers comprising alumina, titania-furfuryl alcohol hybrid, and titanium phosphate
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Includes: Supplementary data
Journal Articles

Role of sublimation kinetics of ammonia borane in chemical vapor deposition of uniform, large-area hexagonal boron nitride

Balaji Sompalle, Chun-Da Liao, Bin Wei, Maria de Fátima Cerqueira, Nicoleta Nicoara, Zhongchang Wang, Sascha Sadewasser, Pedro Alpuim
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 042202 (2021)
https://doi.org/10.1116/6.0000987
Published: June 2021
View article titled, Role of sublimation kinetics of ammonia borane in chemical vapor deposition of uniform, large-area hexagonal boron nitride
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Includes: Supplementary data
Journal Articles

Chemical vapor deposition of sp2-boron nitride on Si(111) substrates from triethylboron and ammonia: Effect of surface treatments

Laurent Souqui, Henrik Pedersen, Hans Högberg
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 043402 (2020)
https://doi.org/10.1116/1.5145287
Published: May 2020
View article titled, Chemical vapor deposition of sp<sup>2</sup>-boron nitride on Si(111) substrates from triethylboron and ammonia: Effect of surface treatments
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Includes: Supplementary data
Journal Articles

In situ x-ray photoelectron spectroscopy study of lithium carbonate removal from garnet-type solid-state electrolyte using ultra high vacuum techniques

Jessica C. Jones, Sathish Rajendran, Aparna Pilli, Veronica Lee, Natasha Chugh, Leela Mohana Reddy Arava, Jeffry A. Kelber
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 023201 (2020)
https://doi.org/10.1116/1.5128102
Published: January 2020
View article titled, <em>In situ</em> x-ray photoelectron spectroscopy study of lithium carbonate removal from garnet-type solid-state electrolyte using ultra high vacuum techniques
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Includes: Supplementary data
Journal Articles

Low temperature chemical vapor deposition of superconducting vanadium nitride thin films

Elham Mohimi, Zhejun V. Zhang, Justin L. Mallek, Sumeng Liu, Brian B. Trinh, Pralav P. Shetty, Gregory S. Girolami, John R. Abelson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 031509 (2019)
https://doi.org/10.1116/1.5088050
Published: April 2019
View article titled, Low temperature chemical vapor deposition of superconducting vanadium nitride thin films
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Journal Articles

Formation of highly conformal spinel lithium titanate thin films based on a novel three-step atomic layer deposition process

Sascha Bönhardt, Kati Kühnel, Alireza M. Kia, Wenke Weinreich
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 031508 (2019)
https://doi.org/10.1116/1.5082275
Published: April 2019
View article titled, Formation of highly conformal spinel lithium titanate thin films based on a novel three-step atomic layer deposition process
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Journal Articles

Atomic layer deposition of InN using trimethylindium and ammonia plasma

Petro Deminskyi, Polla Rouf, Ivan G. Ivanov, Henrik Pedersen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 020926 (2019)
https://doi.org/10.1116/1.5079279
Published: February 2019
View article titled, Atomic layer deposition of InN using trimethylindium and ammonia plasma
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Includes: Supplementary data
Journal Articles

Batch processing of aluminum nitride by atomic layer deposition from AlCl3 and NH3

Zhenzi Chen, Zhen Zhu, Kari Härkönen, Emma Salmi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 020925 (2019)
https://doi.org/10.1116/1.5079509
Published: February 2019
View article titled, Batch processing of aluminum nitride by atomic layer deposition from AlCl<sub>3</sub> and NH<sub>3</sub>
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Journal Articles

Thermal chemical vapor deposition of epitaxial rhombohedral boron nitride from trimethylboron and ammonia

Laurent Souqui, Henrik Pedersen, Hans Högberg
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 020603 (2019)
https://doi.org/10.1116/1.5085192
Published: February 2019
View article titled, Thermal chemical vapor deposition of epitaxial rhombohedral boron nitride from trimethylboron and ammonia
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Includes: Supplementary data
Journal Articles

Hydrocarbon catalyzed-selective catalytic reduction catalysts using core-shell atomic layer deposited CeO2 and ZrO2

David H. K. Jackson, Michael M. Schwartz, Chilan Ngo, Dustin Facteau, Svitlana Pylypenko, Christopher L. Marshall, Arrelaine A. Dameron
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 020919 (2019)
https://doi.org/10.1116/1.5078646
Published: February 2019
View article titled, Hydrocarbon catalyzed-selective catalytic reduction catalysts using core-shell atomic layer deposited CeO<sub>2</sub> and ZrO<sub>2</sub>
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Journal Articles

Low temperature chemical vapor deposition of superconducting molybdenum carbonitride thin films

Elham Mohimi, Kinsey Canova, Zhejun Zhang, Sumeng Liu, Justin L. Mallek, Gregory S. Girolami, John R. Abelson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 021503 (2019)
https://doi.org/10.1116/1.5079805
Published: January 2019
View article titled, Low temperature chemical vapor deposition of superconducting molybdenum carbonitride thin films
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Includes: Supplementary data
Journal Articles

Corrosion resistance of sintered SiC against fluorinated plasmas

Tetsuya Goto, Michito Miyahara, Masaru Sasaki, Shigetoshi Sugawa
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 061404 (2018)
https://doi.org/10.1116/1.5046792
Published: October 2018
View article titled, Corrosion resistance of sintered SiC against fluorinated plasmas
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Journal Articles

Area selective CVD of metallic films from molybdenum, iron, and ruthenium carbonyl precursors: Use of ammonia to inhibit nucleation on oxide surfaces

Editor’s Pick
Elham Mohimi, Zhejun V. Zhang, Sumeng Liu, Justin L. Mallek, Gregory S. Girolami, John R. Abelson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 041507 (2018)
https://doi.org/10.1116/1.5023236
Published: July 2018
View article titled, Area selective CVD of metallic films from molybdenum, iron, and ruthenium carbonyl precursors: Use of ammonia to inhibit nucleation on oxide surfaces
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Includes: Supplementary data
Journal Articles

Coefficient of thermal expansion and biaxial Young's modulus in Si-rich silicon nitride thin films

Scott Habermehl
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 021517 (2018)
https://doi.org/10.1116/1.5020432
Published: March 2018
View article titled, Coefficient of thermal expansion and biaxial Young's modulus in Si-rich silicon nitride thin films
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Journal Articles

Spatial atomic layer deposition for coating flexible porous Li-ion battery electrodes

Alexander S. Yersak, Kashish Sharma, Jasmine M. Wallas, Arrelaine A. Dameron, Xuemin Li, Yongan Yang, Katherine E. Hurst, Chunmei Ban, Robert C. Tenent, Steven M. George
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 01A123 (2018)
https://doi.org/10.1116/1.5006670
Published: December 2017
View article titled, Spatial atomic layer deposition for coating flexible porous Li-ion battery electrodes
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Journal Articles

Measurements and modeling of the impact of radical recombination on silicon nitride growth in microwave plasma assisted atomic layer deposition

Toshihiko Iwao, Peter L. G. Ventzek, Rochan Upadhyay, Laxminarayan L. Raja, Hirokazu Ueda, Kiyotaka Ishibashi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 01A111 (2018)
https://doi.org/10.1116/1.5003403
Published: December 2017
View article titled, Measurements and modeling of the impact of radical recombination on silicon nitride growth in microwave plasma assisted atomic layer deposition
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