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Journal Articles

Formation of thin films via cold-rolled/annealed nickel sputtering targets

Sixie Li, Ming Wen, Chuanjun Wang, Yiqing Wang, Yue Shen

J. Vac. Sci. Technol. A 41, 063405 (2023)

https://doi.org/10.1116/6.0003033

Published: October 2023

View article titled, Formation of thin films via cold-rolled/annealed nickel sputtering targets

Journal Articles

Plasma-enhanced atomic layer deposition of crystalline GaN thin films on quartz substrates with sharp interfaces

Sanjie Liu, Yangfeng Li, Qing Liu, Jiayou Tao, Xinhe Zheng

J. Vac. Sci. Technol. A 41, 052405 (2023)

https://doi.org/10.1116/6.0002639

Published: August 2023

View article titled, Plasma-enhanced atomic layer deposition of crystalline GaN thin films on quartz substrates with sharp interfaces

Journal Articles

Atomic layer deposition of MoO_x thin films using Mo(ⁱPrCp)₂H₂ and O₃

Ethan Hendrix, Ben M. Garland, Vamseedhara Vemuri, Nicholas C. Strandwitz

J. Vac. Sci. Technol. A 41, 032409 (2023)

https://doi.org/10.1116/6.0002436

Published: April 2023

View article titled, Atomic layer deposition of MoOx thin films using Mo(iPrCp)2H2 and O3

Journal Articles

Thermal atomic layer etching of cobalt using sulfuryl chloride for chlorination and tetramethylethylenediamine or trimethylphosphine for ligand addition

Jessica A. Murdzek, Ann Lii-Rosales, Steven M. George

J. Vac. Sci. Technol. A 41, 032603 (2023)

https://doi.org/10.1116/6.0002488

Published: April 2023

View article titled, Thermal atomic layer etching of cobalt using sulfuryl chloride for chlorination and tetramethylethylenediamine or trimethylphosphine for ligand addition

Includes: Supplementary data

Journal Articles

Structural, magnetic, and transport properties of Co₂CrAl epitaxial thin film

Guru Dutt Gupt, Rajendra S. Dhaka

J. Vac. Sci. Technol. A 41, 023402 (2023)

https://doi.org/10.1116/6.0002251

Published: January 2023

View article titled, Structural, magnetic, and transport properties of Co2CrAl epitaxial thin film

Journal Articles

Plasma-enhanced atomic layer deposition of WO₃-SiO₂ films using a heteronuclear precursor

Kamesh Mullapudi, Konner E. K. Holden, Jessica L. Peterson, Charles L. Dezelah, Daniel F. Moser, Ravindra K. Kanjolia, Douglas J. Tweet, John F. Conley, Jr

J. Vac. Sci. Technol. A 41, 012406 (2023)

https://doi.org/10.1116/6.0002214

Published: December 2022

View article titled, Plasma-enhanced atomic layer deposition of WO3-SiO2 films using a heteronuclear precursor

Includes: Supplementary data

Journal Articles

Conformal chemical vapor deposition of boron-rich boron carbide thin films from triethylboron

Arun Haridas Choolakkal, Hans Högberg, Jens Birch, Henrik Pedersen

J. Vac. Sci. Technol. A 41, 013401 (2023)

https://doi.org/10.1116/6.0002203

Published: December 2022

View article titled, Conformal chemical vapor deposition of boron-rich boron carbide thin films from triethylboron

Journal Articles

Low temperature, area-selective atomic layer deposition of NiO and Ni

Himamshu C. Nallan, Xin Yang, Brennan M. Coffey, John G. Ekerdt

J. Vac. Sci. Technol. A 40, 062406 (2022)

https://doi.org/10.1116/6.0002068

Published: October 2022

View article titled, Low temperature, area-selective atomic layer deposition of NiO and Ni

Journal Articles

Atomic layer deposition of lithium metaphosphate from H₃PO₄ and P₄O₁₀ facilitated via direct liquid injection: Experiment and theory

Ivan Kundrata, Antónia Mošková, Martin Moško, Matej Mičušík, Edmund Dobročka, Karol Fröhlich

J. Vac. Sci. Technol. A 39, 062407 (2021)

https://doi.org/10.1116/6.0001255

Published: November 2021

View article titled, Atomic layer deposition of lithium metaphosphate from H3PO4 and P4O10 facilitated via direct liquid injection: Experiment and theory

Includes: Supplementary data

Journal Articles

Vacuum ultraviolet enhanced atomic layer etching of ruthenium films

Brennan M. Coffey, Himamshu C. Nallan, John G. Ekerdt

J. Vac. Sci. Technol. A 39, 012601 (2021)

https://doi.org/10.1116/6.0000742

Published: December 2020

View article titled, Vacuum ultraviolet enhanced atomic layer etching of ruthenium films

Includes: Supplementary data

Journal Articles

Achieving near-zero temperature coefficient of resistivity in atomic layer deposition TiSi_xN films through composition tuning

Corbin Feit, Srishti Chugh, Ajit R. Dhamdhere, Hae Young Kim, Shaurya Dabas, Somilkumar J. Rathi, Niloy Mukherjee, Parag Banerjee

J. Vac. Sci. Technol. A 38, 062404 (2020)

https://doi.org/10.1116/6.0000453

Published: October 2020

View article titled, Achieving near-zero temperature coefficient of resistivity in atomic layer deposition TiSixN films through composition tuning

Includes: Supplementary data

Journal Articles

Interfacial chemistry and electronic structure of epitaxial lattice-matched TiN/Al_0.72Sc_0.28N metal/semiconductor superlattices determined with soft x-ray scattering

Bidesh Biswas, Sanjay Nayak, Vijay Bhatia, Ashalatha Indiradevi Kamalasanan Pillai, Magnus Garbrecht, Mohammed H. Modi, Mukul Gupta, Bivas Saha

J. Vac. Sci. Technol. A 38, 053201 (2020)

https://doi.org/10.1116/6.0000180

Published: July 2020

View article titled, Interfacial chemistry and electronic structure of epitaxial lattice-matched TiN/Al0.72Sc0.28N metal/semiconductor superlattices determined with soft x-ray scattering

Journal Articles

Transition in layer structure of atomic/molecular layer deposited ZnO-zincone multilayers

Janne-Petteri Niemelä, Morteza Aghaee, Wilhelmus M. M. (Erwin) Kessels, Mariadriana Creatore, Marcel A. Verheijen

J. Vac. Sci. Technol. A 37, 040602 (2019)

https://doi.org/10.1116/1.5105348

Published: May 2019

View article titled, Transition in layer structure of atomic/molecular layer deposited ZnO-zincone multilayers

Includes: Supplementary data

Journal Articles

Reference-free grazing incidence x-ray fluorescence and reflectometry as a methodology for independent validation of x-ray reflectometry on ultrathin layer stacks and a depth-dependent characterization

Philipp Hönicke, Blanka Detlefs, Emmanuel Nolot, Yves Kayser, Uwe Mühle, Beatrix Pollakowski, Burkhard Beckhoff

J. Vac. Sci. Technol. A 37, 041502 (2019)

https://doi.org/10.1116/1.5094891

Published: May 2019

View article titled, Reference-free grazing incidence x-ray fluorescence and reflectometry as a methodology for independent validation of x-ray reflectometry on ultrathin layer stacks and a depth-dependent characterization

Journal Articles

Measuring thickness in thin NbN films for superconducting devices

Owen Medeiros, Marco Colangelo, Ilya Charaev, Karl K. Berggren

J. Vac. Sci. Technol. A 37, 041501 (2019)

https://doi.org/10.1116/1.5088061

Published: May 2019

View article titled, Measuring thickness in thin NbN films for superconducting devices

Journal Articles

Influence of temperature on atomic layer epitaxial growth of indium nitride assessed with in situ grazing incidence small-angle x-ray scattering

Jeffrey M. Woodward, Samantha G. Rosenberg, Alexander C. Kozen, Neeraj Nepal, Scooter D. Johnson, Christa Wagenbach, Andrew H. Rowley, Zachary R. Robinson, Howie Joress, Karl F. Ludwig, Jr., Charles R. Eddy, Jr.

J. Vac. Sci. Technol. A 37, 030901 (2019)

https://doi.org/10.1116/1.5081919

Published: March 2019

View article titled, Influence of temperature on atomic layer epitaxial growth of indium nitride assessed with in situ grazing incidence small-angle x-ray scattering

Journal Articles

Hydrogen annealing effects on local structures and oxidation states of atomic layer deposited SnO_x

Siliang Chang, Sriram Vijayan, Mark Aindow, Gregory Jursich, Christos G. Takoudis

J. Vac. Sci. Technol. A 36, 031519 (2018)

https://doi.org/10.1116/1.5026696

Published: May 2018

View article titled, Hydrogen annealing effects on local structures and oxidation states of atomic layer deposited SnOx

Includes: Supplementary data

Journal Articles

Atomic layer deposition of 2D and 3D standards for synchrotron-based quantitative composition and structure analysis methods

Nicholas G. Becker, Anna L. Butterworth, Murielle Salome, Stephen R. Sutton, Vincent De Andrade, Andrey Sokolov, Andrew J. Westphal, Thomas Proslier

J. Vac. Sci. Technol. A 36, 02D403 (2018)

https://doi.org/10.1116/1.5025240

Published: February 2018

View article titled, Atomic layer deposition of 2D and 3D standards for synchrotron-based quantitative composition and structure analysis methods

Includes: Supplementary data

Journal Articles

Growth behavior and structural analysis of atomic layer deposited Sn_xTi_1−xO_y films

Siliang Chang, Christos G. Takoudis

J. Vac. Sci. Technol. A 36, 01A121 (2018)

https://doi.org/10.1116/1.5004993

Published: December 2017

View article titled, Growth behavior and structural analysis of atomic layer deposited SnxTi1−xOy films

Includes: Supplementary data

Journal Articles

Comparison on atomic/molecular layer deposition grown aluminum alkoxide polymer films using alkane and alkyne organic precursors

Devika Choudhury, Gopalan Rajaraman, Shaibal K. Sarkar

J. Vac. Sci. Technol. A 36, 01A108 (2018)

https://doi.org/10.1116/1.4990776

Published: November 2017

View article titled, Comparison on atomic/molecular layer deposition grown aluminum alkoxide polymer films using alkane and alkyne organic precursors

Includes: Supplementary data

NARROW

Topics

Formation of thin films via cold-rolled/annealed nickel sputtering targets

Plasma-enhanced atomic layer deposition of crystalline GaN thin films on quartz substrates with sharp interfaces

Atomic layer deposition of MoO_x thin films using Mo(ⁱPrCp)₂H₂ and O₃

Thermal atomic layer etching of cobalt using sulfuryl chloride for chlorination and tetramethylethylenediamine or trimethylphosphine for ligand addition

Structural, magnetic, and transport properties of Co₂CrAl epitaxial thin film

Plasma-enhanced atomic layer deposition of WO₃-SiO₂ films using a heteronuclear precursor

Conformal chemical vapor deposition of boron-rich boron carbide thin films from triethylboron

Low temperature, area-selective atomic layer deposition of NiO and Ni

Atomic layer deposition of lithium metaphosphate from H₃PO₄ and P₄O₁₀ facilitated via direct liquid injection: Experiment and theory

Vacuum ultraviolet enhanced atomic layer etching of ruthenium films

Achieving near-zero temperature coefficient of resistivity in atomic layer deposition TiSi_xN films through composition tuning

Interfacial chemistry and electronic structure of epitaxial lattice-matched TiN/Al_0.72Sc_0.28N metal/semiconductor superlattices determined with soft x-ray scattering

Transition in layer structure of atomic/molecular layer deposited ZnO-zincone multilayers

Reference-free grazing incidence x-ray fluorescence and reflectometry as a methodology for independent validation of x-ray reflectometry on ultrathin layer stacks and a depth-dependent characterization

Measuring thickness in thin NbN films for superconducting devices

Influence of temperature on atomic layer epitaxial growth of indium nitride assessed with in situ grazing incidence small-angle x-ray scattering

Hydrogen annealing effects on local structures and oxidation states of atomic layer deposited SnO_x

Atomic layer deposition of 2D and 3D standards for synchrotron-based quantitative composition and structure analysis methods

Growth behavior and structural analysis of atomic layer deposited Sn_xTi_1−xO_y films

Comparison on atomic/molecular layer deposition grown aluminum alkoxide polymer films using alkane and alkyne organic precursors

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