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Journal Articles

OrbiSIMS depth profiling of semiconductor materials—Useful yield and depth resolution

Featured
Yundong Zhou, Alexis Franquet, Valentina Spampinato, Alex Merkulov, Michael R. Keenan, Paul A. W. van der Heide, Gustavo F. Trindade, Wilfried Vandervorst, Ian S. Gilmore
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 053208 (2024)
https://doi.org/10.1116/6.0003821
Published: September 2024
View article titled, OrbiSIMS depth profiling of semiconductor materials—Useful yield and depth resolution
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Journal Articles

Practical guides for x-ray photoelectron spectroscopy: Use of argon ion beams for sputter depth profiling and cleaning

Editor’s Pick
Alexander G. Shard, Mark A. Baker
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 050801 (2024)
https://doi.org/10.1116/6.0003681
Published: July 2024
View article titled, Practical guides for x-ray photoelectron spectroscopy: Use of argon ion beams for sputter depth profiling and cleaning
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Journal Articles

Best practices for performing quantitative TOF-SIMS analyses

FeaturedScilight
Alan M. Spool, Lorie Finney
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 043204 (2024)
https://doi.org/10.1116/6.0003660
Published: July 2024
View article titled, Best practices for performing quantitative TOF-SIMS analyses
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Journal Articles

Selecting the best surface analysis method for your materials/samples

Featured
Kye J. Robinson, Helmut Thissen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 040801 (2024)
https://doi.org/10.1116/6.0003576
Published: May 2024
View article titled, Selecting the best surface analysis method for your materials/samples
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Journal Articles

Inhibition of atomic layer deposition of TiO2 by functionalizing silicon surface with 4-fluorophenylboronic acid

Dhamelyz Silva-Quinones, John R. Mason, Robert Norden, Andrew V. Teplyakov
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 032402 (2024)
https://doi.org/10.1116/6.0003316
Published: March 2024
View article titled, Inhibition of atomic layer deposition of TiO<sub>2</sub> by functionalizing silicon surface with 4-fluorophenylboronic acid
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Includes: Supplementary data
Journal Articles

Nucleation of highly uniform AlN thin films by high volume batch ALD on 200 mm platform

Editor’s Pick
Partha Mukhopadhyay, Ivan Fletcher, Zuriel Caribe Couvertier, Brent Schwab, John Gumpher, Winston V. Schoenfeld, Jon Kretzschmar, Anton deVilliers, Jim Fulford
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 032401 (2024)
https://doi.org/10.1116/6.0003405
Published: March 2024
View article titled, Nucleation of highly uniform AlN thin films by high volume batch ALD on 200 mm platform
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Journal Articles

Atomic layer deposition of ZnO thin films using a liquid cyclopentadienyl-based precursor

Fumikazu Mizutani, Makoto Mizui, Nobutaka Takahashi, Mari Inoue, Toshihide Nabatame
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 022403 (2024)
https://doi.org/10.1116/6.0003178
Published: February 2024
View article titled, Atomic layer deposition of ZnO thin films using a liquid cyclopentadienyl-based precursor
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Includes: Supplementary data
Journal Articles

An examination of the performance of molecular dynamics force fields: Silicon and silicon dioxide reactive ion etching

Editor’s Pick
Seungbo Shim, Joseph R. Vella, Jack S. Draney, Donghyeon Na, David B. Graves
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 023207 (2024)
https://doi.org/10.1116/6.0003425
Published: February 2024
View article titled, An examination of the performance of molecular dynamics force fields: Silicon and silicon dioxide reactive ion etching
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Includes: Supplementary data
Journal Articles

ToF-SIMS analysis of ultrathin films and their fragmentation patterns

Shin Muramoto, Daniel J. Graham, David G. Castner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 023416 (2024)
https://doi.org/10.1116/6.0003249
Published: February 2024
View article titled, ToF-SIMS analysis of ultrathin films and their fragmentation patterns
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Includes: Supplementary data
Journal Articles

Area-selective atomic layer deposition of palladium

Editor’s Pick
Himamshu C. Nallan, Xin Yang, Brennan M. Coffey, Andrei Dolocan, John G. Ekerdt
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 022401 (2024)
https://doi.org/10.1116/6.0003261
Published: January 2024
View article titled, Area-selective atomic layer deposition of palladium
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Includes: Supplementary data
Journal Articles

Hydrogen absorption in an epitaxial thin film of high-entropy perovskite oxide

Editor’s Pick
Takahiro Ozawa, Kaidong Wang, Kazunori Nishio, Ryota Shimizu, Taro Hitosugi, Katsuyuki Fukutani
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 023402 (2024)
https://doi.org/10.1116/6.0003256
Published: January 2024
View article titled, Hydrogen absorption in an epitaxial thin film of high-entropy perovskite oxide
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Journal Articles

Oxidation properties of quaternary Zr-based diboride thin films grown by hybrid high-power impulse/DC magnetron co-sputtering

Babak Bakhit
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 010401 (2024)
https://doi.org/10.1116/6.0003197
Published: December 2023
View article titled, Oxidation properties of quaternary Zr-based diboride thin films grown by hybrid high-power impulse/DC magnetron co-sputtering
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Journal Articles

Angle resolved x-ray photoelectron spectroscopy assessment of the structure and composition of nanofilms—including uncertainties—through the multilayer model

Alberto Herrera-Gomez, Dulce Maria Guzman-Bucio, Marisol Mayorga-Garay, Orlando Cortazar-Martinez
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063206 (2023)
https://doi.org/10.1116/6.0002981
Published: October 2023
View article titled, Angle resolved x-ray photoelectron spectroscopy assessment of the structure and composition of nanofilms—including uncertainties—through the multilayer model
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Journal Articles

Selective mask deposition using SiCl4 plasma for highly selective etching process

Miyako Matsui, Makoto Miura, Kenichi Kuwahara
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063002 (2023)
https://doi.org/10.1116/6.0002773
Published: September 2023
View article titled, Selective mask deposition using SiCl<sub>4</sub> plasma for highly selective etching process
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Journal Articles

Comparing sputter rates, depth resolution, and ion yields for different gas cluster ion beams (GCIB): A practical guide to choosing the best GCIB for every application

Editor’s Pick
N. Sano, A. Bellew, P. Blenkinsopp
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053204 (2023)
https://doi.org/10.1116/6.0002864
Published: July 2023
View article titled, Comparing sputter rates, depth resolution, and ion yields for different gas cluster ion beams (GCIB): A practical guide to choosing the best GCIB for every application
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Journal Articles

Plasma-enhanced atomic layer deposition of silicon nitride for front-end-of-line applications

Marco Lisker, Mamathamba Kalishettyhalli Mahadevaiah, Keerthi Dorai Swamy Reddy
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 042406 (2023)
https://doi.org/10.1116/6.0002424
Published: July 2023
View article titled, Plasma-enhanced atomic layer deposition of silicon nitride for front-end-of-line applications
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Journal Articles

Fundamentals of thin film depth profiling by glow discharge optical emission spectroscopy

Editor’s Pick
Alenka Vesel, Rok Zaplotnik, Gregor Primc, Miran Mozetic
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 040801 (2023)
https://doi.org/10.1116/6.0002695
Published: June 2023
View article titled, Fundamentals of thin film depth profiling by glow discharge optical emission spectroscopy
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Journal Articles

Resolving buried interfaces with low energy ion scattering

Adele Valpreda, Jacobus M. Sturm, Andrey E. Yakshin, Marcelo Ackermann
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 043203 (2023)
https://doi.org/10.1116/6.0002567
Published: May 2023
View article titled, Resolving buried interfaces with low energy ion scattering
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Journal Articles

XPS investigation of monoatomic and cluster argon sputtering of zirconium dioxide

Michael C. Burrell, Edward Gillman
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 043202 (2023)
https://doi.org/10.1116/6.0002630
Published: May 2023
View article titled, XPS investigation of monoatomic and cluster argon sputtering of zirconium dioxide
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Journal Articles

Correlating elemental compositions and charge carrier profiles in ultra-pure GaN/AlGaN stacks grown by molecular beam epitaxy

Editor’s Pick
Stefan Schmult, Pascal Appelt, Claudia Silva, Steffen Wirth, Andre Wachowiak, Andreas Großer, Thomas Mikolajick
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 042702 (2023)
https://doi.org/10.1116/6.0002652
Published: May 2023
View article titled, Correlating elemental compositions and charge carrier profiles in ultra-pure GaN/AlGaN stacks grown by molecular beam epitaxy
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