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Journal Articles

Effect of magnetic field on capacitively coupled plasma modulated by electron beam injection

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Minghan Yan, Tianxiang Zhang, Yanli Peng, Hao Wu, Shali Yang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 013005 (2025)
https://doi.org/10.1116/6.0004088
Published: January 2025
View articletitled, Effect of magnetic field on capacitively coupled plasma modulated by electron beam injection
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Journal Articles

Electron temperature and ion density distribution on a vertical section in a weakly magnetized inductively coupled plasma

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You He, Yi-Lang Jiang, Myoung-Jae Lee, Beom-Jun Seo, Ju-Ho Kim, Chin-Wook Chung
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 063004 (2024)
https://doi.org/10.1116/6.0003874
Published: November 2024
View articletitled, Electron temperature and ion density distribution on a vertical section in a weakly magnetized inductively coupled plasma
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Journal Articles

Effect of a DC gradient magnetic field on electron density in a weakly magnetized inductively coupled plasma

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You He, Yi-Lang Jiang, Myoung-Jae Lee, Min-Seok Kim, Beom-Jun Seo, Ju-Ho Kim, Chin-Wook Chung
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 063002 (2024)
https://doi.org/10.1116/6.0003851
Published: October 2024
View articletitled, Effect of a DC gradient magnetic field on electron density in a weakly magnetized inductively coupled plasma
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Journal Articles

Numerical study of the effects of discharge parameters on capacitively coupled plasma in a magnetic field

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Minghan Yan, Huanhuan Wu, Hao Wu, Yanli Peng, Shali Yang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 053007 (2024)
https://doi.org/10.1116/6.0003692
Published: September 2024
View articletitled, Numerical study of the effects of discharge parameters on capacitively coupled plasma in a magnetic field
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Journal Articles

Production of a high-density hydrogen plasma in a capacitively coupled RF discharge with a hollow cathode enclosed by magnets

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Yasunori Ohtsu, Takeshi Uchida, Ryohei Kuno, Julian Schulze
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 033011 (2024)
https://doi.org/10.1116/6.0003448
Published: April 2024
View articletitled, Production of a high-density hydrogen plasma in a capacitively coupled RF discharge with a hollow cathode enclosed by magnets
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Journal Articles

Selective mask deposition using SiCl4 plasma for highly selective etching process

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Miyako Matsui, Makoto Miura, Kenichi Kuwahara
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063002 (2023)
https://doi.org/10.1116/6.0002773
Published: September 2023
View articletitled, Selective mask deposition using SiCl4 plasma for highly selective etching process
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Journal Articles

Temporal evolution of the ion flux to the target in rotational RF multimagnetron plasma

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Yasunori Ohtsu, Koya Yasuda, Julian Schulze
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 053006 (2022)
https://doi.org/10.1116/6.0001994
Published: August 2022
View articletitled, Temporal evolution of the ion flux to the target in rotational RF multimagnetron plasma
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Journal Articles

Tunable emission from Eu:SiOxNy thin films prepared by integrated magnetron sputtering and plasma enhanced chemical vapor deposition

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Fahmida Azmi, Yuxuan Gao, Zahra Khatami, Peter Mascher
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 043402 (2022)
https://doi.org/10.1116/6.0001761
Published: May 2022
View articletitled, Tunable emission from Eu:SiOxNy thin films prepared by integrated magnetron sputtering and plasma enhanced chemical vapor deposition
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Journal Articles

Investigation of TiN film on an RF ceramic window by atomic layer deposition

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Zhen Peng, Gen Chen, Yan-Ping Zhao, Xin Zhang, Yun-Tao Song, Grigori Shirkov, Galina Karamysheva, Oleg Karamyshev, Luciano Calabretta, Antonio Caruso
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 052401 (2020)
https://doi.org/10.1116/6.0000159
Published: July 2020
View articletitled, Investigation of TiN film on an RF ceramic window by atomic layer deposition
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Includes: Supplementary data
Journal Articles

Influence of the microstructure on the diffusion barrier performance of Nb-based coatings for cyclotron targets

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Vincenzo Palmieri, Oscar Azzolini, Edoardo Bemporad, Daniele De Felicis, Richard R. Johnson, Marco Renzelli, Hanna Skliarova
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 051510 (2019)
https://doi.org/10.1116/1.5098168
Published: August 2019
View articletitled, Influence of the microstructure on the diffusion barrier performance of Nb-based coatings for cyclotron targets
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Journal Articles

Rotational cross-shaped magnetized radio-frequency sputtering plasma source for uniform circular target utilization

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Tsubasa Ide, Md. Amzad Hossain, Yutaro Nakamura, Yasunori Ohtsu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 061312 (2017)
https://doi.org/10.1116/1.4999221
Published: November 2017
View articletitled, Rotational cross-shaped magnetized radio-frequency sputtering plasma source for uniform circular target utilization
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Journal Articles

Plasma source development for fusion-relevant material testing

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John B. O. Caughman, Richard H. Goulding, Theodore M. Biewer, Timothy S. Bigelow, Ian H. Campbell, Juan Caneses, Stephanie J. Diem, Andy Fadnek, Dan T. Fehling, Ralph C. Isler, Elijah H. Martin, Chad M. Parish, Juergen Rapp, Kun Wang, Clyde J. Beers, David Donovan, Nischal Kafle, Holly B. Ray, Guinevere C. Shaw, Melissa A. Showers
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 03E114 (2017)
https://doi.org/10.1116/1.4982664
Published: May 2017
View articletitled, Plasma source development for fusion-relevant material testing
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Journal Articles

Improved inflection point method of emissive probe for accurate measurement of plasma potential

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Jian-quan Li, Jun Xu, Yu-jing Bai, Wen-qi Lu, You-nian Wang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 061304 (2016)
https://doi.org/10.1116/1.4964834
Published: October 2016
View articletitled, Improved inflection point method of emissive probe for accurate measurement of plasma potential
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Journal Articles

Electromagnetic simulation of helicon plasma antennas for their electrostatic shield design

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Yorgos Stratakos, Angelos Zeniou, Evangelos Gogolides
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 031307 (2016)
https://doi.org/10.1116/1.4945001
Published: April 2016
View articletitled, Electromagnetic simulation of helicon plasma antennas for their electrostatic shield design
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Includes: Supplementary data
Journal Articles

Pilot-scale electron cyclotron resonance-metal organic chemical vapor deposition system for the preparation of large-area fluorine-doped SnO2 thin films

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Bup Ju Jeon, Chairul Hudaya, Joong Kee Lee
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 031501 (2016)
https://doi.org/10.1116/1.4943389
Published: March 2016
View articletitled, Pilot-scale electron cyclotron resonance-metal organic chemical vapor deposition system for the preparation of large-area fluorine-doped SnO2 thin films
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Includes: Supplementary data
Journal Articles

Nitrogen mass transfer models for plasma-based low-energy ion implantation

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Bocong Zheng, Kesheng Wang, Zhipeng Zhang, Honglong Che, Mingkai Lei
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 021311 (2015)
https://doi.org/10.1116/1.4907713
Published: February 2015
View articletitled, Nitrogen mass transfer models for plasma-based low-energy ion implantation
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Journal Articles

Attenuation of wall disturbances in an electron cyclotron resonance oxygen–argon plasma using real time control

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Bernard Keville, Cezar Gaman, Yang Zhang, Anthony M. Holohan, Miles M. Turner, Stephen Daniels
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 32, 041301 (2014)
https://doi.org/10.1116/1.4879458
Published: May 2014
View articletitled, Attenuation of wall disturbances in an electron cyclotron resonance oxygen–argon plasma using real time control
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Journal Articles

Degradation of transparent conductive properties of undoped ZnO and Ga-doped ZnO films left in atmospheric ambient for several years and trials to recover initial conductance

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Housei Akazawa
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 32, 021512 (2014)
https://doi.org/10.1116/1.4866233
Published: February 2014
View articletitled, Degradation of transparent conductive properties of undoped ZnO and Ga-doped ZnO films left in atmospheric ambient for several years and trials to recover initial conductance
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Journal Articles

Ion optical effects in a low pressure rf plasma

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Hans Oechsner, Hubert Paulus
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 31, 061309 (2013)
https://doi.org/10.1116/1.4823104
Published: September 2013
View articletitled, Ion optical effects in a low pressure rf plasma
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Journal Articles

Impact of static magnetic fields on the radial line slot antenna plasma source

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Jun Yoshikawa, Peter L. G. Ventzek
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 31, 031306 (2013)
https://doi.org/10.1116/1.4802737
Published: April 2013
View articletitled, Impact of static magnetic fields on the radial line slot antenna plasma source
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