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Journal Articles

Preparation and properties of CrNiWMoCoTi gradient high entropy alloy layer by plasma surface metallurgy

Hu Chen, Chenglei Wang, Jinxu Lu, Junfeng Chen, Yatao Zhu, Zhujiang Tan, Mei Huang, Jingya Zhang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 063103 (2024)
https://doi.org/10.1116/6.0003917
Published: September 2024
View article titled, Preparation and properties of CrNiWMoCoTi gradient high entropy alloy layer by plasma surface metallurgy
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Journal Articles

Remote inductively coupled plasmas in Ar/N2 mixtures and implications for plasma enhanced ALD

Editor’s Pick
David R. Boris, Michael J. Johnson, Jeffrey M. Woodward, Virginia D. Wheeler, Scott G. Walton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 033008 (2024)
https://doi.org/10.1116/6.0003538
Published: April 2024
View article titled, Remote inductively coupled plasmas in Ar/N<sub>2</sub> mixtures and implications for plasma enhanced ALD
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Journal Articles

Fabrication of the low-k films with tunable k value as spacers in advanced CMOS technology

Lewen Qian, Xin Sun, Tao Liu, Ziqiang Huang, Xinlong Guo, Maolin Pan, Dawei Wang, Saisheng Xu, Min Xu, Chen Wang, Chunlei Wu, David Wei Zhang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 023423 (2024)
https://doi.org/10.1116/6.0003357
Published: February 2024
View article titled, Fabrication of the low-k films with tunable k value as spacers in advanced CMOS technology
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Journal Articles

Atomic layer deposition of ZnO thin films using a liquid cyclopentadienyl-based precursor

Fumikazu Mizutani, Makoto Mizui, Nobutaka Takahashi, Mari Inoue, Toshihide Nabatame
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 022403 (2024)
https://doi.org/10.1116/6.0003178
Published: February 2024
View article titled, Atomic layer deposition of ZnO thin films using a liquid cyclopentadienyl-based precursor
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Includes: Supplementary data
Journal Articles

Hollow-cathode plasma deposited vanadium oxide films: Metal precursor influence on growth and material properties

Adnan Mohammad, Krishna D. Joshi, Dhan Rana, Saidjafarzoda Ilhom, Barrett Wells, Boris Sinkovic, Ali K. Okyay, Necmi Biyikli
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 012406 (2024)
https://doi.org/10.1116/6.0002988
Published: January 2024
View article titled, Hollow-cathode plasma deposited vanadium oxide films: Metal precursor influence on growth and material properties
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Includes: Supplementary data
Journal Articles

Annealing modulated microstructural and electrical properties of plasma-enhanced atomic layer deposition-derived HfO2/SiO2 nanolaminates on AlGaN/GaN

Editor’s Pick
Boxun Wang, Yao Li, Minran Chen, Duo Cao, Feng Liu, Zhongjian Wang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 012401 (2024)
https://doi.org/10.1116/6.0003000
Published: December 2023
View article titled, Annealing modulated microstructural and electrical properties of plasma-enhanced atomic layer deposition-derived HfO<sub>2</sub>/SiO<sub>2</sub> nanolaminates on AlGaN/GaN
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Journal Articles

Ternary Ga–Sn–O and quaternary In–Ga–Sn–O channel based thin film transistors fabricated by plasma-enhanced atomic layer deposition

Editor’s Pick
Jong Hyeon Won, Hyeonhui Jo, Pil Ju Youn, Bo Keun Park, Taek-Mo Chung, Jeong Hwan Han
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 062406 (2023)
https://doi.org/10.1116/6.0003004
Published: October 2023
View article titled, Ternary Ga–Sn–O and quaternary In–Ga–Sn–O channel based thin film transistors fabricated by plasma-enhanced atomic layer deposition
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Includes: Supplementary data
Journal Articles

Plasma-enhanced atomic layer deposition of crystalline Ga2S3 thin films

Editor’s Pick
Femi Mathew, Nithin Poonkottil, Eduardo Solano, Dirk Poelman, Zeger Hens, Christophe Detavernier, Jolien Dendooven
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 060401 (2023)
https://doi.org/10.1116/6.0002993
Published: October 2023
View article titled, Plasma-enhanced atomic layer deposition of crystalline Ga<sub>2</sub>S<sub>3</sub> thin films
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Includes: Supplementary data
Journal Articles

Plasma-enhanced atomic layer deposition of molybdenum carbide and carbonitride films using bis(isopropylcyclopentadienyl)molybdenum(IV) dihydride and an H2/N2/Ar plasma

Editor’s Pick
Wangu Kang, Ji Sang Ahn, Jeong Hwan Han
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 062401 (2023)
https://doi.org/10.1116/6.0002970
Published: September 2023
View article titled, Plasma-enhanced atomic layer deposition of molybdenum carbide and carbonitride films using bis(isopropylcyclopentadienyl)molybdenum(IV) dihydride and an H<sub>2</sub>/N<sub>2</sub>/Ar plasma
Open the PDF for Plasma-enhanced atomic layer deposition of molybdenum carbide and carbonitride films using bis(isopropylcyclopentadienyl)molybdenum(IV) dihydride and an H<sub>2</sub>/N<sub>2</sub>/Ar plasma in another window
Includes: Supplementary data
Journal Articles

Plasma-enhanced atomic layer deposition of crystalline GaN thin films on quartz substrates with sharp interfaces

Editor’s Pick
Sanjie Liu, Yangfeng Li, Qing Liu, Jiayou Tao, Xinhe Zheng
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 052405 (2023)
https://doi.org/10.1116/6.0002639
Published: August 2023
View article titled, Plasma-enhanced atomic layer deposition of crystalline GaN thin films on quartz substrates with sharp interfaces
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Journal Articles

Effect of atomic layer annealing in plasma-enhanced atomic layer deposition of aluminum nitride on silicon

Editor’s Pick
Heli Seppänen, Igor Prozheev, Christoffer Kauppinen, Sami Suihkonen, Kenichiro Mizohata, Harri Lipsanen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 052401 (2023)
https://doi.org/10.1116/6.0002705
Published: July 2023
View article titled, Effect of atomic layer annealing in plasma-enhanced atomic layer deposition of aluminum nitride on silicon
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Journal Articles

Plasma-enhanced atomic layer deposition of silicon nitride for front-end-of-line applications

Marco Lisker, Mamathamba Kalishettyhalli Mahadevaiah, Keerthi Dorai Swamy Reddy
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 042406 (2023)
https://doi.org/10.1116/6.0002424
Published: July 2023
View article titled, Plasma-enhanced atomic layer deposition of silicon nitride for front-end-of-line applications
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Journal Articles

Plasma enhanced atomic layer deposition of manganese nitride thin film from manganese amidinate and ammonia plasma

Sen Chen, Jiaxuan Ren, Douhao Yang, Lijun Sang, Bowen Liu, Qiang Chen, Zhongwei Liu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 042401 (2023)
https://doi.org/10.1116/6.0002484
Published: May 2023
View article titled, Plasma enhanced atomic layer deposition of manganese nitride thin film from manganese amidinate and ammonia plasma
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Includes: Supplementary data
Journal Articles

Microkinetic based growth and property modeling of plasma enhanced atomic layer deposition silicon nitride thin film

Editor’s Pick
Toshihiko Iwao, Tsung-Hsuan Yang, Gyeong S. Hwang, Peter L. G. Ventzek
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 032410 (2023)
https://doi.org/10.1116/6.0002499
Published: May 2023
View article titled, Microkinetic based growth and property modeling of plasma enhanced atomic layer deposition silicon nitride thin film
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Journal Articles

Conductive TiN thin films grown by plasma-enhanced atomic layer deposition: Effects of N-sources and thermal treatments

Editor’s Pick
Clémence Badie, Héloïse Tissot, Beniamino Sciacca, Maïssa K. Barr, Julien Bachmann, Christophe Vallée, Gaël Gautier, Thomas Defforge, Vincent Astie, Jean-Manuel Decams, Mikhael Bechelany, Lionel Santinacci
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 032401 (2023)
https://doi.org/10.1116/6.0002288
Published: March 2023
View article titled, Conductive TiN thin films grown by plasma-enhanced atomic layer deposition: Effects of N-sources and thermal treatments
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Includes: Supplementary data
Journal Articles

Characterization of neutral species in an NH3-Ar plasma generated by a capacitively coupled plasma source at various radio frequencies

S. M. Johnson, J. P. Zhao, C. Schlechte, J. Carroll, T. Iwao, P. L. G. Ventzek, J. G. Ekerdt
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 023002 (2023)
https://doi.org/10.1116/6.0002247
Published: February 2023
View article titled, Characterization of neutral species in an NH<sub>3</sub>-Ar plasma generated by a capacitively coupled plasma source at various radio frequencies
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Includes: Supplementary data
Journal Articles

Plasma-enhanced atomic layer deposition of WO3-SiO2 films using a heteronuclear precursor

Editor’s Pick
Kamesh Mullapudi, Konner E. K. Holden, Jessica L. Peterson, Charles L. Dezelah, Daniel F. Moser, Ravindra K. Kanjolia, Douglas J. Tweet, John F. Conley, Jr
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 012406 (2023)
https://doi.org/10.1116/6.0002214
Published: December 2022
View article titled, Plasma-enhanced atomic layer deposition of WO<sub>3</sub>-SiO<sub>2</sub> films using a heteronuclear precursor
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Includes: Supplementary data
Journal Articles

Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition

Editor’s Pick
Jeffrey M. Woodward, Samantha G. Rosenberg, David R. Boris, Michael J. Johnson, Scott G. Walton, Scooter D. Johnson, Zachary R. Robinson, Neeraj Nepal, Karl F. Ludwig, Jr., Jennifer K. Hite, Charles R. Eddy, Jr.
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 062405 (2022)
https://doi.org/10.1116/6.0002021
Published: October 2022
View article titled, Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition
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Includes: Supplementary data
Journal Articles

Simple thermal vapor deposition process for and characterization of n-type indium oxysulfide thin films

Editor’s Pick
Ashwin Jayaraman, Sang Bok Kim, Luke M. Davis, Xiabing Lou, Xizhu Zhao, Roy G. Gordon
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 062402 (2022)
https://doi.org/10.1116/6.0001997
Published: September 2022
View article titled, Simple thermal vapor deposition process for and characterization of n-type indium oxysulfide thin films
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Includes: Supplementary data
Journal Articles

Synthesis and characteristics of Sn-doped SiO2 via plasma-enhanced atomic layer deposition for self-aligned patterning

Suhyeon Park, Junyung An, Hyeongtag Jeon
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 062401 (2022)
https://doi.org/10.1116/6.0001895
Published: September 2022
View article titled, Synthesis and characteristics of Sn-doped SiO<sub>2</sub> via plasma-enhanced atomic layer deposition for self-aligned patterning
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