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Journal Articles
Tuning the crystallinity of TiO2 coatings synthesized by an atmospheric pressure dielectric barrier discharge in a single step process
Available to PurchaseNicolas Fosseur, Thomas Fontaine, David Petitjean, Loïc Malet, Rony Snyders, Stéphane Godet, François Reniers
J. Vac. Sci. Technol. A 43, 043413 (2025)
Published: June 2025
Journal Articles
J. Vac. Sci. Technol. A 43, 043007 (2025)
Published: June 2025
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J. Vac. Sci. Technol. A 43, 042603 (2025)
Published: June 2025
Journal Articles
J. Vac. Sci. Technol. A 43, 040402 (2025)
Published: May 2025
Journal Articles
Michael Snure, Eric W. Blanton, Gordon Grzybowski, Bita Pourbahari, Nabil Bassim, Nicholas R. Glavin
J. Vac. Sci. Technol. A 43, 043405 (2025)
Published: May 2025
Journal Articles
Fabrication of soft x-ray windows based on multilayer graphene films
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J. Vac. Sci. Technol. A 43, 043404 (2025)
Published: May 2025
Journal Articles
AI-guided frame prediction techniques to model single crystal diamond growth
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J. Vac. Sci. Technol. A 43, 032708 (2025)
Published: May 2025
Journal Articles
J. Vac. Sci. Technol. A 43, 032405 (2025)
Published: March 2025
Journal Articles
Research on the difference in etching rates of SiO2 at the top and bottom of high-aspect-ratio trench in C4F8/Ar/O2 plasma etching
Available to PurchaseLeyi Zhang, Zhihong Gao, Yongzhi Fang, Dongyu Cen, Maoxiang Liu, Yan Zhang, Chunxia Ma, Enhao Zhao, Wencan Zhu, Wenli Wu, Xudong Wei
J. Vac. Sci. Technol. A 43, 033003 (2025)
Published: March 2025
Journal Articles
J. Vac. Sci. Technol. A 43, 030801 (2025)
Published: March 2025
Journal Articles
SiO2 atomic-layer fluorination-passivation for dual-material molybdenum/polypyrrole area-selective deposition and strategies for surface reactivation
J. Vac. Sci. Technol. A 43, 032401 (2025)
Published: March 2025
Journal Articles
J. Vac. Sci. Technol. A 43, 022413 (2025)
Published: March 2025
Journal Articles
Area selective PECVD on metal oxide resist
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J. Vac. Sci. Technol. A 43, 023407 (2025)
Published: February 2025
Journal Articles
Enhancing chemical vapor deposition growth and fabrication techniques to maximize hole conduction in tungsten diselenide for monolithic CMOS integration
Jatin Vikram Singh, Matthew N. Disiena, S. S. Teja Nibhanupudi, Nicholas T. Watanabe, JaeHyun Ahn, Dong-Won Kim, Anupam Roy, Sanjay K. Banerjee
J. Vac. Sci. Technol. A 43, 022201 (2025)
Published: February 2025
Journal Articles
Effect of organic solvent treatments on oCVD-deposited PEDOT thin films
Available to PurchaseTravis G. Novak, R. Blake Nuwayhid, Battogtokh Jugdersuren, Xiao Liu, Paul A. DeSario, Debra R. Rolison
J. Vac. Sci. Technol. A 43, 022801 (2025)
Published: February 2025
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Study on elementary gas-phase reaction kinetics and chemical vapor deposition modeling from methyltrichlorosilane
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J. Vac. Sci. Technol. A 43, 022702 (2025)
Published: February 2025
Journal Articles
Boron atoms migration during epitaxial growth of boron-doped single-crystal diamond
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J. Vac. Sci. Technol. A 43, 023402 (2025)
Published: January 2025
Journal Articles
Effect of a-C:H:SiOx coating thickness on corrosion resistance and zeta potential level of Ti-6Al-4V
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J. Vac. Sci. Technol. A 43, 023401 (2025)
Published: January 2025
Journal Articles
Lattice kinetic Monte Carlo method on fractal growth of transition metal dichalcogenides
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J. Vac. Sci. Technol. A 43, 012202 (2025)
Published: January 2025
Journal Articles
Molecular dynamics investigation of heteroepitaxial growth of quaternary AlInGaN on wurtzite-GaN surface along [0001] direction
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J. Vac. Sci. Technol. A 43, 012702 (2025)
Published: December 2024
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