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Journal Articles
Chemical vapor deposition of zirconium(IV) sulfide on flexible polymers
Available to Purchase
J. Vac. Sci. Technol. A 43, 053402 (2025)
Published: July 2025
Journal Articles
Rainer Hippler, Anna Kapran, Harm Wulff, Natalia Nepomniashchaia, Zdenek Remes, Jiri Olejnicek, Martin Cada, Zdenek Hubicka
J. Vac. Sci. Technol. A 43, 053002 (2025)
Published: July 2025
Journal Articles
Atomic layer etching of niobium nitride using sequential exposures of O2 and H2/SF6 plasmas
J. Vac. Sci. Technol. A 43, 042605 (2025)
Published: July 2025
Journal Articles
J. Vac. Sci. Technol. A 43, 043414 (2025)
Published: July 2025
Journal Articles
Combining molecular beam epitaxy and low-energy electron microscopy with in situ magnetic susceptibility measurements within an integrated ultrahigh vacuum system
J. Vac. Sci. Technol. A 43, 042703 (2025)
Published: July 2025
Journal Articles
Evaluation of electrical characteristics through band alignment and defect analysis of ultrathin Pt/ZrO2–Al2O3–ZrO2/TiN DRAM metal–insulator–metal capacitors
Available to PurchaseSuwan Lee, Junmo Kim, Beomho Won, Jiyeong Park, Ashshi Kumar, Jiye Baek, Jin Su Lee, Chang-Hwa Jung, Hanjin Lim, Hyungtak Seo
J. Vac. Sci. Technol. A 43, 043210 (2025)
Published: July 2025
Journal Articles
Metalorganic chemical vapor deposition epitaxy of β-Ga2O3 films on (001) Ga2O3 substrates with fast growth rates
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J. Vac. Sci. Technol. A 43, 042702 (2025)
Published: June 2025
Journal Articles
Plasma dynamics of modulated pulsed power magnetron sputtered Cr target in an Ar-He atmosphere
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J. Vac. Sci. Technol. A 43, 043109 (2025)
Published: June 2025
Journal Articles
Plasma enhanced atomic layer deposition of HfO2—A potential gate dielectric for GaN-based devices
Open AccessPallabi Paul, Enrico Brusaterra, Ina Ostermay, Eldad Bahat Treidel, Frank Brunner, Anna Mogilatenko, Kashyap Udas, Jos Boschker, Oliver Hilt, Olaf Krüger
J. Vac. Sci. Technol. A 43, 042406 (2025)
Published: June 2025
Journal Articles
Polycrystalline morphology and anomalous Hall effect in RF-sputtered Co2MnGa films
Available to PurchaseCarter E. Wade, Sunny Phan, Katherine E. Coffin, Gabe J. Paynter, Ty J. Cawein, Kurt G. Eyink, Andrei Kogan, Joseph P. Corbett
J. Vac. Sci. Technol. A 43, 043412 (2025)
Published: June 2025
Journal Articles
Chemical reactions and crystallization behavior in thermal ALD of BaTiO3 thin films from bis-(1,2,4 triisopropylcyclopentadienyl)-barium and titanium isopropoxide precursors
J. Vac. Sci. Technol. A 43, 042405 (2025)
Published: June 2025
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J. Vac. Sci. Technol. A 43, 043410 (2025)
Published: June 2025
Journal Articles
Effect of the repeated application of First Contact™ polymer on xenon-difluoride passivated lithium fluoride on aluminum surfaces for space telescopes
Available to PurchaseJoshua Vawdrey, James Hamilton, Drew Watson, Lauren Miner, Osemudiamhen Destiny Amienghemhen, Walter Paxton, David Allred
J. Vac. Sci. Technol. A 43, 043408 (2025)
Published: May 2025
Journal Articles
Hard x-ray detection by using β-Ga2O3 devices fabricated through radiofrequency sputtering
Available to PurchaseVenkatesh Narasihman, Deveshwar Sasikumar, Balaji Gururajan, Wei-Sheng Liu, Sheng Hsiang Kao, Ting-Rui Hsu
J. Vac. Sci. Technol. A 43, 043407 (2025)
Published: May 2025
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J. Vac. Sci. Technol. A 43, 041601 (2025)
Published: May 2025
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J. Vac. Sci. Technol. A 43, 040402 (2025)
Published: May 2025
Journal Articles
Detection of low levels of oxygen in reactive materials by x-ray photoelectron spectroscopy (XPS)
J. Vac. Sci. Technol. A 43, 042404 (2025)
Published: May 2025
Journal Articles
Role of trace moisture in low temperature thermal ALD of titanium dioxide using tetrakis(dimethylamido) titanium (IV) and molecular oxygen
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J. Vac. Sci. Technol. A 43, 042403 (2025)
Published: May 2025
Journal Articles
In situ, simultaneous spectroscopic ellipsometry and quadrupole mass spectrometry studies of ZnO etching using Hacac and O2 plasma
Terrick McNealy-James, Ruthlyn Mangroo, S. Novia Berriel, Luis Tomar, Eric Bissell, Taylor M. Currie, Justin Moore, Titel Jurca, Parag Banerjee
J. Vac. Sci. Technol. A 43, 042602 (2025)
Published: May 2025
Journal Articles
Atomic layer deposition of entropy stabilized Zr2Ta2O9 and light activated self-rectifying resistive switching
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J. Vac. Sci. Technol. A 43, 042402 (2025)
Published: May 2025
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