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Journal Articles

Kinetic Monte Carlo study on the effect of growth conditions on the epitaxial growth of 3C–SiC (0001) vicinal surface

Xuejiang Chen, Xinyao Zhang, Wensen Ai
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 022703 (2024)
https://doi.org/10.1116/6.0003144
Published: January 2024
View article titled, Kinetic Monte Carlo study on the effect of growth conditions on the epitaxial growth of 3C–SiC (0001) vicinal surface
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Journal Articles

Bottom angle control mechanism and optimization of slanted gratings for optical applications

Jiuru Gao, Chanjuan Liu, Zhiwei He, Shuo Dong, Kaidong Xu, Shiwei Zhuang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 023403 (2024)
https://doi.org/10.1116/6.0003221
Published: January 2024
View article titled, Bottom angle control mechanism and optimization of slanted gratings for optical applications
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Journal Articles

Modeling of microtrenching and bowing effects in nanoscale Si inductively coupled plasma etching process

Ziyi Hu, Hua Shao, Junjie Li, Panpan Lai, Wenrui Wang, Chen Li, Qi Yan, Xiaobin He, Junfeng Li, Tao Yang, Rui Chen, Yayi Wei
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063113 (2023)
https://doi.org/10.1116/6.0003032
Published: November 2023
View article titled, Modeling of microtrenching and bowing effects in nanoscale Si inductively coupled plasma etching process
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Journal Articles

Size distribution of clusters and nucleation preference of trimers during SiC (0001) surface epitaxial growth under low coverage

Wensen Ai, Xuejiang Chen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 042713 (2023)
https://doi.org/10.1116/6.0002686
Published: June 2023
View article titled, Size distribution of clusters and nucleation preference of trimers during SiC (0001) surface epitaxial growth under low coverage
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Journal Articles

Voltage waveform tailoring for high aspect ratio plasma etching of SiO2 using Ar/CF4/O2 mixtures: Consequences of ion and electron distributions on etch profiles

Editor’s Pick
Florian Krüger, Hyunjae Lee, Sang Ki Nam, Mark J. Kushner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 013006 (2023)
https://doi.org/10.1116/6.0002290
Published: December 2022
View article titled, Voltage waveform tailoring for high aspect ratio plasma etching of SiO<sub>2</sub> using Ar/CF<sub>4</sub>/O<sub>2</sub> mixtures: Consequences of ion and electron distributions on etch profiles
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Journal Articles

Coalescence of ultrathin films by atomic layer deposition or chemical vapor deposition: Models of the minimum thickness based on nucleation and growth rates

Diana K. LaFollette, Kinsey L. Canova, Zhejun V. Zhang, John R. Abelson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 023403 (2022)
https://doi.org/10.1116/6.0001562
Published: January 2022
View article titled, Coalescence of ultrathin films by atomic layer deposition or chemical vapor deposition: Models of the minimum thickness based on nucleation and growth rates
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Includes: Supplementary data
Journal Articles

Step barrier effects during early stages of the kinetic roughening of fcc(111) surfaces

Joachim Wollschläger, Mats I. Larsson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 013210 (2022)
https://doi.org/10.1116/6.0001410
Published: December 2021
View article titled, Step barrier effects during early stages of the kinetic roughening of fcc(111) surfaces
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Journal Articles

Betavoltaic cell based on Ni/β-Ga2O3 and 63Ni source

Eugene B. Yakimov, Alexander Y. Polyakov, Stephen J. Pearton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 010401 (2022)
https://doi.org/10.1116/6.0001533
Published: November 2021
View article titled, Betavoltaic cell based on Ni/β-Ga<sub>2</sub>O<sub>3</sub> and <sup>63</sup>Ni source
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Includes: Supplementary data
Journal Articles

Effects of structured electrodes on electron power absorption and plasma uniformity in capacitive RF discharges

Li Wang, Peter Hartmann, Zoltán Donkó, Yuan-Hong Song, Julian Schulze
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 063004 (2021)
https://doi.org/10.1116/6.0001327
Published: October 2021
View article titled, Effects of structured electrodes on electron power absorption and plasma uniformity in capacitive RF discharges
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Journal Articles

Impact of ion species on ion beam sputtered Ta2O5 layer quality parameters and on corresponding process productivity: A preinvestigation for large-area coatings

Wjatscheslaw Sakiew, Philippe Schwerdtner, Marco Jupé, Andreas Pflug, Detlev Ristau
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 063402 (2021)
https://doi.org/10.1116/6.0001224
Published: September 2021
View article titled, Impact of ion species on ion beam sputtered Ta<sub>2</sub>O<sub>5</sub> layer quality parameters and on corresponding process productivity: A preinvestigation for large-area coatings
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Journal Articles

Nonadiabatic localization of H2 in the field of two external positive tip charges

W. Schattke, M. A. Van Hove, R. Díez Muiño
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 053206 (2021)
https://doi.org/10.1116/6.0001138
Published: August 2021
View article titled, Nonadiabatic localization of H<sub>2</sub> in the field of two external positive tip charges
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Journal Articles

Practical guides for x-ray photoelectron spectroscopy (XPS): Interpreting the carbon 1s spectrum

Thomas R. Gengenbach, George H. Major, Matthew R. Linford, Christopher D. Easton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 013204 (2021)
https://doi.org/10.1116/6.0000682
Published: January 2021
View article titled, Practical guides for x-ray photoelectron spectroscopy (XPS): Interpreting the carbon 1s spectrum
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Journal Articles

Plasma polymerization of cyclopropylamine in a low-pressure cylindrical magnetron reactor: A PIC-MC study of the roles of ions and radicals

Stella Mathioudaki, Cédric R. Vandenabeele, Romain Tonneau, Andreas Pflug, Jonathan Tennyson, Stéphane Lucas
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 033003 (2020)
https://doi.org/10.1116/1.5142913
Published: April 2020
View article titled, Plasma polymerization of cyclopropylamine in a low-pressure cylindrical magnetron reactor: A PIC-MC study of the roles of ions and radicals
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Journal Articles

Formation mechanisms of etched feature profiles during Si etching in Cl2/O2 plasmas

Masahito Mori, Yugo Osano, Shoki Irie, Koji Eriguchi, Kouichi Ono
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 051301 (2019)
https://doi.org/10.1116/1.5091673
Published: July 2019
View article titled, Formation mechanisms of etched feature profiles during Si etching in Cl<sub>2</sub>/O<sub>2</sub> plasmas
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Journal Articles

On the limit of defect doping in transition metal oxides

Aravindh Kumar, Raisul Islam, Dipankar Pramanik, Krishna Saraswat
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 021505 (2019)
https://doi.org/10.1116/1.5055563
Published: January 2019
View article titled, On the limit of defect doping in transition metal oxides
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Includes: Supplementary data
Journal Articles

Chemical composition and properties of MoAl thin films deposited by sputtering from MoAl compound targets

Roland Lorenz, Michael O'Sullivan, Dietmar Sprenger, Bernhard Lang, Christian Mitterer
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 041504 (2017)
https://doi.org/10.1116/1.4983689
Published: May 2017
View article titled, Chemical composition and properties of MoAl thin films deposited by sputtering from MoAl compound targets
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Journal Articles

SiO2 etching in an Ar/c-C4F8/O2 dual frequency capacitively coupled plasma

Shahid Rauf, Ajit Balakrishna
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 021308 (2017)
https://doi.org/10.1116/1.4973299
Published: December 2016
View article titled, SiO<sub>2</sub> etching in an Ar/c-C<sub>4</sub>F<sub>8</sub>/O<sub>2</sub> dual frequency capacitively coupled plasma
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Journal Articles

Monte Carlo simulations of atomic layer deposition on 3D large surface area structures: Required precursor exposure for pillar- versus hole-type structures

Véronique Cremers, Filip Geenen, Christophe Detavernier, Jolien Dendooven
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 01B115 (2017)
https://doi.org/10.1116/1.4968201
Published: November 2016
View article titled, Monte Carlo simulations of atomic layer deposition on 3D large surface area structures: Required precursor exposure for pillar- versus hole-type structures
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Journal Articles

Simulation of cryogenic silicon etching under SF6/O2/Ar plasma discharge

Yehya Haidar, Ahmed Rhallabi, Amand Pateau, Arezki Mokrani, Fadia Taher, Fabrice Roqueta, Mohamed Boufnichel
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 061306 (2016)
https://doi.org/10.1116/1.4966606
Published: November 2016
View article titled, Simulation of cryogenic silicon etching under SF<sub>6</sub>/O<sub>2</sub>/Ar plasma discharge
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Journal Articles

Order-of-magnitude differences in retention of low-energy Ar implanted in Si and SiO2

Klaus Wittmaack, Andrew Giordani, Rachel Umbel, Jerry L. Hunter, Jr.
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 051404 (2016)
https://doi.org/10.1116/1.4961574
Published: August 2016
View article titled, Order-of-magnitude differences in retention of low-energy Ar implanted in Si and SiO<sub>2</sub>
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