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Journal Articles

Selective mask deposition using SiCl4 plasma for highly selective etching process

Miyako Matsui, Makoto Miura, Kenichi Kuwahara
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063002 (2023)
https://doi.org/10.1116/6.0002773
Published: September 2023
View article titled, Selective mask deposition using SiCl<sub>4</sub> plasma for highly selective etching process
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Journal Articles

Temporal evolution of the ion flux to the target in rotational RF multimagnetron plasma

Yasunori Ohtsu, Koya Yasuda, Julian Schulze
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 053006 (2022)
https://doi.org/10.1116/6.0001994
Published: August 2022
View article titled, Temporal evolution of the ion flux to the target in rotational RF multimagnetron plasma
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Journal Articles

Rotational cross-shaped magnetized radio-frequency sputtering plasma source for uniform circular target utilization

Tsubasa Ide, Md. Amzad Hossain, Yutaro Nakamura, Yasunori Ohtsu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 061312 (2017)
https://doi.org/10.1116/1.4999221
Published: November 2017
View article titled, Rotational cross-shaped magnetized radio-frequency sputtering plasma source for uniform circular target utilization
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Journal Articles

Improved inflection point method of emissive probe for accurate measurement of plasma potential

Jian-quan Li, Jun Xu, Yu-jing Bai, Wen-qi Lu, You-nian Wang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 061304 (2016)
https://doi.org/10.1116/1.4964834
Published: October 2016
View article titled, Improved inflection point method of emissive probe for accurate measurement of plasma potential
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Journal Articles

Electromagnetic simulation of helicon plasma antennas for their electrostatic shield design

Yorgos Stratakos, Angelos Zeniou, Evangelos Gogolides
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 031307 (2016)
https://doi.org/10.1116/1.4945001
Published: April 2016
View article titled, Electromagnetic simulation of helicon plasma antennas for their electrostatic shield design
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Includes: Supplementary data
Journal Articles

Pilot-scale electron cyclotron resonance-metal organic chemical vapor deposition system for the preparation of large-area fluorine-doped SnO2 thin films

Bup Ju Jeon, Chairul Hudaya, Joong Kee Lee
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 031501 (2016)
https://doi.org/10.1116/1.4943389
Published: March 2016
View article titled, Pilot-scale electron cyclotron resonance-metal organic chemical vapor deposition system for the preparation of large-area fluorine-doped SnO<sub>2</sub> thin films
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Includes: Supplementary data
Journal Articles

Nitrogen mass transfer models for plasma-based low-energy ion implantation

Bocong Zheng, Kesheng Wang, Zhipeng Zhang, Honglong Che, Mingkai Lei
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 021311 (2015)
https://doi.org/10.1116/1.4907713
Published: February 2015
View article titled, Nitrogen mass transfer models for plasma-based low-energy ion implantation
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Journal Articles

Attenuation of wall disturbances in an electron cyclotron resonance oxygen–argon plasma using real time control

Bernard Keville, Cezar Gaman, Yang Zhang, Anthony M. Holohan, Miles M. Turner, Stephen Daniels
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 32, 041301 (2014)
https://doi.org/10.1116/1.4879458
Published: May 2014
View article titled, Attenuation of wall disturbances in an electron cyclotron resonance oxygen–argon plasma using real time control
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Journal Articles

Degradation of transparent conductive properties of undoped ZnO and Ga-doped ZnO films left in atmospheric ambient for several years and trials to recover initial conductance

Housei Akazawa
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 32, 021512 (2014)
https://doi.org/10.1116/1.4866233
Published: February 2014
View article titled, Degradation of transparent conductive properties of undoped ZnO and Ga-doped ZnO films left in atmospheric ambient for several years and trials to recover initial conductance
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Journal Articles

Impact of static magnetic fields on the radial line slot antenna plasma source

Jun Yoshikawa, Peter L. G. Ventzek
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 31, 031306 (2013)
https://doi.org/10.1116/1.4802737
Published: April 2013
View article titled, Impact of static magnetic fields on the radial line slot antenna plasma source
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Journal Articles

Modification of transparent conductive ZnO and Ga-doped ZnO films by irradiation with electron cyclotron resonance argon plasma

Housei Akazawa
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 29, 031304 (2011)
https://doi.org/10.1116/1.3571603
Published: March 2011
View article titled, Modification of transparent conductive ZnO and Ga-doped ZnO films by irradiation with electron cyclotron resonance argon plasma
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Journal Articles

Combinatorial characterization of transparent conductive properties of Ga-doped ZnO films cosputtered from electron cyclotron resonance and rf magnetron plasma sources

Housei Akazawa
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 28, 314–321 (2010)
https://doi.org/10.1116/1.3328053
Published: February 2010
View article titled, Combinatorial characterization of transparent conductive properties of Ga-doped ZnO films cosputtered from electron cyclotron resonance and rf magnetron plasma sources
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Journal Articles

Silane injection in a high-density low-pressure plasma system and its influence on the deposition kinetics and material properties of Si O 2

R. Botha, B. Haj Ibrahim, P. Bulkin, B. Drévillon
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 26, 1115–1119 (2008)
https://doi.org/10.1116/1.2949234
Published: July 2008
View article titled, Silane injection in a high-density low-pressure plasma system and its influence on the deposition kinetics and material properties of Si O 2
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Journal Articles

Charge-state distributions of metallic electron cyclotron resonance plasmas

P. Kumar, G. Rodrigues, P. S. Lakshmy, D. Kanjilal, R. Kumar
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 26, 97–102 (2008)
https://doi.org/10.1116/1.2823486
Published: December 2007
View article titled, Charge-state distributions of metallic electron cyclotron resonance plasmas
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Journal Articles

Performance and analysis of an electron cyclotron resonance plasma cathode

Y. Hidaka, J. E. Foster, W. D. Getty, R. M. Gilgenbach, Y. Y. Lau
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 25, 781–790 (2007)
https://doi.org/10.1116/1.2746041
Published: June 2007
View article titled, Performance and analysis of an electron cyclotron resonance plasma cathode
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Journal Articles

NiCr etching in a reactive gas

J. Ritter, R. Boucher, W. Morgenroth, H. G. Meyer
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 25, 468–473 (2007)
https://doi.org/10.1116/1.2716668
Published: March 2007
View article titled, NiCr etching in a reactive gas
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Journal Articles

Lifetime measurement of metastable fluorine atoms using electron cyclotron resonance plasma source

Masao Shimizu, Hiromasa Ohmi, Hiroaki Kakiuchi, Kiyoshi Yasutake
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 24, 2133–2138 (2006)
https://doi.org/10.1116/1.2357959
Published: October 2006
View article titled, Lifetime measurement of metastable fluorine atoms using electron cyclotron resonance plasma source
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Journal Articles

Rotational and translational temperature equilibrium in an inductively coupled plasma

Masashi Shimada, George R. Tynan, Robert Cattolica
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 24, 1878–1883 (2006)
https://doi.org/10.1116/1.2244539
Published: August 2006
View article titled, Rotational and translational temperature equilibrium in an inductively coupled plasma
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Journal Articles

In vacuo substrate pretreatments for enhancing nanodiamond formation in electron cyclotron resonance plasma

Kungen Teii, Yutaka Kouzuma, Kiichiro Uchino
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 24, 1802–1806 (2006)
https://doi.org/10.1116/1.2221322
Published: August 2006
View article titled, <em>In vacuo</em> substrate pretreatments for enhancing nanodiamond formation in electron cyclotron resonance plasma
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Journal Articles

Effect of substrate material and bias on properties of TiN films deposited in the hybrid plasma reactor

L. Bárdos, H. Baránková, L.-E. Gustavsson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 24, 1655–1659 (2006)
https://doi.org/10.1116/1.2167082
Published: June 2006
View article titled, Effect of substrate material and bias on properties of TiN films deposited in the hybrid plasma reactor
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