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Journal Articles

In-cycle evolution of thickness and roughness parameters during oxygen plasma enhanced ZnO atomic layer deposition using in situ spectroscopic ellipsometry

Editor’s Pick
Yousra Traouli, Ufuk Kilic, Sema G. Kilic, Matthew Hilfiker, Daniel Schmidt, Stefan Schoeche, Eva Schubert, Mathias Schubert
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 052403 (2024)
https://doi.org/10.1116/6.0003830
Published: September 2024
View article titled, In-cycle evolution of thickness and roughness parameters during oxygen plasma enhanced ZnO atomic layer deposition using <em>in situ</em> spectroscopic ellipsometry
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Journal Articles

Numerical ellipsometry: AI for real-time, in situ process control for absorbing films growing on unknown transparent substrates

Editor’s Pick
F. K. Urban, III, D. Barton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 053405 (2024)
https://doi.org/10.1116/6.0003817
Published: August 2024
View article titled, Numerical ellipsometry: AI for real-time, <em>in situ</em> process control for absorbing films growing on unknown transparent substrates
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Journal Articles

Immersion ellipsometry for the uncorrelated determination of ultrathin film thickness and index of refraction: Theory and examples

Featured
Samira Jafari, Blaine Johs, Matthew R. Linford
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 053401 (2024)
https://doi.org/10.1116/6.0003511
Published: July 2024
View article titled, Immersion ellipsometry for the uncorrelated determination of ultrathin film thickness and index of refraction: Theory and examples
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Journal Articles

Plasma atomic layer etching of SiO2 with a low global warming potential fluorocarbon precursor (C6F6)

Inho Seong, Yebin You, Youngseok Lee, Minsu Choi, Dain Sung, Geunyoung Yeom, ShinJae You
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 032601 (2024)
https://doi.org/10.1116/6.0003345
Published: April 2024
View article titled, Plasma atomic layer etching of SiO<sub>2</sub> with a low global warming potential fluorocarbon precursor (C<sub>6</sub>F<sub>6</sub>)
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Journal Articles

Surface treatment of TaN for sub-2 nm, smooth, and conducting atomic layer deposition Ru films

Editor’s Pick
Corbin Feit, Udit Kumar, Md. Rafiqul Islam, Luis Tomar, S. Novia Berriel, John T. Gaskins, Patrick E. Hopkins, Sudipta Seal, Parag Banerjee
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 032407 (2024)
https://doi.org/10.1116/6.0003440
Published: April 2024
View article titled, Surface treatment of TaN for sub-2 nm, smooth, and conducting atomic layer deposition Ru films
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Includes: Supplementary data
Journal Articles

Nucleation of highly uniform AlN thin films by high volume batch ALD on 200 mm platform

Editor’s Pick
Partha Mukhopadhyay, Ivan Fletcher, Zuriel Caribe Couvertier, Brent Schwab, John Gumpher, Winston V. Schoenfeld, Jon Kretzschmar, Anton deVilliers, Jim Fulford
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 032401 (2024)
https://doi.org/10.1116/6.0003405
Published: March 2024
View article titled, Nucleation of highly uniform AlN thin films by high volume batch ALD on 200 mm platform
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Journal Articles

Real-time artificial intelligence enhanced defect engineering in CeO2 nanostructures

Udit Kumar, Ayush Arunachalam, Corbin Feit, S. Novia Berriel, Kanad Basu, Parag Banerjee, Sudipta Seal
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 062409 (2023)
https://doi.org/10.1116/6.0002912
Published: November 2023
View article titled, Real-time artificial intelligence enhanced defect engineering in CeO<sub>2</sub> nanostructures
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Includes: Supplementary data
Journal Articles

Growth and optical properties of NiO thin films deposited by pulsed dc reactive magnetron sputtering

Faezeh A. F. Lahiji, Samiran Bairagi, Roger Magnusson, Mauricio A. Sortica, Daniel Primetzhofer, Erik Ekström, Biplab Paul, Arnaud le Febvrier, Per Eklund
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063402 (2023)
https://doi.org/10.1116/6.0002914
Published: September 2023
View article titled, Growth and optical properties of NiO thin films deposited by pulsed dc reactive magnetron sputtering
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Includes: Supplementary data
Journal Articles

Mechanical and optical properties of amorphous silicon nitride-based films prepared by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Brahim Ahammou, Paramita Bhattacharyya, Christophe Levallois, Fahmida Azmi, Jean-Pierre Landesman, Peter Mascher
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053113 (2023)
https://doi.org/10.1116/6.0002896
Published: August 2023
View article titled, Mechanical and optical properties of amorphous silicon nitride-based films prepared by electron cyclotron resonance plasma-enhanced chemical vapor deposition
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Journal Articles

Plasma-enhanced atomic layer deposition of silicon nitride for front-end-of-line applications

Marco Lisker, Mamathamba Kalishettyhalli Mahadevaiah, Keerthi Dorai Swamy Reddy
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 042406 (2023)
https://doi.org/10.1116/6.0002424
Published: July 2023
View article titled, Plasma-enhanced atomic layer deposition of silicon nitride for front-end-of-line applications
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Journal Articles

Atomic layer deposition of calcium fluoride for barrier coating applications

Editor’s Pick
John Hennessy, Robin E. Rodríguez, William C. West, Erik J. Brandon
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 042405 (2023)
https://doi.org/10.1116/6.0002563
Published: June 2023
View article titled, Atomic layer deposition of calcium fluoride for barrier coating applications
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Includes: Supplementary data
Journal Articles

Comparison of BCl3, TiCl4, and SOCl2 chlorinating agents for atomic layer etching of TiO2 and ZrO2 using tungsten hexafluoride

Editor’s Pick
Holger Saare, Wenyi Xie, Gregory N. Parsons
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 042602 (2023)
https://doi.org/10.1116/6.0002708
Published: June 2023
View article titled, Comparison of BCl<sub>3</sub>, TiCl<sub>4</sub>, and SOCl<sub>2</sub> chlorinating agents for atomic layer etching of TiO<sub>2</sub> and ZrO<sub>2</sub> using tungsten hexafluoride
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Includes: Supplementary data
Journal Articles

Electron-enhanced SiO2 atomic layer deposition at 35 °C using disilane and ozone or water as reactants

Editor’s Pick
Jonas C. Gertsch, Zachary C. Sobell, Andrew S. Cavanagh, Harsono Simka, Steven M. George
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 042404 (2023)
https://doi.org/10.1116/6.0002726
Published: June 2023
View article titled, Electron-enhanced SiO<sub>2</sub> atomic layer deposition at 35 °C using disilane and ozone or water as reactants
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Journal Articles

Atomic layer deposition of MoOx thin films using Mo(iPrCp)2H2 and O3

Ethan Hendrix, Ben M. Garland, Vamseedhara Vemuri, Nicholas C. Strandwitz
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 032409 (2023)
https://doi.org/10.1116/6.0002436
Published: April 2023
View article titled, Atomic layer deposition of MoO<sub>x</sub> thin films using Mo(<sup>i</sup>PrCp)<sub>2</sub>H<sub>2</sub> and O<sub>3</sub>
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Journal Articles

Using metal precursors to passivate oxides for area selective deposition

Kinsey L. Canova, Laurent Souqui, Gregory S. Girolami, John R. Abelson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 033407 (2023)
https://doi.org/10.1116/6.0002413
Published: April 2023
View article titled, Using metal precursors to passivate oxides for area selective deposition
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Includes: Supplementary data
Journal Articles

Challenges in atomic layer etching of gallium nitride using surface oxidation and ligand-exchange

Daniel C. Messina, Kevin A. Hatch, Saurabh Vishwakarma, David J. Smith, Yuji Zhao, Robert J. Nemanich
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 022603 (2023)
https://doi.org/10.1116/6.0002255
Published: March 2023
View article titled, Challenges in atomic layer etching of gallium nitride using surface oxidation and ligand-exchange
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Includes: Supplementary data
Journal Articles

Inhibition of the atomic layer deposition of ZnO and SnO2 using a vapor-based polymer thin film

Editor’s Pick
Raphaël Feougier, Chloe Guerin, Vincent Jousseaume
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 012404 (2023)
https://doi.org/10.1116/6.0002248
Published: December 2022
View article titled, Inhibition of the atomic layer deposition of ZnO and SnO<sub>2</sub> using a vapor-based polymer thin film
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Journal Articles

Numerical ellipsometry: A method for selecting a single β-gallium oxide monoclinic crystal orientation able to determine the complete permittivity tensor

F. K. Urban, III, D. Barton, M. Schubert
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 013402 (2023)
https://doi.org/10.1116/6.0002235
Published: December 2022
View article titled, Numerical ellipsometry: A method for selecting a single β-gallium oxide monoclinic crystal orientation able to determine the complete permittivity tensor
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Journal Articles

In situ spectroscopic ellipsometry and rigorous coupled wave analysis for real time profile evolution of atomic layer deposited films inside SiO2 nanotrenches

Editor’s Pick
S. Novia Berriel, Corbin Feit, Nick Keller, Nicholas G. Rudawski, Parag Banerjee
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 062403 (2022)
https://doi.org/10.1116/6.0001937
Published: September 2022
View article titled, <em>In situ</em> spectroscopic ellipsometry and rigorous coupled wave analysis for real time profile evolution of atomic layer deposited films inside SiO<sub>2</sub> nanotrenches
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Includes: Supplementary data
Journal Articles

Surface oxidation of hydrophobic ZnSe for enhanced growth of atomic layer deposited aluminum oxide

Editor’s Pick
Corbin Feit, Jaynlynn Sosa, Alexandros Kostogiannes, Matthieu Chazot, Nicholas G. Rudawski, Titel Jurca, Kathleen A. Richardson, Parag Banerjee
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 052402 (2022)
https://doi.org/10.1116/6.0002018
Published: August 2022
View article titled, Surface oxidation of hydrophobic ZnSe for enhanced growth of atomic layer deposited aluminum oxide
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