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Journal Articles

Real-time monitoring of atomic layer etching in Cl2/Ar pulsed gas, pulsed power plasmas by optical emission spectroscopy

Qinzhen Hao, Pilbum Kim, Sang Ki Nam, Song-Yun Kang, Vincent M. Donnelly
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 032605 (2023)
https://doi.org/10.1116/6.0002482
Published: April 2023
View article titled, Real-time monitoring of atomic layer etching in Cl<sub>2</sub>/Ar pulsed gas, pulsed power plasmas by optical emission spectroscopy
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Journal Articles

Quasiordered, subwavelength TiO2 hole arrays with tunable, omnidirectional color response

Pavel Shapturenka, Fabian Birkholz, Nicholas Isaac Zakaria, Steven P. DenBaars, Michael J. Gordon
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 053403 (2020)
https://doi.org/10.1116/6.0000328
Published: August 2020
View article titled, Quasiordered, subwavelength TiO<sub>2</sub> hole arrays with tunable, omnidirectional color response
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Journal Articles

Measured relationship between thermodynamic pressure and refractivity for six candidate gases in laser barometry

Patrick F. Egan, Jack A. Stone, Julia K. Scherschligt, Allan H. Harvey
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 031603 (2019)
https://doi.org/10.1116/1.5092185
Published: April 2019
View article titled, Measured relationship between thermodynamic pressure and refractivity for six candidate gases in laser barometry
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Includes: Supplementary data
Journal Articles

Evaluation of grating realized via pulse current electroplating combined with atomic layer deposition as an x-ray grating interferometer

Tae-Eun Song, Seho Lee, Hee Han, Soonyoung Jung, Soo-Hyun Kim, Min Jun Kim, Seung Wook Lee, Chi Won Ahn
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 030903 (2019)
https://doi.org/10.1116/1.5080954
Published: April 2019
View article titled, Evaluation of grating realized via pulse current electroplating combined with atomic layer deposition as an x-ray grating interferometer
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Journal Articles

Interferometry of plasma bursts in helium atmospheric-pressure plasma jets

Vladimir Samara, Sylwia Ptasinska
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 04F402 (2018)
https://doi.org/10.1116/1.5023113
Published: March 2018
View article titled, Interferometry of plasma bursts in helium atmospheric-pressure plasma jets
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Includes: Supplementary data
Journal Articles

Nucleation and growth of CuCl thin films on commercially available SnO2/glass substrates by the sublimation method

Anthony P. Nicholson, Davis R. Hemenway, Walajabad S. Sampath, Kurt L. Barth
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 041511 (2017)
https://doi.org/10.1116/1.4986944
Published: June 2017
View article titled, Nucleation and growth of CuCl thin films on commercially available SnO<sub>2</sub>/glass substrates by the sublimation method
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Journal Articles

Second-harmonic intensity and phase spectroscopy as a sensitive method to probe the space-charge field in Si(100) covered with charged dielectrics

Nick M. Terlinden, Vincent Vandalon, Roger H. E. C. Bosch, W. M. M. (Erwin) Kessels
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 32, 021103 (2014)
https://doi.org/10.1116/1.4862145
Published: February 2014
View article titled, Second-harmonic intensity and phase spectroscopy as a sensitive method to probe the space-charge field in Si(100) covered with charged dielectrics
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Journal Articles

Vacuum sealing using atomic layer deposition of Al2O3 at 250 °C

Seungdo An, Naveen K. Gupta, Yogesh B. Gianchandani
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 32, 01A101 (2014)
https://doi.org/10.1116/1.4820240
Published: September 2013
View article titled, Vacuum sealing using atomic layer deposition of Al<sub>2</sub>O<sub>3</sub> at 250 °C
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Journal Articles

Negative real parts of the equivalent permittivity, permeability, and refractive index of sculptured-nanorod arrays of silver

Yi-Jun Jen, Akhlesh Lakhtakia, Ching-Wei Yu, Yu-Hsiung Wang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 28, 1078–1083 (2010)
https://doi.org/10.1116/1.3456125
Published: September 2010
View article titled, Negative real parts of the equivalent permittivity, permeability, and refractive index of sculptured-nanorod arrays of silver
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Journal Articles

Time-resolved Fourier transform infrared spectroscopy of the gas phase during atomic layer deposition

Brent A. Sperling, William A. Kimes, James E. Maslar, Pamela M. Chu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 28, 613–621 (2010)
https://doi.org/10.1116/1.3455187
Published: June 2010
View article titled, Time-resolved Fourier transform infrared spectroscopy of the gas phase during atomic layer deposition
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Journal Articles

Spectroellipsometric investigation of optical, morphological, and structural properties of reactively sputtered polycrystalline AlN films

T. Easwarakhanthan, S. S. Hussain, P. Pigeat
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 28, 495–501 (2010)
https://doi.org/10.1116/1.3372833
Published: April 2010
View article titled, Spectroellipsometric investigation of optical, morphological, and structural properties of reactively sputtered polycrystalline AlN films
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Journal Articles

Model for aspect ratio dependent etch modulated processing

Peter J. Gilgunn, J. Fernando Alfaro, Gary K. Fedder
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 28, 334–346 (2010)
https://doi.org/10.1116/1.3305716
Published: March 2010
View article titled, Model for aspect ratio dependent etch modulated processing
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Journal Articles

Fabrication of surface plasmon waveguides and integrated components on ultrathin freestanding membranes

Pierre Berini, Nancy Lahoud, Robert Charbonneau
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 26, 1383–1391 (2008)
https://doi.org/10.1116/1.2975196
Published: October 2008
View article titled, Fabrication of surface plasmon waveguides and integrated components on ultrathin freestanding membranes
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Journal Articles

Near-infrared diode laser hydrogen fluoride monitor for dielectric etch

Ning Xu, David R. Pirkle, Jay B. Jeffries, Brian McMillin, Ronald K. Hanson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 22, 2479–2486 (2004)
https://doi.org/10.1116/1.1809124
Published: November 2004
View article titled, Near-infrared diode laser hydrogen fluoride monitor for dielectric etch
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Journal Articles

Microcrystalline silicon by plasma enhanced chemical vapor deposition from silicon tetrafluoride

G. Cicala, P. Capezzuto, G. Bruno
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 19, 515–523 (2001)
https://doi.org/10.1116/1.1351004
Published: March 2001
View article titled, Microcrystalline silicon by plasma enhanced chemical vapor deposition from silicon tetrafluoride
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Journal Articles

In situ determination of growth rate by pyrometric interferometry during molecular-beam epitaxy: Application to the growth of AlGaN/GaN quantum wells

H. M. Ng, S. N. G. Chu, A. Y. Cho
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 19, 292–294 (2001)
https://doi.org/10.1116/1.1335838
Published: January 2001
View article titled, <em>In</em> <em>situ</em> determination of growth rate by pyrometric interferometry during molecular-beam epitaxy: Application to the growth of AlGaN/GaN quantum wells
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Journal Articles

Fluorocarbon polymer deposition kinetics in a low-pressure, high-density, inductively coupled plasma reactor

M. J. Sowa, M. E. Littau, V. Pohray, J. L. Cecchi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 18, 2122–2129 (2000)
https://doi.org/10.1116/1.1286396
Published: September 2000
View article titled, Fluorocarbon polymer deposition kinetics in a low-pressure, high-density, inductively coupled plasma reactor
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Journal Articles

Thickness determination of metal thin films with spectroscopic ellipsometry for x-ray mirror and multilayer applications

Chian Liu, J. Erdmann, J. Maj, A. Macrander
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 17, 2741–2748 (1999)
https://doi.org/10.1116/1.581939
Published: September 1999
View article titled, Thickness determination of metal thin films with spectroscopic ellipsometry for x-ray mirror and multilayer applications
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Journal Articles

Analysis of the etching of silicon in an inductively coupled chlorine plasma using laser thermal desorption

Jae Y. Choe, Irving P. Herman, Vincent M. Donnelly
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 15, 3024–3031 (1997)
https://doi.org/10.1116/1.580899
Published: November 1997
View article titled, Analysis of the etching of silicon in an inductively coupled chlorine plasma using laser thermal desorption
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Journal Articles

Temperature and concentration effects on ozone ashing of photoresist

W. L. Gardner, A. P. Baddorf, W. M. Holber
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 15, 1409–1412 (1997)
https://doi.org/10.1116/1.580551
Published: May 1997
View article titled, Temperature and concentration effects on ozone ashing of photoresist
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