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Journal Articles

Surface modification of Al-15Al₂O₃-0.3G powder metallurgical alloy induced by high-current pulsed electron beam

Lei Wang, Bo Gao, Huanfeng Zhang, Wenhuan Shen, Zhuang Liu, Haiyang Fu, Xin Lan

J. Vac. Sci. Technol. A 42, 053106 (2024)

https://doi.org/10.1116/6.0003686

Published: August 2024

View article titled, Surface modification of Al-15Al2O3-0.3G powder metallurgical alloy induced by high-current pulsed electron beam

Journal Articles

Electron beam-induced etching of SiO₂, Si₃N₄, and poly-Si assisted by CF₄/O₂ remote plasma

Kang-Yi Lin, Christian Preischl, Christian Felix Hermanns, Daniel Rhinow, Hans-Michael Solowan, Michael Budach, Hubertus Marbach, Klaus Edinger, G. S. Oehrlein

J. Vac. Sci. Technol. A 41, 013004 (2023)

https://doi.org/10.1116/6.0002234

Published: December 2022

View article titled, Electron beam-induced etching of SiO2, Si3N4, and poly-Si assisted by CF4/O2 remote plasma

Journal Articles

SiO₂ etching and surface evolution using combined exposure to CF₄/O₂ remote plasma and electron beam

Kang-Yi Lin, Christian Preischl, Christian Felix Hermanns, Daniel Rhinow, Hans-Michael Solowan, Michael Budach, Klaus Edinger, G. S. Oehrlein

J. Vac. Sci. Technol. A 40, 063004 (2022)

https://doi.org/10.1116/6.0002038

Published: October 2022

View article titled, SiO2 etching and surface evolution using combined exposure to CF4/O2 remote plasma and electron beam

Journal Articles

Etching with electron beam-generated plasmas: Selectivity versus ion energy in silicon-based films

S. G. Walton, D. R. Boris, S. G. Rosenberg, H. Miyazoe, E. A. Joseph, S. U. Engelmann

J. Vac. Sci. Technol. A 39, 033002 (2021)

https://doi.org/10.1116/6.0000868

Published: March 2021

View article titled, Etching with electron beam-generated plasmas: Selectivity versus ion energy in silicon-based films

Journal Articles

Design and implementation of floating field ring edge termination on vertical geometry β-Ga₂O₃ rectifiers

Ribhu Sharma, Minghan Xian, Mark E. Law, Marko Tadjer, Fan Ren, Stephen J. Pearton

J. Vac. Sci. Technol. A 38, 063414 (2020)

https://doi.org/10.1116/6.0000693

Published: November 2020

View article titled, Design and implementation of floating field ring edge termination on vertical geometry β-Ga2O3 rectifiers

Journal Articles

Electron beam injection from a hollow cathode plasma into a downstream reactive environment: Characterization of secondary plasma production and Si₃N₄ and Si etching

Chen Li, Valery Godyak, Thorsten Hofmann, Klaus Edinger, Gottlieb S. Oehrlein

J. Vac. Sci. Technol. A 38, 033001 (2020)

https://doi.org/10.1116/1.5143537

Published: March 2020

View article titled, Electron beam injection from a hollow cathode plasma into a downstream reactive environment: Characterization of secondary plasma production and Si3N4 and Si etching

Journal Articles

Growth of cobalt films at room temperature using sequential exposures of cobalt tricarbonyl nitrosyl and low energy electrons

Zachary C. Sobell, Andrew S. Cavanagh, Steven M. George

J. Vac. Sci. Technol. A 37, 060906 (2019)

https://doi.org/10.1116/1.5113711

Published: October 2019

View article titled, Growth of cobalt films at room temperature using sequential exposures of cobalt tricarbonyl nitrosyl and low energy electrons

Journal Articles

Effect of two-step post-treatment on optical properties, microstructure, and nanosecond laser damage threshold of HfO₂/TiO₂/SiO₂ multilayer high reflection films

Sida Mao, Jie Fan, Yonggang Zou, Yunping Lan, Yingtian Xu, Jiabin Zhang, Jianing Dong, Xiaohui Ma

J. Vac. Sci. Technol. A 37, 061503 (2019)

https://doi.org/10.1116/1.5116294

Published: October 2019

View article titled, Effect of two-step post-treatment on optical properties, microstructure, and nanosecond laser damage threshold of HfO2/TiO2/SiO2 multilayer high reflection films

Journal Articles

Precise control of ion and radical production using electron beam generated plasmas

David R. Boris, Scott G. Walton

J. Vac. Sci. Technol. A 36, 060601 (2018)

https://doi.org/10.1116/1.5053615

Published: October 2018

View article titled, Precise control of ion and radical production using electron beam generated plasmas

Journal Articles

Plasma assisted low temperature electron beam deposited NiO thin films for electro-optic applications

Mustafa Burak Cosar, Kerem Cagatay Icli, Macit Ozenbas

J. Vac. Sci. Technol. A 36, 031501 (2018)

https://doi.org/10.1116/1.5013126

Published: March 2018

View article titled, Plasma assisted low temperature electron beam deposited NiO thin films for electro-optic applications

Journal Articles

Residual stress measurements in electron beam evaporated yttria doped zirconia films deposited on Si (111) substrates

Kamalan Kirubaharan Amirtharaj Moses, Kuppusami Parasuraman, Sujay Chakravarty, Arul Maximus Rabel, Anandh Jesuraj Selvaraj, Akash Singh

J. Vac. Sci. Technol. A 36, 021504 (2018)

https://doi.org/10.1116/1.5004229

Published: December 2017

View article titled, Residual stress measurements in electron beam evaporated yttria doped zirconia films deposited on Si (111) substrates

Journal Articles

Epitaxial multilayers of β-FeSi₂ nanodots/Si for Si-based nanostructured electronic materials

Shunya Sakane, Masayuki Isogawa, Kentaro Watanabe, Jun Kikkawa, Shotaro Takeuchi, Akira Sakai, Yoshiaki Nakamura

J. Vac. Sci. Technol. A 35, 041402 (2017)

https://doi.org/10.1116/1.4984107

Published: June 2017

View article titled, Epitaxial multilayers of β-FeSi2 nanodots/Si for Si-based nanostructured electronic materials

Journal Articles

Surface degradation of uranium tetrafluoride

J. G. Tobin, A. M. Duffin, S.-W. Yu, R. Qiao, W. L. Yang, C. H. Booth, D. K. Shuh

J. Vac. Sci. Technol. A 35, 03E108 (2017)

https://doi.org/10.1116/1.4979540

Published: March 2017

View article titled, Surface degradation of uranium tetrafluoride

Journal Articles

Plasma enhanced atomic layer deposition of Al₂O₃ gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments

Emanuela Schilirò, Patrick Fiorenza, Giuseppe Greco, Fabrizio Roccaforte, Raffaella Lo Nigro

J. Vac. Sci. Technol. A 35, 01B140 (2017)

https://doi.org/10.1116/1.4972257

Published: December 2016

View article titled, Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments

Journal Articles

Low-carbon steel ultra-high-vacuum Schottky emitter electron gun with double O-rings for axis adjustment

In-Yong Park, Boklae Cho

J. Vac. Sci. Technol. A 35, 020604 (2017)

https://doi.org/10.1116/1.4971413

Published: December 2016

View article titled, Low-carbon steel ultra-high-vacuum Schottky emitter electron gun with double O-rings for axis adjustment

Journal Articles

Atomic fluorine densities in electron beam generated plasmas: A high ion to radical ratio source for etching with atomic level precision

David R. Boris, Tzvetelina B. Petrova, George M. Petrov, Scott G. Walton

J. Vac. Sci. Technol. A 35, 01A104 (2017)

https://doi.org/10.1116/1.4971416

Published: December 2016

View article titled, Atomic fluorine densities in electron beam generated plasmas: A high ion to radical ratio source for etching with atomic level precision

Journal Articles

Defect analysis in low temperature atomic layer deposited Al₂O₃ and physical vapor deposited SiO barrier films and combination of both to achieve high quality moisture barriers

Tony Maindron, Tony Jullien, Agathe André

J. Vac. Sci. Technol. A 34, 031513 (2016)

https://doi.org/10.1116/1.4947289

Published: May 2016

View article titled, Defect analysis in low temperature atomic layer deposited Al2O3 and physical vapor deposited SiO barrier films and combination of both to achieve high quality moisture barriers

Journal Articles

National Synchrotron Light Source II storage ring vacuum systems

Hsiao-Chaun Hseuh, Charles Hetzel, Shuwei Leng, King Wilson, Huijuan Xu, Douglas Zigrosser

J. Vac. Sci. Technol. A 34, 031603 (2016)

https://doi.org/10.1116/1.4945406

Published: April 2016

View article titled, National Synchrotron Light Source II storage ring vacuum systems

Journal Articles

One-dimensional Ar-SF₆ hydromodel at low-pressure in e-beam generated plasmas

George M. Petrov, David R. Boris, Tzvetelina B. Petrova, Scott G. Walton

J. Vac. Sci. Technol. A 34, 021302 (2016)

https://doi.org/10.1116/1.4940885

Published: February 2016

View article titled, One-dimensional Ar-SF6 hydromodel at low-pressure in e-beam generated plasmas

Journal Articles

Structural and growth aspects of electron beam physical vapor deposited NiO-CeO₂ nanocomposite films

Sushil Kumar Kuanr, Suresh Babu K

J. Vac. Sci. Technol. A 34, 021507 (2016)

https://doi.org/10.1116/1.4937357

Published: December 2015

View article titled, Structural and growth aspects of electron beam physical vapor deposited NiO-CeO2 nanocomposite films

NARROW

Topics

Surface modification of Al-15Al₂O₃-0.3G powder metallurgical alloy induced by high-current pulsed electron beam

Electron beam-induced etching of SiO₂, Si₃N₄, and poly-Si assisted by CF₄/O₂ remote plasma

SiO₂ etching and surface evolution using combined exposure to CF₄/O₂ remote plasma and electron beam

Etching with electron beam-generated plasmas: Selectivity versus ion energy in silicon-based films

Design and implementation of floating field ring edge termination on vertical geometry β-Ga₂O₃ rectifiers

Electron beam injection from a hollow cathode plasma into a downstream reactive environment: Characterization of secondary plasma production and Si₃N₄ and Si etching

Growth of cobalt films at room temperature using sequential exposures of cobalt tricarbonyl nitrosyl and low energy electrons

Effect of two-step post-treatment on optical properties, microstructure, and nanosecond laser damage threshold of HfO₂/TiO₂/SiO₂ multilayer high reflection films

Precise control of ion and radical production using electron beam generated plasmas

Plasma assisted low temperature electron beam deposited NiO thin films for electro-optic applications

Residual stress measurements in electron beam evaporated yttria doped zirconia films deposited on Si (111) substrates

Epitaxial multilayers of β-FeSi₂ nanodots/Si for Si-based nanostructured electronic materials

Surface degradation of uranium tetrafluoride

Plasma enhanced atomic layer deposition of Al₂O₃ gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments

Low-carbon steel ultra-high-vacuum Schottky emitter electron gun with double O-rings for axis adjustment

Atomic fluorine densities in electron beam generated plasmas: A high ion to radical ratio source for etching with atomic level precision

Defect analysis in low temperature atomic layer deposited Al₂O₃ and physical vapor deposited SiO barrier films and combination of both to achieve high quality moisture barriers

National Synchrotron Light Source II storage ring vacuum systems

One-dimensional Ar-SF₆ hydromodel at low-pressure in e-beam generated plasmas

Structural and growth aspects of electron beam physical vapor deposited NiO-CeO₂ nanocomposite films

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