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Journal Articles

Growth and optical properties of NiO thin films deposited by pulsed dc reactive magnetron sputtering

Faezeh A. F. Lahiji, Samiran Bairagi, Roger Magnusson, Mauricio A. Sortica, Daniel Primetzhofer, Erik Ekström, Biplab Paul, Arnaud le Febvrier, Per Eklund
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063402 (2023)
https://doi.org/10.1116/6.0002914
Published: September 2023
View article titled, Growth and optical properties of NiO thin films deposited by pulsed dc reactive magnetron sputtering
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Includes: Supplementary data
Journal Articles

Vertical NiO/β-Ga2O3 rectifiers grown by metalorganic chemical vapor deposition

Hsiao-Hsuan Wan, Jian-Sian Li, Chao-Ching Chiang, Fan Ren, Timothy Jinsoo Yoo, Honggyu Kim, Andrei Osinsky, Fikadu Alema, Stephen J. Pearton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 052707 (2023)
https://doi.org/10.1116/6.0002884
Published: August 2023
View article titled, Vertical NiO/β-Ga<sub>2</sub>O<sub>3</sub> rectifiers grown by metalorganic chemical vapor deposition
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Journal Articles

Plasma deposited carbon containing zirconia films as thermal barriers

Vitali Bedarev, Philipp A. Maaß, Anna Thewes, Marc Böke, Achim von Keudell
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053001 (2023)
https://doi.org/10.1116/6.0002745
Published: July 2023
View article titled, Plasma deposited carbon containing zirconia films as thermal barriers
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Journal Articles

Foldable electrochromic NiO films

Xi Su, Zexin Tu, Liwei Ji, Hao Wu, Hongxing Xu, Chang Liu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 043414 (2023)
https://doi.org/10.1116/6.0002742
Published: June 2023
View article titled, Foldable electrochromic NiO films
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Journal Articles

Effect of drift layer doping and NiO parameters in achieving 8.9 kV breakdown in 100 μm diameter and 4 kV/4 A in 1 mm diameter NiO/β-Ga2O3 rectifiers

Jian-Sian Li, Chao-Ching Chiang, Xinyi Xia, Hsiao-Hsuan Wan, Fan Ren, S. J. Pearton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 043404 (2023)
https://doi.org/10.1116/6.0002722
Published: June 2023
View article titled, Effect of drift layer doping and NiO parameters in achieving 8.9 kV breakdown in 100 <em>μ</em>m diameter and 4 kV/4 A in 1 mm diameter NiO/β-Ga<sub>2</sub>O<sub>3</sub> rectifiers
Open the PDF for Effect of drift layer doping and NiO parameters in achieving 8.9 kV breakdown in 100 <em>μ</em>m diameter and 4 kV/4 A in 1 mm diameter NiO/β-Ga<sub>2</sub>O<sub>3</sub> rectifiers in another window
Journal Articles

Modulation of the LaFeO3 film growth by the terrace width of SrTiO3 substrates

Zeguo Lin, Xiaofeng Xu, Xiaoran Liu, Jiandong Guo, Fang Yang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 043204 (2023)
https://doi.org/10.1116/6.0002579
Published: May 2023
View article titled, Modulation of the LaFeO<sub>3</sub> film growth by the terrace width of SrTiO<sub>3</sub> substrates
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Includes: Supplementary data
Journal Articles

7.5 kV, 6.2 GW cm−2 NiO/β-Ga2O3 vertical rectifiers with on–off ratio greater than 1013

Jian-Sian Li, Chao-Ching Chiang, Xinyi Xia, Hsiao-Hsuan Wan, Fan Ren, S. J. Pearton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 030401 (2023)
https://doi.org/10.1116/6.0002580
Published: April 2023
View article titled, 7.5 kV, 6.2 GW cm<sup>−2</sup> NiO/β-Ga<sub>2</sub>O<sub>3</sub> vertical rectifiers with on–off ratio greater than 10<sup>13</sup>
Open the PDF for 7.5 kV, 6.2 GW cm<sup>−2</sup> NiO/β-Ga<sub>2</sub>O<sub>3</sub> vertical rectifiers with on–off ratio greater than 10<sup>13</sup> in another window
Journal Articles

Low-temperature synthesis of crystalline vanadium oxide films using oxygen plasmas

Adnan Mohammad, Krishna D. Joshi, Dhan Rana, Saidjafarzoda Ilhom, Barrett Wells, Brian Willis, Boris Sinkovic, A. K. Okyay, Necmi Biyikli
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 032405 (2023)
https://doi.org/10.1116/6.0002383
Published: March 2023
View article titled, Low-temperature synthesis of crystalline vanadium oxide films using oxygen plasmas
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Includes: Supplementary data
Journal Articles

Area selective atomic layer deposition of SnO2 as an etch resist in fluorine based processes

Xin Yang, Himamshu Nallan, Brennan M. Coffey, John G. Ekerdt
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 032402 (2023)
https://doi.org/10.1116/6.0002429
Published: March 2023
View article titled, Area selective atomic layer deposition of SnO<sub>2</sub> as an etch resist in fluorine based processes
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Journal Articles

NiO/β-(AlxGa1−x)2O3/Ga2O3 heterojunction lateral rectifiers with reverse breakdown voltage >7 kV

Hsiao-Hsuan Wan, Jian-Sian Li, Chao-Ching Chiang, Xinyi Xia, Fan Ren, Hannah N. Masten, James Spencer Lundh, Joseph A. Spencer, Fikadu Alema, Andrei Osinsky, Alan G. Jacobs, Karl Hobart, Marko J. Tadjer, S. J. Pearton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 032701 (2023)
https://doi.org/10.1116/6.0002393
Published: March 2023
View article titled, NiO/β-(Al<em><sub>x</sub></em>Ga<sub>1−<em>x</em></sub>)<sub>2</sub>O<sub>3</sub>/Ga<sub>2</sub>O<sub>3</sub> heterojunction lateral rectifiers with reverse breakdown voltage &gt;7 kV
Open the PDF for NiO/β-(Al<em><sub>x</sub></em>Ga<sub>1−<em>x</em></sub>)<sub>2</sub>O<sub>3</sub>/Ga<sub>2</sub>O<sub>3</sub> heterojunction lateral rectifiers with reverse breakdown voltage >7 kV in another window
Journal Articles

Atomic layer deposition of Cu2O using copper acetylacetonate

Gabriel Bartholazzi, M. M. Shehata, Daniel H. Macdonald, Lachlan E. Black
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 022402 (2023)
https://doi.org/10.1116/6.0002238
Published: February 2023
View article titled, Atomic layer deposition of Cu<sub>2</sub>O using copper acetylacetonate
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Journal Articles

Surface reaction modelling of thermal atomic layer etching on blanket hafnium oxide and its application on high aspect ratio structures

Andreas Fischer, David Mui, Aaron Routzahn, Ryan Gasvoda, Jim Sims, Thorsten Lill
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 012601 (2023)
https://doi.org/10.1116/6.0002244
Published: December 2022
View article titled, Surface reaction modelling of thermal atomic layer etching on blanket hafnium oxide and its application on high aspect ratio structures
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Journal Articles

Deposition of sputtered NiO as a p-type layer for heterojunction diodes with Ga2O3

Jian-Sian Li, Xinyi Xia, Chao-Ching Chiang, David C. Hays, Brent P. Gila, Valentin Craciun, Fan Ren, S. J. Pearton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 013405 (2023)
https://doi.org/10.1116/6.0002250
Published: December 2022
View article titled, Deposition of sputtered NiO as a p-type layer for heterojunction diodes with Ga<sub>2</sub>O<sub>3</sub>
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Journal Articles

Type II band alignment of NiO/α-Ga2O3 for annealing temperatures up to 600 °C

Xinyi Xia, Jian-Sian Li, Chao-Ching Chiang, Timothy Jinsoo Yoo, Eitan Hershkovitz, Fan Ren, Honggyu Kim, Jihyun Kim, Dae-Woo Jeon, Ji-Hyeon Park, S. J. Pearton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 063408 (2022)
https://doi.org/10.1116/6.0002257
Published: November 2022
View article titled, Type II band alignment of NiO/α-Ga<sub>2</sub>O<sub>3</sub> for annealing temperatures up to 600 °C
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Journal Articles

Epitaxial growth of the first two members of the Ban+1InnO2.5n+1 Ruddlesden–Popper homologous series

Felix V. E. Hensling, Michelle A. Smeaton, Veronica Show, Kathy Azizie, Matthew R. Barone, Lena F. Kourkoutis, Darrell G. Schlom
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 062707 (2022)
https://doi.org/10.1116/6.0002205
Published: November 2022
View article titled, Epitaxial growth of the first two members of the Ba<sub><em>n</em>+1</sub>In<sub><em>n</em></sub>O<sub>2.5<em>n</em>+1</sub> Ruddlesden–Popper homologous series
Open the PDF for Epitaxial growth of the first two members of the Ba<sub><em>n</em>+1</sub>In<sub><em>n</em></sub>O<sub>2.5<em>n</em>+1</sub> Ruddlesden–Popper homologous series in another window
Includes: Supplementary data
Journal Articles

Temperature dependence of on–off ratio and reverse recovery time in NiO/β-Ga2O3 heterojunction rectifiers

Jian-Sian Li, Chao-Ching Chiang, Xinyi Xia, Fan Ren, S. J. Pearton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 063407 (2022)
https://doi.org/10.1116/6.0002186
Published: November 2022
View article titled, Temperature dependence of on–off ratio and reverse recovery time in NiO/β-Ga<sub>2</sub>O<sub>3</sub> heterojunction rectifiers
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Journal Articles

Low temperature, area-selective atomic layer deposition of NiO and Ni

Himamshu C. Nallan, Xin Yang, Brennan M. Coffey, John G. Ekerdt
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 062406 (2022)
https://doi.org/10.1116/6.0002068
Published: October 2022
View article titled, Low temperature, area-selective atomic layer deposition of NiO and Ni
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Journal Articles

Deposition of tungsten oxide films by reactive magnetron sputtering on different substrates

A. Hrubantova, R. Hippler, H. Wulff, M. Cada, J. Olejnicek, N. Nepomniashchaia, C. A. Helm, Z. Hubicka
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 063402 (2022)
https://doi.org/10.1116/6.0002012
Published: October 2022
View article titled, Deposition of tungsten oxide films by reactive magnetron sputtering on different substrates
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Journal Articles

Characterization of vacuum ultraviolet-irradiated surface modification of CoO(111) crystal by low-energy atom scattering spectroscopy

G. Tan, H. Fukuta, K. K. H. De Silva, A. Matsuda, M. Yoshimura, M. Yoshimoto, K. Umezawa
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 063202 (2022)
https://doi.org/10.1116/6.0001971
Published: September 2022
View article titled, Characterization of vacuum ultraviolet-irradiated surface modification of CoO(111) crystal by low-energy atom scattering spectroscopy
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Journal Articles

Germanium dioxide: A new rutile substrate for epitaxial film growth

Sieun Chae, Lucas A. Pressley, Hanjong Paik, Jiseok Gim, Don Werder, Berit H. Goodge, Lena F. Kourkoutis, Robert Hovden, Tyrel M. McQueen, Emmanouil Kioupakis, John T. Heron
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 050401 (2022)
https://doi.org/10.1116/6.0002011
Published: August 2022
View article titled, Germanium dioxide: A new rutile substrate for epitaxial film growth
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