Page 1 | Search Results | Journal of Vacuum Science & Technology A

1-20 of 27

Sort by

Sort Order Select

Journal Articles

Ambient pressure x-ray photoelectron spectroscopy study on the initial atomic layer deposition process of platinum

E. Kokkonen, H.-E. Nieminen, F. Rehman, V. Miikkulainen, M. Putkonen, M. Ritala, S. Huotari, J. Schnadt, S. Urpelainen

J. Vac. Sci. Technol. A 42, 062406 (2024)

https://doi.org/10.1116/6.0003871

Published: October 2024

View articletitled, Ambient pressure x-ray photoelectron spectroscopy study on the initial atomic layer deposition process of platinum

Journal Articles

Ultrathin ZrO₂ thickness control on TiO₂/ZrO₂ core/shell nanoparticles using ZrO₂ atomic layer deposition and etching

Janine D. Sempel, Marja-Leena Kaariainen, Troy A. Colleran, Alejo M. Lifschitz, Steven M. George

J. Vac. Sci. Technol. A 42, 052604 (2024)

https://doi.org/10.1116/6.0003781

Published: August 2024

View articletitled, Ultrathin ZrO2 thickness control on TiO2/ZrO2 core/shell nanoparticles using ZrO2 atomic layer deposition and etching

Journal Articles

Operando study of HfO₂ atomic layer deposition on partially hydroxylated Si(111)

Rosemary Jones, Giulio D’Acunto, Payam Shayesteh, Indiana Pinsard, François Rochet, Fabrice Bournel, Jean-Jacques Gallet, Ashley Head, Joachim Schnadt

J. Vac. Sci. Technol. A 42, 022404 (2024)

https://doi.org/10.1116/6.0003349

Published: February 2024

View articletitled, Operando study of HfO2 atomic layer deposition on partially hydroxylated Si(111)

Includes: Supplementary data

Journal Articles

Isotropic plasma-thermal atomic layer etching of superconducting titanium nitride films using sequential exposures of molecular oxygen and SF₆/H₂ plasma

Azmain A. Hossain, Haozhe Wang, David S. Catherall, Martin Leung, Harm C. M. Knoops, James R. Renzas, Austin J. Minnich

J. Vac. Sci. Technol. A 41, 062601 (2023)

https://doi.org/10.1116/6.0002965

Published: September 2023

View articletitled, Isotropic plasma-thermal atomic layer etching of superconducting titanium nitride films using sequential exposures of molecular oxygen and SF6/H2 plasma

Journal Articles

Comparison of BCl₃, TiCl₄, and SOCl₂ chlorinating agents for atomic layer etching of TiO₂ and ZrO₂ using tungsten hexafluoride

Holger Saare, Wenyi Xie, Gregory N. Parsons

J. Vac. Sci. Technol. A 41, 042602 (2023)

https://doi.org/10.1116/6.0002708

Published: June 2023

View articletitled, Comparison of BCl3, TiCl4, and SOCl2 chlorinating agents for atomic layer etching of TiO2 and ZrO2 using tungsten hexafluoride

Includes: Supplementary data

Journal Articles

Challenges in atomic layer etching of gallium nitride using surface oxidation and ligand-exchange

Daniel C. Messina, Kevin A. Hatch, Saurabh Vishwakarma, David J. Smith, Yuji Zhao, Robert J. Nemanich

J. Vac. Sci. Technol. A 41, 022603 (2023)

https://doi.org/10.1116/6.0002255

Published: March 2023

View articletitled, Challenges in atomic layer etching of gallium nitride using surface oxidation and ligand-exchange

Includes: Supplementary data

Journal Articles

Thermal atomic layer etching of VO₂ using sequential BCl₃ and SF₄ exposures: Observation of conversion, ligand-exchange, and oxidation state changes

Jonas C. Gertsch, Jonathan L. Partridge, Austin M. Cano, Joel W. Clancey, Victor M. Bright, Steven M. George

J. Vac. Sci. Technol. A 41, 012603 (2023)

https://doi.org/10.1116/6.0002149

Published: January 2023

View articletitled, Thermal atomic layer etching of VO2 using sequential BCl3 and SF4 exposures: Observation of conversion, ligand-exchange, and oxidation state changes

Includes: Supplementary data

Journal Articles

Surface reaction modelling of thermal atomic layer etching on blanket hafnium oxide and its application on high aspect ratio structures

Andreas Fischer, David Mui, Aaron Routzahn, Ryan Gasvoda, Jim Sims, Thorsten Lill

J. Vac. Sci. Technol. A 41, 012601 (2023)

https://doi.org/10.1116/6.0002244

Published: December 2022

View articletitled, Surface reaction modelling of thermal atomic layer etching on blanket hafnium oxide and its application on high aspect ratio structures

Journal Articles

Plasma-enhanced atomic layer deposition of WO₃-SiO₂ films using a heteronuclear precursor

Kamesh Mullapudi, Konner E. K. Holden, Jessica L. Peterson, Charles L. Dezelah, Daniel F. Moser, Ravindra K. Kanjolia, Douglas J. Tweet, John F. Conley, Jr

J. Vac. Sci. Technol. A 41, 012406 (2023)

https://doi.org/10.1116/6.0002214

Published: December 2022

View articletitled, Plasma-enhanced atomic layer deposition of WO3-SiO2 films using a heteronuclear precursor

Includes: Supplementary data

Journal Articles

Plasma enhanced atomic layer deposition and atomic layer etching of gallium oxide using trimethylgallium

Kevin A. Hatch, Daniel C. Messina, Robert J. Nemanich

J. Vac. Sci. Technol. A 40, 042603 (2022)

https://doi.org/10.1116/6.0001871

Published: June 2022

View articletitled, Plasma enhanced atomic layer deposition and atomic layer etching of gallium oxide using trimethylgallium

Journal Articles

Atomic layer etching of Al₂O₃ with NF₃ plasma fluorination and trimethylaluminum ligand exchange

Jihyun Kim, Dahee Shim, Yongjae Kim, Heeyeop Chae

J. Vac. Sci. Technol. A 40, 032603 (2022)

https://doi.org/10.1116/6.0001616

Published: April 2022

View articletitled, Atomic layer etching of Al2O3 with NF3 plasma fluorination and trimethylaluminum ligand exchange

Journal Articles

Control of etch profiles in high aspect ratio holes via precise reactant dosing in thermal atomic layer etching

Andreas Fischer, Aaron Routzahn, Ryan J. Gasvoda, Jim Sims, Thorsten Lill

J. Vac. Sci. Technol. A 40, 022603 (2022)

https://doi.org/10.1116/6.0001691

Published: February 2022

View articletitled, Control of etch profiles in high aspect ratio holes via precise reactant dosing in thermal atomic layer etching

Journal Articles

Thermal atomic layer etching of amorphous and crystalline Al₂O₃ films

Jessica A. Murdzek, Adarsh Rajashekhar, Raghuveer S. Makala, Steven M. George

J. Vac. Sci. Technol. A 39, 042602 (2021)

https://doi.org/10.1116/6.0000995

Published: June 2021

View articletitled, Thermal atomic layer etching of amorphous and crystalline Al2O3 films

Journal Articles

Surface reaction of the hafnium precursor with a linked amido-cyclopentadienyl ligand: A density functional theory study

Romel Hidayat, Hye-Lee Kim, Hohoon Kim, Younghun Byun, Jongsoo Lee, Won-Jun Lee

J. Vac. Sci. Technol. A 39, 032410 (2021)

https://doi.org/10.1116/6.0000796

Published: March 2021

View articletitled, Surface reaction of the hafnium precursor with a linked amido-cyclopentadienyl ligand: A density functional theory study

Includes: Supplementary data

Journal Articles

Thermal atomic layer etching: A review

Andreas Fischer, Aaron Routzahn, Steven M. George, Thorsten Lill

J. Vac. Sci. Technol. A 39, 030801 (2021)

https://doi.org/10.1116/6.0000894

Published: March 2021

View articletitled, Thermal atomic layer etching: A review

Journal Articles

Causes of anisotropy in thermal atomic layer etching of nanostructures

Andreas Fischer, Aaron Routzahn, Sandy Wen, Thorsten Lill

J. Vac. Sci. Technol. A 38, 042601 (2020)

https://doi.org/10.1116/6.0000261

Published: June 2020

View articletitled, Causes of anisotropy in thermal atomic layer etching of nanostructures

Journal Articles

Effect of crystallinity on thermal atomic layer etching of hafnium oxide, zirconium oxide, and hafnium zirconium oxide

Jessica A. Murdzek, Steven M. George

J. Vac. Sci. Technol. A 38, 022608 (2020)

https://doi.org/10.1116/1.5135317

Published: February 2020

View articletitled, Effect of crystallinity on thermal atomic layer etching of hafnium oxide, zirconium oxide, and hafnium zirconium oxide

Journal Articles

Thermal etching of AlF₃ and thermal atomic layer etching of Al₂O₃

Andreas Fischer, Aaron Routzahn, Younghee Lee, Thorsten Lill, Steven M. George

J. Vac. Sci. Technol. A 38, 022603 (2020)

https://doi.org/10.1116/1.5135911

Published: January 2020

View articletitled, Thermal etching of AlF3 and thermal atomic layer etching of Al2O3

Journal Articles

Surface reaction mechanisms during atomic layer deposition of zirconium oxide using water, ethanol, and water-ethanol mixture as the oxygen sources

Wanxing Xu, Paul C. Lemaire, Kashish Sharma, Dennis M. Hausmann, Sumit Agarwal

J. Vac. Sci. Technol. A 38, 012401 (2020)

https://doi.org/10.1116/1.5122994

Published: December 2019

View articletitled, Surface reaction mechanisms during atomic layer deposition of zirconium oxide using water, ethanol, and water-ethanol mixture as the oxygen sources

Journal Articles

Real-time in situ ellipsometric monitoring of aluminum nitride film growth via hollow-cathode plasma-assisted atomic layer deposition

Adnan Mohammad, Deepa Shukla, Saidjafarzoda Ilhom, Brian Willis, Blaine Johs, Ali Kemal Okyay, Necmi Biyikli

J. Vac. Sci. Technol. A 37, 020927 (2019)

https://doi.org/10.1116/1.5085341

Published: February 2019

View articletitled, Real-time in situ ellipsometric monitoring of aluminum nitride film growth via hollow-cathode plasma-assisted atomic layer deposition

Includes: Supplementary data

Update search

NARROW

Format

Collections

Topics

Subjects

Journal

Article Type

Issue Section

Date

Availability

Ambient pressure x-ray photoelectron spectroscopy study on the initial atomic layer deposition process of platinum

Ultrathin ZrO₂ thickness control on TiO₂/ZrO₂ core/shell nanoparticles using ZrO₂ atomic layer deposition and etching

Operando study of HfO₂ atomic layer deposition on partially hydroxylated Si(111)

Isotropic plasma-thermal atomic layer etching of superconducting titanium nitride films using sequential exposures of molecular oxygen and SF₆/H₂ plasma

Comparison of BCl₃, TiCl₄, and SOCl₂ chlorinating agents for atomic layer etching of TiO₂ and ZrO₂ using tungsten hexafluoride

Challenges in atomic layer etching of gallium nitride using surface oxidation and ligand-exchange

Thermal atomic layer etching of VO₂ using sequential BCl₃ and SF₄ exposures: Observation of conversion, ligand-exchange, and oxidation state changes

Surface reaction modelling of thermal atomic layer etching on blanket hafnium oxide and its application on high aspect ratio structures

Plasma-enhanced atomic layer deposition of WO₃-SiO₂ films using a heteronuclear precursor

Plasma enhanced atomic layer deposition and atomic layer etching of gallium oxide using trimethylgallium

Atomic layer etching of Al₂O₃ with NF₃ plasma fluorination and trimethylaluminum ligand exchange

Control of etch profiles in high aspect ratio holes via precise reactant dosing in thermal atomic layer etching

Thermal atomic layer etching of amorphous and crystalline Al₂O₃ films

Surface reaction of the hafnium precursor with a linked amido-cyclopentadienyl ligand: A density functional theory study

Thermal atomic layer etching: A review

Causes of anisotropy in thermal atomic layer etching of nanostructures

Effect of crystallinity on thermal atomic layer etching of hafnium oxide, zirconium oxide, and hafnium zirconium oxide

Thermal etching of AlF₃ and thermal atomic layer etching of Al₂O₃

Surface reaction mechanisms during atomic layer deposition of zirconium oxide using water, ethanol, and water-ethanol mixture as the oxygen sources

Real-time in situ ellipsometric monitoring of aluminum nitride film growth via hollow-cathode plasma-assisted atomic layer deposition

Resources

Explore

pubs.aip.org

Connect with AIP Publishing

Update search

Resources

Explore

pubs.aip.org

Connect with AIP Publishing

This Feature Is Available To Subscribers Only