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Journal Articles

Tuning the crystallinity of TiO2 coatings synthesized by an atmospheric pressure dielectric barrier discharge in a single step process

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Nicolas Fosseur, Thomas Fontaine, David Petitjean, Loïc Malet, Rony Snyders, Stéphane Godet, François Reniers
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 043413 (2025)
https://doi.org/10.1116/6.0004617
Published: June 2025
View articletitled, Tuning the crystallinity of TiO2 coatings synthesized by an atmospheric pressure dielectric barrier discharge in a single step process
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Journal Articles

Characterization of H2 plasma within RF-powered hollow cathode discharge equipped with hybrid multicusp magnetic field under varying inner-ring magnetic strength

Open Access
Md Hasibul Islam, Yasunori Ohtsu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 043007 (2025)
https://doi.org/10.1116/6.0004690
Published: June 2025
View articletitled, Characterization of H2 plasma within RF-powered hollow cathode discharge equipped with hybrid multicusp magnetic field under varying inner-ring magnetic strength
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Journal Articles

On the way to more sustainability: Development of five Al0.25Ga0.75N atomic layer etching modes for shorter cycle times

Open Access
Christian Miersch, Sarah Seidel, Friedrich Roth, Johannes Heitmann, Franziska C. Beyer
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 042603 (2025)
https://doi.org/10.1116/6.0004593
Published: June 2025
View articletitled, On the way to more sustainability: Development of five Al0.25Ga0.75N atomic layer etching modes for shorter cycle times
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Journal Articles

Self-limiting deposition of copper from copper beta-diketonates and plasma electrons

Open Access
Premrudee Promdet, Pentti Niiranen, Simon Lagerkvist, Daniel Lundin, Henrik Pedersen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 040402 (2025)
https://doi.org/10.1116/6.0004410
Published: May 2025
View articletitled, Self-limiting deposition of copper from copper beta-diketonates and plasma electrons
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Journal Articles

In situ metal organic chemical vapor deposition of ultrathin sp2-bonded boron nitride dielectric on gallium nitride

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Michael Snure, Eric W. Blanton, Gordon Grzybowski, Bita Pourbahari, Nabil Bassim, Nicholas R. Glavin
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 043405 (2025)
https://doi.org/10.1116/6.0004483
Published: May 2025
View articletitled, In situ metal organic chemical vapor deposition of ultrathin sp2-bonded boron nitride dielectric on gallium nitride
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Journal Articles

Fabrication of soft x-ray windows based on multilayer graphene films

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Bingxin Wu, Hailin Bi, Wenyu Lin, Zhengwei Mei, Ziyang He, Xudi Wang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 043404 (2025)
https://doi.org/10.1116/6.0004468
Published: May 2025
View articletitled, Fabrication of soft x-ray windows based on multilayer graphene films
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Journal Articles

AI-guided frame prediction techniques to model single crystal diamond growth

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Rohan Reddy Mekala, Arjun Srinivasan, Matthias Muehle, Elias Garratt, Adam Porter, Mikael Lindvall
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 032708 (2025)
https://doi.org/10.1116/6.0004290
Published: May 2025
View articletitled, AI-guided frame prediction techniques to model single crystal diamond growth
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Journal Articles

Atomic layer deposition of AlxTi1−xN via co-evaporation of metal precursors

Open Access
Pamburayi Mpofu, Pentti Niiranen, Oscar Alm, Jonas Lauridsen, Tommy Larsson, Henrik Pedersen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 032405 (2025)
https://doi.org/10.1116/6.0004420
Published: March 2025
View articletitled, Atomic layer deposition of AlxTi1−xN via co-evaporation of metal precursors
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Journal Articles

Research on the difference in etching rates of SiO2 at the top and bottom of high-aspect-ratio trench in C4F8/Ar/O2 plasma etching

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Leyi Zhang, Zhihong Gao, Yongzhi Fang, Dongyu Cen, Maoxiang Liu, Yan Zhang, Chunxia Ma, Enhao Zhao, Wencan Zhu, Wenli Wu, Xudong Wei
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 033003 (2025)
https://doi.org/10.1116/6.0004402
Published: March 2025
View articletitled, Research on the difference in etching rates of SiO2 at the top and bottom of high-aspect-ratio trench in C4F8/Ar/O2 plasma etching
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Journal Articles

Recent trends in thermal atomic layer deposition chemistry

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Georgi Popov, Miika Mattinen, Anton Vihervaara, Markku Leskelä
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 030801 (2025)
https://doi.org/10.1116/6.0004320
Published: March 2025
View articletitled, Recent trends in thermal atomic layer deposition chemistry
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Journal Articles

SiO2 atomic-layer fluorination-passivation for dual-material molybdenum/polypyrrole area-selective deposition and strategies for surface reactivation

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Hwan Oh, Hyuenwoo Yang, Nicholas M. Carroll, Yujin Jang, Gregory N. Parsons
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 032401 (2025)
https://doi.org/10.1116/6.0004298
Published: March 2025
View articletitled, SiO2 atomic-layer fluorination-passivation for dual-material molybdenum/polypyrrole area-selective deposition and strategies for surface reactivation
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Journal Articles

Development of single-chamber deposition equipment for organic/inorganic nanohybrid composite material

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Kyungmin Yoo, Youngchan Kim, Seo Kyung Park, Sungho Park, Je Seung Lee
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 022413 (2025)
https://doi.org/10.1116/6.0004213
Published: March 2025
View articletitled, Development of single-chamber deposition equipment for organic/inorganic nanohybrid composite material
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Journal Articles

Area selective PECVD on metal oxide resist

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Rosanna A. Robert, Katie Lutker-Lee, Christophe Vallée
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 023407 (2025)
https://doi.org/10.1116/6.0004072
Published: February 2025
View articletitled, Area selective PECVD on metal oxide resist
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Journal Articles

Enhancing chemical vapor deposition growth and fabrication techniques to maximize hole conduction in tungsten diselenide for monolithic CMOS integration

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Jatin Vikram Singh, Matthew N. Disiena, S. S. Teja Nibhanupudi, Nicholas T. Watanabe, JaeHyun Ahn, Dong-Won Kim, Anupam Roy, Sanjay K. Banerjee
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 022201 (2025)
https://doi.org/10.1116/6.0003893
Published: February 2025
View articletitled, Enhancing chemical vapor deposition growth and fabrication techniques to maximize hole conduction in tungsten diselenide for monolithic CMOS integration
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Journal Articles

Effect of organic solvent treatments on oCVD-deposited PEDOT thin films

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Travis G. Novak, R. Blake Nuwayhid, Battogtokh Jugdersuren, Xiao Liu, Paul A. DeSario, Debra R. Rolison
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 022801 (2025)
https://doi.org/10.1116/6.0004304
Published: February 2025
View articletitled, Effect of organic solvent treatments on oCVD-deposited PEDOT thin films
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Journal Articles

Study on elementary gas-phase reaction kinetics and chemical vapor deposition modeling from methyltrichlorosilane

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Botao Song, Bing Gao, Sheng Liu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 022702 (2025)
https://doi.org/10.1116/6.0004201
Published: February 2025
View articletitled, Study on elementary gas-phase reaction kinetics and chemical vapor deposition modeling from methyltrichlorosilane
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Journal Articles

Boron atoms migration during epitaxial growth of boron-doped single-crystal diamond

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Yulong Zhu, Xingyan Li, Li Gou
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 023402 (2025)
https://doi.org/10.1116/6.0004186
Published: January 2025
View articletitled, Boron atoms migration during epitaxial growth of boron-doped single-crystal diamond
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Journal Articles

Effect of a-C:H:SiOx coating thickness on corrosion resistance and zeta potential level of Ti-6Al-4V

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A. S. Grenadyorov, V. V. Chebodaeva, I. А. Khlusov, V. O. Semin, N. E. Madzhara, A. A. Solovyev
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 023401 (2025)
https://doi.org/10.1116/6.0004085
Published: January 2025
View articletitled, Effect of a-C:H:SiOx coating thickness on corrosion resistance and zeta potential level of Ti-6Al-4V
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Journal Articles

Lattice kinetic Monte Carlo method on fractal growth of transition metal dichalcogenides

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Xuejiang Chen, Yishan Lin, Wensen Ai, Xinyao Zhang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 012202 (2025)
https://doi.org/10.1116/6.0004104
Published: January 2025
View articletitled, Lattice kinetic Monte Carlo method on fractal growth of transition metal dichalcogenides
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Journal Articles

Molecular dynamics investigation of heteroepitaxial growth of quaternary AlInGaN on wurtzite-GaN surface along [0001] direction

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Anuj Debnath, Chandan K. Das
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 012702 (2025)
https://doi.org/10.1116/6.0004113
Published: December 2024
View articletitled, Molecular dynamics investigation of heteroepitaxial growth of quaternary AlInGaN on wurtzite-GaN surface along [0001] direction
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