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Journal Articles

Study of Al2124-SiC nanocomposites by an improved statistical nanoindentation methodology

Esteban Broitman, Yuri Kadin, Predrag Andric
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063210 (2023)
https://doi.org/10.1116/6.0003048
Published: November 2023
View article titled, Study of Al2124-SiC nanocomposites by an improved statistical nanoindentation methodology
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Journal Articles

Nonadiabatic localization of H2 in the field of two external positive tip charges

W. Schattke, M. A. Van Hove, R. Díez Muiño
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 053206 (2021)
https://doi.org/10.1116/6.0001138
Published: August 2021
View article titled, Nonadiabatic localization of H<sub>2</sub> in the field of two external positive tip charges
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Journal Articles

Electron beam injection from a hollow cathode plasma into a downstream reactive environment: Characterization of secondary plasma production and Si3N4 and Si etching

Chen Li, Valery Godyak, Thorsten Hofmann, Klaus Edinger, Gottlieb S. Oehrlein
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 033001 (2020)
https://doi.org/10.1116/1.5143537
Published: March 2020
View article titled, Electron beam injection from a hollow cathode plasma into a downstream reactive environment: Characterization of secondary plasma production and Si<sub>3</sub>N<sub>4</sub> and Si etching
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Journal Articles

Epitaxial multilayers of β-FeSi2 nanodots/Si for Si-based nanostructured electronic materials

Shunya Sakane, Masayuki Isogawa, Kentaro Watanabe, Jun Kikkawa, Shotaro Takeuchi, Akira Sakai, Yoshiaki Nakamura
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 041402 (2017)
https://doi.org/10.1116/1.4984107
Published: June 2017
View article titled, Epitaxial multilayers of <em>β</em>-FeSi<sub>2</sub> nanodots/Si for Si-based nanostructured electronic materials
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Journal Articles

Experimental and numerical investigations on time-resolved characteristics of pulsed inductively coupled O2/Ar plasmas

Chan Xue, De-Qi Wen, Wei Liu, Yu-Ru Zhang, Fei Gao, You-Nian Wang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 021301 (2017)
https://doi.org/10.1116/1.4967913
Published: November 2016
View article titled, Experimental and numerical investigations on time-resolved characteristics of pulsed inductively coupled O<sub>2</sub>/Ar plasmas
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Journal Articles

Improved inflection point method of emissive probe for accurate measurement of plasma potential

Jian-quan Li, Jun Xu, Yu-jing Bai, Wen-qi Lu, You-nian Wang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 061304 (2016)
https://doi.org/10.1116/1.4964834
Published: October 2016
View article titled, Improved inflection point method of emissive probe for accurate measurement of plasma potential
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Journal Articles

Implementation of atomic layer etching of silicon: Scaling parameters, feasibility, and profile control

Alok Ranjan, Mingmei Wang, Sonam D. Sherpa, Vinayak Rastogi, Akira Koshiishi, Peter L. G. Ventzek
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 031304 (2016)
https://doi.org/10.1116/1.4944850
Published: March 2016
View article titled, Implementation of atomic layer etching of silicon: Scaling parameters, feasibility, and profile control
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Journal Articles

Probabilistic distributions of pinhole defects in atomic layer deposited films on polymeric substrates

Alexander S. Yersak, Yung-Cheng Lee
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 01A149 (2016)
https://doi.org/10.1116/1.4938496
Published: December 2015
View article titled, Probabilistic distributions of pinhole defects in atomic layer deposited films on polymeric substrates
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Journal Articles

Nanoscale characterization and metrology

Alain C. Diebold
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 31, 050804 (2013)
https://doi.org/10.1116/1.4807116
Published: May 2013
View article titled, Nanoscale characterization and metrology
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Journal Articles

A model for calculating resputter rates in codeposition

J. M. Gregoire, R. B. van Dover
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 26, 1030–1036 (2008)
https://doi.org/10.1116/1.2885213
Published: July 2008
View article titled, A model for calculating resputter rates in codeposition
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Journal Articles

Tuning metal surface diffusion on diblock copolymer films

S. B. Darling, Axel Hoffmann
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 25, 1048–1051 (2007)
https://doi.org/10.1116/1.2748806
Published: July 2007
View article titled, Tuning metal surface diffusion on diblock copolymer films
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Journal Articles

Electron and ion kinetics in magnetized capacitively coupled plasma source

S. H. Lee, S. J. You, H. Y. Chang, J. K. Lee
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 25, 455–463 (2007)
https://doi.org/10.1116/1.2713408
Published: March 2007
View article titled, Electron and ion kinetics in magnetized capacitively coupled plasma source
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Journal Articles

Temperature characterization of a - Si : H thin-film transistor for analog circuit design using analog hardware description language modeling

Clement Ng, Arokia Nathan
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 24, 883–887 (2006)
https://doi.org/10.1116/1.2167084
Published: May 2006
View article titled, Temperature characterization of a - Si : H thin-film transistor for analog circuit design using analog hardware description language modeling
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Journal Articles

Maximum likelihood principal component analysis of time-of-flight secondary ion mass spectrometry spectral images

Michael R. Keenan
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 23, 746–750 (2005)
https://doi.org/10.1116/1.1861935
Published: June 2005
View article titled, Maximum likelihood principal component analysis of time-of-flight secondary ion mass spectrometry spectral images
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Journal Articles

Monte Carlo simulation of growth and decay processes in a cluster aggregation source

Boris Briehl, Herbert M. Urbassek
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 17, 256–265 (1999)
https://doi.org/10.1116/1.581580
Published: January 1999
View article titled, Monte Carlo simulation of growth and decay processes in a cluster aggregation source
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Journal Articles

Analysis of surface void fraction using atomic force microscopy

C. S. Lindquist, F. K. Urban, III
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 14, 1957–1962 (1996)
https://doi.org/10.1116/1.580367
Published: May 1996
View article titled, Analysis of surface void fraction using atomic force microscopy
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Journal Articles

Correction of dead time effects in time‐of‐flight mass spectrometry

T. Stephan, J. Zehnpfenning, A. Benninghoven
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 12, 405–410 (1994)
https://doi.org/10.1116/1.579255
Published: March 1994
View article titled, Correction of dead time effects in time‐of‐flight mass spectrometry
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Journal Articles

New ways of using tests on statistical properties of randomly real rough surfaces

F. Varnier, G. Rasigni, A. Llebaria
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 10, 2869–2874 (1992)
https://doi.org/10.1116/1.577722
Published: July 1992
View article titled, New ways of using tests on statistical properties of randomly real rough surfaces
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Journal Articles

Applications of surface analytical techniques to the characterization of catalytic reactions

Charles T. Campbell
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 6, 1108–1112 (1988)
https://doi.org/10.1116/1.575654
Published: May 1988
View article titled, Applications of surface analytical techniques to the characterization of catalytic reactions
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Journal Articles

Gas concentration nonuniformity and kinetic anisotropy in high vacuum

Andrzej Horodeński
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 3, 39–44 (1985)
https://doi.org/10.1116/1.573243
Published: January 1985
View article titled, Gas concentration nonuniformity and kinetic anisotropy in high vacuum
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