1-20 of 42
Optical instruments
Close
Save search
Follow your search
Access your saved searches in your account
Close Modal
Sort by
Journal Articles

Measuring thickness in thin NbN films for superconducting devices

Owen Medeiros, Marco Colangelo, Ilya Charaev, Karl K. Berggren
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 041501 (2019)
https://doi.org/10.1116/1.5088061
Published: May 2019
View article titled, Measuring thickness in thin NbN films for superconducting devices
Open the PDF for Measuring thickness in thin NbN films for superconducting devices in another window
Journal Articles

Measured relationship between thermodynamic pressure and refractivity for six candidate gases in laser barometry

Patrick F. Egan, Jack A. Stone, Julia K. Scherschligt, Allan H. Harvey
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 031603 (2019)
https://doi.org/10.1116/1.5092185
Published: April 2019
View article titled, Measured relationship between thermodynamic pressure and refractivity for six candidate gases in laser barometry
Open the PDF for Measured relationship between thermodynamic pressure and refractivity for six candidate gases in laser barometry in another window
Includes: Supplementary data
Journal Articles

Real-time in situ ellipsometric monitoring of aluminum nitride film growth via hollow-cathode plasma-assisted atomic layer deposition

Adnan Mohammad, Deepa Shukla, Saidjafarzoda Ilhom, Brian Willis, Blaine Johs, Ali Kemal Okyay, Necmi Biyikli
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 020927 (2019)
https://doi.org/10.1116/1.5085341
Published: February 2019
View article titled, Real-time <em>in situ</em> ellipsometric monitoring of aluminum nitride film growth via hollow-cathode plasma-assisted atomic layer deposition
Open the PDF for Real-time <em>in situ</em> ellipsometric monitoring of aluminum nitride film growth via hollow-cathode plasma-assisted atomic layer deposition in another window
Includes: Supplementary data
Journal Articles

Use of ellipsometry to monitor methane plasma ion implant process

Nicholas P. T. Bateman
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 021302 (2019)
https://doi.org/10.1116/1.5068759
Published: January 2019
View article titled, Use of ellipsometry to monitor methane plasma ion implant process
Open the PDF for Use of ellipsometry to monitor methane plasma ion implant process in another window
Journal Articles

Gas modulation refractometry for high-precision assessment of pressure under non-temperature-stabilized conditions

Isak Silander, Thomas Hausmaninger, Martin Zelan, Ove Axner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 03E105 (2018)
https://doi.org/10.1116/1.5022244
Published: April 2018
View article titled, Gas modulation refractometry for high-precision assessment of pressure under non-temperature-stabilized conditions
Open the PDF for Gas modulation refractometry for high-precision assessment of pressure under non-temperature-stabilized conditions in another window
Journal Articles

Electron-enhanced atomic layer deposition of silicon thin films at room temperature

Jaclyn K. Sprenger, Huaxing Sun, Andrew S. Cavanagh, Steven M. George
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 01A118 (2018)
https://doi.org/10.1116/1.5006696
Published: December 2017
View article titled, Electron-enhanced atomic layer deposition of silicon thin films at room temperature
Open the PDF for Electron-enhanced atomic layer deposition of silicon thin films at room temperature in another window
Journal Articles

Graphene as plasma-compatible blocking layer material for area-selective atomic layer deposition: A feasibility study for III-nitrides

Editor’s Pick
Petro Deminskyi, Ali Haider, Evgeniya Kovalska, Necmi Biyikli
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 01A107 (2018)
https://doi.org/10.1116/1.5003421
Published: November 2017
View article titled, Graphene as plasma-compatible blocking layer material for area-selective atomic layer deposition: A feasibility study for III-nitrides
Open the PDF for Graphene as plasma-compatible blocking layer material for area-selective atomic layer deposition: A feasibility study for III-nitrides in another window
Journal Articles

Influence of Ag volume fraction on microstructure and optical constants of Ag-WO3 thin films

Xishun Jiang, Qibin Lin, Yongchun Zhang, Yonghua Shi, Xinyi Li, Yangyi Zhang, Kexiu Dong, Zhaoqi Sun
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 041516 (2017)
https://doi.org/10.1116/1.4990645
Published: July 2017
View article titled, Influence of Ag volume fraction on microstructure and optical constants of Ag-WO<sub>3</sub> thin films
Open the PDF for Influence of Ag volume fraction on microstructure and optical constants of Ag-WO<sub>3</sub> thin films in another window
Journal Articles

Effects of ultraviolet and vacuum ultraviolet synchrotron radiation on organic underlayers to modulate line-edge roughness of fine-pitch poly-silicon patterns

Hiroyuki Miyazoe, Sebastian U. Engelmann, Michael A. Guillorn, Dongfei Pei, Weiyi Li, Jason L. Lauer, J. Leon Shohet, Nicholas C. M. Fuller
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 05C306 (2017)
https://doi.org/10.1116/1.4985541
Published: June 2017
View article titled, Effects of ultraviolet and vacuum ultraviolet synchrotron radiation on organic underlayers to modulate line-edge roughness of fine-pitch poly-silicon patterns
Open the PDF for Effects of ultraviolet and vacuum ultraviolet synchrotron radiation on organic underlayers to modulate line-edge roughness of fine-pitch poly-silicon patterns in another window
Journal Articles

Enhanced light trapping and plasmonic properties of aluminum nanorods fabricated by glancing angle deposition

Rosure Borhanalden Abdulrahman, Hilal Cansizoglu, Mehmet F. Cansizoglu, Joseph B. Herzog, Tansel Karabacak
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 041501 (2015)
https://doi.org/10.1116/1.4919737
Published: May 2015
View article titled, Enhanced light trapping and plasmonic properties of aluminum nanorods fabricated by glancing angle deposition
Open the PDF for Enhanced light trapping and plasmonic properties of aluminum nanorods fabricated by glancing angle deposition in another window
Includes: Supplementary data
Journal Articles

Microscopic silicon-based lateral high-aspect-ratio structures for thin film conformality analysis

Feng Gao, Sanna Arpiainen, Riikka L. Puurunen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 010601 (2015)
https://doi.org/10.1116/1.4903941
Published: December 2014
View article titled, Microscopic silicon-based lateral high-aspect-ratio structures for thin film conformality analysis
Open the PDF for Microscopic silicon-based lateral high-aspect-ratio structures for thin film conformality analysis in another window
Journal Articles

In-situ real-time ellipsometric investigations during the atomic layer deposition of ruthenium: A process development from [(ethylcyclopentadienyl)(pyrrolyl)ruthenium] and molecular oxygen

Martin Knaut, Marcel Junige, Matthias Albert, Johann W. Bartha
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 30, 01A151 (2012)
https://doi.org/10.1116/1.3670405
Published: December 2011
View article titled, <em>In-situ</em> real-time ellipsometric investigations during the atomic layer deposition of ruthenium: A process development from [(ethylcyclopentadienyl)(pyrrolyl)ruthenium] and molecular oxygen
Open the PDF for <em>In-situ</em> real-time ellipsometric investigations during the atomic layer deposition of ruthenium: A process development from [(ethylcyclopentadienyl)(pyrrolyl)ruthenium] and molecular oxygen in another window
Journal Articles

Numerical ellipsometry: n-k plane analysis of transparent conducting films

D. Barton, F. K. Urban, III
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 29, 041508 (2011)
https://doi.org/10.1116/1.3589803
Published: June 2011
View article titled, Numerical ellipsometry: <em>n-k</em> plane analysis of transparent conducting films
Open the PDF for Numerical ellipsometry: <em>n-k</em> plane analysis of transparent conducting films in another window
Journal Articles

Polymer molded templates for nanostructured amorphous silicon photovoltaics

Lei Pei, Amy Balls, Cary Tippets, Jonathan Abbott, Matthew R. Linford, Jian Hu, Arun Madan, David D. Allred, Richard R. Vanfleet, Robert C. Davis
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 29, 021017 (2011)
https://doi.org/10.1116/1.3554720
Published: February 2011
View article titled, Polymer molded templates for nanostructured amorphous silicon photovoltaics
Open the PDF for Polymer molded templates for nanostructured amorphous silicon photovoltaics in another window
Journal Articles

Isolation of exchange- and spin-orbit-driven effects via manipulation of the axis of quantization

Takashi Komesu, G. D. Waddill, S.-W. Yu, M. T. Butterfield, J. G. Tobin
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 28, 1371–1376 (2010)
https://doi.org/10.1116/1.3498716
Published: October 2010
View article titled, Isolation of exchange- and spin-orbit-driven effects via manipulation of the axis of quantization
Open the PDF for Isolation of exchange- and spin-orbit-driven effects via manipulation of the axis of quantization in another window
Journal Articles

Chemical-etch-assisted growth of epitaxial zinc oxide

E. J. Adles, D. E. Aspnes
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 28, 689–692 (2010)
https://doi.org/10.1116/1.3305814
Published: June 2010
View article titled, Chemical-etch-assisted growth of epitaxial zinc oxide
Open the PDF for Chemical-etch-assisted growth of epitaxial zinc oxide in another window
Includes: Supplementary data
Journal Articles

Surface morphology of Kr + -polished amorphous Si layers

A. J. R. van den Boogaard, E. Louis, E. Zoethout, S. Müllender, F. Bijkerk
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 28, 552–558 (2010)
https://doi.org/10.1116/1.3428545
Published: June 2010
View article titled, Surface morphology of Kr + -polished amorphous Si layers
Open the PDF for Surface morphology of Kr + -polished amorphous Si layers in another window
Journal Articles

Large-area pulsed-laser deposition of dielectric and ferroelectric thin films

Shigeki Sakai, Mitsue Takahashi, Kennichi Motohashi, Yuji Yamaguchi, Naomasa Yui, Takichi Kobayashi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 25, 903–907 (2007)
https://doi.org/10.1116/1.2748808
Published: July 2007
View article titled, Large-area pulsed-laser deposition of dielectric and ferroelectric thin films
Open the PDF for Large-area pulsed-laser deposition of dielectric and ferroelectric thin films in another window
Journal Articles

Resonant soft x-ray reflectivity of organic thin films

Cheng Wang, Tohru Araki, Benjamin Watts, Shane Harton, Tadanori Koga, Saibal Basu, Harald Ade
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 25, 575–586 (2007)
https://doi.org/10.1116/1.2731352
Published: April 2007
View article titled, Resonant soft x-ray reflectivity of organic thin films
Open the PDF for Resonant soft x-ray reflectivity of organic thin films in another window
Journal Articles

Amorphous silicon layer characteristics during 70 – 2000 eV   Ar + -ion bombardment of Si(100)

A. A. E. Stevens, W. M. M. Kessels, M. C. M. van de Sanden, H. C. W. Beijerinck
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 24, 1933–1940 (2006)
https://doi.org/10.1116/1.2244535
Published: August 2006
View article titled, Amorphous silicon layer characteristics during 70 – 2000 eV   Ar + -ion bombardment of Si(100)
Open the PDF for Amorphous silicon layer characteristics during 70 – 2000 eV   Ar + -ion bombardment of Si(100) in another window