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Journal Articles

Ultrathin ZrO2 thickness control on TiO2/ZrO2 core/shell nanoparticles using ZrO2 atomic layer deposition and etching

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Janine D. Sempel, Marja-Leena Kaariainen, Troy A. Colleran, Alejo M. Lifschitz, Steven M. George
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 052604 (2024)
https://doi.org/10.1116/6.0003781
Published: August 2024
View articletitled, Ultrathin ZrO2 thickness control on TiO2/ZrO2 core/shell nanoparticles using ZrO2 atomic layer deposition and etching
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Journal Articles

Etching of elemental layers in oxide molecular beam epitaxy by O2-assisted formation and evaporation of their volatile (sub)oxide: The examples of Ga and Ge

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Wenshan Chen, Kingsley Egbo, Huaide Zhang, Andrea Ardenghi, Oliver Bierwagen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 032708 (2024)
https://doi.org/10.1116/6.0003453
Published: April 2024
View articletitled, Etching of elemental layers in oxide molecular beam epitaxy by O2-assisted formation and evaporation of their volatile (sub)oxide: The examples of Ga and Ge
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Journal Articles

Cross-ionization of the sputtered flux during hybrid high power impulse/direct-current magnetron co-sputtering

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Viktor Šroba, Katarína Viskupová, Bartosz Wicher, Vladyslav Rogoz, Xiao Li, Marián Mikula, Grzegorz Greczynski
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 023410 (2024)
https://doi.org/10.1116/6.0003258
Published: January 2024
View articletitled, Cross-ionization of the sputtered flux during hybrid high power impulse/direct-current magnetron co-sputtering
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Journal Articles

In situ and ex situ quantification of nanoparticle fluxes in magnetron sputter inert gas condensation: A Cu nanoparticle case study

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Florian Knabl, Christine Bandl, Thomas Griesser, Christian Mitterer
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 023201 (2024)
https://doi.org/10.1116/6.0003283
Published: January 2024
View articletitled, In situ and ex situ quantification of nanoparticle fluxes in magnetron sputter inert gas condensation: A Cu nanoparticle case study
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Journal Articles

Thermal atomic layer etching of cobalt using sulfuryl chloride for chlorination and tetramethylethylenediamine or trimethylphosphine for ligand addition

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Jessica A. Murdzek, Ann Lii-Rosales, Steven M. George
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 032603 (2023)
https://doi.org/10.1116/6.0002488
Published: April 2023
View articletitled, Thermal atomic layer etching of cobalt using sulfuryl chloride for chlorination and tetramethylethylenediamine or trimethylphosphine for ligand addition
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Includes: Supplementary data
Journal Articles

Thermal atomic layer etching of VO2 using sequential BCl3 and SF4 exposures: Observation of conversion, ligand-exchange, and oxidation state changes

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Jonas C. Gertsch, Jonathan L. Partridge, Austin M. Cano, Joel W. Clancey, Victor M. Bright, Steven M. George
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 012603 (2023)
https://doi.org/10.1116/6.0002149
Published: January 2023
View articletitled, Thermal atomic layer etching of VO2 using sequential BCl3 and SF4 exposures: Observation of conversion, ligand-exchange, and oxidation state changes
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Includes: Supplementary data
Journal Articles

Reaction mechanism studies on atomic layer deposition process of AlF3

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Heta-Elisa Nieminen, Mikko Ritala
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 022401 (2022)
https://doi.org/10.1116/6.0001624
Published: January 2022
View articletitled, Reaction mechanism studies on atomic layer deposition process of AlF3
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Journal Articles

Plasma-enhanced atomic layer deposition: Correlating O 2 plasma parameters and species to blister formation and conformal film growth

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Andreas Werbrouck, Kevin Van de Kerckhove, Diederik Depla, Dirk Poelman, Philippe F. Smet, Jolien Dendooven, Christophe Detavernier
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 062402 (2021)
https://doi.org/10.1116/6.0001094
Published: September 2021
View articletitled, Plasma-enhanced atomic layer deposition: Correlating O 2 plasma parameters and species to blister formation and conformal film growth
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Includes: Supplementary data
Journal Articles

Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma

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Valerio Di Palma, Harm C. M. Knoops, Wilhelmus M. M. (Erwin) Kessels, Mariadriana Creatore
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 022416 (2020)
https://doi.org/10.1116/1.5143896
Published: February 2020
View articletitled, Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
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Includes: Supplementary data
Journal Articles

Growth of cobalt films at room temperature using sequential exposures of cobalt tricarbonyl nitrosyl and low energy electrons

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Zachary C. Sobell, Andrew S. Cavanagh, Steven M. George
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 060906 (2019)
https://doi.org/10.1116/1.5113711
Published: October 2019
View articletitled, Growth of cobalt films at room temperature using sequential exposures of cobalt tricarbonyl nitrosyl and low energy electrons
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Journal Articles

Calibration of ultra-fine helium leak rates for leak testing of microelectromechanical systems

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Hajime Yoshida, Kenta Arai
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 031602 (2019)
https://doi.org/10.1116/1.5090454
Published: April 2019
View articletitled, Calibration of ultra-fine helium leak rates for leak testing of microelectromechanical systems
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Journal Articles

New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell

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Cathy Bugot, Muriel Bouttemy, Nathanaelle Schneider, Arnaud Etcheberry, Daniel Lincot, Frédérique Donsanti
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 061510 (2018)
https://doi.org/10.1116/1.5048124
Published: October 2018
View articletitled, New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell
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Includes: Supplementary data
Journal Articles

Comparison of permeation of atmospheric gases through Viton O-ring gaskets for different initial conditions

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Makfir Sefa, Janez Setina
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 041603 (2017)
https://doi.org/10.1116/1.4984292
Published: May 2017
View articletitled, Comparison of permeation of atmospheric gases through Viton O-ring gaskets for different initial conditions
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Journal Articles

Uniform deposition of size-selected clusters using Lissajous scanning

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Atsushi Beniya, Hirohito Hirata, Yoshihide Watanabe
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 031601 (2016)
https://doi.org/10.1116/1.4944051
Published: March 2016
View articletitled, Uniform deposition of size-selected clusters using Lissajous scanning
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Includes: Supplementary data
Journal Articles

Outgassing rate measurements of stainless steel and polymers using the difference method

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Katharina Battes, Christian Day, Volker Hauer
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 021603 (2015)
https://doi.org/10.1116/1.4905099
Published: January 2015
View articletitled, Outgassing rate measurements of stainless steel and polymers using the difference method
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Journal Articles

In situ reaction mechanism studies on the Ti(NMe2)2(OiPr)2-D2O and Ti(OiPr)3[MeC(NiPr)2]-D2O atomic layer deposition processes

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Yoann Tomczak, Kjell Knapas, Markku Leskelä, Mikko Ritala
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 32, 01A121 (2014)
https://doi.org/10.1116/1.4843496
Published: December 2013
View articletitled, In situ reaction mechanism studies on the Ti(NMe2)2(OiPr)2-D2O and Ti(OiPr)3[MeC(NiPr)2]-D2O atomic layer deposition processes
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Journal Articles

Waterless TiO2 atomic layer deposition using titanium tetrachloride and titanium tetraisopropoxide

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Virginia R. Anderson, Andrew S. Cavanagh, Aziz I. Abdulagatov, Zachary M. Gibbs, Steven M. George
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 32, 01A114 (2014)
https://doi.org/10.1116/1.4839015
Published: December 2013
View articletitled, Waterless TiO2 atomic layer deposition using titanium tetrachloride and titanium tetraisopropoxide
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Journal Articles

Optimization of closed ion source for a high-sensitivity residual gas analyzer

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Cheolsu Han, Jong Rok Ahn, Sang Jung Ahn, Chang Joon Park
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 32, 021603 (2014)
https://doi.org/10.1116/1.4835635
Published: December 2013
View articletitled, Optimization of closed ion source for a high-sensitivity residual gas analyzer
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Journal Articles

Chemistry of Cu(acac)2 on Ni(110) and Cu(110) surfaces: Implications for atomic layer deposition processes

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Qiang Ma, Francisco Zaera
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 31, 01A112 (2013)
https://doi.org/10.1116/1.4763358
Published: October 2012
View articletitled, Chemistry of Cu(acac)2 on Ni(110) and Cu(110) surfaces: Implications for atomic layer deposition processes
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Journal Articles

Hydrogen measurements using new temperature-programmed desorption mass spectrometry system with double cryopanel-attached quadrupole mass spectrometers

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Yasuhiro Higashi, Norihiro Fujimoto, Hiroyuki Saito, Takashi Sawada
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 30, 051601 (2012)
https://doi.org/10.1116/1.4737134
Published: July 2012
View articletitled, Hydrogen measurements using new temperature-programmed desorption mass spectrometry system with double cryopanel-attached quadrupole mass spectrometers
Open the PDF for Hydrogen measurements using new temperature-programmed desorption mass spectrometry system with double cryopanel-attached quadrupole mass spectrometers in another window