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Journal Articles

Impact of the DC intensity and electrode distance on pulsed-DC powder-pack boride layer growth kinetics

I. Campos-Silva, L. E. Castillo-Vela, I. Mejía-Caballero, J. L. Rosales-Lopez, M. Olivares-Luna, K. D. Chaparro-Pérez, F. P. Espino-Cortes, J. M. González-Carmona
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063115 (2023)
https://doi.org/10.1116/6.0003167
Published: November 2023
View article titled, Impact of the DC intensity and electrode distance on pulsed-DC powder-pack boride layer growth kinetics
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Journal Articles

Effect of plasma nitriding substrate current density on the adhesion strength of in situ PVD TiN coatings

Xin Zhang, Xiu-bo Tian, Chun-zhi Gong, Xiang-li Liu, Jin Li
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 033405 (2023)
https://doi.org/10.1116/6.0002353
Published: April 2023
View article titled, Effect of plasma nitriding substrate current density on the adhesion strength of <em>in situ</em> PVD TiN coatings
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Journal Articles

Influence of γ'N and ɛ'N phases on the properties of AISI 304L after low-temperature plasma nitrocarburizing

Jeet Vijay Sah, Pravin Kumari Dwivedi, Subroto Mukherjee, Ghanshyam Jhala, Alphonsa Joseph
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 033101 (2023)
https://doi.org/10.1116/6.0002346
Published: March 2023
View article titled, Influence of γ'<sub>N</sub> and ɛ'<sub>N</sub> phases on the properties of AISI 304L after low-temperature plasma nitrocarburizing
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Journal Articles

In-Cu alloy substrates for low-temperature chemical vapor deposition of Mo2C

Katherine T. Young, Colter Smith, Dale A. Hitchcock, Eric M. Vogel
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 012201 (2021)
https://doi.org/10.1116/6.0000735
Published: December 2020
View article titled, In-Cu alloy substrates for low-temperature chemical vapor deposition of Mo<sub>2</sub>C
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Includes: Supplementary data
Journal Articles

Cathodic cage plasma deposition of TiN and TiO2 thin films on silicon substrates

Romulo R. M. de Sousa, Patricia S. Sato, Bartolomeu C. Viana, Clodomiro Alves, Jr., Akio Nishimoto, Pedro A. P. Nascente
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 041502 (2015)
https://doi.org/10.1116/1.4919770
Published: May 2015
View article titled, Cathodic cage plasma deposition of TiN and TiO<sub>2</sub> thin films on silicon substrates
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Journal Articles

Nitrogen mass transfer models for plasma-based low-energy ion implantation

Bocong Zheng, Kesheng Wang, Zhipeng Zhang, Honglong Che, Mingkai Lei
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 021311 (2015)
https://doi.org/10.1116/1.4907713
Published: February 2015
View article titled, Nitrogen mass transfer models for plasma-based low-energy ion implantation
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Journal Articles

Microstructure evolution of Ti 3 SiC 2 compound cathodes during reactive cathodic arc evaporation

J. Q. Zhu, A. O. Eriksson, N. Ghafoor, M. P. Johansson, G. Greczynski, L. Hultman, J. Rosén, M. Odén
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 29, 031601 (2011)
https://doi.org/10.1116/1.3569052
Published: March 2011
View article titled, Microstructure evolution of Ti 3 SiC 2 compound cathodes during reactive cathodic arc evaporation
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Journal Articles

Characterization of worn Ti–Si cathodes used for reactive cathodic arc evaporation

J. Q. Zhu, A. Eriksson, N. Ghafoor, M. P. Johansson, J. Sjölén, L. Hultman, J. Rosén, M. Odén
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 28, 347–353 (2010)
https://doi.org/10.1116/1.3330767
Published: March 2010
View article titled, Characterization of worn Ti–Si cathodes used for reactive cathodic arc evaporation
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Journal Articles

Gate oxide process control optimization by x-ray photoelectron spectroscopy in a semiconductor fabrication line

A. Le Gouil, N. Cabuil, P. Dupeyrat, B. Dickson, M. Kwan, D. Barge, E. Gurer, O. Doclot, J.-C. Royer
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 26, 805–811 (2008)
https://doi.org/10.1116/1.2902966
Published: July 2008
View article titled, Gate oxide process control optimization by x-ray photoelectron spectroscopy in a semiconductor fabrication line
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Journal Articles

Influence of the microstructure on steel hardening in pulsed plasma nitriding

E. A. Ochoa, C. A. Figueroa
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 26, 328–332 (2008)
https://doi.org/10.1116/1.2889395
Published: March 2008
View article titled, Influence of the microstructure on steel hardening in pulsed plasma nitriding
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Journal Articles

Nitriding of AISI 4140 steel by a low energy broad ion source

E. A. Ochoa, C. A. Figueroa, F. Alvarez
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 24, 2113–2116 (2006)
https://doi.org/10.1116/1.2356480
Published: October 2006
View article titled, Nitriding of AISI 4140 steel by a low energy broad ion source
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Journal Articles

Nitriding of a tool steel with an electron-beam-excited plasma

H. Shoyama, T. Hishida, T. Hara, Y. Dake, T. Mori, H. Nagai, M. Hori, T. Goto
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 24, 1999–2002 (2006)
https://doi.org/10.1116/1.2338563
Published: October 2006
View article titled, Nitriding of a tool steel with an electron-beam-excited plasma
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Journal Articles

Previous heat treatment inducing different plasma nitriding behaviors in martensitic stainless steels

C. A. Figueroa, F. Alvarez, D. R. G. Mitchell, G. A. Collins, K. T. Short
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 24, 1795–1801 (2006)
https://doi.org/10.1116/1.2219759
Published: August 2006
View article titled, Previous heat treatment inducing different plasma nitriding behaviors in martensitic stainless steels
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Journal Articles

In vacuo substrate pretreatments for enhancing nanodiamond formation in electron cyclotron resonance plasma

Kungen Teii, Yutaka Kouzuma, Kiichiro Uchino
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 24, 1802–1806 (2006)
https://doi.org/10.1116/1.2221322
Published: August 2006
View article titled, <em>In vacuo</em> substrate pretreatments for enhancing nanodiamond formation in electron cyclotron resonance plasma
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Journal Articles

In situ formation of bioactive titanium coating using reactive plasma spraying

M. Inagaki, Y. Yokogawa, T. Kameyama
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 23, 755–760 (2005)
https://doi.org/10.1116/1.1885024
Published: June 2005
View article titled, <em>In situ</em> formation of bioactive titanium coating using reactive plasma spraying
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Journal Articles

Structural modifications and corrosion behavior of martensitic stainless steel nitrided by plasma immersion ion implantation

C. A. Figueroa, F. Alvarez, Z. Zhang, G. A. Collins, K. T. Short
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 23, 693–698 (2005)
https://doi.org/10.1116/1.1931681
Published: June 2005
View article titled, Structural modifications and corrosion behavior of martensitic stainless steel nitrided by plasma immersion ion implantation
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Journal Articles

Chemical state of nitrogen in a high nitrogen face-centered-cubic phase formed on plasma source ion nitrided austenitic stainless steel

M. K. Lei, X. M. Zhu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 22, 2067–2070 (2004)
https://doi.org/10.1116/1.1786305
Published: September 2004
View article titled, Chemical state of nitrogen in a high nitrogen face-centered-cubic phase formed on plasma source ion nitrided austenitic stainless steel
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Journal Articles

Electron cyclotron resonance plasma enhanced metalorganic chemical vapor deposition system with monitoring in situ for epitaxial growth of group-III nitrides

Yin Xu, Biao Gu, Fu-Wen Qin
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 22, 302–308 (2004)
https://doi.org/10.1116/1.1641055
Published: February 2004
View article titled, Electron cyclotron resonance plasma enhanced metalorganic chemical vapor deposition system with monitoring <em>in situ</em> for epitaxial growth of group-III nitrides
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Journal Articles

Effects of pretreatment on the performance of diamond-coated cemented carbide cutting tools

Qiang Wang, Qing Zhang, S. G. Wang, S. F. Yoon, J. Ahn, Biaoqin Zhao, W. Z. Tang, J. Q. Miao, F. X. Lu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 21, 1939–1942 (2003)
https://doi.org/10.1116/1.1619419
Published: October 2003
View article titled, Effects of pretreatment on the performance of diamond-coated cemented carbide cutting tools
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Journal Articles

Improvement of bond strength of plasma-sprayed hydroxyapatite/titanium composite coatings on titanium: Partial nitriding of titanium deposits by rf thermal plasma

M. Inagaki, Y. Yokogawa, T. Kameyama
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 21, 1225–1229 (2003)
https://doi.org/10.1116/1.1575224
Published: July 2003
View article titled, Improvement of bond strength of plasma-sprayed hydroxyapatite/titanium composite coatings on titanium: Partial nitriding of titanium deposits by rf thermal plasma
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