1-20 of 155
Electron impact ionization
Close
Save search
Follow your search
Access your saved searches in your account
Close Modal
Sort by
Journal Articles

Selective generation of reactive oxygen species in plasma-activated water using CO2 plasma

Vikas Rathore, Sudhir Kumar Nema
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 043001 (2023)
https://doi.org/10.1116/6.0002460
Published: May 2023
View article titled, Selective generation of reactive oxygen species in plasma-activated water using CO<sub>2</sub> plasma
Open the PDF for Selective generation of reactive oxygen species in plasma-activated water using CO<sub>2</sub> plasma in another window
Journal Articles

Thermal atomic layer etching of VO2 using sequential BCl3 and SF4 exposures: Observation of conversion, ligand-exchange, and oxidation state changes

Jonas C. Gertsch, Jonathan L. Partridge, Austin M. Cano, Joel W. Clancey, Victor M. Bright, Steven M. George
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 012603 (2023)
https://doi.org/10.1116/6.0002149
Published: January 2023
View article titled, Thermal atomic layer etching of VO<sub>2</sub> using sequential BCl<sub>3</sub> and SF<sub>4</sub> exposures: Observation of conversion, ligand-exchange, and oxidation state changes
Open the PDF for Thermal atomic layer etching of VO<sub>2</sub> using sequential BCl<sub>3</sub> and SF<sub>4</sub> exposures: Observation of conversion, ligand-exchange, and oxidation state changes in another window
Includes: Supplementary data
Journal Articles

Atmospheric pressure plasma functionalization of polystyrene

Jordyn Polito, Mark Denning, Richard Stewart, David Frost, Mark J. Kushner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 043001 (2022)
https://doi.org/10.1116/6.0001850
Published: May 2022
View article titled, Atmospheric pressure plasma functionalization of polystyrene
Open the PDF for Atmospheric pressure plasma functionalization of polystyrene in another window
Journal Articles

Elucidating energetics and kinetics in environmentally relevant mixed gas plasmas

Tara L. Van Surksum, Ellen R. Fisher
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 053001 (2021)
https://doi.org/10.1116/6.0001080
Published: July 2021
View article titled, Elucidating energetics and kinetics in environmentally relevant mixed gas plasmas
Open the PDF for Elucidating energetics and kinetics in environmentally relevant mixed gas plasmas in another window
Includes: Supplementary data
Journal Articles

A high-power impulse magnetron sputtering global model for argon plasma–chromium target interactions

Joelle Zgheib, Pierre Yves Jouan, Ahmed Rhallabi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 043004 (2021)
https://doi.org/10.1116/6.0000865
Published: June 2021
View article titled, A high-power impulse magnetron sputtering global model for argon plasma–chromium target interactions
Open the PDF for A high-power impulse magnetron sputtering global model for argon plasma–chromium target interactions in another window
Journal Articles

Glow discharge-optical emission spectroscopy for in situ analysis of surfaces in plasmas

Priyanka Arora, Junghyun Cho, Rafael Cervantes, Vincent M. Donnelly
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 063004 (2020)
https://doi.org/10.1116/6.0000373
Published: October 2020
View article titled, Glow discharge-optical emission spectroscopy for <em>in situ</em> analysis of surfaces in plasmas
Open the PDF for Glow discharge-optical emission spectroscopy for <em>in situ</em> analysis of surfaces in plasmas in another window
Journal Articles

Gas-phase diagnostic studies of H2 and CH4 inductively coupled plasmas

Tara L. Van Surksum, Ellen R. Fisher
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 033010 (2020)
https://doi.org/10.1116/6.0000090
Published: April 2020
View article titled, Gas-phase diagnostic studies of H<sub>2</sub> and CH<sub>4</sub> inductively coupled plasmas
Open the PDF for Gas-phase diagnostic studies of H<sub>2</sub> and CH<sub>4</sub> inductively coupled plasmas in another window
Journal Articles

Excitation mechanisms in a nonequilibrium helium plasma jet emerging in ambient air at 1 atm

Tam Nguyen, Eduardo Hernandez, Vincent M. Donnelly, Demetre J. Economou
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 04F406 (2018)
https://doi.org/10.1116/1.5023693
Published: June 2018
View article titled, Excitation mechanisms in a nonequilibrium helium plasma jet emerging in ambient air at 1 atm
Open the PDF for Excitation mechanisms in a nonequilibrium helium plasma jet emerging in ambient air at 1 atm in another window
Journal Articles

Mass spectrometric method for estimating dissociation rates in hydrogen discharge plasmas

A. Cotter, Alexander Stowell, John Carlson, James R. Doyle
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 031304 (2018)
https://doi.org/10.1116/1.5020723
Published: April 2018
View article titled, Mass spectrometric method for estimating dissociation rates in hydrogen discharge plasmas
Open the PDF for Mass spectrometric method for estimating dissociation rates in hydrogen discharge plasmas in another window
Journal Articles

Downstream etching of silicon nitride using continuous-wave and pulsed remote plasma sources sustained in Ar/NF3/O2 mixtures

Shuo Huang, Vladimir Volynets, James R. Hamilton, Sang Ki Nam, In-Cheol Song, Siqing Lu, Jonathan Tennyson, Mark J. Kushner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 021305 (2018)
https://doi.org/10.1116/1.5019673
Published: February 2018
View article titled, Downstream etching of silicon nitride using continuous-wave and pulsed remote plasma sources sustained in Ar/NF<sub>3</sub>/O<sub>2</sub> mixtures
Open the PDF for Downstream etching of silicon nitride using continuous-wave and pulsed remote plasma sources sustained in Ar/NF<sub>3</sub>/O<sub>2</sub> mixtures in another window
Journal Articles

Insights to scaling remote plasma sources sustained in NF3 mixtures

Shuo Huang, Vladimir Volynets, James R. Hamilton, Sangheon Lee, In-Cheol Song, Siqing Lu, Jonathan Tennyson, Mark J. Kushner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 031302 (2017)
https://doi.org/10.1116/1.4978551
Published: March 2017
View article titled, Insights to scaling remote plasma sources sustained in NF<sub>3</sub> mixtures
Open the PDF for Insights to scaling remote plasma sources sustained in NF<sub>3</sub> mixtures in another window
Journal Articles

Inductively coupled BCl3/Cl2/Ar plasma etching of Al-rich AlGaN

Erica A. Douglas, Carlos A. Sanchez, Robert J. Kaplar, Andrew A. Allerman, Albert G. Baca
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 021305 (2017)
https://doi.org/10.1116/1.4971245
Published: December 2016
View article titled, Inductively coupled BCl<sub>3</sub>/Cl<sub>2</sub>/Ar plasma etching of Al-rich AlGaN
Open the PDF for Inductively coupled BCl<sub>3</sub>/Cl<sub>2</sub>/Ar plasma etching of Al-rich AlGaN in another window
Journal Articles

Experimental and numerical investigations on time-resolved characteristics of pulsed inductively coupled O2/Ar plasmas

Chan Xue, De-Qi Wen, Wei Liu, Yu-Ru Zhang, Fei Gao, You-Nian Wang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 021301 (2017)
https://doi.org/10.1116/1.4967913
Published: November 2016
View article titled, Experimental and numerical investigations on time-resolved characteristics of pulsed inductively coupled O<sub>2</sub>/Ar plasmas
Open the PDF for Experimental and numerical investigations on time-resolved characteristics of pulsed inductively coupled O<sub>2</sub>/Ar plasmas in another window
Journal Articles

Insights into the mechanism of in-plasma photo-assisted etching using optical emission spectroscopy

Shyam Sridhar, Lei Liu, Emilia W. Hirsch, Vincent M. Donnelly, Demetre J. Economou
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 061303 (2016)
https://doi.org/10.1116/1.4964641
Published: October 2016
View article titled, Insights into the mechanism of in-plasma photo-assisted etching using optical emission spectroscopy
Open the PDF for Insights into the mechanism of in-plasma photo-assisted etching using optical emission spectroscopy in another window
Journal Articles

Synthesis of hydrogenated diamondlike carbon thin films using neon–acetylene based high power impulse magnetron sputtering discharges

Asim Aijaz, Sascha Louring, Daniel Lundin, Tomáš Kubart, Jens Jensen, Kostas Sarakinos, Ulf Helmersson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 061504 (2016)
https://doi.org/10.1116/1.4964749
Published: October 2016
View article titled, Synthesis of hydrogenated diamondlike carbon thin films using neon–acetylene based high power impulse magnetron sputtering discharges
Open the PDF for Synthesis of hydrogenated diamondlike carbon thin films using neon–acetylene based high power impulse magnetron sputtering discharges in another window
Journal Articles

F-atom kinetics in SF6/Ar inductively coupled plasmas

Wei Yang, Shu-Xia Zhao, De-Qi Wen, Wei Liu, Yong-Xin Liu, Xue-Chun Li, You-Nian Wang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 031305 (2016)
https://doi.org/10.1116/1.4945003
Published: March 2016
View article titled, F-atom kinetics in SF<sub>6</sub>/Ar inductively coupled plasmas
Open the PDF for F-atom kinetics in SF<sub>6</sub>/Ar inductively coupled plasmas in another window
Journal Articles

One-dimensional Ar-SF6 hydromodel at low-pressure in e-beam generated plasmas

George M. Petrov, David R. Boris, Tzvetelina B. Petrova, Scott G. Walton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 021302 (2016)
https://doi.org/10.1116/1.4940885
Published: February 2016
View article titled, One-dimensional Ar-SF<sub>6</sub> hydromodel at low-pressure in e-beam generated plasmas
Open the PDF for One-dimensional Ar-SF<sub>6</sub> hydromodel at low-pressure in e-beam generated plasmas in another window
Journal Articles

Fluid simulation of the bias effect in inductive/capacitive discharges

Yu-Ru Zhang, Fei Gao, Xue-Chun Li, Annemie Bogaerts, You-Nian Wang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 061303 (2015)
https://doi.org/10.1116/1.4928033
Published: August 2015
View article titled, Fluid simulation of the bias effect in inductive/capacitive discharges
Open the PDF for Fluid simulation of the bias effect in inductive/capacitive discharges in another window
Journal Articles

Chamber wall interactions with HBr/Cl2/O2 plasmas

Ashutosh K. Srivastava, Tomohiro Ohashi, Vincent M. Donnelly
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 041301 (2015)
https://doi.org/10.1116/1.4920933
Published: May 2015
View article titled, Chamber wall interactions with HBr/Cl<sub>2</sub>/O<sub>2</sub> plasmas
Open the PDF for Chamber wall interactions with HBr/Cl<sub>2</sub>/O<sub>2</sub> plasmas in another window
Journal Articles

Etching mechanisms of (In, Ga, Zn)O thin films in CF4/Ar/O2 inductively coupled plasma

Kwangsoo Kim, Alexander Efremov, Junmyung Lee, Kwang-Ho Kwon, Geun Young Yeom
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 031601 (2015)
https://doi.org/10.1116/1.4913735
Published: February 2015
View article titled, Etching mechanisms of (In, Ga, Zn)O thin films in CF<sub>4</sub>/Ar/O<sub>2</sub> inductively coupled plasma
Open the PDF for Etching mechanisms of (In, Ga, Zn)O thin films in CF<sub>4</sub>/Ar/O<sub>2</sub> inductively coupled plasma in another window