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Journal Articles

High power impulse magnetron sputtering of a zirconium target

Featured
Swetha Suresh Babu, Joel Fischer, Kateryna Barynova, Martin Rudolph, Daniel Lundin, Jon Tomas Gudmundsson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 043007 (2024)
https://doi.org/10.1116/6.0003647
Published: June 2024
View article titled, High power impulse magnetron sputtering of a zirconium target
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Journal Articles

Investigating different carbon-based target materials: Can we improve ionization in HiPIMS for the deposition of diamondlike carbon films?

Martin Fenker, Martin Balzer, Holger Kaßner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 043402 (2024)
https://doi.org/10.1116/6.0003333
Published: May 2024
View article titled, Investigating different carbon-based target materials: Can we improve ionization in HiPIMS for the deposition of diamondlike carbon films?
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Journal Articles

Power measurement analysis of moderate pressure capacitively coupled discharges

Shadhin Hussain, Abhishek Verma, Kallol Bera, Shahid Rauf, Matthew Goeckner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 033010 (2024)
https://doi.org/10.1116/6.0003366
Published: April 2024
View article titled, Power measurement analysis of moderate pressure capacitively coupled discharges
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Includes: Supplementary data
Journal Articles

Stannane in extreme ultraviolet lithography and vacuum technology: Synthesis and characterization

Raquel Garza, Nathan Bartlett, Jameson Crouse, Andrew Herschberg, R. Mohan Sankaran, Md. Amzad Hossain, David N. Ruzic
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063209 (2023)
https://doi.org/10.1116/6.0002980
Published: October 2023
View article titled, Stannane in extreme ultraviolet lithography and vacuum technology: Synthesis and characterization
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Journal Articles

Selective generation of reactive oxygen species in plasma-activated water using CO2 plasma

Vikas Rathore, Sudhir Kumar Nema
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 043001 (2023)
https://doi.org/10.1116/6.0002460
Published: May 2023
View article titled, Selective generation of reactive oxygen species in plasma-activated water using CO<sub>2</sub> plasma
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Journal Articles

Thermal atomic layer etching of VO2 using sequential BCl3 and SF4 exposures: Observation of conversion, ligand-exchange, and oxidation state changes

Editor’s Pick
Jonas C. Gertsch, Jonathan L. Partridge, Austin M. Cano, Joel W. Clancey, Victor M. Bright, Steven M. George
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 012603 (2023)
https://doi.org/10.1116/6.0002149
Published: January 2023
View article titled, Thermal atomic layer etching of VO<sub>2</sub> using sequential BCl<sub>3</sub> and SF<sub>4</sub> exposures: Observation of conversion, ligand-exchange, and oxidation state changes
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Includes: Supplementary data
Journal Articles

Atmospheric pressure plasma functionalization of polystyrene

Editor’s Pick
Jordyn Polito, Mark Denning, Richard Stewart, David Frost, Mark J. Kushner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 043001 (2022)
https://doi.org/10.1116/6.0001850
Published: May 2022
View article titled, Atmospheric pressure plasma functionalization of polystyrene
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Journal Articles

Elucidating energetics and kinetics in environmentally relevant mixed gas plasmas

Tara L. Van Surksum, Ellen R. Fisher
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 053001 (2021)
https://doi.org/10.1116/6.0001080
Published: July 2021
View article titled, Elucidating energetics and kinetics in environmentally relevant mixed gas plasmas
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Includes: Supplementary data
Journal Articles

A high-power impulse magnetron sputtering global model for argon plasma–chromium target interactions

Joelle Zgheib, Pierre Yves Jouan, Ahmed Rhallabi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 043004 (2021)
https://doi.org/10.1116/6.0000865
Published: June 2021
View article titled, A high-power impulse magnetron sputtering global model for argon plasma–chromium target interactions
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Journal Articles

Glow discharge-optical emission spectroscopy for in situ analysis of surfaces in plasmas

Priyanka Arora, Junghyun Cho, Rafael Cervantes, Vincent M. Donnelly
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 063004 (2020)
https://doi.org/10.1116/6.0000373
Published: October 2020
View article titled, Glow discharge-optical emission spectroscopy for <em>in situ</em> analysis of surfaces in plasmas
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Journal Articles

Gas-phase diagnostic studies of H2 and CH4 inductively coupled plasmas

Editor’s Pick
Tara L. Van Surksum, Ellen R. Fisher
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 033010 (2020)
https://doi.org/10.1116/6.0000090
Published: April 2020
View article titled, Gas-phase diagnostic studies of H<sub>2</sub> and CH<sub>4</sub> inductively coupled plasmas
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Journal Articles

Excitation mechanisms in a nonequilibrium helium plasma jet emerging in ambient air at 1 atm

Tam Nguyen, Eduardo Hernandez, Vincent M. Donnelly, Demetre J. Economou
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 04F406 (2018)
https://doi.org/10.1116/1.5023693
Published: June 2018
View article titled, Excitation mechanisms in a nonequilibrium helium plasma jet emerging in ambient air at 1 atm
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Journal Articles

Mass spectrometric method for estimating dissociation rates in hydrogen discharge plasmas

A. Cotter, Alexander Stowell, John Carlson, James R. Doyle
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 031304 (2018)
https://doi.org/10.1116/1.5020723
Published: April 2018
View article titled, Mass spectrometric method for estimating dissociation rates in hydrogen discharge plasmas
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Journal Articles

Downstream etching of silicon nitride using continuous-wave and pulsed remote plasma sources sustained in Ar/NF3/O2 mixtures

Editor’s Pick
Shuo Huang, Vladimir Volynets, James R. Hamilton, Sang Ki Nam, In-Cheol Song, Siqing Lu, Jonathan Tennyson, Mark J. Kushner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 021305 (2018)
https://doi.org/10.1116/1.5019673
Published: February 2018
View article titled, Downstream etching of silicon nitride using continuous-wave and pulsed remote plasma sources sustained in Ar/NF<sub>3</sub>/O<sub>2</sub> mixtures
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Journal Articles

Insights to scaling remote plasma sources sustained in NF3 mixtures

Shuo Huang, Vladimir Volynets, James R. Hamilton, Sangheon Lee, In-Cheol Song, Siqing Lu, Jonathan Tennyson, Mark J. Kushner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 031302 (2017)
https://doi.org/10.1116/1.4978551
Published: March 2017
View article titled, Insights to scaling remote plasma sources sustained in NF<sub>3</sub> mixtures
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Journal Articles

Inductively coupled BCl3/Cl2/Ar plasma etching of Al-rich AlGaN

Erica A. Douglas, Carlos A. Sanchez, Robert J. Kaplar, Andrew A. Allerman, Albert G. Baca
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 021305 (2017)
https://doi.org/10.1116/1.4971245
Published: December 2016
View article titled, Inductively coupled BCl<sub>3</sub>/Cl<sub>2</sub>/Ar plasma etching of Al-rich AlGaN
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Journal Articles

Experimental and numerical investigations on time-resolved characteristics of pulsed inductively coupled O2/Ar plasmas

Chan Xue, De-Qi Wen, Wei Liu, Yu-Ru Zhang, Fei Gao, You-Nian Wang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 021301 (2017)
https://doi.org/10.1116/1.4967913
Published: November 2016
View article titled, Experimental and numerical investigations on time-resolved characteristics of pulsed inductively coupled O<sub>2</sub>/Ar plasmas
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Journal Articles

Insights into the mechanism of in-plasma photo-assisted etching using optical emission spectroscopy

Shyam Sridhar, Lei Liu, Emilia W. Hirsch, Vincent M. Donnelly, Demetre J. Economou
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 061303 (2016)
https://doi.org/10.1116/1.4964641
Published: October 2016
View article titled, Insights into the mechanism of in-plasma photo-assisted etching using optical emission spectroscopy
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Journal Articles

Synthesis of hydrogenated diamondlike carbon thin films using neon–acetylene based high power impulse magnetron sputtering discharges

Asim Aijaz, Sascha Louring, Daniel Lundin, Tomáš Kubart, Jens Jensen, Kostas Sarakinos, Ulf Helmersson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 061504 (2016)
https://doi.org/10.1116/1.4964749
Published: October 2016
View article titled, Synthesis of hydrogenated diamondlike carbon thin films using neon–acetylene based high power impulse magnetron sputtering discharges
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Journal Articles

F-atom kinetics in SF6/Ar inductively coupled plasmas

Wei Yang, Shu-Xia Zhao, De-Qi Wen, Wei Liu, Yong-Xin Liu, Xue-Chun Li, You-Nian Wang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 031305 (2016)
https://doi.org/10.1116/1.4945003
Published: March 2016
View article titled, F-atom kinetics in SF<sub>6</sub>/Ar inductively coupled plasmas
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