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Journal Articles

Elucidating energetics and kinetics in environmentally relevant mixed gas plasmas

Tara L. Van Surksum, Ellen R. Fisher
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 053001 (2021)
https://doi.org/10.1116/6.0001080
Published: July 2021
View article titled, Elucidating energetics and kinetics in environmentally relevant mixed gas plasmas
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Includes: Supplementary data
Journal Articles

Experimental investigation of SF6–O2 plasma for advancement of the anisotropic Si etch process

Khaled A. Alshaltami, Muhammad Morshed, Cezar Gaman, Jim Conway, Stephen Daniels
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 031307 (2017)
https://doi.org/10.1116/1.4981785
Published: April 2017
View article titled, Experimental investigation of SF<sub>6</sub>–O<sub>2</sub> plasma for advancement of the anisotropic Si etch process
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Journal Articles

Y2O3 wall interactions in Cl2 etching and NF3 cleaning plasmas

Editor’s Pick
Tianyu Ma, Tyler List, Vincent M. Donnelly
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 031303 (2017)
https://doi.org/10.1116/1.4978552
Published: March 2017
View article titled, Y<sub>2</sub>O<sub>3</sub> wall interactions in Cl<sub>2</sub> etching and NF<sub>3</sub> cleaning plasmas
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Journal Articles

Determination of the number density of excited and ground Zn atoms during rf magnetron sputtering of ZnO target

L. Maaloul, R. K. Gangwar, L. Stafford
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 041302 (2015)
https://doi.org/10.1116/1.4921225
Published: May 2015
View article titled, Determination of the number density of excited and ground Zn atoms during rf magnetron sputtering of ZnO target
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Journal Articles

Optical emission spectroscopic studies and comparisons of CH3F/CO2 and CH3F/O2 inductively coupled plasmas

Qiaowei Lou, Sanbir Kaler, Vincent M. Donnelly, Demetre J. Economou
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 021305 (2015)
https://doi.org/10.1116/1.4904213
Published: December 2014
View article titled, Optical emission spectroscopic studies and comparisons of CH<sub>3</sub>F/CO<sub>2</sub> and CH<sub>3</sub>F/O<sub>2</sub> inductively coupled plasmas
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Journal Articles

Modulated IR radiometry for determining thermal properties and basic characteristics of titanium thin films

Mihai Apreutesei, Claudia Lopes, Joel Borges, Filipe Vaz, Francisco Macedo
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 32, 041511 (2014)
https://doi.org/10.1116/1.4884351
Published: June 2014
View article titled, Modulated IR radiometry for determining thermal properties and basic characteristics of titanium thin films
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Journal Articles

Measurements of sputtered neutrals and ions and investigation of their roles on the plasma properties during rf magnetron sputtering of Zn and ZnO targets

L. Maaloul, L. Stafford
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 31, 061306 (2013)
https://doi.org/10.1116/1.4821186
Published: September 2013
View article titled, Measurements of sputtered neutrals and ions and investigation of their roles on the plasma properties during rf magnetron sputtering of Zn and ZnO targets
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Journal Articles

Nitrogen actinometry for measurement of nitrogen radical spatial distribution in large-area plasma-enhanced chemical vapor deposition

Changhoon Oh, Minwook Kang, Seungsuk Nam, Jae W. Hahn
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 31, 031303 (2013)
https://doi.org/10.1116/1.4798772
Published: April 2013
View article titled, Nitrogen actinometry for measurement of nitrogen radical spatial distribution in large-area plasma-enhanced chemical vapor deposition
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Journal Articles

Comparison endpoint study of process plasma and secondary electron beam exciter optical emission spectroscopy

P. L. Stephan Thamban, Stuart Yun, Gabriel Padron-Wells, Jimmy W. Hosch, Matthew J. Goeckner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 30, 061303 (2012)
https://doi.org/10.1116/1.4756694
Published: October 2012
View article titled, Comparison endpoint study of process plasma and secondary electron beam exciter optical emission spectroscopy
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Journal Articles

Role of surface temperature in fluorocarbon plasma-surface interactions

Caleb T. Nelson, Lawrence J. Overzet, Matthew J. Goeckner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 30, 041305 (2012)
https://doi.org/10.1116/1.4729445
Published: June 2012
View article titled, Role of surface temperature in fluorocarbon plasma-surface interactions
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Journal Articles

Spatially resolved study of primary electron transport in magnetic cusps

Aimee A. Hubble, John E. Foster
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 30, 011301 (2012)
https://doi.org/10.1116/1.3656742
Published: November 2011
View article titled, Spatially resolved study of primary electron transport in magnetic cusps
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Journal Articles

High rate deep Si etching for through-silicon via applications

Itsuko Sakai, Noriko Sakurai, Tokuhisa Ohiwa
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 29, 021009 (2011)
https://doi.org/10.1116/1.3543635
Published: January 2011
View article titled, High rate deep Si etching for through-silicon via applications
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Journal Articles

Surface loss rates of H and Cl radicals in an inductively coupled plasma etcher derived from time-resolved electron density and optical emission measurements

G. A. Curley, L. Gatilova, S. Guilet, S. Bouchoule, G. S. Gogna, N. Sirse, S. Karkari, J. P. Booth
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 28, 360–372 (2010)
https://doi.org/10.1116/1.3330766
Published: March 2010
View article titled, Surface loss rates of H and Cl radicals in an inductively coupled plasma etcher derived from time-resolved electron density and optical emission measurements
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Journal Articles

Effect on plasma and etch-rate uniformity of controlled phase shift between rf voltages applied to powered electrodes in a triode capacitively coupled plasma reactor

Dougyong Sung, Sangmin Jeong, Youngmin Park, Vladimir N. Volynets, Andrey G. Ushakov, Gon-Ho Kim
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 27, 13–19 (2009)
https://doi.org/10.1116/1.3010717
Published: December 2008
View article titled, Effect on plasma and etch-rate uniformity of controlled phase shift between rf voltages applied to powered electrodes in a triode capacitively coupled plasma reactor
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Journal Articles

Study of fluorocarbon plasma in 60 and 100 MHz capacitively coupled discharges using mass spectrometry

Andrey Ushakov, Vladimir Volynets, Sangmin Jeong, Dougyong Sung, Yongho Ihm, Jehun Woo, Moonhyeong Han
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 26, 1198–1207 (2008)
https://doi.org/10.1116/1.2965812
Published: August 2008
View article titled, Study of fluorocarbon plasma in 60 and 100 MHz capacitively coupled discharges using mass spectrometry
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Journal Articles

Mechanisms and selectivity for etching of Hf O 2 and Si in B Cl 3 plasmas

Chunyu Wang, Vincent M. Donnelly
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 26, 597–604 (2008)
https://doi.org/10.1116/1.2938396
Published: June 2008
View article titled, Mechanisms and selectivity for etching of Hf O 2 and Si in B Cl 3 plasmas
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Journal Articles

Experimental study of spatial nonuniformities in 100 MHz capacitively coupled plasma using optical probe

V. N. Volynets, A. G. Ushakov, D. Sung, Y. N. Tolmachev, V. G. Pashkovsky, J. B. Lee, T. Y. Kwon, K. S. Jeong
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 26, 406–415 (2008)
https://doi.org/10.1116/1.2899413
Published: April 2008
View article titled, Experimental study of spatial nonuniformities in 100 MHz capacitively coupled plasma using optical probe
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Journal Articles

Spatial profile monitoring of etch products of silicon in H Br ∕ Cl 2 ∕ O 2 ∕ Ar plasma

Junichi Tanaka, Go Miya
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 25, 353–359 (2007)
https://doi.org/10.1116/1.2539295
Published: February 2007
View article titled, Spatial profile monitoring of etch products of silicon in H Br ∕ Cl 2 ∕ O 2 ∕ Ar plasma
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Journal Articles

Plasma etching of benzocyclobutene in C F 4 ∕ O 2 and S F 6 ∕ O 2 plasmas

G. S. Kim, C. Steinbrüchel
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 24, 424–430 (2006)
https://doi.org/10.1116/1.2187994
Published: April 2006
View article titled, Plasma etching of benzocyclobutene in C F 4 ∕ O 2 and S F 6 ∕ O 2 plasmas
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Journal Articles

Etching of high aspect ratio features in Si using S F 6 ∕ O 2 ∕ H Br and S F 6 ∕ O 2 ∕ Cl 2 plasma

Sergi Gomez, Rodolfo Jun Belen, Mark Kiehlbauch, Eray S. Aydil
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 23, 1592–1597 (2005)
https://doi.org/10.1116/1.2049303
Published: October 2005
View article titled, Etching of high aspect ratio features in Si using S F 6 ∕ O 2 ∕ H Br and S F 6 ∕ O 2 ∕ Cl 2 plasma
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