1-20 of 2057
X-ray photoelectron spectroscopy
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Journal Articles

Influence of interface structure on the bonding strength between alumina and diamondlike carbon deposited by plasma-enhanced chemical vapor deposition

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Zhengjie An, Junping Zhao, Dongliang Liu, Jinchu Chen, Chengyan Han, Shuya Cao
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 053401 (2025)
https://doi.org/10.1116/6.0004659
Published: July 2025
View articletitled, Influence of interface structure on the bonding strength between alumina and diamondlike carbon deposited by plasma-enhanced chemical vapor deposition
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Journal Articles

Atomic layer etching of niobium nitride using sequential exposures of O2 and H2/SF6 plasmas

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Azmain A. Hossain, Sela Murphy, David S. Catherall, Anthony J. Ardizzi, Austin J. Minnich
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 042605 (2025)
https://doi.org/10.1116/6.0004548
Published: July 2025
View articletitled, Atomic layer etching of niobium nitride using sequential exposures of O2 and H2/SF6 plasmas
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Journal Articles

Fluorine plasma-assisted remediation of single crystal diamond surfaces

Open Access
M. A. Mathews, Jr., J. B. Levine-Miles, B. B. Pate
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 043009 (2025)
https://doi.org/10.1116/6.0004654
Published: July 2025
View articletitled, Fluorine plasma-assisted remediation of single crystal diamond surfaces
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Journal Articles

Evaluation of electrical characteristics through band alignment and defect analysis of ultrathin Pt/ZrO2–Al2O3–ZrO2/TiN DRAM metal–insulator–metal capacitors

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Suwan Lee, Junmo Kim, Beomho Won, Jiyeong Park, Ashshi Kumar, Jiye Baek, Jin Su Lee, Chang-Hwa Jung, Hanjin Lim, Hyungtak Seo
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 043210 (2025)
https://doi.org/10.1116/6.0004387
Published: July 2025
View articletitled, Evaluation of electrical characteristics through band alignment and defect analysis of ultrathin Pt/ZrO2–Al2O3–ZrO2/TiN DRAM metal–insulator–metal capacitors
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Journal Articles

Interfacial oxide and other species in trimethylaluminum-pretreated atomic layer deposition-Al2O3/GaN characterized by sputter-assisted ToF-SIMS

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B. D. Rummel, J. P. Klesko, M. L. Meyerson, J. A. Ohlhausen, C. E. Glaser, A. T. Binder, P. T. Dickens, R. J. Kaplar
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 042407 (2025)
https://doi.org/10.1116/6.0004311
Published: June 2025
View articletitled, Interfacial oxide and other species in trimethylaluminum-pretreated atomic layer deposition-Al2O3/GaN characterized by sputter-assisted ToF-SIMS
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Journal Articles

Editorial: Submitting your x-ray photoelectron spectral data to Surface Science Spectra

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Richard T. Haasch
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 040403 (2025)
https://doi.org/10.1116/6.0004729
Published: June 2025
View articletitled, Editorial: Submitting your x-ray photoelectron spectral data to Surface Science Spectra
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Journal Articles

Nonlinear decomposition of gallium x-ray induced Auger transitions: A new path to quantify gallium-based III–V materials

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Kirène Gaffar, Solène Béchu, Romain Jouanneaud, Guillaume Monier, Christine Robert-Goumet, Arnaud Etcheberry, Muriel Bouttemy
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 043205 (2025)
https://doi.org/10.1116/6.0004551
Published: June 2025
View articletitled, Nonlinear decomposition of gallium x-ray induced Auger transitions: A new path to quantify gallium-based III–V materials
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Journal Articles

Analysis of x-ray emission spectroscopy (XES) data using artificial intelligence techniques included in the XES Neo package

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Alaina Humiston, Miu Lun Lau, Tim Stack, Evan Restuccia, Alberto Herrera-Gomez, Min Long, Daniel T. Olive, Jeff Terry
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 043411 (2025)
https://doi.org/10.1116/6.0004326
Published: June 2025
View articletitled, Analysis of x-ray emission spectroscopy (XES) data using artificial intelligence techniques included in the XES Neo package
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Journal Articles

Etching characteristics of tungsten and tungsten compounds by energetic fluorocarbon and argon ions

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Hojun Kang, Shunta Kawabata, Tomoko Ito, Song-Yun Kang, Dongkyu Lee, Yuna Lee, Kazuhiro Karahashi, Satoshi Hamaguchi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 043004 (2025)
https://doi.org/10.1116/6.0004658
Published: June 2025
View articletitled, Etching characteristics of tungsten and tungsten compounds by energetic fluorocarbon and argon ions
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Journal Articles

What more can be done with XPS? Highly informative but underused approaches to XPS data collection and analysis

FeaturedScilightOpen Access
Donald R. Baer, Merve Taner Camci, David J. H. Cant, Scott A. Chambers, Hagai Cohen, Pinar Aydogan Gokturk, David J. Morgan, Andrey Shchukarev, Peter M. A. Sherwood, Sefik Suzer, Sven Tougaard, John F. Watts
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 040801 (2025)
https://doi.org/10.1116/6.0004543
Published: May 2025
View articletitled, What more can be done with XPS? Highly informative but underused approaches to XPS data collection and analysis
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Journal Articles

Effect of the repeated application of First Contact™ polymer on xenon-difluoride passivated lithium fluoride on aluminum surfaces for space telescopes

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Joshua Vawdrey, James Hamilton, Drew Watson, Lauren Miner, Osemudiamhen Destiny Amienghemhen, Walter Paxton, David Allred
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 043408 (2025)
https://doi.org/10.1116/6.0004601
Published: May 2025
View articletitled, Effect of the repeated application of First Contact™ polymer on xenon-difluoride passivated lithium fluoride on aluminum surfaces for space telescopes
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Journal Articles

Self-limiting deposition of copper from copper beta-diketonates and plasma electrons

Open Access
Premrudee Promdet, Pentti Niiranen, Simon Lagerkvist, Daniel Lundin, Henrik Pedersen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 040402 (2025)
https://doi.org/10.1116/6.0004410
Published: May 2025
View articletitled, Self-limiting deposition of copper from copper beta-diketonates and plasma electrons
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Journal Articles

Detection of low levels of oxygen in reactive materials by x-ray photoelectron spectroscopy (XPS)

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Jeffrey R. Shallenberger, Robert W. Hengstebeck, Gilbert B. Rayner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 042404 (2025)
https://doi.org/10.1116/6.0004652
Published: May 2025
View articletitled, Detection of low levels of oxygen in reactive materials by x-ray photoelectron spectroscopy (XPS)
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Journal Articles

Role of trace moisture in low temperature thermal ALD of titanium dioxide using tetrakis(dimethylamido) titanium (IV) and molecular oxygen

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Harshdeep S. Bhatia, Gregory Jursich, Christos G. Takoudis
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 042403 (2025)
https://doi.org/10.1116/6.0004434
Published: May 2025
View articletitled, Role of trace moisture in low temperature thermal ALD of titanium dioxide using tetrakis(dimethylamido) titanium (IV) and molecular oxygen
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Journal Articles

In situ metal organic chemical vapor deposition of ultrathin sp2-bonded boron nitride dielectric on gallium nitride

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Michael Snure, Eric W. Blanton, Gordon Grzybowski, Bita Pourbahari, Nabil Bassim, Nicholas R. Glavin
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 043405 (2025)
https://doi.org/10.1116/6.0004483
Published: May 2025
View articletitled, In situ metal organic chemical vapor deposition of ultrathin sp2-bonded boron nitride dielectric on gallium nitride
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Journal Articles

Operando XPS in reactive plasmas: The importance of the wall reactions

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J. Trey Diulus, Ashley R. Head, Jorge Anibal Boscoboinik, Andrei Kolmakov
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 040401 (2025)
https://doi.org/10.1116/6.0004569
Published: May 2025
View articletitled, Operando XPS in reactive plasmas: The importance of the wall reactions
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Journal Articles

Aluminum silicate deposition on polyethylene naphthalate films and its application to Cs absorber in Cs aqueous solution

Open Access
Hibiki Takeda, Haruto Suzuki, Ryo Miyazawa, Masanori Miura, Bashir Ahmmad, Fumihiko Hirose
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 042401 (2025)
https://doi.org/10.1116/6.0004544
Published: May 2025
View articletitled, Aluminum silicate deposition on polyethylene naphthalate films and its application to Cs absorber in Cs aqueous solution
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Journal Articles

Thermal annealing and radiation effects on structural and electrical properties of NbN/GaN superconductor/semiconductor junction

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Stephen Margiotta, Binzhi Liu, Saleh Ahmed Khan, Gabriel Calderon Ortiz, Ahmed Ibreljic, Jinwoo Hwang, A. F. M. Anhar Uddin Bhuiyan
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 042701 (2025)
https://doi.org/10.1116/6.0004539
Published: May 2025
View articletitled, Thermal annealing and radiation effects on structural and electrical properties of NbN/GaN superconductor/semiconductor junction
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Journal Articles

Testing commonly used background removal procedures for XPS quantitation of homogeneous material: Fe2O3, a transition metal oxide example

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Christopher Richard Brundle, Bruce Vincent Crist, Paul S. Bagus
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 033211 (2025)
https://doi.org/10.1116/6.0004533
Published: May 2025
View articletitled, Testing commonly used background removal procedures for XPS quantitation of homogeneous material: Fe2O3, a transition metal oxide example
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Journal Articles

Plasma enhanced atomic layer deposition of silicon nitride and silicon carbonitride using a single source precursor and different plasmas

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Samuel M. Johnson, Jianping Zhao, Tsung-Hsuan Yang, Toshihiko Iwao, Charles Schlechte, John Carroll, Gabriel Blankemeyer, Peter L. G. Ventzek, Joaquin Resasco, Gyeong S. Hwang, John G. Ekerdt
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 032409 (2025)
https://doi.org/10.1116/6.0004510
Published: May 2025
View articletitled, Plasma enhanced atomic layer deposition of silicon nitride and silicon carbonitride using a single source precursor and different plasmas
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