1-20 of 449
Ion source
Close
Save search
Follow your search
Access your saved searches in your account
Close Modal
Sort by
Journal Articles

Characterization of a broad beam Kaufman-type ion source operated with CHF3 and O2

Gregor Dornberg, Erik Rohkamm, Peter Birtel, Frank Scholze, Frank Frost
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053104 (2023)
https://doi.org/10.1116/6.0002766
Published: July 2023
View article titled, Characterization of a broad beam Kaufman-type ion source operated with CHF<sub>3</sub> and O<sub>2</sub>
Open the PDF for Characterization of a broad beam Kaufman-type ion source operated with CHF<sub>3</sub> and O<sub>2</sub> in another window
Includes: Supplementary data
Journal Articles

Study on etch characteristics of magnetic tunnel junction materials using rf-biased H2/NH3 reactive ion beam

Ye Eun Kim, Doo San Kim, Yun Jong Jang, Hong Seong Gil, Ho Seop Jeon, Jong Woo Hong, In Ho Kim, Cheol Kim, Jeong-Heon Park, Geun Young Yeom
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 033005 (2023)
https://doi.org/10.1116/6.0002465
Published: April 2023
View article titled, Study on etch characteristics of magnetic tunnel junction materials using rf-biased H<sub>2</sub>/NH<sub>3</sub> reactive ion beam
Open the PDF for Study on etch characteristics of magnetic tunnel junction materials using rf-biased H<sub>2</sub>/NH<sub>3</sub> reactive ion beam in another window
Journal Articles

Practical guide to understanding goodness-of-fit metrics used in chemical state modeling of x-ray photoelectron spectroscopy data by synthetic line shapes using nylon as an example

Neal Fairley, Pascal Bargiela, Adam Roberts, Vincent Fernandez, Jonas Baltrusaitis
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 013203 (2023)
https://doi.org/10.1116/6.0002196
Published: December 2022
View article titled, Practical guide to understanding goodness-of-fit metrics used in chemical state modeling of x-ray photoelectron spectroscopy data by synthetic line shapes using nylon as an example
Open the PDF for Practical guide to understanding goodness-of-fit metrics used in chemical state modeling of x-ray photoelectron spectroscopy data by synthetic line shapes using nylon as an example in another window
Includes: Supplementary data
Journal Articles

Negative ion beam bombardment of a protic ionic liquid: Alleviating surface charging and damage and analyzing the surface of organic insulating materials

Yukio Fujiwara, Naoaki Saito
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 053203 (2022)
https://doi.org/10.1116/6.0001999
Published: August 2022
View article titled, Negative ion beam bombardment of a protic ionic liquid: Alleviating surface charging and damage and analyzing the surface of organic insulating materials
Open the PDF for Negative ion beam bombardment of a protic ionic liquid: Alleviating surface charging and damage and analyzing the surface of organic insulating materials in another window
Journal Articles

Negative-cluster ion beam production from the tip of a sharp needle: Suppression of surface charging and surface analysis of an insulated sample

Yukio Fujiwara, Naoaki Saito
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 063218 (2021)
https://doi.org/10.1116/6.0001431
Published: October 2021
View article titled, Negative-cluster ion beam production from the tip of a sharp needle: Suppression of surface charging and surface analysis of an insulated sample
Open the PDF for Negative-cluster ion beam production from the tip of a sharp needle: Suppression of surface charging and surface analysis of an insulated sample in another window
Includes: Supplementary data
Journal Articles

Quantitative depth profiling of Al in SiC using time of flight–secondary ion mass spectroscopy

Vincent S. Smentkowski, Shubhodeep Goswami
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 033204 (2021)
https://doi.org/10.1116/6.0000905
Published: April 2021
View article titled, Quantitative depth profiling of Al in SiC using time of flight–secondary ion mass spectroscopy
Open the PDF for Quantitative depth profiling of Al in SiC using time of flight–secondary ion mass spectroscopy in another window
Journal Articles

Properties of indium tin oxide thin films grown by Ar ion beam sputter deposition

Carsten Bundesmann, Jens Bauer, Annemarie Finzel, Jürgen W. Gerlach, Wolfgang Knolle, Anke Hellmich, Ron Synowicki
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 033406 (2021)
https://doi.org/10.1116/6.0000917
Published: March 2021
View article titled, Properties of indium tin oxide thin films grown by Ar ion beam sputter deposition
Open the PDF for Properties of indium tin oxide thin films grown by Ar ion beam sputter deposition in another window
Journal Articles

Effect of a low pressure low temperature hydrogen plasma on the work function of europium

Sofia Cristofaro, Roland Friedl, Ursel Fantz
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 063002 (2020)
https://doi.org/10.1116/6.0000461
Published: October 2020
View article titled, Effect of a low pressure low temperature hydrogen plasma on the work function of europium
Open the PDF for Effect of a low pressure low temperature hydrogen plasma on the work function of europium in another window
Journal Articles

Sample handling, preparation and mounting for XPS and other surface analytical techniques

Fred A. Stevie, Roberto Garcia, Jeffrey Shallenberger, John G. Newman, Carrie L. Donley
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 063202 (2020)
https://doi.org/10.1116/6.0000421
Published: September 2020
View article titled, Sample handling, preparation and mounting for XPS and other surface analytical techniques
Open the PDF for Sample handling, preparation and mounting for XPS and other surface analytical techniques in another window
Journal Articles

Plasma resistance of sintered and ion-plated yttrium oxyfluorides with various Y, O, and F composition ratios for use in plasma process chamber

Tetsuya Goto, Yoshinobu Shiba, Akinobu Teramoto, Yukio Kishi, Shigetoshi Sugawa
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 043003 (2020)
https://doi.org/10.1116/1.5142515
Published: June 2020
View article titled, Plasma resistance of sintered and ion-plated yttrium oxyfluorides with various Y, O, and F composition ratios for use in plasma process chamber
Open the PDF for Plasma resistance of sintered and ion-plated yttrium oxyfluorides with various Y, O, and F composition ratios for use in plasma process chamber in another window
Journal Articles

XPS guide: Charge neutralization and binding energy referencing for insulating samples

Donald R. Baer, Kateryna Artyushkova, Hagai Cohen, Christopher D. Easton, Mark Engelhard, Thomas R. Gengenbach, Grzegorz Greczynski, Paul Mack, David J. Morgan, Adam Roberts
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 031204 (2020)
https://doi.org/10.1116/6.0000057
Published: April 2020
View article titled, XPS guide: Charge neutralization and binding energy referencing for insulating samples
Open the PDF for XPS guide: Charge neutralization and binding energy referencing for insulating samples in another window
Journal Articles

Properties of secondary particles for ion beam sputtering of silicon using low-energy oxygen ions

Kyunghwan Oh, Dmitry Kalanov, André Anders, Carsten Bundesmann
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 033011 (2020)
https://doi.org/10.1116/6.0000037
Published: April 2020
View article titled, Properties of secondary particles for ion beam sputtering of silicon using low-energy oxygen ions
Open the PDF for Properties of secondary particles for ion beam sputtering of silicon using low-energy oxygen ions in another window
Journal Articles

Properties of secondary particles for the reactive ion beam sputtering of Ti and TiO2 using oxygen ions

Thomas Amelal, Lukas Pietzonka, Erik Rohkamm, Carsten Bundesmann
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 033403 (2020)
https://doi.org/10.1116/1.5142911
Published: March 2020
View article titled, Properties of secondary particles for the reactive ion beam sputtering of Ti and TiO<sub>2</sub> using oxygen ions
Open the PDF for Properties of secondary particles for the reactive ion beam sputtering of Ti and TiO<sub>2</sub> using oxygen ions in another window
Journal Articles

Limited dose and angle-directed beam atomic layer etching and atomic layer deposition processes for localized film coatings on 3D sidewall structures

Thomas E. Seidel, Michael I. Current
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 022602 (2020)
https://doi.org/10.1116/1.5133953
Published: January 2020
View article titled, Limited dose and angle-directed beam atomic layer etching and atomic layer deposition processes for localized film coatings on 3D sidewall structures
Open the PDF for Limited dose and angle-directed beam atomic layer etching and atomic layer deposition processes for localized film coatings on 3D sidewall structures in another window
Journal Articles

Effect of two-step post-treatment on optical properties, microstructure, and nanosecond laser damage threshold of HfO2/TiO2/SiO2 multilayer high reflection films

Sida Mao, Jie Fan, Yonggang Zou, Yunping Lan, Yingtian Xu, Jiabin Zhang, Jianing Dong, Xiaohui Ma
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 061503 (2019)
https://doi.org/10.1116/1.5116294
Published: October 2019
View article titled, Effect of two-step post-treatment on optical properties, microstructure, and nanosecond laser damage threshold of HfO<sub>2</sub>/TiO<sub>2</sub>/SiO<sub>2</sub> multilayer high reflection films
Open the PDF for Effect of two-step post-treatment on optical properties, microstructure, and nanosecond laser damage threshold of HfO<sub>2</sub>/TiO<sub>2</sub>/SiO<sub>2</sub> multilayer high reflection films in another window
Journal Articles

Ion beam sputtering of silicon: Energy distributions of sputtered and scattered ions

Dmitry Kalanov, André Anders, Carsten Bundesmann
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 051507 (2019)
https://doi.org/10.1116/1.5114973
Published: August 2019
View article titled, Ion beam sputtering of silicon: Energy distributions of sputtered and scattered ions
Open the PDF for Ion beam sputtering of silicon: Energy distributions of sputtered and scattered ions in another window
Journal Articles

Reactive ion beam sputtering of Ti: Influence of process parameters on angular and energy distribution of sputtered and backscattered particles

Thomas Lautenschläger, Carsten Bundesmann
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 041001 (2017)
https://doi.org/10.1116/1.4985050
Published: June 2017
View article titled, Reactive ion beam sputtering of Ti: Influence of process parameters on angular and energy distribution of sputtered and backscattered particles
Open the PDF for Reactive ion beam sputtering of Ti: Influence of process parameters on angular and energy distribution of sputtered and backscattered particles in another window
Journal Articles

Vacuum properties and operation stability of the radio-frequency quadrupole accelerator in Japan Proton Accelerator Research Complex linac

Takatoshi Morishita, Yasuhiro Kondo, Hidetomo Oguri, Kazuo Hasegawa
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 041602 (2017)
https://doi.org/10.1116/1.4983527
Published: May 2017
View article titled, Vacuum properties and operation stability of the radio-frequency quadrupole accelerator in Japan Proton Accelerator Research Complex linac
Open the PDF for Vacuum properties and operation stability of the radio-frequency quadrupole accelerator in Japan Proton Accelerator Research Complex linac in another window
Journal Articles

Effects of hydrogen ion irradiation on zinc oxide etching

Hu Li, Kazuhiro Karahashi, Pascal Friederich, Karin Fink, Masanaga Fukasawa, Akiko Hirata, Kazunori Nagahata, Tetsuya Tatsumi, Wolfgang Wenzel, Satoshi Hamaguchi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 05C303 (2017)
https://doi.org/10.1116/1.4982715
Published: May 2017
View article titled, Effects of hydrogen ion irradiation on zinc oxide etching
Open the PDF for Effects of hydrogen ion irradiation on zinc oxide etching in another window
Journal Articles

Ion beam assisted organic chemical vapor etch of magnetic thin films

Jack Kun-Chieh Chen, Taeseung Kim, Nicholas D. Altieri, Ernest Chen, Jane P. Chang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 031304 (2017)
https://doi.org/10.1116/1.4978553
Published: March 2017
View article titled, Ion beam assisted organic chemical vapor etch of magnetic thin films
Open the PDF for Ion beam assisted organic chemical vapor etch of magnetic thin films in another window