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Journal Articles

Promoting subsurface Sn incorporation at Nb(100) oxide surface sites leading to homogeneous Nb3Sn film growth for superconducting radiofrequency applications

Sarah A. Willson, Rachael G. Farber, S. J. Sibener
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 063204 (2024)
https://doi.org/10.1116/6.0003892
Published: September 2024
View article titled, Promoting subsurface Sn incorporation at Nb(100) oxide surface sites leading to homogeneous Nb<sub>3</sub>Sn film growth for superconducting radiofrequency applications
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Journal Articles

In-cycle evolution of thickness and roughness parameters during oxygen plasma enhanced ZnO atomic layer deposition using in situ spectroscopic ellipsometry

Editor’s Pick
Yousra Traouli, Ufuk Kilic, Sema G. Kilic, Matthew Hilfiker, Daniel Schmidt, Stefan Schoeche, Eva Schubert, Mathias Schubert
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 052403 (2024)
https://doi.org/10.1116/6.0003830
Published: September 2024
View article titled, In-cycle evolution of thickness and roughness parameters during oxygen plasma enhanced ZnO atomic layer deposition using <em>in situ</em> spectroscopic ellipsometry
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Journal Articles

Numerical ellipsometry: AI for real-time, in situ process control for absorbing films growing on unknown transparent substrates

Editor’s Pick
F. K. Urban, III, D. Barton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 053405 (2024)
https://doi.org/10.1116/6.0003817
Published: August 2024
View article titled, Numerical ellipsometry: AI for real-time, <em>in situ</em> process control for absorbing films growing on unknown transparent substrates
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Journal Articles

Observation of an abrupt 3D-2D morphological transition in thin Al layers grown by MBE on InGaAs surface

A. Elbaroudy, B. Khromets, F. Sfigakis, E. Bergeron, Y. Shi, M. C. A. Tam, G. Nichols, T. Blaikie, J. Baugh, Z. R. Wasilewski
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 032706 (2024)
https://doi.org/10.1116/6.0003459
Published: April 2024
View article titled, Observation of an abrupt 3D-2D morphological transition in thin Al layers grown by MBE on InGaAs surface
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Journal Articles

Homoepitaxial growth of CaWO4

Hanlin Tang, Kidae Shin, Shuhang Pan, Hanshi Li, Frederick J. Walker, Charles H. Ahn
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 022701 (2024)
https://doi.org/10.1116/6.0003181
Published: January 2024
View article titled, Homoepitaxial growth of CaWO<sub>4</sub>
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Includes: Supplementary data
Journal Articles

Numerical ellipsometry: Artificial intelligence for real-time, in situ absorbing film process control

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F. K. Urban, III, D. Barton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 023404 (2024)
https://doi.org/10.1116/6.0003196
Published: January 2024
View article titled, Numerical ellipsometry: Artificial intelligence for real-time, <em>in situ</em> absorbing film process control
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Journal Articles

Near-surface electronic structure in strained Ni-ferrite films: An x-ray absorption spectroscopy study

S. Saha, R. Knut, A. Gupta, F. Radu, C. Luo, O. Karis, D. A. Arena
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 012702 (2024)
https://doi.org/10.1116/6.0003095
Published: January 2024
View article titled, Near-surface electronic structure in strained Ni-ferrite films: An x-ray absorption spectroscopy study
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Journal Articles

Growth of large edge length two-dimensional W S 2 using a custom 12-zone atmospheric pressure chemical vapor deposition system

Md Samim Reza, Aman Abhishek Tiwari, Deshdeep Sahdev, Madhusudan Singh
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 012701 (2024)
https://doi.org/10.1116/6.0002985
Published: December 2023
View article titled, Growth of large edge length two-dimensional W S 2 using a custom 12-zone atmospheric pressure chemical vapor deposition system
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Includes: Supplementary data
Journal Articles

Microscopic study of submonolayer nucleation characteristics during GaN (0001) homoepitaxial growth

Peng Su, Wensen Ai, Xuejiang Chen, Lijun Liu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 062704 (2023)
https://doi.org/10.1116/6.0003115
Published: October 2023
View article titled, Microscopic study of submonolayer nucleation characteristics during GaN (0001) homoepitaxial growth
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Journal Articles

Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge

J. Zgheib, L. Berthelot, J. Tranchant, N. Ginot, M.-P. Besland, A. Caillard, T. Minea, A. Rhallabi, P.-Y. Jouan
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063003 (2023)
https://doi.org/10.1116/6.0002857
Published: September 2023
View article titled, Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge
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Journal Articles

Nucleation and quantum confinement of nano-platelet Bi2–Bi2Se3

Margaret M. Brown, Ricardo Ruvalcaba, Katherine M. Burzynski, Derek Winner, Krishnamurthy Mahalingam, Venkata S. Puli, Ryan P. Laing, Tobin C. Muratore, Jeff L. Brown, Kurt G. Eyink, Said Elhamri, Aldo H. Romero, Jonathan Guerrero-Sanchez, Joseph P. Corbett, Amber Reed
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 043406 (2023)
https://doi.org/10.1116/6.0002655
Published: June 2023
View article titled, Nucleation and quantum confinement of nano-platelet Bi<sub>2</sub>–Bi<sub>2</sub>Se<sub>3</sub>
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Includes: Supplementary data
Journal Articles

Plasma-enhanced atomic layer deposition of WO3-SiO2 films using a heteronuclear precursor

Editor’s Pick
Kamesh Mullapudi, Konner E. K. Holden, Jessica L. Peterson, Charles L. Dezelah, Daniel F. Moser, Ravindra K. Kanjolia, Douglas J. Tweet, John F. Conley, Jr
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 012406 (2023)
https://doi.org/10.1116/6.0002214
Published: December 2022
View article titled, Plasma-enhanced atomic layer deposition of WO<sub>3</sub>-SiO<sub>2</sub> films using a heteronuclear precursor
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Includes: Supplementary data
Journal Articles

Bandgap engineering of indium gallium nitride layers grown by plasma-enhanced chemical vapor deposition

Jonathan Emanuel Thomet, Aman Kamlesh Singh, Mélanie Nelly Rouèche, Nils Toggwyler, Franz-Josef Haug, Gabriel Christmann, Sylvain Nicolay, Christophe Ballif, Nicolas Wyrsch, Aïcha Hessler-Wyser, Mathieu Boccard
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 063102 (2022)
https://doi.org/10.1116/6.0002039
Published: November 2022
View article titled, Bandgap engineering of indium gallium nitride layers grown by plasma-enhanced chemical vapor deposition
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Journal Articles

Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition

Editor’s Pick
Jeffrey M. Woodward, Samantha G. Rosenberg, David R. Boris, Michael J. Johnson, Scott G. Walton, Scooter D. Johnson, Zachary R. Robinson, Neeraj Nepal, Karl F. Ludwig, Jr., Jennifer K. Hite, Charles R. Eddy, Jr.
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 062405 (2022)
https://doi.org/10.1116/6.0002021
Published: October 2022
View article titled, Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition
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Includes: Supplementary data
Journal Articles

Effect of V/III ratio and growth pressure on surface and crystal quality of AlN grown on sapphire by metal-organic chemical vapor deposition

Isabel Streicher, Stefano Leone, Lutz Kirste, Oliver Ambacher
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 032702 (2022)
https://doi.org/10.1116/6.0001794
Published: May 2022
View article titled, Effect of V/III ratio and growth pressure on surface and crystal quality of AlN grown on sapphire by metal-organic chemical vapor deposition
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Journal Articles

Substitutional Co-mediated island-edge decoration in Co/Cu(001): A kinetic Monte Carlo study

Marvin A. Albao
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 063201 (2021)
https://doi.org/10.1116/6.0001323
Published: September 2021
View article titled, Substitutional Co-mediated island-edge decoration in Co/Cu(001): A kinetic Monte Carlo study
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Journal Articles

Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches

Editor’s Pick
Moustapha Jaffal, Taguhi Yeghoyan, Gauthier Lefèvre, Rémy Gassilloud, Nicolas Possémé, Christophe Vallée, Marceline Bonvalot
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 030402 (2021)
https://doi.org/10.1116/6.0000969
Published: March 2021
View article titled, Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
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Journal Articles

Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2

Editor’s Pick
Samia Belahcen, Christophe Vallée, Ahmad Bsiesy, Ahmad Chaker, Moustapha Jaffal, Taguhi Yeghoyan, Marceline Bonvalot
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 012410 (2021)
https://doi.org/10.1116/6.0000655
Published: December 2020
View article titled, Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO<sub>2</sub>
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Journal Articles

Chemical vapor deposition of sp2-boron nitride on Si(111) substrates from triethylboron and ammonia: Effect of surface treatments

Laurent Souqui, Henrik Pedersen, Hans Högberg
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 043402 (2020)
https://doi.org/10.1116/1.5145287
Published: May 2020
View article titled, Chemical vapor deposition of sp<sup>2</sup>-boron nitride on Si(111) substrates from triethylboron and ammonia: Effect of surface treatments
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Includes: Supplementary data
Journal Articles

Plasma polymerization of cyclopropylamine in a low-pressure cylindrical magnetron reactor: A PIC-MC study of the roles of ions and radicals

Stella Mathioudaki, Cédric R. Vandenabeele, Romain Tonneau, Andreas Pflug, Jonathan Tennyson, Stéphane Lucas
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 033003 (2020)
https://doi.org/10.1116/1.5142913
Published: April 2020
View article titled, Plasma polymerization of cyclopropylamine in a low-pressure cylindrical magnetron reactor: A PIC-MC study of the roles of ions and radicals
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