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Journal Articles
Influence of interface structure on the bonding strength between alumina and diamondlike carbon deposited by plasma-enhanced chemical vapor deposition
Available to Purchase
J. Vac. Sci. Technol. A 43, 053401 (2025)
Published: July 2025
Journal Articles
Atomic layer etching of niobium nitride using sequential exposures of O2 and H2/SF6 plasmas
J. Vac. Sci. Technol. A 43, 042605 (2025)
Published: July 2025
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J. Vac. Sci. Technol. A 43, 043009 (2025)
Published: July 2025
Journal Articles
Evaluation of electrical characteristics through band alignment and defect analysis of ultrathin Pt/ZrO2–Al2O3–ZrO2/TiN DRAM metal–insulator–metal capacitors
Available to PurchaseSuwan Lee, Junmo Kim, Beomho Won, Jiyeong Park, Ashshi Kumar, Jiye Baek, Jin Su Lee, Chang-Hwa Jung, Hanjin Lim, Hyungtak Seo
J. Vac. Sci. Technol. A 43, 043210 (2025)
Published: July 2025
Journal Articles
B. D. Rummel, J. P. Klesko, M. L. Meyerson, J. A. Ohlhausen, C. E. Glaser, A. T. Binder, P. T. Dickens, R. J. Kaplar
J. Vac. Sci. Technol. A 43, 042407 (2025)
Published: June 2025
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J. Vac. Sci. Technol. A 43, 040403 (2025)
Published: June 2025
Journal Articles
Nonlinear decomposition of gallium x-ray induced Auger transitions: A new path to quantify gallium-based III–V materials
Available to PurchaseKirène Gaffar, Solène Béchu, Romain Jouanneaud, Guillaume Monier, Christine Robert-Goumet, Arnaud Etcheberry, Muriel Bouttemy
J. Vac. Sci. Technol. A 43, 043205 (2025)
Published: June 2025
Journal Articles
Analysis of x-ray emission spectroscopy (XES) data using artificial intelligence techniques included in the XES Neo package
Alaina Humiston, Miu Lun Lau, Tim Stack, Evan Restuccia, Alberto Herrera-Gomez, Min Long, Daniel T. Olive, Jeff Terry
J. Vac. Sci. Technol. A 43, 043411 (2025)
Published: June 2025
Journal Articles
Etching characteristics of tungsten and tungsten compounds by energetic fluorocarbon and argon ions
Available to PurchaseHojun Kang, Shunta Kawabata, Tomoko Ito, Song-Yun Kang, Dongkyu Lee, Yuna Lee, Kazuhiro Karahashi, Satoshi Hamaguchi
J. Vac. Sci. Technol. A 43, 043004 (2025)
Published: June 2025
Journal Articles
Donald R. Baer, Merve Taner Camci, David J. H. Cant, Scott A. Chambers, Hagai Cohen, Pinar Aydogan Gokturk, David J. Morgan, Andrey Shchukarev, Peter M. A. Sherwood, Sefik Suzer, Sven Tougaard, John F. Watts
J. Vac. Sci. Technol. A 43, 040801 (2025)
Published: May 2025
Journal Articles
Effect of the repeated application of First Contact™ polymer on xenon-difluoride passivated lithium fluoride on aluminum surfaces for space telescopes
Available to PurchaseJoshua Vawdrey, James Hamilton, Drew Watson, Lauren Miner, Osemudiamhen Destiny Amienghemhen, Walter Paxton, David Allred
J. Vac. Sci. Technol. A 43, 043408 (2025)
Published: May 2025
Journal Articles
J. Vac. Sci. Technol. A 43, 040402 (2025)
Published: May 2025
Journal Articles
Detection of low levels of oxygen in reactive materials by x-ray photoelectron spectroscopy (XPS)
J. Vac. Sci. Technol. A 43, 042404 (2025)
Published: May 2025
Journal Articles
Role of trace moisture in low temperature thermal ALD of titanium dioxide using tetrakis(dimethylamido) titanium (IV) and molecular oxygen
Available to Purchase
J. Vac. Sci. Technol. A 43, 042403 (2025)
Published: May 2025
Journal Articles
Michael Snure, Eric W. Blanton, Gordon Grzybowski, Bita Pourbahari, Nabil Bassim, Nicholas R. Glavin
J. Vac. Sci. Technol. A 43, 043405 (2025)
Published: May 2025
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J. Vac. Sci. Technol. A 43, 040401 (2025)
Published: May 2025
Journal Articles
J. Vac. Sci. Technol. A 43, 042401 (2025)
Published: May 2025
Journal Articles
Thermal annealing and radiation effects on structural and electrical properties of NbN/GaN superconductor/semiconductor junction
Available to PurchaseStephen Margiotta, Binzhi Liu, Saleh Ahmed Khan, Gabriel Calderon Ortiz, Ahmed Ibreljic, Jinwoo Hwang, A. F. M. Anhar Uddin Bhuiyan
J. Vac. Sci. Technol. A 43, 042701 (2025)
Published: May 2025
Journal Articles
Testing commonly used background removal procedures for XPS quantitation of homogeneous material: Fe2O3, a transition metal oxide example
Available to Purchase
J. Vac. Sci. Technol. A 43, 033211 (2025)
Published: May 2025
Journal Articles
Plasma enhanced atomic layer deposition of silicon nitride and silicon carbonitride using a single source precursor and different plasmas
Available to PurchaseSamuel M. Johnson, Jianping Zhao, Tsung-Hsuan Yang, Toshihiko Iwao, Charles Schlechte, John Carroll, Gabriel Blankemeyer, Peter L. G. Ventzek, Joaquin Resasco, Gyeong S. Hwang, John G. Ekerdt
J. Vac. Sci. Technol. A 43, 032409 (2025)
Published: May 2025
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